scieee Science in your language
[en] (orig)

LC-VCO design optimization methodology based on the gm/ID ratio for nanometer CMOS technologies

Abstract

In this paper, an LC voltage-controlled oscillator (LC-VCO) design optimization methodology based on the gm/ID technique and on the exploration of all inversion regions of the MOS transistor (MOST) is presented. An in-depth study of the compromises between phase noise and current consumption permits optimization of the design for given specifications. Semiempirical models of MOSTs and inductors, obtained by simulation, jointly with analytical phase noise models, allow to get a design space map where the design tradeoffs are easily identified. Four LC-VCO designs in different inversion regions in a 90-nm CMOS process are obtained with the proposed methodology and verified with electrical simulations. Finally, the implementation and measurements are presented for a 2.4-GHz VCO operating in moderate inversion. The designed VCO draws 440 μA from a 1.2-V power supply and presents a phase noise of -106.2 dBc/Hz at 400 kHz from the carrier.

Read accessible full text

LC-VCO design optimization methodology based on the gm/ID ratio for nanometer CMOS technologies

Author: Fiorelli, Rafaella; Peralías Macías, Eduardo; Silveira Noguerol, Fernando
Publisher: Institute of Electrical and Electronics Engineers
Year: 2011
DOI: 10.1109/TMTT.2011.2132735
Source: https://idus.us.es/bitstreams/c2000014-d705-4184-990a-b5cf48d5a685/download
1
LC-VCO Design Op imiza ion Me hodology
Based on he gm/IDRa io o Nanome e
CMOS Technologies
Ra aella Fio elli, Edua do Pe al´
ıas and Fe nando Sil ei a,
Abs ac
In his pape , an LC-VCO design op imiza ion me hodology based on he gm/ID echnique and on
he explo a ion o all in e sion egions o he MOS ansis o is p esen ed. An in-dep h s udy o he
comp omises be ween phase noise and cu en consump ion pe mi s op imiza ion o he design o gi en
speci ica ions. Semi-empi ical models o MOS ansis o s and induc o s, ob ained by simula ion, join ly
wi h analy ical phase noise models, allow o ge a design space map whe e he design ade-o s a e
easily iden i ied.
Fou LC-VCO designs in di e en in e sion egions in a 90 nm CMOS p ocess a e ob ained wi h
he p oposed me hodology and e i ied wi h elec ical simula ions. Finally, he implemen a ion and
measu emen s a e p esen ed o a 2.4 GHz VCO ope a ing in mode a e in e sion. The designed VCO
d aws 440 µA om a 1.2V powe supply and p esen s a phase noise o −106.2dBc/Hz a 400 kHz
om he ca ie .
I. INTRODUCTION
The inc easing demand o wi eless applica ions wi h special emphasis on low powe equi emen s
o ces adio- equency designe s o wo k a he limi s o he echnology. To achie e hese challeng-
ing speci ica ions, bes pe o mance is manda o y in each block o he ci cui , especially in e ms o
powe consump ion, noise and linea i y. In addi ion, since a ew yea s ago, he ex ended use o CMOS
echnologies enables RF designe s o educe cos s as well as eaching good pe o mance.
Ra aella Fio elli and Edua do Pe al´
ıas a e wi h he Ins i u o de Mic oelec ´
onica de Se illa, CNM-CSIC, Se ille, 41092, Spain
(e-mail:[email p o ec ed], [email p o ec ed]).
Fe nando Sil ei a is wi h he Ins i u o de Ingenie ´
ıa Elc ica, Uni e sidad de la Rep´
ublica, Mon e ideo, 11300, U uguay
(e-mail:[email p o ec ed]).
Oc obe 29, 2013 DRAFT
2
Fig. 1. (a) gm/IDand (b) gds/ID s. i=ID/(W/L) o ou nMOS ansis o s and a VDS = 600 mV . Typical limi s o
s ong (SI), mode a e (MI) and weak (WI) in e sion egions a e shown.
The equi emen s o an RF block, such as gain, noise o powe consump ion, s ongly depend on he RF
applica ion. Fo example, an applica ion ha is e y demanding in e ms o noise would need o accep
high powe consump ion, whe eas a e y low powe design would cope wi h jus enough non- e y-low
noise alues. As hese wo cha ac e is ics a e di ec ly ela ed, hei ade-o has o be achie ed op imizing
he design o RF blocks. This wo k explo es hose comp omises in o de o op imize induc o -capaci o -
ank ol age con olled oscilla o s (LC-VCOs). This s udy is ele an as VCOs, due o hei phase noise,
a e esponsible o mos pa o he e o in he p ocessed signal in an RF ecei e [1], as well as o
a non-negligible pe cen age o he sys em cu en consump ion. The men ioned op imiza ion is done by
exploi ing he consump ion-spec al pu i y ade-o o he VCOs in o de o use jus he needed cu en
o ul ill he applica ion equi emen s. This is achie ed by using he a io o ansconduc ance o d ain
cu en gm/IDme hodology p esen ed in [2], [3] and aking ad an age o ope a ion in all he in e sion
egions (weak, mode a e and s ong) o he MOS ansis o (MOST) [4].
The gm/ID a io o a sa u a ed MOST is di ec ly ela ed o i s in e sion le el. The in e sion le el
is di ec ly associa ed wi h he no malized cu en o cu en densi y, de ined as i=ID/(W/L)and
dependen on he ga e, sou ce and d ain ol ages [5]–[7]. The ela ionship be ween gm/IDand i-and
hence ID o a ce ain MOST aspec a io W/L- is biuni ocal; a ypical o m o his cu e can be
Oc obe 29, 2013 DRAFT
3
app ecia ed in Fig. 1(a). Se e al ac o s make he gm/ID a io a e y use ul pa ame e o desc ibing he
s a e o ope a ion and pe o mance o a MOST and explo ing i s design space. Fi s ly, he ease o w i e
ci cui design exp essions as a unc ion o his pa ame e , since gene ally he ansconduc ance o he
cu en a e pa o hem. Secondly, i s alue gi es a di ec indica ion o he in e sion egion and o he
e iciency o he ansis o in ansla ing cu en consump ion in o ansconduc ance. Finally, i s a ia ion
is cons ained o a e y small ange, e icien ly co e ed wi h a g id o some ens o alues o gm/ID
(e.g. om 3 V−1 o 28 V−1 o a nanome e bulk nMOS). U ilizing his a iable on he exp essions o
he VCO cha ac e is ics and sweeping gm/IDallows o ob ain a se o design space maps o phase noise,
gain, powe consump ion, among o he s, as i will be shown in Sec ion V. This g aphical ep esen a ion
helps he designe o s udy he e olu ion and ade-o s o some o hese cha ac e is ics when wo king
in any o he h ee in e sion egions.
The MOST channel leng h educ ion, as i is shown below, pe mi s he design o RF blocks in weak and
mode a e in e sion (WI/MI) wi h less powe consump ion han when hey a e biased in he adi ional way,
in he s ong in e sion (SI) egion. Se e al RF blocks designed in CMOS echnologies and wo king in MI
o WI ha e been epo ed in he las decade. Po e e al. [8] and Melly e al. [9] p esen , espec i ely, he
design o a ecei e and a ansmi e wo king a 433 MHz in MI. Ramos e al. [10] showed a 950 MHz
LNA in MI-WI. The au ho s ha e p esen ed an RF ampli ie o 900 MHz [11] and a 2.4 GHz VCO [12]
bo h designed in MI egions. Lee and Mohammadi [13] p esen ed a 2.4 GHz VCO design in WI whe eas
Hsieh and Lu [14] designed a 5 GHz ecei e on -end in MI and WI. Finally, Pe umana e al. [15]
designed a sub h eshold 2.4 GHz ecei e . Al hough he men ioned wo ks success ully ake ad an age o
wo king in hese MOS egions o ope a ion, hey do no p esen a sys ema ic me hodology o choosing
he ope a ing poin . This issue is co e ed in his pape o LC-VCOs.
The e ec o mo ing om SI h ough WI implies a conside able cu en educ ion, bu as a coun e pa ,
pa asi ic capaci ances a e highe as he ansis o dimensions inc ease. Tha is why, wi h sub-mic ome e
echnologies, high equency design in MI is limi ed o a ound one gigahe z [11]. Nowadays, he ad en
o nanome e CMOS echnologies p epa ed o adio- equency designs enable o design in MI wi h
wo king equencies o se e al gigahe z. This idea conside s he conse a i e limi whe e he MOS
ansis o equency is below he quasis a ic-limi equency o one en h o T[4], wi h T he MOST
ansi ion equency. To isualize hese ac s, Tand gm/ID e sus IDa e depic ed in Fig. 2 o a pMOS
ansis o in 90 nm echnology. These esul s show ha inc easing ID(i.e. mo ing o SI) leads o a ise
in Tand a educ ion in he gm/ID a io. I is also app ecia ed in Fig. 3, whe e he ela ion be ween T
and gm/IDand he o e d i e ol age VOD =VGS −VT, a pa ame e classically u ilized in RF designs
Oc obe 29, 2013 DRAFT
4
Fig. 2. gm/IDand T e sus IDo a pMOS ansis o wi h an aspec a io o 360 µm/100 nm.
Fig. 3. T e sus gm/IDand e sus he o e d i e ol age VOD o nMOS ansis o s.
o indica e he bias poin , a e depic ed. These plo s also show ha , in spi e o he conside able all in T
when wo king in MI, he esul ing alue is enough o wo k in he RF ange o some gigahe z.
The p oposed op imiza ion me hodology ollows ou s eps. Fi s o all, he DC and low equency,
small signal beha iou o he MOS ansis o has o be e lec ed in sui able exp essions o cu es o
gm/ID,gds/IDand in insic capaci ances e sus i, as i will be discussed in Sec ion II. In second place
comes he ex ac ion o he models o passi e componen s, p esen ed in Sec ion III. In hi d place is he
modeling o he LC-VCO, whe e he exp essions o phase noise (L), ou pu ol age Vou and VCO licke
co ne equency c,1/ 3a e eo de ed o make hem unc ion o gm/IDand i. This s ep is p esen ed
in Sec ion IV. Finally, a design low is p o ided; i o ganizes he necessa y compu a ions based on he
hi d s ep and he decisions cons ained by he VCO speci ica ions, while i uses he echnological da a
Oc obe 29, 2013 DRAFT
5
collec ed in he i s wo s eps. This ou h phase is de eloped in Sec ion V. Sec ions VI and VII alida e
his design me hodology, con as ing ou VCO designs wi h hei co esponden elec ical simula ions
as well as p esen s measu emen esul s o a speci ic implemen a ion. Sec ion VIII summa izes he main
con ibu ions o his wo k.
II. MOS TRANSISTOR ANALYSIS
The i s s ep o he me hodology, in o de o gene a e a da abase wi h i s h ee mos impo an
cha ac e is ic da a, is he co ec modeling o he MOST in DC beha iou and in small signal, low
equency o ope a ion. Fi s ly, he ansconduc ance o cu en a io gm/ID e sus iis used o gi e an
indica ion o he ansis o ope a ion egion as well as o calcula ing MOST dimensions. Secondly, he
ou pu conduc ance gds is also conside ed because in nanome e echnologies his alue is conside ably
inc eased, and especially o LC-VCOs i a ec s he inal ansconduc ance alue. The a io gds/ID
e sus iis also applied he e [3]. In hi d place, he MOST in insic capaci ances a e included because,
in RF, hey subs an ially modi y he ci cui beha iou . Conside ing he quasis a ic limi equency, only
Cij, wi h ij={gs, gd, gb, bs, bd}, a e included. In o de o simpli y he modeling, he capaci ances a e
conside ed o be p opo ional o he MOST ga e a ea, WL. Hence, each no malized MOST capaci ance
C0
ij =Cij/(W L)is conside ed equal o all ansis o s o a speci ic wid h ange. Because C0
ij a e also
dependen on he in e sion zone, he cu e C0
ij e sus iis used. Finally he noise cons an s ha e o be
known. In his wo k we ha e conside ed hese wo cons an s: a) he excess noise ac o λo he whi e
noise [5], and b) he licke noise cons an KF(o K0
, i i is di ided by he MOS no malized oxide
capaci ance C0
ox).
The gm/ID,gds/IDand C0
ij e sus icu es a y only sligh ly wi h MOST wid h and leng h [3]; his
change is only non-negligible in e y na ow de ices. Fig. 1(b) shows, o a 100 nm nMOS ansis o ,
and ou wid hs W={360 nm, 3.6µm, 36 µm, 360 µm}, he simula ed esul s o he cu es o gm/ID
and gds/ID e sus i. Fo his echnology, he sp ead o he cu es is almos impe cep ible. Because o
he sligh a ia ion in he cu es o such a la ge wid h ange, he me hodology p esen ed he e succeeds.
In his pape , a semi-empi ical MOS model is u ilized o desc ibe he MOST because i conside s he
second and highe o de e ec s o nanome e echnologies, and i is easily ob ained by ex ac ing MOS
cha ac e is ics ia DC simula ion. The use o analy ical compac models, such as EKV [5], ACM [6]
o PSP [16], ha e been disca ded because he i ing o pa ame e s is e y ime consuming; howe e ,
i p ope ly se , hese models can also be used. To acqui e he equi ed cha ac e is ics cu es o his
semi-empi ical model, a e y simple scheme is u ilized: ansis o ga e and d ain nodes a e connec ed o
Oc obe 29, 2013 DRAFT

6
a DC ol age sou ce, while sou ce and bulk nodes a e connec ed ei he o g ound (nMOS ansis o ) o o
he supply ol age (pMOS ansis o ). Then, he ga e ol age VGis swep ex ac ing ID,gm,gds and C0
ij.
The d ain ol age is se a ound i s expec ed DC alue in he a ge ci cui . To ge a e y comple e da ase
he same simula ion should be un o a se o wid hs ( o example, he se chosen o Fig. 1), when a
ixed ansis o leng h alue is used. O he wise, ollowing he same idea, a small se o leng hs should
be chosen. Finally, λand KF alues should be ob ained om handling MOST noise da a p o ided by
he ound y o es ima ed om simula ions o measu emen s [17].
III. ANALYSIS OF PASSIVE COMPONENTS
The second s ep in he me hodology is he cha ac e iza ion o passi e componen s. LC-VCOs pe -
o mance is e y much dependen on hei non-ideali ies. Thei cha ac e iza ion can be done ei he by
semi-empi ical models o lib a y cells p o ided by he ound y o by elec omagne ic sol e s such as
ASITIC [18] o ADSTMMomen um. Elec omagne ic sol e has majo d awbacks: 1) he need o ha e he
echnological da a p o ided by he ound y o ob ain accu a e desc ip ions, and 2) he high compu a ional
ime spen o ob ain he solu ions.
In his pape , o he sake o e iciency, we u ilize passi e elemen cells supplied by he ound y. By
means o S-pa ame e analysis, we ob ain hei equi alen complex admi ance a he wo king equency,
0.
A. Induc o modeling
In his wo k, he di e en ial ank induc o is modeled a he oscilla ion equency as a ne wo k o
an equi alen induc o Lind and a pa allel pa asi ic esis o Rind. S-pa ame e analysis is applied o
ex ac he pa ame e s o he model wi h he induc o in a di e en ial con igu a ion. In o de o ob ain
a comple e da abase, he analysis has o be done o a la ge se o induc o s. In his wo k, he bes
induc o is conside ed he one wi h he highes pa allel esis ance, since i will lead o he lowes equi ed
ansconduc ance and hence consump ion, as i will be shown in Sec ion IV. Looking o biuni ocal
ela ionships be ween Lind and Rind, compu a ional ou ines a e implemen ed o ind, o a pa icula
induc ance alue, he nea es bes induc o . Figu e 4 displays he esul ing Rind o sweeping coil conduc o
wid h o ou s anda d 90 nm CMOS p ocess and highligh s he induc o s da ase wi h he maximum
esis ances. The da a in his plo show ha he highes esis ances come wi h he la ges induc ance alues.
Oc obe 29, 2013 DRAFT
7
Fig. 4. Pa allel esis ance e sus induc ance alue Lind o ou induc o wid hs wwi h a common ex e nal diame e o
300 µm, a 0=2.4 GHz. The black line ep esen s he induc o s wi h he highes esis ance.
B. Va ac o modeling
Va ac o pa asi ic esis ance has been usually neglec ed, especially due o i s high alue compa ed wi h
induc o pa asi ic esis ance. Howe e , on-chip coils ha e imp o ed and i is possible o ha e a a ac o
conduc ance compa able wi h induc o conduc ance. The e o e, a ac o pa asi ic esis ance ex ac ion by
simula ions is now necessa y, in o de o check whe he i mus be conside ed in he design.
Fo he accumula ion nMOS a ac o s used in he design p esen ed in Sec ion VI, he maximum alue
o g a o e he a ac o con ol ol age ange is app oxima ely 70 µS; so a ac o conduc ance can be
igno ed compa ed o he conduc ances o he o he VCO componen s.
IV. VCO MODELING
The LC-VCO opology used in his wo k is depic ed in Fig. 5. I shows a c oss-coupled complemen a y
VCO wi h i s LC ank, biased wi h a pMOS cu en mi o , which d i es he Ibias cu en o he LC-
VCO. This pMOS s uc u e is used o i s be e licke noise pe o mance wi h espec o an nMOS one
wi h he same size. C oss-coupled ansis o s p o ide he needed nega i e eedback and a pMOS-nMOS
complemen a y s uc u e inc eases VCO ansconduc ance while consuming he same quiescen d ain
cu en , ID, wi h Ibias = 2 ·ID.
A small-signal model o he LC-VCO o Fig. 5 is displayed in Fig. 6(a) join ly wi h i s simpli ied
model in Fig. 6(b). I comp ises he equi alen induc ance o he di e en ial induc o Lind and he
equi alen capaci ance o he a ac o s C a , bo h calcula ed a he oscilla ion equency 0; he equi alen
pa asi ic capaci ances o he nMOS and pMOS ansis o s CnMOS and CpMOS; and he load capaci ance
Oc obe 29, 2013 DRAFT
8
Fig. 5. C oss coupled complemen a y LC-VCO. Cload ep esen s he di e en ial capaci i e load a he ou pu o he VCO.
Cload. In his pape , he nMOS and pMOS sizing is done in o de o ma ch he pMOS and nMOS
ansconduc ances, gm,p and gm,n, i.e gm,n =gm,p =gm. Conside ing, espec i ely, C ank and g ank as
he equi alen capaci ance and conduc ance o he VCO ank, he well-known oscilla ion equency and
oscilla ion condi ion exp essions a e, espec i ely
0=1
2π√LindC ank
(1)
and
g ank ≤gm,p
2+gm,n
2=gm(2)
whe e
C ank =C a +CpMOS +CnMOS
2+Cload (3)
and
g ank =gind +g a +gds,p
2+gds,n
2(4)
whe e gds,n and gds,p a e he ou pu conduc ances o he nMOS and pMOS ansis o s; gind = 1/Rind
and g a a e he pa asi ic conduc ances o he induc o and a ac o , espec i ely.
Oc obe 29, 2013 DRAFT
9
Fig. 6. Small signal LC-VCO model: (a) a comple e model and (b) a educed model. C ank and g ank a e, espec i ely, he
VCO equi alen capaci ance and conduc ance.
Conside ing he i e capaci ance model o he MOS ansis o , he equi alen c oss-coupled ansis o
capaci ance CMOS, alid bo h o he nMOS and pMOS ansis o s, is
CMOS = 4Cgd + (Cgs +Cgb +Cdb +Cds).(5)
Due o he expec ed echnology pa ame e a ia ions, a sa e y ma gin ac o kosc -usually called
oscilla ion ac o - is u ilized in (2) o ans o m he inequali y o
gm=kosc g ank (6)
whe e kosc is gene ally in he ange o 1.5 o 3.
The MOST in insic gain Ai, de ined as he gain o a common sou ce ansis o ampli ie loaded by
an ideal cu en sou ce [2], is Ai=gm/gds = (gm/ID)/(gds/ID). Since g a is conside ed negligible
wi h espec o gind and gds, (4) is ans o med in o
g ank ∼
=gind +1
2gm,p
Ai,p
+gm,n
Ai,n 
=gind +gm
21
Ai,p
+1
Ai,n .(7)
Oc obe 29, 2013 DRAFT
16
VII. EXPERIMENTAL RESULTS
The cha ac e is ics o he VCO we e measu ed on die using a mic op obe s a ion. To measu e i s
spec um and phase noise he Agilen Spec um Analyze E4440A was employed.
A se o phase noise measu emen s has been done o he ab ica ed chip. Un o una ely, he bu e does
no wo k p ope ly and in e e es wi h he VCO beha iou , so necessa y he measu emen s we e done
wi h he ou pu bu e swi ched o . Figu e 13 displays he a ia ion o 0wi h con ol ol age Vcon ol.
In he inse o Fig. 13, i is shown he VCO spec um o a Vcon ol = 0V. The minimum bias cu en
whe e a clean spec um wi hou in e e e s is ob ained was ID=220 µA. Fo his cu en , he phase noise
e sus he o se equency, wi h he ca ie a 2.16 GHz (Vcon ol = 0V) is shown in Fig. 14. The phase
noise a 400 kHz om he ca ie is -106.2 dBc/Hz. The measu ed licke co ne equency c,1/ 3is
203 kHz, whe eas he simula ed licke co ne equency, shown in Table I, is 72 kHz. This ise in c,1/ 3
espec o he simula ed da a o P4, happens because Vou is dis o ed when he bu e is u ned o . Γa
ises o app oxima ely 0.4, and he compu ed c,1/ 3is 257 kHz, e y nea he measu ed da a.
The cu en IDwas also swep o 310 µA and a se o phase noise measu emen s a 400 kHz om
he ca ie we e pe o med ( o y measu emen s o Lwe e aken o each cu en alue), as depic ed
in Fig. 15, conside ing again a ca ie equency a ound 2.16 GHz. The heo e ical cu e o (11) is
supe imposed wi h expe imen al da a, conside ing α= 0.65,kosc = 3 and γ= 0.55. The i ed model
is ex ended up o he nominal IDcu en o 165 µA, ob aining an ex apola ed phase noise alue o
-104.6 dBc/Hz. Good ag eemen exis s be ween model, simula ions and measu emen s.
The minimum measu ed IDwhe e he VCO wo ks, o h ee samples’ a e age, is 62.5 µA; 13.5%
highe han he expec ed alue o 52 µA ob ained om he design low. The ou pu ol age when he
bu e is swi ched on, o Ibias=440 µA is 630 mV, a bi lowe han expec ed.
Table II compa es he pe o mance o he designed LC-VCO in mode a e in e sion wi h ha o some
p io wo ks, whe e he well known igu e-o -me i (FoM) o he VCO de ined in [22] is used. Ou VCO
is well posi ioned conside ing o he simila designs, as only he second one has a be e FoM. Howe e
he la e occupies mo e a ea han ou design because i uses wo on-chip induc o s, which inc eases he
ank quali y ac o and educes he phase noise.
VIII. CONCLUSIONS
In his pape , an RF LC-VCO design me hodology o nanome e echnologies based on he gm/ID
echnique has been p esen ed. The me hodology p oposed enables a conside able design ime educ ion
Oc obe 29, 2013 DRAFT

17
TABLE II
PERFORMANCE COMPARISON OF RECENTLY PUBLISHED LC-VCOS.
VCO Tech. 0∆ Powe LFoM
(nm) (GHz) (MHz) (mW) (dBc/Hz) (dB)
[23] 180 2.2 1 5.17 -119 179
[13] 180 2.645 0.4 0.63 -106.4 184.8
[15] 180 2.5 1 1.2 -103.7 171
[22] 180 1.57 1 3.06 -120 180
This wo k 90 2.16 0.4 0.53 -106.2 183.6
as li le e-design is needed. I also shows he VCO ade-o s, p o iding be o ehand a global iew o
he VCO beha iou when adjus ing ce ain componen pa ame e s du ing he design.
MOST, induc o and a ac o da a we e ex ac ed om Spec eRF simula ions o accu a ely and quickly
model hese componen s and include ha da a in he design low. VCO modeling equa ions we e modi ied
o in oduce IDand he MOS a iable gm/ID, in o de o easily see he comp omises o wo king in
di e en MOS in e sion egions. Specially, Hajimi i phase noise model equa ions we e e-o de ed o
exp ess hem in e ms o gm/ID. Plo s o se e al a iables in ol ed in he VCO design we e shown
and comp omises wi h he in e sion egion o he selec ion o he induc o we e highligh ed. I has been
shown ha designing in mode a e and weak in e sion leads o educed cu en while phase noise is
inc eased; on he o he hand an inc emen o he induc o alue (and hence a inc emen in i s equi alen
pa allel esis ance) con ibu es o an imp o emen in he VCO spec al pu i y. Fou designs we e simula ed
o alida e he me hod. Finally, an applica ion example was implemen ed o show he use ulness o he
me hod, as well as o p o e he alidi y o he phase noise model. Phase noise esul s om he calcula ions
o ou design ou ines, elec ical simula ions and measu emen s a e in ag eemen .
APPENDIX
DEDUCTION OF PHASE NOISE EXPRESSIONS
A. Exp ession o phase noise o a LC-VCO in he 1/ 2spec um egion.
The exp ession o phase noise o an a bi a y oscilla o in he 1/ 2 egion o he phase noise spec um
exp essed by Hajimi i in [20] is
L1/ 2(∆ ) = 10 log Γ2
ms
q2
max
i2
n/∆
2∆ 2!(16)
Oc obe 29, 2013 DRAFT
18
whe e Γ ms is he ms alue o he impulse sensi i i y unc ion ISF de ined in [20], qmax is he maximum
cha ge displacemen ac oss he capaci o in he ou pu nodes, ∆ is he equency o se espec o he
oscilla ion equency 0, and i2
n/∆ is he powe spec al densi y o he noise sou ce conside ed a he
ou pu nodes.
To e alua e he phase noise exp ession o ou LC-VCO, le ’s ob ain he exp essions o each e m in
(16). Fi s ly we calcula e he mos impo an VCO whi e noise sou ces. Fo simplici y we will conside
ha no co ela ion exis s be ween hem. Supe posi ion will be applied when subs i u ing hei exp essions
in (16).
The gene al exp ession o MOS whi e noise is [4]
i2
w,MOS
∆ = 4kBTγgdo = 4kBTγ
αgm.(17)
The equi alen powe spec al densi y o he wo nMOS and wo pMOS is [24]
i2
w,MOSeq
∆ =1
2(i2
w,n
∆ +i2
w,p
∆ )(18)
Subs i u ing (17) in (18)
i2
w,MOSeq
∆ ∼
=4kBTγgm
1
21
αn
+1
αp
= 4kBTγ
αeq
.(19)
The whi e noise o each c oss-coupled ansis o block due o i s equi alen d ain-sou ce conduc ance
is [4] [25]:
i2
w,gds
∆ = 4kBTgds
2= 4kBTgm
2Ai
.(20)
Conside ing bo h nMOS and pMOS equi alen conduc ances,
i2
w,geq
ds
∆ = 4kBTgm
21
Ai,n
+1
Ai,p .(21)
The whi e noise o he induc o pa allel esis ance Rind = 1/gind is, applying (9),
i2
w,Lind
∆ = 4kBTgind = 4kBTgm
k0
osc
.(22)
The whi e noise powe spec al densi y o he a ac o has been neglec ed o his deduc ion as gene ally
g a gind.
Oc obe 29, 2013 DRAFT
19
The equi alen whi e noise powe spec al densi y o he LC-VCO is, om equa ions, (8), (19), (21)
and (22):
i2
w,V CO
∆ = 4kBTgmγ
αeq
+1
k0
osc
+1
2Ai,n
+1
2Ai,p 
= 4kBTgmγ
αeq
+1
kosc = 4kBTgmλ. (23)
Besides, qmax =C ankVou , whe e C ank is he equi alen capaci ance a he ou pu nodes, exp essed
as:
C ank =1
4π2 2
0Lind
=Q
2π 0R ank
(24)
Then, om (10) and (24), qmax is
qmax =8
π
IDQ
(2π 0)=2IDR ank
(π3) 2
0Lind
.(25)
Finally, subs i u ing (23) and (25) in (16), conside ing Γ ms ≈0.5due o he symme y cha ac e is ics
o his VCO, and eo de ing he e ms, we ob ain
L1/ 2(∆ ) = 10 log kBTπ2
82λ1
Q2
gm
ID
1
ID
2
0
∆ 2!(26)
B. Exp ession o phase noise o a LC-VCO in he 1/ 3spec um egion.
F om [20], he ollowing is he gene al exp ession o he phase nose in he 1/ 3po ion o he phase
noise spec um
L(∆ )1/ 3= 10 log Γ2
a
8q2
max
i21/ /∆
∆ 2!(27)
Conside ing ha only he MOS ansis o s injec s licke noise, he o al powe spec al densi y o he
licke noise sou ces is
i2
1/
∆ =1
2 i2
1/ ,n
∆ +i2
1/ ,p
∆ !
=1
2K0
F,ng2
m
WnL+K0
F,pg2
m
WpL1
(28)
Equa ions (27) oge he wi h (25) and (28) esul s in he ollowing exp ession o phase noise in he 1/ 3
zone in e ms o gm/ID:
L1/ 3(∆ ) = 10 log Γ2
a
8
π2
82
1
L K0
F,n
Wn
+K0
F,p
Wp!
1
Q2 gm
ID!2 2
0
∆ 3!(29)
Oc obe 29, 2013 DRAFT
20
C. Co ne equency o MOST exp essed as a unc ion o gm/IDand i.
The co ne equency o a MOST cis ob ained equaling he exp essions o whi e noise and licke
noise, esul ing in:
c=K0
F
4kBT
α
γ
gm
ID
ID
W/L
1
L2=K0
F
4kBT
α
γ
gm
ID
i1
L2(30)
D. Flicke co ne equency o he VCO phase noise exp essed as a unc ion o gm/IDand i.
The licke co ne equency o he VCO phase noise, ob ained when making equal he phase noise
exp essions a whi e noise and licke zones -(26) and (29), espec i ely-, esul s
c,1/ 3=k0i2
w,n c,n +i2
w,p c,p
i2
w,n +i2
w,p =k0 c,eq.(31)
whe e k0=Γa
2Γ ms 2
.
REFERENCES
[1] D. Leenae s, J. an de Tang, and C. S. Vauche , Ci cui Design o RF T anscei e s, 1s ed. Sp inge , 2001.
[2] F. Sil ei a, D. Fland e, and P. G. A. Jespe s, “A gm/IDbased me hodology o he design o CMOS analog ci cui s and
i s applica ions o he syn hesis o a silicon-on-insula o mic opowe OTA,” IEEE Jou nal o Solid-S a e Ci cui s, ol. 31,
no. 9, pp. 1314–1319, Sep. 1996.
[3] P. G. Jespe s, The gm/IDMe hodology, a sizing ool o low- ol age analog CMOS Ci cui s. Sp inge , 2010.
[4] Y. Tsi idis, Ope a ion and Modelling o he MOS T ansis o , 2nd ed. Ox o d Uni e si y P ess, 2000.
[5] C. Enz and E. Vi oz, Cha ge-based MOS ansis o modeling. John Wiley and Sons, 2006.
[6] A.Cunha, M. C. Schneide , and C. Galup-Mon o o, “An MOS ansis o model o analog ci cui design,” IEEE Jou nal
o Solid-S a e Ci cui s, ol. 33, no. 10, pp. 1510–1519, Oc . 1998.
[7] C. Galup-Mon o o, M. C. Schneide , and A. A. Cunha, “A cu en -based MOSFET model o in eg a ed ci cui design,”
in Low Vol age/Low Powe In eg a ed Ci cui s and Sys ems, E. Snchez-Sinencio and A. And eou, Eds. Pisca away, NJ:
IEEE P ess, 1999, ch. 2, pp. 7–55.
[8] A.-S. Po e , T. Melly, D. Py hon, C. C. Enz, and E. A. Vi oz, “An ul alow -powe UHF anscei e in eg a ed in a s anda d
digi al CMOS p ocess: A chi ec u e and ecei e ,” IEEE Jou nal o Solid-S a e Ci cui s, ol. 36, no. 3, pp. 452–464, Ma .
2001.
[9] T. Melly, A.-S. Po e , C. C. Enz, and E. A. Vi oz, “An ul alow -powe UHF anscei e in eg a ed in a s anda d digi al
CMOS p ocess: T ansmi e ,” IEEE Jou nal o Solid-S a e Ci cui s, ol. 36, no. 3, pp. 467–472, Ma . 2001.
[10] J. Ramos and e al, “90nm RF CMOS echnology o low-powe 900MHz applica ions,” P oceeding o he 34 h Eu opean
Solid-S a e De ice Resea ch con e ence ESSDERC 2004, pp. 329–332, Sep. 2004.
[11] L. Ba boni, R. Fio elli, and F. Sil ei a, “A ool o design explo a ion and powe op imiza ion o CMOS RF ci cui blocks,”
IEEE In e na ional Symposium on Ci cui s and Sys ems ISCAS’06, May 2006.
[12] R. Fio elli, E. Pe al´
ıas, and F. Sil ei a, “Phase noise - consump ion ade-o in low powe RF-LC-VCO design in mic o
and nanome ic echnologies,” in P oceedings o he 22 h Symposium on In eg a ed Ci cui s and Sys ems Design (SBCCI).
Na al, B azil: ACM, Se 2009.
Oc obe 29, 2013 DRAFT
21
[13] H. Lee and S. Mohammadi, “A sub h eshold low phase noise CMOS LC VCO o ul a low powe applica ions,” IEEE
Mic owa e and Wi eless Componen Le e s, ol. 17, no. 11, pp. 796–799, No . 2007.
[14] H.-H. Hsieh and L.-H. Lu, “Design o ul a-low- ol age RF on ends wi h complemen a y cu en - eused a chi ec u es,”
IEEE T ansac ions on Mic owa e Theo y and Techniques, ol. 55, no. 7, pp. 1445–1458, Jul. 2007.
[15] B. Pe umana, S. Chak abo y, C.-H. Lee, and J. Laska , “A low-powe ully monoli hic sub h eshold CMOS ecei e wi h
in eg a ed LO gene a ion o 2.4 GHz wi eless PAN applica ions,” IEEE Jou nal o Solid-S a e Ci cui s, ol. 43, no. 10,
pp. 2229–2238, Oc 2008.
[16] G. Gildenbla , X. Li, W.Wu, H. Wang, A. Jha, R. an Lange elde, G. Smi , A. Schol en, and D. Klaassen, “PSP: An
ad anced su ace-po en ial-based MOSFET model o ci cui simula ion,” IEEE T ansac ions on Elec on De ices, ol. 53,
no. 9, pp. 1979–1993, Sep. 2006.
[17] M. Manghisoni, L. Ra i, V. Re, V. Speziali, and G. T a e si, “Noise cha ac e iza ion o 130 nm and 90 nm CMOS
echnologies o analog on -end elec onics,” in 2006 IEEE Nuclea Science Symposium Con e ence Reco d., 2006, pp.
214–218.
[18] A. M. Niknejad, “Analysis o Si induc o s and ans o me s o IC’s (ASITIC),” 2000, h p:// ic.eecs.be keley.edu/ nikne-
jad/asi ic.h ml.
[19] A. Hajimi i and T. H. Lee, “Design issues in CMOS di e en ial LC oscilla o s,” IEEE Jou nal o Solid-S a e Ci cui s,
ol. 34, no. 5, pp. 717–724, 1999.
[20] A. Hajimi i and T. Lee, “A gene al heo y o phase noise in elec ical oscilla o s,” IEEE Jou nal o Solid-S a e Ci cui s,
ol. 33, no. 2, pp. 179–194, Feb. 1998.
[21] D. Leeson, “A simple model o eedback oscilla o noise spec um,” P oceedings o he IEEE, ol. 54, pp. 329–330, Feb.
1966.
[22] K.-G. Pa k, C.-Y. Jeong, J.-W. Pa k, J.-W. Lee, J.-G. Jo, , and C. Yoo, “Cu en eusing VCO and di ide-by- wo equency
di ide o quad a u e LO gene a ion,” IEEE Mic owa e and Wi eless Componen s Le e s, ol. 18, no. 6, pp. 413–415,
Jun. 2008.
[23] L. L. K. Leung and H. C. Luong, “A 1 V 9.7 mW CMOS equency syn hesize o IEEE 802.11a anscei e s,” IEEE
T ansac ions on Mic owa e Theo y and Techniques, ol. 56, no. 1, pp. 39–48, Jan. 2008.
[24] A. Hajimi i, T ade-o s in Analog Ci cui Design. Kluwe Academic Publishe s, 2002, ch. T ade o s in oscilla o phase
noise, pp. 551–585.
[25] BSIM Resea ch G oup, “BSIM3 3 and BSIM4 MOS Model,” 2008, www-de ice.eecs.be keley.edu/ bsim3/bsim4.h ml.
Ra aella Fio elli Ra aella Fio elli (S’05) was bo n in Mon e ideo, U uguay in 1978. She ecei ed he
B.Sc. and M.Sc. deg ees in Elec ical Enginee ing om he Uni e sidad de la Rep´
ublica, Mon e ideo,
U uguay, in 2002 and 2005 espec i ely. She is cu en ly wo king owa ds he doc o al deg ee in elec ical
enginee ing. In 2003 she joined he Elec ical Enginee ing Ins i u e o he Uni e sidad de la Rep´
ublica,
U uguay. F om 2009 she is wo king in he IMSE-CNM o Se ille, Spain, wi h a MAE-AECIC Spanish
go e nmen g an . He cu en esea ch includes he implemen a ion o design me hodologies o low powe
RF blocks and BIST es in RF.
Oc obe 29, 2013 DRAFT

22
Edua do Pe alas Edua do J. Pe al´
ıas ecei ed he Ph.D. deg ee om he Uni e si y o Se ille, (Spain)
in 1999. Since 2001, he has been wi h he Ins i u o de Mic oelec ´
onica de Se illa (IMSE-CNM-CSIC),
whe e he is cu en ly a Tenu ed Scien is . His main esea ch in e es s ha e been in he a eas o Mixed
Design wi h emphasis on Analog- o-Digi al con e e s, Tes and Design o Tes abili y o Analog and
Mixed-Signal Ci cui s, and S a is ical Beha io al Modeling.
Fe nando Sil ei a Fe nando Sil ei a (S’89- M’90- SM’03) ecei ed he Elec ical Enginee ing deg ee
om Uni e sidad de la Rep´
ublica, U uguay in 1990 and he MSc. and PhD deg ee in Mic oelec onics
om Uni e si `
e ca holique de Lou ain, Belgium in, espec i ely, 1995 and 2002. He is cu en ly P o esso
a he Elec ical Enginee ing Depa men o he School o Enginee ing o Uni e sidad de la Rep´
ublica,
U uguay. His esea ch in e es s a e in design o ul a low-powe analog and RF in eg a ed ci cui s and
sys ems, in pa icula wi h biomedical applica ion. In his ield, he is co-au ho o one book and many
echnical a icles. He has had mul iple indus ial ac i i ies wi h CCC Medical De ices and NanoWa ICs, including leading
he design o an ASIC o implan able pacemake s and designing analog ci cui modules o implan able de ices o a ious
companies wo ldwide.
Oc obe 29, 2013 DRAFT
23
Fig. 10. L1/ 2in dBc/Hz mapped e sus gm/IDand Lind. The ex -box displays he cha ac e is ics and pa ame e s o he
LC-VCO associa ed wi h he picked poin (P4 in his example).
Fig. 11. Phase noise Spec eRF simula ions o designs P1,P2,P3 and P4.
Oc obe 29, 2013 DRAFT
24
Fig. 12. Layou and mic opho og aph o he ab ica ed VCO.
Fig. 13. Ca ie equency 0 e sus Vcon ol and ou pu spec um (inse ) a Vcon ol = 0 wi h he bu e swi ched o .
Oc obe 29, 2013 DRAFT
25
Fig. 14. Lwi h he VCO biased wi h Ibias = 2 ·ID= 440µA and 0= 2.1639GHz (bu e swi ched o ). 1/ 2and 1/ 3
slopes a e shown as well as he es ima ed licke co ne c,1/ 3.
Fig. 15. Phase noise measu ed and es ima ed by (11) sweeping only ID.
Oc obe 29, 2013 DRAFT