Citations refer to the original publication, not to a Scieee localized version.
Barranco Quero, Á., Cotrino Bautista, J., Yubero Valencia, F., Girardeau, T., Camelio, S., Clerc, C., & Rodríguez González-Elipe, A. (2003). Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas. AVS Science and Technology Society. https://doi.org/10.1116/1.1577134
Barranco Quero, Ángel, et al. Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas. AVS Science and Technology Society, 2003. https://doi.org/10.1116/1.1577134.
Barranco Quero, Ángel, José Cotrino Bautista, Francisco Yubero Valencia, T. Girardeau, S. Camelio, C. Clerc, and Agustín Rodríguez González-Elipe. Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas. AVS Science and Technology Society, 2003. https://doi.org/10.1116/1.1577134.
Barranco Quero, Á. et al. (2003) Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas. AVS Science and Technology Society. Available at: https://doi.org/10.1116/1.1577134.
Á. Barranco Quero et al., “Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas,” AVS Science and Technology Society, 2003, doi: 10.1116/1.1577134.
@misc{barrancoquero2003plasmaenhanced,
author = {Barranco Quero, Ángel and Cotrino Bautista, José and Yubero Valencia, Francisco and Girardeau, T. and Camelio, S. and Clerc, C. and Rodríguez González-Elipe, Agustín},
title = {Plasma-enhanced chemical vapor deposition of SiO2 from a Si(CH3)3Cl precursor and mixtures Ar/O2 as plasma gas},
year = {2003},
publisher = {AVS Science and Technology Society},
doi = {10.1116/1.1577134},
url = {https://doi.org/10.1116/1.1577134}
}
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