scieee Science in your language
[en] (orig)

Influence of topographical features on the fluoride corrosion of Ni-Ti orthodontic archwires

Abstract

Different manufacturing processes of Ni–Ti archwires respond differently to corrosion due to the surface conditions involved. In this study, several topographical features and their influence upon fluoride corrosion were studied. Four topographies (smooth, dimple, scratch, and crack) according to the main surface defect were characterized (n = 40). Static corrosion tests were performed in artificial saliva with fluorated prophylactic gel (12500 ppm) for 28 days. The surface was characterized by SEM and laser confocal microscopy. Standard electrochemical corrosion (open circuit potential, corrosion potential and corrosion current density) was performed. Statistical analysis was carried out using the ANOVA test (α ≤ 0.05). An increase was observed in the surface defects and/or roughness of the cracked and scratched surfaces. These defects produced an important increase in corrosion behavior. The best surfaces for the orthodontic archwires were the smooth and dimpled surfaces, respectively. The increase in defects was independent of roughness. Manufacturing processes that produce surface cracks should be avoided in orthodontic applications.

Read accessible full text

Influence of topographical features on the fluoride corrosion of Ni-Ti orthodontic archwires

Author: Ábalos Labruzzi, Camilo Manuel; Paúl Escolano, Antonio; Mendoza Mendoza, María Asunción; Solano Reina, Enrique; Gil, F. J.
Publisher: Springer
Year: 2011
DOI: 10.1007/s10856-011-4460-y
Source: https://idus.us.es/bitstreams/5fc1a16c-459c-4c4f-be9a-9c1fb30ff648/download
Depósi o de in es igación de la Uni e sidad de Se illa
h ps://idus.us.es/
Es a es la e sión acep ada del a ículo publicado en:
This is a accep ed manusc ip o a pape published in:
Jou nal o ma e ials science-ma e ials in medicine
(2011
DOI: h ps://doi.o g/10.1007/s10856-011-4460-y
Copy igh : © Sp inge Na u e
El acceso a la e sión publicada del a ículo puede eque i la
susc ipción de la e is a.
Access o he published e sion may equi e subsc ip ion.
This e sion o he a icle has been accep ed o publica ion, a e pee
e iew (when applicable) and is subjec o Sp inge Na u e’s AM e ms
o use, bu is no he Ve sion o Reco d and does no e lec pos -
accep ance imp o emen s, o any co ec ions. The Ve sion o Reco d
is a ailable online a : h ps://doi.o g/10.1007/s10856-011-4460-y
1
In luence o Su ace Pa e n on he Fluo ide
Co osion o Ni-Ti O hodon ic A chwi es
Camilo Abalos,a An onio Paul,b Asunción Mendoza,c En ique Solano,d and
F ancisco Ja ie Gil.e
aDepa men o Den al Ma e ials, cDepa men o Pedia ic Den is y and
dDepa men o O hodon ics, School o Den is y, Uni e si y o Se illa, Spain.
bDepa men o Mechanical and Ma e ials Enginee ing, School o Enginee ing,
Se ille, Spain.
eDepa men o Ma e ials Science and Me allu gical Enginee ing, Poly echnic
Uni e si y o Ca alonia, Ba celona, Spain.
Abalos,C. Mendoza, A. and Solano, E.: Facul ad de Odon ología, c/ A icena s/n, 41009-Se illa,
Spain. Telephone numbe : +34954481137. Fax numbe : 0034954481157. E-mail add ess:
[email p o ec ed], e[email p o ec ed], [email p o ec ed]
Paul, A.: Escuela Técnica Supe io de Ingenie os, A da. de los Descub imien os s/n, 42092
Se illa, Spain. Telephone numbe : +34954487304. Fax numbe : +34954460475. E-mail add ess:
[email p o ec ed]
Gil, FJ: Depa amen o de Ciencia de Ma e iales e Ingenie ía Me alú gica, Uni e sidad Poli écnica
de Ca aluña, Diagonal 647, 08028 Ba celona, Spain. Telephone numbe : +34934016111. Fax
numbe : +34934016210. E-mail add ess: [email p o ec ed].
2
Abs ac
In oduc ion: Di e en manu ac u ing p ocesses o Ni-Ti a chwi es espond di e en ly o
co osion. The in luence o su ace condi ion is impo an . In his s udy we es ablish se e al
su ace pa e ns and s udy hei in luence in luo ide co osion. Me hods: In a p elimina y s udy
we de e mined ou su ace pa e ns (smoo h, sc a ch, dimple and c ack) acco ding o he main
su ace de ec . We selec ed a chwi es wi h hese pa e ns (n=40). Imme sion es s we e pe o med
in a i icial sali a+ luo a ed p ophylac ic gel (12500 ppm) o 28 days. The su ace was
cha ac e ised by SEM and Lase Con ocal Mic oscopy. Ano a es was ca ied ou (α≤0.05).
Resul s: The e is an inc ease in he su ace de ec s and/o oughness o he c ack and sc a ch
pa e ns. Conclusions: The e is a ela ionship be ween he su ace pa e n and he ex en o luo ide
co osion. Tha ac o should be aken in o accoun in u u e s udies. The inc ease in de ec s is
independen o oughness. Manu ac u ing p ocesses ha p oduces su ace c acks should be
a oided.
Key wo ds: NiTi, O hodon ic a chwi e, Su ace pa e n, Su ace opog aphy, Roughness,
Fluo ide, Co osion esis ance.
Abb e ia ions: NiTi: Nickel-Ti anium alloys; SEM: Scanning Elec on Mic oscope;
EDS: Ene gy Dispe si e Spec ome y; LSCM: Lase Scanning Con ocal Mic oscope Sys em;
PP: polyp opylene; Ra: he a i hme ical mean o he absolu e alues o he scanned su ace p o ile;
Rms: he oo -mean-squa e alue o he scanned su ace p o ile; Rp: he highe alue o he
scanned p o ile; R : he lowe alue o he scanned p o ile.
1 In oduc ion
Nickel-Ti anium alloys (NiTi) nea equia omic composi ion ha e wide
clinical applica ion in o hodon ics due o hei excellen mechanical p ope ies
[1,2]. They ha e good biocompa ibili y in a i icial sali a, Ringe ’s solu ion and
physiological sal solu ion [3]. Ne e heless, he co osion esis ance o NiTi
alloys dec eases in acidic sali a [4-6] and chlo ine [7] o luo ide solu ions [8-12],
which is equen ly used in o hodon ic ea men s o he p e en ion o den al
ca ies.
Fluo ide ions can de e io a e he passi e ilm o he i anium oxide su ace
[9,13-15] by hyd ogen abso p ion [15], dec easing he co osion esis ance o he
alloy and hence i s biocompa ibili y [3,5,6]. Fac o s such as exposu e ime
[15,16], luo ide concen a ion [8,9,17] and a mo e acidic pH [15,17] acili a e he
su ace co osion o Ni-Ti alloys since hese ac o s a e in e ela ed [16]. A pH
dependen c i ical concen a ion has e en been de ined [8,18,19] which can
deg ade he passi e ilm o supe icial oxides. When his happens, he e ec o
3
he co osion is a elease o me allic ions [5,8,14,19,20], mo phological su ace
changes [8,15,16] and inc eases in he oughness [5,8] and ic ion coe icien s
[21] among o he s.
Besides he a o emen ioned ac o ela ed o luo ine ions, he wi e su ace
plays an impo an ole in co osion, al hough he esul s published a e
con o e sial. P e ious s udies [5,20,22,23] poin o su ace de ec s p oduced
du ing wi e manu ac u ing as p e e en ial co osion a eas while in o he s udies
hey do no [4,9]. O he au ho s [13] conside he oughness o he a chwi e o be
an indica o o he endency owa d co osion, al hough o he esea ch [4,5,8,9]
did no ind such a ela ionship when including esidual s esses and he deg ee o
homogenei y as co osion accele a o s [4,9]. This is o say ha di e en a chwi e
su aces ha e a be e o wo se esponse o co osi e luo ide. Thus, he a chwi e
manu ac u e is a a iable i sel [4,8], al hough mo e esea ch is equi ed [8,9].
The wi e su ace, su ace de ec s and oughness a e ela ed o he
manu ac u ing p ocesses [8] ha lead o di e en su ace inishes [24]. The
objec i e o his s udy is o examine he in luence o he su ace (su ace de ec s
and oughness), as a esul o he manu ac u ing p ocess, in he co osion o NiTi
a chwi es exposed o a high luo ide concen a ion bu in a way ne e done
be o e. In p e ious s udies [4,7-9,16,17,19,20] he e a e 1 o 4 a chwi es om
di e en manu ac u e s and he su ace inish is ela ed o a speci ic comme cial
b and. In ou s udy, we analyze 16 b ands om di e en manu ac u e s and
es ablish a su ace pa e n o each wi e depending on he p edominan de ec
(c ack, sc a ch, po e, dimple o smoo h). We g oup he wi es om di e en
manu ac u e s acco ding o he su ace pa e n which co esponds o he di e en
manu ac u ing p ocesses. Then, we s udy he in luence o each pa e n on he
luo ide co osion by means o a su ace s udy (Scanning Elec on Mic oscopy)
and oughness (Lase Con ocal mic oscopy) cha ac e iza ion. The hypo hesis is
ha di e en su ace pa e ns, de i ed om di e en manu ac u ing p ocesses,
espond di e en ly o luo ide co osion.
4
2 Ma e ials And Me hods
2.1 P elimina y S udy
We s udied he su aces o 16 NiTi a chwi es (0.016x0.022 inch.) om 9
comme cial b ands in he as- ecei ed condi ion [25] (Table 1). The su ace
mo phology and composi ion was e alua ed by Scanning Elec on Mic oscope
(SEM) (Philips XL-30 Philips, Eindho en, Ne he lands) and Ene gy Dispe si e
Spec ome y (EDS) (Edax In e na ional, Mahwah, U.S.A.); oughness was
measu ed using a Lase Scanning Con ocal Mic oscope Sys em (LSCM) (Leica
TCS-SP2, We zla , Ge many). We s udied h ee samples om each ba ch o
a chwi es, each sample coming om a di e en a chwi e wi hin he ba ch. The
a chwi es we e classi ied acco ding o hei su ace pa e ns using 18 a iables.
The Pea son co ela ion es was pe o med o e alua e he exis ence o linea
co ela ions be ween he a iables and he su ace pa e ns. We ound ha i e o
hese co ela ed wi h he pa e n: dimples, sc a ches, c acks, po es and smoo h/no
de ec . As a esul we classi ied he NiTi a chwi es acco ding o hese i e
pa e ns (Table 1) depending on he p edominan su ace de ec s. The di e en
su ace de ec s a e de e mined in he ollowing way: C ack is a long, deep issu e
wi h i egula edges and a iable wid h (Fig. 1C); Sc a ch is a long issu e wi h
smoo h edges and cons an wid h, in which he bo om is clea ly isible (Fig. 1D);
Po e is a deep, usually ounded de ec ; Mic opo e is a po e wi h diame e smalle
han one mic ome e . Dimple is a small hole, an ellip ical o ounded dep ession
on he su ace simila o he dimples in a gol ball (Fig. 1B).
2.2 Ma e ial and Imme sion Tes
Eigh NiTi wi es wi h nea equia omic composi ions made by di e en
manu ac u e s we e used in his s udy. Each su ace pa e n (dimple, sc a ch,
c ack, po e and smoo h/no de ec ) co esponds o wo di e en comme cial
b ands (Table 1). The po ous su ace pa e n was elimina ed om his s udy
because he e was only one manu ac u e . Fo he es s, we used 5 samples o
di e en a chwi es om he same ba ch (n=40). The samples we e 2 cm segmen s

5
ex ac ed om he s aigh pa o he a ch. P e ious o imme sion es each
specimen was cleaned and deg eased o 5 minu es in ace one.
The samples we e pu in a polyp opylene (PP) ube (15 ml) wi h 2 ml a i icial
sali a o 28 days a 37ºC. Modi ied Fusayama a i icial sali a composi ion: NaCl
(0.4 g/l), KCl (0.4 g/l), CaCl2 .2H2O (0.906 g/l), NaH2PO4 .H2O (0.690 g/l),
Na2S.9H2O (0.005 g/l), KSCN (0.3 g/l) and u ea (1 g/l) was used. [5,6,9,10] The
pH was measu ed by means o a pH-me e (mic opH 2001, C ison Ins umen
S.A., Ba celona, Spain) gi ing a alue o 5.3. Then hey we e placed in a 15 ml
PP ube wi h 2 ml a i icial sali a + luo ide solu ion wi h a pH o 4. Imme sion
ime was 8 minu es, which is equi alen o 4 weeks o oo h b ushing o 2
minu es pe week. The luo ide solu ion was p epa ed by ul asonic agi a ion in
he PP ube o 5 ml a i icial sali a and 5g luo a ed p ophylac ic gel (12500 ppm)
(Elmex gel, GABA GmbH, Lö ach, Ge many); he mix u e was cen i uged o
10 minu es a 2000 pm. The uppe clea liquid wi hou he deposi s in he PP ube
was used as he imme sion es solu ion and kep a 37ºC. [8] Righ a e he
imme sion es he samples we e insed o 5 minu es in dis illed wa e and 5
minu es in me hanol in a s i e main ained a he es ing empe a u e o 37ºC.
2.3 Su ace Cha ac e isa ion
The su ace opog aphy o he NiTi a chwi es was examined be o e and a e
he imme sion es s. SEM mic og aphs a low (400x) and high (1600x)
magni ica ion we e aken o ep esen a i e deg aded a eas o he su ace. We used
he 400x images o measu e he su ace occupied by each de ec (dimples,
sc a ches, c acks and po es) in h ee di e en a eas o 10000 μm2. The h ee
measu emen s we e hen a e aged. When small mic opo es appea ed on he
su ace we used he 1600x images wi h an a ea o 400μm2. So, we ha e 5 samples
pe b and o wi e (n=40) and 3 a eas pe specimen.
The su ace oughness o he NiTi a chwi es was analysed be o e and a e he
imme sion es s by means o LSCM. The mic oscope was p e iously calib a ed
using a Mi u oyo p ecision Re e ence Specimen (Code no. 178-601) wi h
Ra=3.1μm, e o coe icien was below 0.3%. The images we e p ocessed using
he Leica Con ocal so wa e ( Leica Mic osys ems GMBH, We zla , Ge many).
Mic og aphs co esponding o 750 linea mic ons we e aken. We andomly
6
selec ed 5 a eas o 10000 μm2 om each opog aphic image and measu ed he
oughness. Ra, Rms, Rp and R alues ob ained in each a ea we e a e aged. Ra
and Rms ep esen he a i hme ical mean o he absolu e alues and he oo -
mean-squa e alue o he scanned su ace p o ile, espec i ely. Rp and R
ep esen he highe and lowe alues o he scanned p o ile. So, o oughness
s udies we analysed 5 a eas om 5 samples o each a chwi e (n=40).
2.4 S a is ical Analysis
Mean alues and s anda d de ia ion o each o he 8 b ands and he 4
su ace pa e ns we e compu ed om he da a ob ained du ing he su ace
cha ac e isa ion. This was done o he as- ecei ed a chwi es as well as a e he
imme sion es . Since he a chwi es used had di e en ini ial alues, in o de o
ensu e a alid compa ison o s a is ical esul s i was deemed app op ia e o use
he di e ence be ween he as- ecei ed and pos -imme sion es alues ob ained
o each wi e es ed. So, he inal da a e e o he inc eases o dec eases in he
a ea occupied by he su ace de ec s o su ace oughness. Posi i e alues mean
su ace deg ada ion while ze o o nega i e alues indica e he absence o
co osion. S a is ical analysis was ca ied ou wi h an analysis o a iance o
compa ison o mean alues, he s a is ical signi icance being se a α ≤ 0.05. The
da a we e analysed using SPSS 14.0 s a is ical so wa e package (SPSS Inc,
Chicago, Ill., USA).
3 Resul s
Table 2 shows he esul s o he su ace de ec in he as- ecei ed
a chwi es. The quan i ica ion was done wi h he su ace alues o each de ec and
he o al su ace de ec s o each a chwi e. The inc emen al alue also e e ed o
each su ace pa e n included o he a chwi es a e he imme sion es s in
sali a+ luo ide. The e a e signi ican di e ences in he pa e n wi h c acks. Figu e
1 shows ep esen a i e SEM images o he changes in he su ace o he ou
pa e ns a e he co osion es s. In he smoo h pa e n, we obse e pi ing
7
co osion and da k ci cula spo s (Fig. 1A). In he sc a ch pa e n he e a e also
some ci cula spo s (Fig. 1D). In he dimple pa e n he e is no pi ing o
discolo a ion bu we see a smoo hing o he su ace which educes he numbe o
dimples (Fig. 1B). Finally, in he c ack pa e n we obse e a 6% inc ease in he
su ace occupied by he de ec s mainly due o he inc eased su ace o he c acks
(Fig. 1C).
The su ace oughness da a (LSCM) o he a chwi es in he as- ecei ed
and pos -imme sion condi ions a e exp essed in Table 3. The e a e signi ican
di e ences o he c acked and sc a ched pa e ns whe e he e is a 33% inc ease in
he su ace oughness: In he c ack pa e n Ra changes om 0.3 μm in he as-
ecei ed a chwi es o 0.4 μm in he pos imme sion samples. In he sc a ched
pa e n Ra changes om 0.35 o 0.48μm. Figu e 2 shows ep esen a i e LSCM
images o he ou pa e ns s udied.
4 Discussion
The p oduc ion p ocess o o hodon ic a chwi es is no disclosed by
manu ac u e s. Ne e heless, i lea es ma ks on he su ace o he wi es. I we
obse e he su ace o a chwi es om di e en manu ac u e s wi h an elec on
mic oscope, we will see di e en su ace de ec s (c acks, dimples, sc a ches
o ien ed in he axis di ec ion o no , po es, e c.) [4,5,8,9,20,25]. We will also ind
discolo a ions, deposi s, inclusions and a ious deg ees o oughness [4,9,25].
This is due o he di e en ea men s used h oughou he p oduc ion p ocess
( he momechanical ea men s, wi ed awing, polishing, e c.) [4,5,8,20]. These
indings show e y di e en su ace inishes on he a chwi es which may no
always be o good quali y [20,24,25].
In ou p elimina y s udies [25], we g ouped he wi es acco ding o hei
p edominan su ace de ec , co esponding di e en a chwi es o he same su ace
pa e n and he e o e o a simila inishing p ocess. Consequen ly, we we e able o
s udy he in luence o hese su ace pa e ns. The e is a gene al ag eemen in he
bibliog aphy ha he a chwi e manu ac u e has a s a is ically signi ican
in luence on he co osion esis ance [4,5,9,20]. Howe e , he e is some
8
con o e sy o conside ing he su ace de ec s [4,5,9,20,22,23] and/o he
oughness [4,5,8,9] as he causes o he co osion. These s udies compa e
a chwi es wi h di e en su ace inishes, bu he au ho s do no speci y hei
p edominan su ace pa e n. We ound de ec s ha clea ly in luence he co osion
in luo ide, as is he case o c acks. Howe e , o he su ace pa e ns did no show
any co osion as is he case o smoo h and dimple pa e ns. The p eexis ing
su ace pa e n could p o ide answe s abou he a iabili y o he co osion
esis ance o di e en NiTi a chwi es wi h nea equia omic composi ion. We
hink ha he su ace pa e n should be aken in o accoun when compa ing
di e en NiTi o hodon ic wi es. Ne e heless, we ag ee wi h o he au ho s [8,9]
ha mo e s udies a e necessa y since o he ac o s such as esidual s esses [4,9],
he amoun o esidues [20,24,24) and he deg ee o homogenei y o
mic os uc u es[20], e c. can also be in ol ed.
In ou s udy, we used an amine luo ide gel solu ion wi h a concen a ion
o 1.25 % (12500 ppm) and pH=4 as he imme sion media. Co osion in HF is
p oduced wi h a c i ical concen a ion o 30 ppm ha will des oy he TiO2-based
passi e ilm on NiTi a chwi es [26]. This concen a ion is eached wi h ≥500 ppm
luo ide and pH=4[26] o wi h 2250 ppm luo ide in neu al solu ion [9]. Thus, he
solu ion used in ou esea ch is jus i ied by i s high concen a ion and acid pH,
ensu ing i s co osi e e ec . Di e en kinds o luo ide solu ions (s annous
luo ide, sodium luo ide, e c) ha e di e en deg ees o co osi eness [18,19],
he e o e he in luence o he luo ide solu ion on he su ace pa e n o
o hodon ic a chwi es could be he subjec o u u e esea ch.
A e imme sion in luo ide solu ion, we ound ha he e was an inc ease
in he su ace de ec s in he a chwi es wi h c ack as su ace pa e n, unlike hose
wi h smoo h, sc a ch o dimple su ace pa e ns. The inc eased numbe o de ec s
is caused by an inc emen in he numbe and size o he c acks. In p e ious s udies
[5,20,22,23] p eexis ing de ec s we e iden i ied as co osion si es. In he same
way, s udies on a chwi es wi h polished su aces ind less co osion [23,27].
Co osion is due o highe esidual s ess and/o non-uni o m passi e ilm on he
su ace de ec s [5]. Repassi a ion can also be di e en due o di e en su ace
condi ions [28]. These p eexis ing su ace de ec s a e ela ed o he p oduc ion
p ocess [5]. Fu he mo e, o he esea che s ha e no ound any ela ionship
be ween he su ace de ec s and he deg ee o co osion [4,9]. So, he di e ence
15
Rama i an Li e
Den au um
60648
54.5 / 45.5
Sc a ch
G4
G&H
142669
53.3 / 46.7
Sc a ch
M5
G&H
126755
53.3 / 46.6
Sc a ch
The momemo ia
Leone
08022001
53.9 / 46.1
Sc a ch
The maloy
RMO
A07304
53.4 / 46.6
Sc a ch
Re lex Hea -Ac i a ed
TPO
1297060
53.2 / 46.7
Sc a ch
Neo Sen alloy
GAC
H326
53.1 / 46.8
Po ous
(*) %Ni / %Ti (w %)
(†) A chwi es used in he expe imen al s udy
(‡) %Ni / %Ti / %Cu (w %)

16
Table 2 Su ace a ea o de ec s and a ia ion (Δ De , ob ained by sub ac ing a e age To al de ec s) be o e and a e imme sion es . C ack pa e n shows s a is ically signi ican
a ia ion.
Ni-Ti
A chwi es
MANUFACTURING DEFECTS (In 10.000 μm2)
PATTERN
Δ De -SALIVA+F
C acks
Po es
μPo es
Sc a ches*
Dimples
To al
Mean
SD
Re lex SE
0
0
0.8
2.9
0
3.7
Smoo h
39.8
24.6
Ni inol Classic
0
174
1.9
0
25
200.1
O honol
0
228
1.5
0
6215
6444.5
Dimple
-144
48.0
Align XF
73.7
258
3,3
0
1302
1637
Memo ia
577.5
5.1
1.7
12.8
176
773.1
C ack
631.3†
68.0
Ti anol SE
264.5
35.6
1.3
0
0
301.4
Tensic
70
0
0
6.8
0.28
77.1
Sc a ch
51.7
31.6
Ni inol HA
57.9
58.8
7.7
13
138
275.4
(*) μm pe 100 μm in linea sc a ches.
(†) Mean signi ican di e ence (p < 0.05)
17
Table 3 Su ace oughness da a and a ia ion be o e and a e imme sion es . Sc a ch and c ack pa e ns show s a is ically signi ican a ia ions.
Ni-Ti
A chwi es
SURFACE ROUGHNESS AS-RECIEVED (10.000 μm2)
SALIVA+FLUORIDE
Ra
Rms
R
Rp
PATTERN
Ra
Rms
ΔRa
ΔRms
Re lex SE
0.22
0.31
2.31
1.20
Smoo h
0.32 (0.13)*
0.45 (0.18)
0.03 (0.01)
0.03 (0.01)
Ni inol Classic
0.46
0.61
3.46
2.76
O honol
1.32
1.71
8.45
4.53
Dimple
1.01 (0.35)
1.35 (0.47)
-0.06 (0.02)
-0.08 (0.02)
Align XF
0.70
0.95
7.60
4.09
Memo ia
0.44
0.60
4.30
2.23
C ack
0,35 (0.13)
0.48 (0.17)
0.13† (0.04)
0.19† (0.06)
Ti anol SE
0.25
0.37
3.33
1.18
Tensic
0.34
0.47
3.87
1.87
Sc a ch
0.30 (0.09)
0.40 (0.13)
0.10† (0.03)
0.14† (0.04)
Ni inol HA
0.26
0.36
3.14
1.81
* S anda d de ia ions a e gi en in pa en heses.
† Mean signi ican di e ence (p < 0.05)