Citations refer to the original publication, not to a Scieee localized version.
Ferrer Troyano, F. J., Frutos Rayego, F., García López, F. J., Jiménez, C., & Yubero Valencia, F. (2009). Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature. Elsevier. https://doi.org/10.1016/j.tsf.2009.01.099
Ferrer Troyano, Francisco Javier, et al. Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature. Elsevier, 2009. https://doi.org/10.1016/j.tsf.2009.01.099.
Ferrer Troyano, Francisco Javier, Fabián Frutos Rayego, Francisco Javier García López, C. Jiménez, and Francisco Yubero Valencia. Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature. Elsevier, 2009. https://doi.org/10.1016/j.tsf.2009.01.099.
Ferrer Troyano, F. J. et al. (2009) Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature. Elsevier. Available at: https://doi.org/10.1016/j.tsf.2009.01.099.
F. J. Ferrer Troyano, F. Frutos Rayego, F. J. García López, C. Jiménez, and F. Yubero Valencia, “Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature,” Elsevier, 2009, doi: 10.1016/j.tsf.2009.01.099.
@misc{ferrertroyano2009electrical,
author = {Ferrer Troyano, Francisco Javier and Frutos Rayego, Fabián and García López, Francisco Javier and Jiménez, C. and Yubero Valencia, Francisco},
title = {Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature},
year = {2009},
publisher = {Elsevier},
doi = {10.1016/j.tsf.2009.01.099},
url = {https://doi.org/10.1016/j.tsf.2009.01.099}
}
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