Citations refer to the original publication, not to a Scieee localized version.
Barranco Quero, Á., Jiménez Marín, A., Frutos Rayego, F., Cotrino Bautista, J., Yubero Valencia, F., Espinós Manzorro, J. P., & González Elipe, A. R. (2001). Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE. https://doi.org/10.1109/ICSD.2001.955633
Barranco Quero, Ángel, et al. Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE, 2001. https://doi.org/10.1109/ICSD.2001.955633.
Barranco Quero, Ángel, Alfonso Jiménez Marín, Fabián Frutos Rayego, José Cotrino Bautista, Francisco Yubero Valencia, Juan Pedro Espinós Manzorro, and Agustín Rodríguez González Elipe. Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE, 2001. https://doi.org/10.1109/ICSD.2001.955633.
Barranco Quero, Á. et al. (2001) Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD. IEEE. Available at: https://doi.org/10.1109/ICSD.2001.955633.
Á. Barranco Quero et al., “Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD,” IEEE, 2001, doi: 10.1109/ICSD.2001.955633.
@misc{barrancoquero2001dielectric,
author = {Barranco Quero, Ángel and Jiménez Marín, Alfonso and Frutos Rayego, Fabián and Cotrino Bautista, José and Yubero Valencia, Francisco and Espinós Manzorro, Juan Pedro and González Elipe, Agustín Rodríguez},
title = {Dielectric breakdown of SiO2 thin films deposited by ion beam induced and plasma enhanced CVD},
year = {2001},
publisher = {IEEE},
doi = {10.1109/ICSD.2001.955633},
url = {https://doi.org/10.1109/ICSD.2001.955633}
}
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