Recei ed: 19 Feb ua y 2024 Re ised: 12 Sep embe 2024 Accep ed: 13 Oc obe 2024
DOI: 10.1111/jace.20248
RESEARCH ARTICLE
A p ac ical analysis o p edic sample o e hea ing in lash
expe imen s using he cu en amp me hodology
Alejand o F. Manchón-Go dón1Sand a Molina-Molina1An onio Pe ejón1,2
Ped o Sánchez-Jiménez1Luis A. Pé ez-Maqueda1
1Ins i u o de Ciencia de Ma e iales de
Se illa, ICMSE CSIC-Uni e sidad de
Se illa, Se illa, Spain
2Depa amen o de Química Ino gánica,
Facul ad de Química, Uni e sidad de
Se illa, Se illa, Spain
Co espondence
A.F. Manchón-Go dón and A. Pe ejón,
Ins i u o de Ciencia de Ma e iales de
Se illa, ICMSE CSIC-Uni e sidad de
Se illa, C. Amé ico Vespucio 49, Se illa
41092, Spain.
Email: alejand o[email p o ec ed]
and [email p o ec ed]
Funding in o ma ion
Jun a de Andalucía-Conseje ía de
Uni e sidad, In es igación e Inno ación,
G an /Awa d Numbe : P oyExcel_00360;
Spanish Minis y o Science and
Inno a ion, G an /Awa d Numbe :
PID2022-140815OB-C22
Abs ac
This wo k p esen s a s aigh o wa d s a egy o achie ing speci ic o e hea ing
du ing lash expe imen s by adjus ing he ini ial elec ical pa ame e s. To do ha ,
an ex ensi e expe imen al analysis was pe o med o e alua e he empe a u e
e olu ion o dense ZnO specimens du ing con olled-cu en amping a di e -
en u nace empe a u es, which in u n modi ied he ini ial elec ical esis ance
o he sample. A de ailed elec ical explana ion o con olled-cu en amp lash
p ocesses is p o ided and, o he i s ime, a p ac ical equi alence be ween
cu en - amp and empe a u e- amp lash me hodologies is es ablished. By
pa ame e izing he expe imen s in e ms o an e ec i e powe densi y, a con-
sis en hea ing pa e n ollowing he blackbody adia ion end was iden i ied,
despi e he di e en elec ical cha ac e is ics o each expe imen . Finally, a “ lash
hea ing map” is in oduced, which can be used o de e mine he s a ing elec-
ical pa ame e s necessa y o achie e a speci ic empe a u e inc ease, whe he
employing cu en o empe a u e amps.
KEYWORDS
blackbody adia ion, con olled-cu en amping, Flash sin e ing, o e hea ing, zinc oxide
1 INTRODUCTION
Flash sin e ing, FS, is an ad anced ce amic sin e ing ech-
niquep oposedin2010,
1in which an elec ic ield is
applied o a specimen, ypically a ce amic, so ha he
cu en lows h ough he ma e ial. The echnique is cha -
ac e ized by a d ama ic d op in he elec ical esis ance
o he specimen a a ce ain empe a u e, leading o a
sudden su ge in he elec ical cu en densi y passing
h ough i . This nonlinea inc ease in elec ical cu -
en esul s in, ypically, apid densi ica ion a u nace
empe a u es signi ican ly lowe han hose equi ed in
This is an open access a icle unde he e ms o he C ea i e Commons A ibu ion-NonComme cial-NoDe i s License, which pe mi s use and dis ibu ion in any medium,
p o ided he o iginal wo k is p ope ly ci ed, he use is non-comme cial and no modi ica ions o adap a ions a e made.
© 2024 The Au ho (s). Jou nal o he Ame ican Ce amic Socie y published by Wiley Pe iodicals LLC on behal o Ame ican Ce amic Socie y.
con en ional sin e ing echniques.2Since i s incep ion, FS
has been employed o p epa e a wide a ie y o ma e-
ials, each ea u ing di e en conduc ion mechanisms,
including dielec ic, semiconduc o , elec onic, and ionic
conduc ing ma e ials.3–7 The lash phenomenon ex ends
beyond g een bodies and has been in es iga ed in dense
ce amics o elimina e he impac o densi ica ion on elec-
ical conduc i i y.8Mo eo e , FS has been ex ended o
he eac i e lash sin e ing echnique, aimed a p oducing
dense and single-phase complex oxides in a single s ep9
and ecen ly employed in he p epa a ion o a wide ange
o ma e ials.10–15 Fu he mo e, in a ecen de elopmen ,
J Am Ce am Soc. 2025;108:e20248. wileyonlinelib a y.com/jou nal/jace 1o 9
h ps://doi.o g/10.1111/jace.20248
2o 9 MANCHÓN-GORDÓN e al.
i has been demons a ed ha bo h lash16 and eac i e
lash17 p ocesses can be ini ia ed wi hou he need o
elec odes.
In con en ional FS expe imen s, he applied elec ic
ield emains cons an while he u nace empe a u e is
inc eased as a linea amp. As he conduc i i y o he
sample inc eases, he cu en densi y passing h ough he
specimen ises un il i eaches a maximum p ese alue.
A his poin , he powe supply swi ches om con olled-
ol age o con olled-cu en mode. In his app oach, he
managemen o he mal condi ions du ing he lash p o-
cess may esul in a ious ypes o he e ogenei ies.18 This
is a ibu ed o he c ea ion o p e e en ial cu en pa hs
ha p omo e he de elopmen o he mal g adien s, which
a e u he in ensi ied by cooling lows a he sample su -
ace, ul ima ely gi ing ise o he o ma ion o ho spo s.19
Al e na i ely, u nace empe a u e can be kep cons an as
well. In his scena io, he incuba ion ime, which co e-
sponds o he ime needed o he lash e en o occu , plays
a majo ole.20 FS can also be pe o med using a cu en
amping me hodology, whe e he cu en densi y passing
h ough he ma e ial inc eases linea ly wi h ime while he
applied ol age is au oma ically adjus ed and he u nace
empe a u e is cons an .21 Th ough his app oach, despi e
main aining a consis en u nace empe a u e, he empe -
a u e o he specimen unde goes a con inuous ise as a
esul o he escala ing cu en densi y lowing h ough i .
This me hod e icien ly educes empe a u e g adien s and
he o ma ion o ho spo s ypically ound in con en ional
lash expe imen s.22–24
Accu a ely es ima ing he ac ual empe a u e o he
specimen du ing lash expe imen s is c ucial o a co ec
in e p e a ion o he lash phenomenon, whose d i ing
mechanisms a e s ill unde deba e.1,25–27 Fo example, his
is essen ial in elucida ing whe he Joule hea ing is he only
eason o he elec ical esis i i y d op and apid den-
si ica ion, o i he e a e also a he mal, dielec ic e ec s
playing an impo an ole in lash p ocesses.28 Ce ainly,
he lash communi y has dedica ed subs an ial e o s
o p ecisely assess he mal e olu ion du ing lash p o-
cesses h ough mul iple expe imen al app oaches, includ-
ing in si u impedance spec oscopy,29 py ome e s,30,31
he mocouples placed wi hin he sample,4in a ed cam-
e as, he mal expansion measu emen s,32 and in si u
X- ay di ac ion.33–35 The la e echnique, while likely
he mos accu a e one, can be inaccessible o much
o he scien i ic communi y due o i s complexi y and
esou ce equi emen s. Fu he mo e, he communi y has
explo ed a heo e ical app oach o es ima e empe a u e
changes du ing FS, employing bo h he blackbody adi-
a ion model,36,37 and ini e elemen me hod simula ions
ha conside conduc i e and con ec i e hea ans e as
well.38,39
The p esen wo k aims o p o ide a mo e ex ensi e
po ayal o he he mal e olu ion exhibi ed by dense sam-
ples unde going lash p ocesses in e ms o hei elec i-
cal pa ame e s. Sample empe a u e es ima ions ob ained
om he blackbody adia ion model we e compa ed wi h
IR he mal measu emen s o a b oad se o expe imen s.
The use o al eady dense specimens is in ended o p e-
en mic os uc u al changes associa ed wi h sin e ing,
which can al e he elec ical conduc i i y and compli-
ca e he s udy o he mal e olu ion. While he use o an
in a ed came a o de e mine he su ace empe a u e o
he sample may no be he mos accu a e echnique, as
he exis ence o empe a u e g adien s be ween co e and
su ace is dismissed,40 i is eadily accessible in many
lash labo a o ies. Zinc oxide is a n- ype semiconduc o
wi h a bandgap o ∼3.3 eV a oom empe a u e.41 As i
has been ex ensi ely analyzed bo h inside and ou side FS
li e a u e,33,42–46 i se es as a sui able s anda d o in es i-
ga e lash phenomenology. To he bes o ou knowledge,
es ablishing a p ac icalequi alence be ween di e en lash
me hodologies, which is he p ima y goal o his s udy, has
no been p e iously epo ed.
2EXPERIMENTAL
Comme cially a ailable zinc oxide nanopowde s
(<100 nm) om Sigma-Ald ich (p oduc numbe 544906)
we e mixed wi h a 3 w % poly inyl alcohol binde solu ion
in dis illed wa e and uniaxially p essed in o dogbone-
shaped pelle s unde a p essu e o 500 MPa o 3 min.
Subsequen ly, he specimens we e hea ed a a a e o
3◦C/min up o 500◦C o 0.5 h in ai o emo e he binde .
Following his, hey unde wen sin e ing a 1000◦C o
2 h, esul ing in a ela i e densi y o 95 % as ob ained using
A chimedes’ p inciple.
The dense dogbones we e suspended by hooks a he
ends o wo pla inum wi es, which we e hung oge he
inside a ubula u nace. Du ing he con olled-cu en
amping, he u nace empe a u ewaskep cons an , while
he cu en was g adually inc eased a 8 mA s−1.This
a e ep esen s he lowes inc emen achie able wi h he
1500 W DC powe supply (EA-PSI 9760-06 DT) used o he
expe imen s. Flash expe imen s we e conduc ed a a ying
u nace empe a u es (300–700◦C) and maximum cu en
limi s (10–500 mA). Con en ional lash expe imen s we e
conduc ed a a hea ing a e o 10◦C/min unde se e al
combina ions o applied elec ic ield and cu en limi o
modi y he maximum elec ic powe . In bo h me hodolo-
gies, elec ical pa ame e s we e eco ded using a powe
analyze (PPA1500 New ons 4 h L d). The wo-dimensional
empe a u e e olu ion o he specimens du ing he lash
expe imen s was moni o ed using an in a ed came a
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
MANCHÓN-GORDÓN e al. 3o 9
(P1 1 M, Op is GmbH). The accu acy o he empe a-
u e measu emen s was ±10◦C in he empe a u e ange
150−1500◦C. The came a was used a e a p ecise calib a-
ion, which in ol ed compa ing he empe a u es eco ded
by a he mocouple placed nea he sample wi h hose
o e ed by he he mal came a. The ideos eco ded by he
he mal came a we e analyzed using he Op is PIX Con-
nec so wa e. No e ha selec ing a p ope emissi i y alue
is pa icula ly challenging since i can a y wi h ac o s
such as densi y, su ace oughness, wa eleng h, and em-
pe a u e. In his s udy, we chose an emissi i y alue o 0.9,
which is ypical o ZnO ce amics.39
Fo he pu pose o compa ison, he beha io o dogbone-
shaped pelle s made om 8 mol% Y ia-s abilized zi conia
(8YSZ, Tosoh Co po a ion, TZ-8Y, 40 nm) was analyzed.
These pelle s we e also densi ied a 1400◦C o 1 h, achie -
ing a ela i e densi y o 95% a e sin e ing, as ob ained
using A chimedes’ p inciple. In ha case, a su ace emis-
si i y alue o 0.7 was used.47
Mic os uc u al analysis o he samples was ca ied ou
by scanning elec on mic oscopy (SEM) in seconda y elec-
on mode using a Hi achi S-4800 (Hi achi, L d.) ope a ed
a 2 kV. A e age g ain sizes we e es ima ed om SEM
images by measu ing he dimensions o a leas 100 g ains.
3RESULTS AND DISCUSSION
Figu e 1shows se e al examples o ypical da a se s om
con olled-cu en amping expe imen s, plo ed as a unc-
ion o cu en densi y. The choice o using cu en densi y
as he x-axis allows o di ec da a compa ison. The panels
show he applied elec ic ield (a), dissipa ed powe densi y
(b), and esis ance e olu ion (c) o expe imen s conduc ed
a he indica ed u nace empe a u es, ha is, co espond-
ing o di e en ini ial esis ance alues o he ma e ial,
𝑅s a , bu he same alue o maximum cu en densi y,
𝐽max=91 mA mm−2. The mic os uc u e o he specimen
be o e and a e exposu e o mo e ex eme lash expe i-
men al condi ions, i.e. a a u nace empe a u e o 700◦C
and a maximum cu en densi y o 91 mA mm−2,isshown
in Figu e S1. No signi ican di e ences can be obse ed
in he mic og aphs, con i ming ha he lash p ocess did
no a ec he mic os uc u e o he analyzed samples, a
leas unde he explo ed condi ions. The mic os uc u e o
he sample co esponds o a well-sin e ed ma e ial wi h
a ela i ely uni o m dis ibu ion o mic ome ic g ains.
The a e age g ain sizes we e es ima ed by measu ing he
dimensions o 100 g ains, esul ing in alues o 90 ±20 µm
o he sample be o e and 86 ±16 µm o he sample a e
lash.
In con olled-cu en amping expe imen s, unlike con-
en ional lash expe imen s, he cu en densi y is egu-
(A)
(B)
(C)
FIGURE 1 (A) Applied elec ic ield, (B) dissipa ed powe
densi y, and (C) esis ance as a unc ion o cu en densi y du ing
con olled-cu en amping o expe imen s conduc ed up o he
same alue o 𝐽𝑚𝑎𝑥 bu a di e en u nace empe a u es wi h he
objec i e o changing he ini ial esis ance o he ma e ial.
la ed igh om he ou se . In ou case, he powe supply
adjus ed he ol age o main ain he p og ammed linea
amp o 8 mA s−1up o he p ese cu en densi y limi .
Thus, depending on 𝑅s a , h ee di e en egimes wi hin
he e olu ion o he applied elec ic ield we e ound (see
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
4o 9 MANCHÓN-GORDÓN e al.
TABLE 1 Quali a i e ca ego iza ion o cu en amp lash
expe imen s based on he beha io o he main elec ical
pa ame e s.
Ini ial
esis i i y
Elec ic
ield peak
Powe
densi y peak
Low No No
Medium Yes No
High Yes Yes
Table 1). In he case o a high alue o 𝑅s a , such as o he
expe imen ca ied ou a a u nace empe a u e o 300◦C,
a low cu en alues, a sha p inc ease in he applied ield
was clea ly obse ed, which was essen ial o ollow he
p esc ibed cu en densi y amp. A e wa d, he elec ic
ield expe ienced a swi ini ial educ ion ollowed by a
g adual decline, e en as he cu en densi y con inued o
ele a e due o he diminishing esis ance o he specimen,
asshowninpanelc.
A simila end was obse ed o he dissipa ed powe
densi y, calcula ed as he p oduc o he cu en densi y
h ough he sample, 𝐽, and he applied elec ic ield, 𝐸,
esul ing in 𝑃=𝐽𝐸. Consequen ly, a disce nible peak in
powe densi y was e iden a lowe alues o cu en den-
si y. Con e sely, when he ini ial esis ance alue was
low, as exempli ied in expe imen s conduc ed a a u nace
empe a u e o 700◦C, a g adual ise in 𝐸was e iden ,
pla eauing a app oxima ely 𝐽= 30 mA mm−2wi h no
obse able peaks in 𝐸o 𝑃. In ins ances o in e media e
𝑅s a alues, such as expe imen s ca ied ou a a u -
nace empe a u e o 500◦C, an in e media e beha io was
appa en . A mino peak was obse ed in 𝐸, which was
high enough o be e lec ed in he beha io o 𝑃.Fo
𝐽>30 mA mm−2,𝑃exhibi ed a simila beha io ac oss all
expe imen s, whe e inc eased 𝐽led o highe 𝑃.
The con inuous inc ease in elec ical powe densi y, a
cha ac e is ic o con olled-cu en amp FS expe imen s,
also esul s in a con inuous ise in he sample empe a u e
du ing he lash p ocess, despi e keeping he u nace em-
pe a u e cons an . The empe a u e o he specimen, 𝑇𝑆,
ob ained using an in a ed came a, is plo ed as a unc ion
o ime in Figu e 2 o he indica ed u nace empe a u es
and 𝐽max=91 mA mm−2.
The es ima ed empe a u e o he specimen is app oxi-
ma e due o unce ain ies in emissi i y and he assump ion
o uni o m empe a u e, which may no be ully alid
du ing he lash e en . Addi ional ac o s include he
impe ec geome y o he specimens and he con ac esis-
ance be ween he sample and he elec odes. Poo con ac
in oduces high esis ance in he elec ode egion, causing
powe dissipa ion and po en ial empe a u e asymme y
be ween elec odes o o e 200◦C.27 This o e hea ing can
lead o excessi e g ain g ow h a bo h he anode and ca h-
FIGURE 2 (A) E olu ion o sample empe a u e wi h ime o
a ious cu en amp expe imen s conduc ed on dense ZnO a
di e en u nace empe a u es, all using a cu en a e o 8 mA s−1,
and he same alue o 𝐽max=91 mA mm−2The inc emen in sample
empe a u e, Δ𝑇, is indica ed o he sample a a u nace
empe a u e o 300◦C. (B) In a ed he mog aphic images showing
he e olu ion o sample empe a u e du ing he lash expe imen
pe o med a a u nace empe a u e o 700◦C.
ode o di ec and al e na ing cu en s.48 Con e sely, good
he mal con ac allows hea o sink om he sample o
he coole elec odes.49 A comp ehensi e analysis o he
a ious he mal g adien s ypically ound in FS expe i-
men s can be ound in e e ence.50 The e o e, he he ein
es ima ed alues should be in e p e ed as a empe a u e
dis ibu ion a he han he exac sample empe a u e.
Al hough he use o IR came as o empe a u e es ima-
ion has some limi a ions in p ecision, hey a e widely
employed by he FS communi y due o hei capaci y o
p o ide eal- ime empe a u e isualiza ion o ela i ely
la ge a eas, unlike o he mo e p ecise ins umen s such as
py ome e s. Figu e S2 shows ep esen a i e SEM images
o he c oss-sec ional ac u e o he lashed specimen,
ob ained using he speci ied cu en amp a a u nace
empe a u e o 700◦C and a maximum cu en densi y o
91 mA mm−2. The mic og aphs we e aken a he cen e
o he dogbone and nea he elec ode. No signi ican di -
e ences can be obse ed be ween he wo mic og aphs,
indica ing good elec ical con ac be ween he sample and
he elec odes. This is in ag eemen wi h he IR he mo-
g aphic images shown in Figu e 2B, whe e no empe a u e
g adien s we e obse ed wi hin he specimen.
The empe a u e di e ence be ween he u nace em-
pe a u e, as indica ed by he u nace con olle , and
he sample empe a u e, de e mined by he IR came a,
highligh s he challenges in empe a u e measu emen .
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
MANCHÓN-GORDÓN e al. 5o 9
This unde sco es he impo ance o clea ly de ining he
me hod employed o empe a u e measu emen . The da a
ob ained indica ed ha 𝑇𝑆inc eased a a nea ly cons an
a e ollowing a small incuba ion pe iod a e he powe
supply was u ned on. Du ing his incuba ion ime, he
applica ion o an elec ic ield o he specimen did no
imply i s signi ican hea ing, which sugges s ha he elec-
ical beha io o he ma e ial can be changed wi hou
signi ican powe dissipa ion, as ecen ly epo ed.28
The de e mined hea ing a e was consis en ly egis e ed
a 360◦Cmin
−1ac oss all examined scena ios. In ac , i
is es ablished ha he hea ing a e is in luenced by he
cu en a e; a highe cu en a e gi es ise o a highe
hea ing a e.21 I is no ewo hy ha his hea ing a e is
signi ican ly low when jux aposed wi h a es achie ed
in con en ional lash expe imen s, whe e he lash e en
induces apid sample hea ing a a a e o app oxima ely
103–105◦Cmin−1.51 Addi ionally, i is appa en ha a lowe
u nace empe a u es (associa ed wi h highe 𝑅s a al-
ues), he e is a mo e p onounced a ia ion in he sample
empe a u e, Δ𝑇, du ing he expe imen .
Fo compa a i e analysis, a se ies o con en ional
ol age-con olled lash expe imen s we e conduc ed
using dense ZnO dogbones. As illus a ed in Figu e S3,
as an example, he e olu ion o he elec ical pa ame e s
du ing a empe a u e amp a 10◦Cmin
−1, an applied
elec ic ield o 167 V cm−1, and a cu en densi y limi o
43 mA mm−2, ollows he h ee classical s ages o FS.20
A e an incuba ion ime, in s age II, he e is a sha p
inc ease in conduc i i y up o he p ese maximum limi
o cu en densi y, accompanied by a dec ease in he
applied elec ic ield when he powe supply ansi ions o
he cu en con ol mode. This ise in conduc i i y is co -
ela ed wi h an inc ease in he empe a u e o he sample
(see Figu e S4). Subsequen ly, he sample is main ained
in a lash-ac i a ed s a e unde a con olled cu en o a
speci ic du a ion, ep esen ing s age III.
The sample empe a u e can be also assessed using
he blackbody adia ion (BBR) model, acco ding o he
ollowing Equa ion (1)25:
𝑇𝑆=(𝑇4
𝑓+𝑊𝑒
𝜀𝐴𝜎)1∕4
,(1)
whe e 𝑇𝑆and 𝑇𝑓 ep esen he sample and u nace em-
pe a u es, espec i ely, 𝑊𝑒deno es powe dissipa ion, 𝐴
ep esen s he su ace a ea o he sample, 𝜀is he emissi -
i y and 𝜎co esponds o he S e an-Bol zmann cons an .
I is wo h no ing wo impo an ac o s when u iliz-
ing he BBR model o empe a u e es ima ion du ing
FS. Fi s , he assump ion o a cons an emissi i y alue
o 1 o all ma e ials may no be accu a e as emissi i y
ends o a y (always <1) o ce amics depending on ac-
o s such as empe a u e and wa eleng h.37 Second, he
omission o he ac ha he model is alid o Δ𝑇∕𝑇 ≪
1.52 Ne e heless, he BBR is commonly used by he FS
communi y as an app oach o ob ain easonably accu a e
es ima ions.
The BBR model has p o en mos e ec i e du ing S age
III, cha ac e ized by a s eady-s a e powe densi y. This
allows he equa ing o he inpu a e o elec ical ene gy o
he a e o ene gy dissipa ed h ough blackbody adia ion.
Pe Equa ion (1), he ise in he specimen empe a u e is
co ela ed wi h he elec ical powe densi y. Howe e , he
cha ac e is ic beha io o dissipa ed powe densi y in con-
en ional lash expe imen s, 𝑃CF, di e s ma kedly om
ha obse ed in he cu en amp me hodology. In con-
en ional lash expe imen s, 𝑃CF exhibi s an ini ial almos
ze o alue ha expe iences a sudden su ge du ing he lash
e en . The e o e, he heo e ical maximum powe den-
si y, associa ed wi h he peak empe a u e eached in he
sample, can be exp essed as Equa ion (2):
𝑃CF
max =𝐸
CF
max 𝐽CF
max,(2)
whe e 𝐸CF
max ep esen s he ini ially se applied elec ic
ield, and 𝐽CF
max deno es he p ede e mined densi y cu en
limi . The subsc ip 𝐶𝐹 indica es ha hese pa ame e s
a e associa ed wi h con en ional lash expe imen s. As
demons a ed ea lie , his si ua ion does no apply o he
con olled-cu en amp me hodology, whe e powe den-
si y unde goes con inuous changes wi h cu en densi y.
This beha io p o okes ha , in he case o con olled-
cu en amps, he maximum powe does no necessa ily
ha e o co espond o he momen when he maximum
cu en alue is eached, ha is, a he end o he amp. I
can be clea ly obse ed in Figu e 1, in he case o highe
𝑅𝑠𝑡𝑎𝑟𝑡 and low cu en densi y alues. Fo example, a
a u nace empe a u e o 300◦Cand𝐽<40mA mm−2,
he maximum powe densi y co esponded o he peak
obse ed a ound ∼15 mA mm−2.
Gi en he di e gen cha ac e is ics o powe densi y
in con en ional and cu en amp lash expe imen s, we
employed an e ec i e powe densi y, 𝑃e , oenablea
di ec compa ison o sample o e hea ing in bo h lash
me hodologies. 𝑃e is calcula ed as he p oduc o he
maximum applied elec ic ield, 𝐸max, and he inal p e-
de e mined densi y cu en limi , 𝐽max, ha is, 𝑃e =
𝐸max 𝐽max. In con as o con en ional lash expe imen s,
whe e 𝐸CF
max is ini ially ixed, 𝐸max isa eepa ame e .No e
ha , while 𝑃max is an expe imen al alue, 𝑃e is no an
ac ual powe densi y expe ienced by he sample a any
ime, bu a he a ma hema ical cons uc in oduced o
ansla eo e hea ing du ing con olled-cu en ampsin o
o e hea ing du ing con en ional ol age-con olled lash
expe imen s.
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
6o 9 MANCHÓN-GORDÓN e al.
FIGURE 3 Rela ionship be ween 𝑃max s. 𝑃e . Each symbol
ep esen s a di e en lash expe imen ca ied ou a di e en
u nace empe a u es and di e en alues o 𝐽max.The edlineis
jus a guide o he eyes o show he de ia ion be ween bo h
pa ame e s.
The log–log ela ionship be ween bo h pa ame e s, 𝑃e
and 𝑃max, is e idenced in Figu e 3 o cu en amp
expe imen s ca ied ou a di e en alues o u nace em-
pe a u e and 𝐽max (each poin in he igu e co espond
o a di e en expe imen ). Fo alues o 𝑃e <200 mW
mm−3, he e is a s ong co ela ion be ween bo h pa am-
e e s, ollowing a linea end. Howe e , o highe alues
o 𝑃e , i can be obse ed ha 𝑃max almos app oaches a
sa u a ion poin a ∼200 mW mm−3. This can be unde -
s ood by examining he beha io o he applied elec ic
ield as a unc ion o cu en densi y (see Figu e 1A). A low
cu en densi y alues, powe densi y is highly in luenced
by he elec ic ield peak, bu his con ibu ion dimin-
ishes as cu en densi y inc eases. On he o he hand,
he heigh o he ield peak is di ec ly ela ed o he ini-
ial esis ance o he sample, which makes i c ucial o
unde s anding he e olu ion o he es o he elec ical
pa ame e s du ing he lash p ocess. The appa en sa u a-
ion o 𝑃max is an a i ac ela ed o he ac ha he cu en
densi y in ou cu en amp expe imen s was limi ed o
91 mA/mm2. As obse ed in Figu e 1, his alue o 𝐽max
implies a 𝑃max o abou 200–300 mW/mm3, which co e-
sponds o he ob ained sa u a ion alue. The exis ence o
hese wo powe densi y egimes aligns wi h he la es ind-
ings abou he dielec ic na u e o he lash phenomenon.
Ve y ecen ly, i has been epo ed ha powe dissipa ion
and empe a u e inc ease only become ele an once he
sample is conduc i e enough o allow o signi ican cu -
en low. Be o e his poin , ield-induced e ec s such as
elec ic a c o ma ion be ween he elec odes53,54 o a he -
mal esis ance deg ada ion o he sample28 domina e o e
Joule hea ing.
(A)
(B)
FIGURE 4 Sample empe a u e inc emen as a unc ion o (A)
𝑃max and (B) 𝑃𝑒𝑓𝑓 o a se ies o con olled-cu en amp
expe imen s conduc ed on dense ZnO samples a di e en u nace
empe a u es and di e en alues o 𝐽max . The con inuous line
ep esen s he es ima ion o he o e hea ing using he blackbody
model.
Figu e 4shows he ob ained alues o Δ𝑇 o he se ies
o con olled-cu en amp expe imen s conduc ed wi h
a ious cu en densi y limi s and u nace empe a u es,
whe e each poin co esponds o a di e en combina ion
o u nace empe a u e and 𝐽max. The da a a e shown as a
unc ion o (A) 𝑃max and (B) 𝑃e , ega dless o he u nace
empe a u e. Fo compa ison pu poses, we included he
alues o Δ𝑇 ob ained o con en ional lash expe imen s
(i.e., amping empe a u e wi h a cons an alue o applied
ol age and a p ese maximum cu en ) conduc ed wi h
dense ZnO samples. We also included he es ima ion o
Δ𝑇 using Equa ion (1), ep esen ed by he con inuous line
(BBR model). In addi ion, he Δ𝑇 s. 𝑃e da a co espond-
ing o con olled-cu en amp expe imen s conduc ed on
dense 8YSZ dogbones a e shown in Figu e 5.Asan ic-
ipa ed om he co ela ion shown in Figu e 3,no able
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
MANCHÓN-GORDÓN e al. 7o 9
FIGURE 5 Sample empe a u e inc emen as a unc ion o
𝑃e o a se ies o con olled-cu en amp expe imen s conduc ed
on dense ZnO samples a di e en u nace empe a u es and
di e en alues o 𝐽max. The con inuous line ep esen s he
es ima ion o he o e hea ing using he blackbody model. S a
symbols co espond o cu en amp lash expe imen s pe o med
on dense 8YSZ dogbones.
disc epancies in sample o e hea ing a e e iden when
compa ing o e hea ing in cu en and empe a u e amp
expe imen s o 𝑃max>200 mW mm−3. On he o he hand,
al hough he BBR model ollows he same end as he
expe imen al da a ob ained om empe a u e amp expe -
imen s, i clea ly o e es ima es Δ𝑇, which is expec ed
due o he limi a ions o he model desc ibed abo e. In
ac , i was ound ha he empe a u es es ima ed using
he BBR model we e signi ican ly highe han he mea-
su ed empe a u es (when conside ing a la ice pa am-
e e expansion) due o laws in he heo e ical model,
which dismisses non- adia i e hea losses and s ongly
depends on he s age o he lash in which he powe is
conside ed.32
The disc epancies obse ed in bo h cu en and em-
pe a u e amp expe imen s a e elimina ed when plo ing
he o e hea ing Δ𝑇 agains he e ec i e powe densi y
𝑃e (Figu e 4B). Fo alues o 𝑃e <200 mW mm−3
(indica ing low maximum cu en densi y and/o a low
ol age peak), Δ𝑇 emains close o 0◦C. This ange o
dissipa ed powe densi y co esponds o hose in which
𝑃e ∼𝑃
max (see Figu e 3). As p e iously men ioned, he
con ibu ion o he elec ic ield o he lash p ocess is
mo e p ominen in his ange, as i is e iden ha Joule
hea ing does no occu ins an ly when he powe sup-
ply is u ned on. Con e sely, o 𝑃e >200 mW mm−3
(indica ing a la ge maximum cu en densi y and/o a
high ol age peak), Δ𝑇 becomes p og essi ely mo e signi -
ican , and Δ𝑇 inc eases as 𝑃e inc eases. The expe imen al
esul s ega ding he o e hea ing o 8YSZ dogbones using
a cu en - amp me hodology a e shown in Figu e 5.A
simila end was ound ac oss he comple e s udied
ange, despi e he no able di e ences in elec ical beha io
be ween ZnO and 8YSZ, which is a model ionic con-
duc o . Elec ode e ec s leading o he mal he e ogenei y
when pe o ming lash expe imen s in 8YSZ unde DC
ields ha e been amply epo ed and discussed.4,27 E en so,
he o e hea ing p o ile o 8YSZ con olled-cu en amps
ema kably esembles hose ob ained o ZnO and he BBR
model. This sugges s a common beha io p ima ily in lu-
enced by elec ical powe dissipa ion, consis en wi h he
p inciple o Joule hea ing.
Conside ing he common beha io desc ibed in
Figu es 4B and 5, his plo could be u ilized o es ima e he
elec ical pa ame e s equi ed o a aining a ce ain em-
pe a u e inc ease du ing a lash expe imen , ega dless o
he chosen me hodology (cu en o empe a u e amp). I
is pa icula ly aluable in he case o cu en amp expe -
imen s whe e he u nace empe a u e emains cons an .
Fo ins ance, a a gi en u nace empe a u e, i he sample
needs o be o e hea ed by 300◦C, i would be necessa y
o dissipa e a 𝑃e o app oxima ely 300 mW mm−3.
While he pa ame e s ob ained may no be de ini i e, as
inding he op imum combina ion o elec ical ield and
cu en densi y limi leading o a success ul expe imen
isacomplex ask,
55 hey can se e as a s a ing poin o
expe imen a ion. This way, once he desi ed o e hea ing
alue is known, he numbe o possible (𝐸,𝐽) combina-
ions can be conside ably educed, hence op imizing he
ial-and-e o p ocess mos o en employed o de e mine
he expe imen al lash condi ions.
4 CONCLUSION
In his wo k, we analyzed he e olu ion o he sample em-
pe a u e du ing con olled-cu en amping lash sin e ing
expe imen s o dense ZnO dogbones a di e en u nace
empe a u es, hus e ec i ely changing he ini ial esis-
ance o he specimen. Based on he ob ained esul s, he
ollowing conclusions can be made:
- The ini ial esis i i y o he specimen de e mines he
e olu ion o he a ious elec ical pa ame e s in ol ed
in he lash p ocess, as well as he he mal e olu ion o
he sample.
- When in oducing a simple equi alen elec ic powe
densi y, a common o e hea ing beha io is ound o
con olled-cu en amps and ol age-con olled in ZnO
specimens, which is also ound o con olled-cu en
amps in 8YSZ dogbones. A p ac ical s a egy o es ima e
he elec ical pa ame e s equi ed o achie e a speci ic
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
8o 9 MANCHÓN-GORDÓN e al.
empe a u e inc ease unde lash condi ions has been
de ined.
Fu u e s udies a e welcomed o es he alidi y o he
p oposed s a egy h ough a sys ema ic analysis on di e -
en ma e ials and geome ies subjec ed o a ying lash
condi ions. Mo eo e , he es ablishmen o a p ac ical
equi alence be ween he wo lash me hodologies ana-
lyzed in his wo k and iso he mal lash p ocesses unde
cons an ol age should be also explo ed in u u e s udies.
ACKNOWLEDGMENTS
This wo k has been unded by Jun a de Andalucía-
Conseje ía de Uni e sidad, In es igación e Inno ación
(p oyec P oyExcel_00360). Financial suppo is also
acknowledged om he g an PID2022-140815OB-C22
unded by he Spanish Minis y o Science and Inno a ion.
ORCID
Alejand oF. Manchón-Go dón h ps://o cid.o g/0000-
0002-8320-5575
Sand aMolina-Molina h ps://o cid.o g/0000-0001-
9318-6585
An onioPe ejón h ps://o cid.o g/0000-0002-5525-2227
Ped o Sánchez-Jiménez h ps://o cid.o g/0000-0001-
6982-1411
REFERENCES
1. Cologna M, Rashko a B, Raj R. Flash sin e ing o nanog ain
zi conia in <5sa 850
◦C. J Am Ce amSoc. 2010;93(11):3556–9.
2. Yu M, G asso S, Mckinnon R, Saunde s T, Reece MJ. Re iew o
lash sin e ing: ma e ials, mechanisms and modelling. Ad Appl
Ce am. 2017;116(1):24–60.
3. Pe ez-Maqueda LA, Gil-Gonzalez E, Pe ejon A, Leb un J-M,
Sanchez-Jimenez PE, Raj R. Flash sin e ing o highly insu-
la ing nanos uc u ed phase-pu e BiFeO3. J Am Ce am Soc.
2017;100(8):3365–9.
4. Molina-Molina S, Pe ejón A, Pé ez-Maqueda LA, Sánchez-
Jiménez PE. In luence o AC ields and elec ical conduc-
ion mechanisms on he lash-onse empe a u e: Elec onic
(BiFeO3) s. ionic conduc o s (8YSZ). Ce am In . 2023;49(9, Pa
B):14834–43.
5. Zhang L, Pu Y, Chen M. Ul a-high ene gy s o age pe -
o mance unde low elec ic ields in Na0.5Bi0.5TiO3-based
elaxo e oelec ics o pulse capaci o applica ions. Ce am In .
2020;46(1):98–105.
6. Rheinheime W, Phuah XL, Wang H, Lemke F, Ho mann MJ,
Wang H. The ole o poin de ec s and de ec g adien s in lash
sin e ing o pe o ski e oxides. Ac a Ma e ialia. 2019;165:398–408.
7. P e e ALG, Cologna M, Sgla o V, Raj R. Flash-sin e ing o
Co2MnO4 spinel o solid oxide uel cell applica ions. J Powe
Sou ces. 2011;196(4):2061–5.
8. Yada D, Raj R. Two unique measu emen s ela ed o lash
expe imen s wi h y ia-s abilized zi conia. J A Ce am Soc.
2017;100(12):5374–8.
9. Gil-González E, Pe ejón A, Sánchez-Jiménez PE, Sayagués MJ,
Raj R, Pé ez-Maqueda LA. Phase-pu e BiFeO3 p oduced by
eac ion lash-sin e ing o Bi2O3 and Fe2O3. J Ma e Chem A.
2018;6(13):5356–66.
10. Manchón-Go dón AF, Sánchez-Jiménez PE, Blázquez JS,
Pe ejón A, Pé ez-Maqueda LA. S uc u al, ib a ional, and mag-
ne ic cha ac e iza ion o o ho e i eLaFeO3 ce amic p epa ed
by eac ion lash sin e ing. Ma e ials. 2023;16(3):1019.
11. Ma B, Zhu Y, Wang K, Sun Z, Ren K, Wang Y. Reac i e
lash sin e ing and elec ical anspo p ope ies o high-
en opy (MgCoNiCuZn) 1-xLixO oxides. J Am Ce am Soc.
2022;105(6):3765–73.
12. A ila V, Yoon B, Ne o RRI, Sil a RS, Ghose S, Raj R, e al. Reac-
i e lash sin e ing o he complex oxide Li0. 5La0. 5TiO3 s a -
ing om an amo phous p ecu so powde . Sc ip a Ma e ialia.
2020;176:78–82.
13. Manchón-Go dónAF, Sánchez-Jiménez PE, Blázquez J, Pe ejón
A, Pé ez-Maqueda LA. Reac i e lash sin e ing o S Fe12O19
ce amic pe manen magne s. J Alloys Comp. 2022;922:166203.
14. Su X, Jiao Z, Fu M, An G, Wu Y, Tian Q, e al. Ul a as syn hesis
and densi ica ion o Z O2 doped KNN ce amics by eac i e lash
sin e ing. In J Appl Ce am Technol. 2021;18(6):1999–2009.
15. Manchón-Go dón AF, Almanza-Ve ga a GE, Molina-Molina S,
Pe ejón A, Blázquez JS, Sánchez-Jiménez PE, e al. S uc u al,
Mössbaue and magne ic s udy o (Mn0.2Co0.2Ni0.2Cu0.2×0.2)
Fe2O4 (X =Fe, Mg) spinel high-en opy oxides ab ica ed ia
eac i e lash sin e ing. J Eu Ce am Soc. 2024;44(14):116686.
16. Jalali SIA, Raj R. Touch- ee lash sin e ing wi h magne ic induc-
ion wi hin a eac o ac i a ed by he usual lash me hod. J Am
Ce am Soc. 2022;105(11):6517–22.
17. Jalali SIA, Manchón-Go dón AF, Chaca egui R, Sánchez-
Jiménez PE, Blázquez JS, Pe ejón A, e al. Touch- ee eac i e
lash sin e ing o dense s on ium hexa e i e pe manen mag-
ne . J Am Ce am Soc. 2023;106(12):7202–8.
18. Biesuz M, Sgla o VM. Cu en -induced abno mal and o i-
en ed g ain g ow h in co undum upon lash sin e ing. Sc ip a
Ma e ialia. 2018;150:82–6.
19. Jones GM, Biesuz M, Ji W, John SF, G imley C, Maniè e C,
e al. P omo ing mic os uc u al homogenei y du ing lash sin-
e ing o ce amics h ough he mal managemen . MRS Bulle in.
2021;46:59–66.
20. F ancis JSC, Raj R. In luence o he ield and he cu en limi on
lash sin e ing a iso he mal u nace empe a u es. J Am Ce am
Soc. 2013;96(9):2754–8.
21. Kuma MKP, Yada D, Leb un J-M, Raj R. Flash sin e ing
wi h cu en a e: a di e en app oach. J Am Ce am Soc.
2019;102(2):823–35.
22. Lewin D, Michiels I, Fa habad SM, K öll E, Menze K-H, Lupascu
DC. Flash and b eakdown: he mal unaway and dielec ic
b eakdown as compe ing mechanisms du ing lash sin e ing o
ba ium i ana e. Ad Eng Ma e s. n/a(n/a):2300142.
23. La agnini IR, Campos JV, Fe ei a JA, Pallone EMA.
Mic os uc u al e olu ion o 3YSZ lash-sin e ed wi h cu en
amp con ol. J Am Ce am Soc. 2020;103(6):3493–9.
24. Cha alambous H, Jha SK, Ch is ian KH, Lay RT, Tsakalakos T.
Flash sin e ing using con olled cu en amp. J Eu Ce am Soc.
2018;38(10):3689–93.
25. Raj R. Joule hea ing du ing lash-sin e ing. J Eu Ce am Soc.
2012;32(10):2293–301.
26. Naik KS, Sgla o VM, Raj R. Flash sin e ing as a nucle-
a ion phenomenon and a model he eo . J Eu Ce am Soc.
2014;34(15):4063–7.
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
MANCHÓN-GORDÓN e al. 9o 9
27. Biesuz M, Pin e L, Saunde s T, Reece M, Binne J, Sgla o
VM, e al. In es iga ion o elec ochemical, op ical and he mal
e ec s du ing lash sin e ing o 8YSZ. Ma e ials. 2018;11(7):1214.
28. Molina-Molina S, Pe ejón A, Pe ez-Maqueda LA, Sanchez-
En iquez PE. On he a he mal o igin o lash sin e ing: sepa a -
ing ield-induced e ec s om joule hea ing using a cu en amp
app oach. Sc ip a Ma e ialia. 2024;247:116086.
29. Pa k J, Chen I-W. In si u he mome y measu ing empe -
a u e lashes exceeding 1,700◦C in 8 mol% Y2O3-s ablized
zi conia unde cons an - ol age hea ing. J Am Ce am Soc.
2013;96(3):697–700.
30. F ancis JSC, Cologna M, Raj R. Pa icle size e ec s in lash
sin e ing. J Eu Ce am Soc. 2012;32(12):3129–36.
31. Yoshida H, Mo i a K, Kim B-N, Sakka Y, Yamamo o T. Reduc-
ion in sin e ing empe a u e o lash-sin e ing o y ia by
nickel ca ion-doping. Ac a Ma e ialia. 2016;106:344–52.
32. Campos JV, La agnini IR, A ila V, Yoon B, Ghose S, Raj R,
e al.On he A henius-likebeha io o conduc i i y du ing lash
sin e ing o 3 mol% y ia s abilized zi conia ce amics. Sc ip a
Ma e ialia. 2021;203:114093.
33. Cha alambous H, Jha SK, Lay RT, Cabales A, Okasinski J,
Tsakalakos T. In es iga ion o empe a u e app oxima ion me h-
ods du ing lash sin e ing o ZnO. Ce am In . 2018;44(6):6162–9.
34. Pe ez-Maqueda LA, Gil-Gonzalez E, Wassel MA, Jha SK, Pe ejon
A, Cha alambous H, e al. Insigh in o he BiFeO3 lash sin e ing
p ocess by in-si u ene gy dispe si e X- ay di ac ion (ED-XRD).
Ce am In . 2019;45(2, Pa B):2828–34.
35. Leb un J-M, Jha SK, McCo mack SJ, K i en WM, Raj R. B oad-
ening o di ac ion peak wid hs and empe a u e nonuni o mi y
du ing lash expe imen s. J Am Ce am Soc. 2016;99(10):3429–34.
36. Te auds K, Leb un J-M, Lee H-H, Jeon T-Y, Lee S-H, Je JH, e al.
Elec oluminescence and he measu emen o empe a u e du -
ing S age III o lash sin e ing expe imen s. J Eu Ce am Soc.
2015;35(11):3195–99.
37. Zhang Y, Jung J-I, Luo J. The mal unaway, lash sin e ing and
asymme ical mic os uc u al de elopmen o ZnO and ZnO–
Bi2O3 unde di ec cu en s. Ac a Ma e ialia. 2015;94:87–100.
38. A ya KS, Eqbal A, Rai P, Yada D, Chak aba i T. In es iga ion
on he ole o Joule hea ing on lash sin e ing using a com-
bined expe imen al and modeling app oach. J Am Ce em Soc.
2022;105(10):6049–62.
39. Eqbal A, A ya KS, Chak aba i T. In-dep h s udy o he e ol ing
he mal unaway and he mal g adien in he dog bone sample
du ing lash sin e ing using ini e elemen analysis. Ce am In .
2020;46(8, Pa ):10370–78.
40.LiY,To chioR,FalcoS,Alo oP,HuangZ,ToddRI.P o-
mo ing co e/su ace homogenei y du ing lash sin e ing o
3YSZ ce amic by cu en pa h managemen : expe imen al and
modelling s udies. J Eu Ce am Soc. 2021;41(13):6649–59.
41. Özgü Ü, Ali o YI, Liu C, Teke A, Reshchiko MA, Doğan S,
e al. A comp ehensi e e iew o ZnO ma e ials and de ices. J
Appl Phys. 2005;98(4).
42. Schme bauch C, Gonzalez-Julian J, Röde R, Ronning C,
Guillon O. Flash sin e ing o nanoc ys alline zinc oxide and i s
in luence on mic os uc u e and de ec o ma ion. J Am Ce am
Soc. 2014;97(6):1728–35.
43. Zhang Y, Luo J. P omo ing he lash sin e ing o ZnO in
educed a mosphe es o achie e nea ly ull densi ies a u nace
empe a u es o <120 C. Sc ip a Ma e ialia. 2015;106:26–9.
44. Zhang Y, Nie J, Chan JM, Luo J. P obing he densi ica ion
mechanisms du ing lash sin e ing o ZnO. Ac a Ma e ialia.
2017;125:465–75.
45. Cho J, Phuah XL, Li J, Shang Z, Wang H, Cha alambous
H, e al. Tempe a u e e ec on mechanical esponse o lash-
sin e ed ZnO by in-si u comp ession es s. Ac a Ma e ialia.
2020;200:699–709.
46. Molina-Molina S, Gil-González E, Du án-Oli encia FJ, Val e de
JM, Pe ejón A, Sánchez-Jiménez PE, e al. A no el mul i-
phase lash sin e ing (MPFS) echnique o 3D complex-shaped
ce amics. Appl Ma Today. 2022;26:101274.
47. Tanaka H, Sawai S, Mo imo o K, Hisano K. Measu emen
o spec al emissi i y and he mal conduc i i y o zi conia
by he mal adia ion calo ime y. J The m Anal Calo ime y.
2001;64:867–72.
48. Qin W, Majidi H, Yun J, an Ben hem K. Elec ode e ec s
on mic os uc u e o ma ion du ing lash sin e ing o y ium-
s abilized zi conia. J Am Ce am Soc. 2016;99(7):2253–59.
49. Campos JV, La agnini IR, da Sil a JGP, Fe ei a JA, Sousa RV,
Mücke R, e al. Flash sin e ing scaling-up challenges: In luence
o he sample size on he mic os uc u e and onse empe a u e
o he lash e en . Sc ip a Ma e ialia. 2020;186:1–5.
50. Jones GM, Biesuz M, Ji W, John SF, G imley C, Maniè e C,
e al. P omo ing mic os uc u al homogenei y du ing lash sin-
e ing o ce amics h ough he mal managemen . MRS Bulle in.
2021;46(1):59–66.
51. G asso S, Sakka Y, Rend o N, Hu C, Maizza G, Bo odianska H,
e al. Modeling o he empe a u e dis ibu ion o lash sin e ed
zi conia. J Ce am Soc Japan. 2011;119(1386):144–6.
52. Yang D, Con ad H. Enhanced sin e ing a e o zi conia (3Y-TZP)
by applica ion o a small AC elec ic ield. Sc ip a Ma e ialia.
2010;63(3):328–31.
53. Li Y, Xu C, Huang R, Zhao X, Wang X, Jia Z. Mechanism analysis
o a c-induced lash sin e ing o 3YSZ a oom empe a u e. J Eu
Ce am Soc. 2023;43(15):7033–40.
54. Bech ele C, Gibson A, Falco S, Ki kpa ick A, Todd RI. Plasma
o ma ion du ing lash sin e ing o bo on ca bide—Pa I:
Plasma cha ac e is ics. Ce am In . 2024.
55. Gil-González E, Pe ejón A, Sánchez-Jiménez PE, Román-
González D, Pé ez-Maqueda LA. Con ol o expe imen al con-
di ions in eac ion lash-sin e ing o complex s oichiome y
ce amics. Ce am In . 2020;46(18, Pa B):29413–20.
SUPPORTING INFORMATION
Addi ional suppo ing in o ma ion can be ound online
in he Suppo ing In o ma ion sec ion a he end o his
a icle.
How o ci e his a icle: Manchón-Go dón AF,
Molina-Molina S, Pe ejón A, Sánchez-Jiménez PS,
Pé ez-Maqueda LA. A p ac ical analysis o p edic
sample o e hea ing in lash expe imen s using he
cu en amp me hodology. J Am Ce am Soc.
2025;108:e20248. h ps://doi.o g/10.1111/jace.20248
15512916, 2025, 3, Downloaded om h ps://ce amics.onlinelib a y.wiley.com/doi/10.1111/jace.20248 by Readcube (Lab i a Inc.), Wiley Online Lib a y on [12/05/2025]. See he Te ms and Condi ions (h ps://onlinelib a y.wiley.com/ e ms-and-condi ions) on Wiley Online Lib a y o ules o use; OA a icles a e go e ned by he applicable C ea i e Commons License
