Citations refer to the original publication, not to a Scieee localized version.
Yang, J., Bahrami, A., Ding, X., Zhao, P., He, S., Lehmann, S., Laitinen, M., Julin, J., Kivekäs, M., Sajavaara, T., & Nielsch, K. (2022). Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors. Wiley-VCH Verlag. https://jyx.jyu.fi/handle/123456789/82795
Yang, Jun, et al. Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors. Wiley-VCH Verlag, 2022. https://jyx.jyu.fi/handle/123456789/82795.
Yang, Jun, Amin Bahrami, Xingwei Ding, Panpan Zhao, Shiyang He, Sebastian Lehmann, Mikko Laitinen, et al. Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors. Wiley-VCH Verlag, 2022. https://jyx.jyu.fi/handle/123456789/82795.
Yang, J. et al. (2022) Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors. Wiley-VCH Verlag. Available at: https://jyx.jyu.fi/handle/123456789/82795.
J. Yang et al., “Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors,” Wiley-VCH Verlag, 2022. [Online]. Available: https://jyx.jyu.fi/handle/123456789/82795
@misc{yang2022lowtemperature,
author = {Yang, Jun and Bahrami, Amin and Ding, Xingwei and Zhao, Panpan and He, Shiyang and Lehmann, Sebastian and Laitinen, Mikko and Julin, Jaakko and Kivekäs, Mikko and Sajavaara, Timo and Nielsch, Kornelius},
title = {Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistors},
year = {2022},
publisher = {Wiley-VCH Verlag},
url = {https://jyx.jyu.fi/handle/123456789/82795}
}
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