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Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering

Abstract

Platinum is the most widespread electrode material used for implantable biomedical and neuroelectronic devices, motivating exploring ways to improve its performance and understand its fundamental properties. Using reactive magnetron sputtering, PtOx is prepared, which upon partial reduction yields a porous thin-film form of platinum with favorable properties, notably record-low impedance values outcompeting other reports for platinum-based electrodes. It is established that its high electrochemical capacitance scales with thickness, in the way of volumetric capacitor materials like IrOx and poly(3,4-ethylenedioxythiophene), PEDOT. Unlike these two well-known analogs, however, it is found that PtOx capacitance is not caused by reversible pseudofaradaic reactions but rather due to high surface area. In contrast to IrOx, PtOx is not a reversible valence-change oxide, but rather a porous form of platinum. The findings show that this oxygen-containing form of Pt can place Pt electrodes on a level competitive with IrOx and PEDOT. Due to its relatively low cost and ease of preparation, PtOx can be a good choice for microfabricated bioelectronic devices. Platinum is used in many medical implants, but lags behind next-generation electrode materials in performance. How sputtered platinum oxide is a microfabricatable thin film material that provides bioelectronics electrodes with volumetric capacitance and low impedance that tweaks platinum to compete at the level of conducting polymers and IrOx is shown. image

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Elevating Platinum to Volumetric Capacitance: High Surface Area Electrodes through Reactive Pt Sputtering

Author: Gryszel, Maciej; Jakešová, Marie; Vu, Xuan Thang; Ingebrandt, Sven; Glowacki, Eric Daniel
Publisher: WILEY
Year: 2024
DOI: 10.1002/adhm.202302400
Source: https://dspace.vut.cz/bitstreams/2e29adfe-0566-4d87-a928-32d80170bc06/download
RESEARCH ARTICLE
www.ad heal hma .de
Ele a ing Pla inum o Volume ic Capaci ance: High Su ace
A ea Elec odes h ough Reac i e P Spu e ing
Maciej G yszel, Ma ie Jakešo á, Xuan Thang Vu, S en Ingeb and ,
and E ic Daniel Głowacki*
Pla inum is he mos widesp ead elec ode ma e ial used o implan able
biomedical and neu oelec onic de ices, mo i a ing explo ing ways o
imp o e i s pe o mance and unde s and i s undamen al p ope ies. Using
eac i e magne on spu e ing, P Oxis p epa ed, which upon pa ial educ ion
yields a po ous hin-film o m o pla inum wi h a o able p ope ies, no ably
eco d-low impedance alues ou compe ing o he epo s o pla inum-based
elec odes. I is es ablished ha i s high elec ochemical capaci ance scales
wi h hickness, in he way o olume ic capaci o ma e ials like I Oxand
poly(3,4-e hylenedioxy hiophene), PEDOT. Unlike hese wo well-known
analogs, howe e , i is ound ha P Oxcapaci ance is no caused by e e sible
pseudo a adaic eac ions bu a he due o high su ace a ea. In con as o
I Ox,P O
xis no a e e sible alence-change oxide, bu a he a po ous o m
o pla inum. The findings show ha his oxygen-con aining o m o P can
place P elec odes on a le el compe i i e wi h I Oxand PEDOT. Due o i s
ela i ely low cos and ease o p epa a ion, P Oxcan be a good choice o
mic o ab ica ed bioelec onic de ices.
1. In oduc ion
Pla inum is he mos common bioin e ace elec ode ma e ial
o neu os imula ion and neu al eco ding elec odes. P esen ly,
M. G yszel
Labo a o y o O ganic Elec onics
Depa men o Science and Technology
Linköping Uni e si y
B edga an 33, No köping 60174, Sweden
M. Jakešo á, E. D. Głowacki
Bioelec onics Ma e ials and De ices Labo a o y
Cen al Eu opean Ins i u e o Technology
B no Uni e si y o Technology
Pu kyˇ
no a 123, B no 61200, Czech Republic
E-mail: [email p o ec ed].cz
X. T. Vu, S. Ingeb and
Ins i u e o Ma e ials in Elec ical Enginee ing 1
RWTH Aachen Uni e si y
52074 Aachen, Ge many
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can be ound unde h ps://doi.o g/10.1002/adhm.202302400
© 2024 The Au ho (s). Ad anced Heal hca e Ma e ials published by
Wiley-VCH GmbH. This is an open access a icle unde he e ms o he
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ci ed.
DOI: 10.1002/adhm.202302400
nea ly all ch onically implan ed bioelec-
onic medicine de ices, such as deep b ain
s imula o s, pe iphe al ne e in e aces,
implan ed encephalog aphy elec odes, and
spinal co d s imula o s u ilize pla inum
as he ac i e elec ode.[1–3]Pla inum is e-
ga ded as a noble me al wi h sui able bio-
compa ibili y. I s double-laye capaci ance
and cha ge s o age/injec ion capaci y a e,
howe e , ela i ely low compa ed o many
nex -gene a ion neu al in e ace elec ode
ma e ials such as TiN, conduc ing poly-
me s, and I Ox.[4,5]To boos he in e a-
cial capaci ance o P o mo e compe i i e
le els, a ious echniques o mic o- and
nano-s uc u ing o pla inum ha e been ex-
plo ed. Pla inum elec odes can be ough-
ened and po osified by lase abla ion,[6]
o by elec ochemical ea men s.[7]These
p ocedu es enhance he exposed su ace
a ea o he pla inum, inc easing capaci ance
and leading o a d op in elec ochemical
impedance. The mos -explo ed me hod o p epa a ion o
high su ace-a ea ul a-low-impedance pla inum is elec ochem-
ical deposi ion o s uc u ed pla inum om pla inum sal
solu ions.[8,9]These po ous s uc u es a e some imes e e ed
o as pla inum black o g ey, and can ea u e a ious shapes
o nano o mic os uc u ed P . P ominen examples include P
nanog ass[9]o nanoP [10]coa ings epo ed by Asplund and co-
wo ke s, demons a ed o in i o and in i o applica ions.[10]
These coa ings ep esen he o-da e bes epo s in e ms o low
impedance pla inum (e.g., |Z| @ 1 kHz be ween 20–50 kΩ o
35 μm diame e elec odes). Ne e heless, he key pe o mance
me ics o pla inum elec odes lag behind he a o emen ioned
eme ging neu al in e ace ma e ials.
He ein we ake an al e na i e app oach o imp o ing he
elec ochemical p ope ies o P : p epa a ion o pa ially bulk-
oxidized P Oxfilms by eac i e magne on spu e ing. This builds
upon ou ecen ly published me hod o p epa a ion o po ous no-
ble me al films by (elec o)chemical educ ion o spu e ed noble
me al oxides (Au, Pd, and P ).[11]In his ea lie wo k we ound
ha unlike he o he “noble” me als, educ ion o P Oxp oceeded
only pa ially and a high le el o oxygen con en always emained
in he bulk o he films ega dless o ea men condi ions. In-
spi ed by his finding, he ein we ha e se ou o cha ac e ize
spu e ed P Oxas an elec ode ma e ial in he con ex o bioelec-
onics applica ions. To his end, we p epa e elec odes based on
eac i ely spu e ed P Ox(Figu e 1A,B) and compa e hem wi h
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Figu e 1. A) C oss sec ion schema ic o mic oelec odes es ed in his s udy: Ø 40 μm Au mic oelec odes coa ed wi h P Ox. B) Scanning elec on
mic oscopy (SEM) mic og aphs o a plana P film, e sus a P Oxfilm. The P Oxshows a fine mic opo ous s uc u e. C) Elec ochemical impedance
spec a (solid line – modulus, dashed line – phase angle) o Ø 40 μm Au mic oelec odes coa ed wi h 240 nm o P Ox, PEDOT:PSS (c osslinked wi h
GOPS), o I Ox(a e elec ochemical ac i a ion desc ibed in he expe imen al sec ion). Impedance o plana P elec odes o he same size (no shown),
gi e |Z| (≈450 kΩ@ 1 kHz). D) A eal and olume ic capaci ance o P Ox(135 W DC spu e ing a 47 mTo o A wi h 20% O2) laye s o diffe en
hickness, deposi ed on Ø 40 μm Au mic oelec odes. Calcula ions we e done based on cyclic ol amme y da a. A eal capaci ance linea ly scales up
wi h P Ox hickness up o 600 nm, hicke samples ha e only sligh ly inc eased a eal capaci ance and lowe olume ic capaci ance. Inc easing hickness
beyond his poin leads o an inc ease in se ies esis ance, which may o igina e om he poo conduc i i y o he P Oxbulk film,[12]and/o so-called
po e esis ance, and small elec oly e-filled channels in oduce elec ochemical impedance.
wo well-known high-capaci y/low-impedance elec odes used
in bioelec onics: poly(3,4-e hylenedioxy hiophene):poly(s y ene
sul ona e), PEDOT:PSS, and I Ox. These ma e ials se e as
poin s o e e ence o help unde s and bo h he pe o mance and
elec ochemical na u e o P Oxelec odes.
2. Resul s and Discussion
2.1. Capaci i e P ope ies o P Ox
We cha ac e ized he elec ochemical impedance o Ø 40 μm
P Oxmic oelec odes, and es ima ed he elec ochemical capac-
i ance o P Oxfilms using cyclic ol amme y (de ails on film
p epa a ion can be ound in Sec ion 2.2). The impedance o
hese is significan ly lowe han plana P , and lowe han p e i-
ous epo s on bes -o s uc u ed P mic oelec odes (we achie e
≈8.6 kΩ@ 1 kHz, compa ed wi h alues >20 kΩ epo ed in
he li e a u e o he same sized elec odes, Ø 35–40 μm).[13]In a
side-by-side compa ison, ou measu ed impedance is on-pa wi h
pseudo a adaic coa ings PEDOT:PSS and I Ox(Figu e 1C). Mo e-
o e , he mos ema kable esul was ha he wo-dimensional
a eal capaci ance o P Oxwas no only ela i ely high (Figu e 1D),
bu he measu ed capaci ance scaled linea ly wi h he hickness
o he deposi ed P Oxlaye , in he same manne as he so-called
olume ic capaci o ma e ials PEDOT and I Ox.Wecalcula e
a olume ic capaci ance o 200 mF cm−3, a alue on-pa wi h
he bes op imized PEDOT o mula ions.[14]This finding begs
he ques ion as o he mechanism behind his high capaci y. PE-
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Figu e 2. Cyclic ol amme y scans (100 mV s−1, deoxygena ed PBS o pH 7.4) egis e ed in −1.0 o +1.0 V e sus Ag/AgCl ange o esh samples o :
A) P Ox,B)I O
x. While he I Oxsample shows a p og essi e inc ease in elec ochemical capaci ance, known as elec ode “ac i a ion,” P Oxshows he
opposi e beha io whe e he ea u es o he CV e ol e o esemble hose o P . By 40 scans, he scan s abilizes, and P Oxfilms beha e essen ially as P
o a high su ace a ea. Film hickness =240 nm, a ea o he samples =0.05 cm2. Impedance o P Oxand olume ic capaci ance emain unchanged ia
his p ocedu e.
DOT and I Oxs o e cha ge in hei olume due o pseudo a adaic
eac ions.[4]The PEDOT chains can be e e sibly oxidized and
educed, and coun e ions can be anspo ed in and ou o he
PEDOT laye .[15]In I Ox, e e sible edox eac ions a e a ailable,
especially he I 3+/I 4+couple. This makes I Oxa alence-change
oxide which can e e sibly s o e cha ge in i s bulk. We pe o med
a se ies o expe imen s o es i he bulk o he P Oxbeha es anal-
ogously o I Ox, wi h bulk elec ochemical e e sibili y. I is well-
es ablished ha he su ace o pla inum is e e sibly oxidized, as
an oxide o ms du ing anodic pola iza ion and is subsequen ly
educed du ing a ca hodic scan.[16]The ques ion is i pla inum
oxide in he bulk is elec ochemically accessible o edox ac i -
i y in a way analogous o I Ox. Ou expe imen s show ha in
a po en ial window ele an o bioelec onics, i.e., neu os im-
ula ion, he e is no e idence o bulk e e sibili y. In epea ed
cyclic ol amme y scans om +1 o−1 V e sus Ag/AgCl in de-
oxygena ed PBS (Figu e 2) we see a dec ease in peak ampli ude
and a ea on P Ox, o yield a CV eminiscen o no mal P , albei
wi h high capaci ance (Figu e 2A). The fi s ew scans show high
educ ion cu en s, which we in e p e as elec ochemically ac-
cessible pla inum oxides being educed o pla inum. O e he
cou se o 40 cycles, he CV s abilizes o a amilia one o P .
E en he highly cha ac e is ic p o on adso p ion peaks[16] om
he o ma ion o P -H a e appa en . This e e sion o he CV
cha ac e is ics o hose esembling pla inum would indica e ha
he P Oxsample is, ne , elec ochemically beha ing as P i sel ,
and he oxide is bu ied wi hin elec ochemically inaccessible ac-
ions o he sample. I Oxelec odes, unde he same scanning
condi ions, show p og essi ely highe ampli ude peaks, bo h ca-
hodic and anodic, o e he whole scan ange (Figu e 2B).[4]This
p ocess o inc easing cha ge s o age capaci y is indica i e o in-
c easing hyd a ion o he laye and high e e sibili y o he I e-
dox eac ions, and is in he li e a u e on such elec odes known
as ac i a ion o p econdi ioning. The exchange o H+and OH−
in o he laye is epo ed o accompany he alence change eac-
ions o I .[17]Thus, well-hyd a ed I Oxlaye s a e associa ed wi h
high elec ochemical capaci ance. This analogous “ac i a ion”
p ocess does no appea in P Oxfilms. We can su mise ha hese
P Oxlaye s consis s o po ous conduc i e suppo , which om
ene gy-dispe si e X- ay spec oscopy (EDX) we can conclude
is la gely oxidized, wi h elec ochemically ac i e pla inum a
he su ace.
The i e e sibili y o P Ox edox beha io is co obo a ed by
measu ing oxygen con en in he films be o e and a e gal-
anos a ic educ ion and hen eoxida ion. I he eac ion we e
e e sible, educ ion is expec ed o yield lowe measu ed oxy-
gen con en while eoxida ion should es o e he oxygen con-
en . While he e is a small deg ee o e e sibili y o oxygen con-
en appa en in P Oxdu ing educ ion/ eoxida ion due o well-
known su ace oxida ion/ educ ion, he le el o e e sibili y is
much highe in I Oxsamples (Table 1). This dis inc ion in e-
e sibili y we ound is also appa en in expe imen s o epea ed
CVs (2600 cycles in −0.3 o +0.1 V s Ag/AgCl ange). While
he oxygen con en o P Ox alls, I Ox e ains i s o iginal s oi-
chiome y (Table 1). The oxygen s oichiome y imbalance can be
mechanis ically a ionalized in he ollowing way: The gal anos-
a ic applica ion o nega i e cu en can d i e a adaic eac ions
like wa e educ ion, while gal anos a ic applica ion o posi i e
cu en leads o oxida ion o exposed me allic pla inum, bu only
a he elec ochemically accessible su ace. Mos o he cu en
goes in o wa e oxida ion. I is well-es ablished ha wa e oxi-
da ion p oceeds elec oca aly ically om he oxidized pla inum
su ace.[18]The o ma ion o a su ace oxide is well-es ablished,
bu he oxide hickness is e y limi ed and does no ing ess in o
he film wi h highe applied ol age. Meanwhile, in I Ox, elec o-
chemical edox eac ions occu h oughou he bulk o he sam-
ple, allowing he oxygen con en o change.
To u he p obe he dis inc ion in elec ochemical eac ions
occu ing a P Ox e sus I Ox, we measu ed elec ochemical ca-
paci ance in aqueous and nonaqueous elec oly e using 0.05 m
LiClO4, as his elec oly e sal is soluble in bo h wa e and ace-
oni ile. The esul s a e shown in Table 2. In he case o I Ox, he
measu ed capaci ance dec eases by a ac o o h ee when mea-
su ed in nonaqueous elec oly e. This can be unde s ood since
wi hou wa e , he pseudo a adaic eac ions affo ding he high ca-
paci y a e blocked. These eac ions equi e exchange o H+and
H2O wi h he bulk o he film. We do no obse e his kind o
d op in capaci ance o P Ox, howe e . In ac , he measu ed ca-
paci ance alue is abou 10% highe in ace oni ile han in wa-
e . This signals ha he cha ge s o age mechanism in P Oxdoes
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Table 1. Change in he oxygen con en in laye s (100 nm) subjec ed o elec ochemical educ ion and eoxida ion ea men s. Due o limi a ions o he
EDX assay,[11] he esul s should be ea ed as semi-quan i a i e.
O con en [a om%] by EDX
Elec ochemical expe imen S age o he expe imen P OxI Ox
Gal anos a ic educ ion/ eoxida ion:
high cu en densi y
F esh sample 45.2 47.3
A e educ ion: −5mAcm
−2, 60 s 22.9 40.9
A e eoxida ion: +5mAcm
−2, 60 s 26.3 46.0
Reco e y o ini ial O con en (a om%) 15.0% 80.0%
Gal anos a ic educ ion/ eoxida ion:
low cu en densi y
F esh sample 45.2 48.1
A e educ ion: −70 μAcm
−2, 2500 s (3.5 mC) 37.4 41.5
A e eoxida ion: +40 μAcm
−2, 4750 s (3.8 mC) 39.6 47.3
Reco e y o ini ial O con en (a om%) 27.1% 87.5%
CV cycling: −0.3 o +0.1 V,
100 mV s−1
F esh sample 45.2 47.6
A e 2600 CV cycles (5 h 45´) 37.6 47.4
Dec ease o he O con en (a om%) 17.5% 0.4%
no equi e aqueous ion exchange as in I Ox. The highe mea-
su ed capaci ance o nonaqueous condi ions in P Oxcan be ex-
plained by he lowe iscosi y o ace oni ile, which allows be e
elec oly e pene a ion in o he po ous s uc u e o P Ox. Taken
oge he , hese esul s all implica e he P Oxfilm as a po ous
double-laye capaci ance P ma e ial wi h a adaic p ope ies e-
sembling P , and no he pseudo a adaic mechanism pos ula ed
o he alence-change oxide I Ox.
2.2. Op imizing Deposi ion Condi ions o P OxElec odes
We uned he eac i e spu e ing condi ions (spu e ing p essu e,
powe , DC e sus RF plasma, and oxygen:a gon a io) o yield
an op imized P Oxwi h espec o high elec ochemical capac-
i y and low impedance. We also es ima ed he oxygen con en
in he films. Va ying he spu e ing condi ions, when conside -
ing he final oxygen con en o he film as es ima ed by EDX
analysis, se e al ends a e appa en : Fi s , mo e oxygen added
in he spu e ing mix u e always co ela es wi h highe oxygen
con en . Fo a fixed A :O2 a io, DC spu e ing always yields less
oxygen con en han he analogous p ocess using RF. Rega dless
o plasma ype, inc easing powe always co ela es wi h less oxy-
gen con en . O e all wo king p essu e does inc ease oxygen con-
en , also he wo king p essu e has a subs an ial effec on film
oughness and mo phology. While hese diffe en pa ame e s
may yield po ous P Oxfilms sui able o many in e es ing appli-
ca ions, anging om ca alysis o biosenso s, ou p esen ocus
Table 2. Capaci ance alues calcula ed om CV scans in aqueous e sus
nonaqueous elec oly es. Film hickness =100 nm.
Ma e ial Elec oly e sol en A eal capaci ance
[mF cm−2]
I OxAce oni ile 0.41
H2O 1.17
P OxAce oni ile 1.17
H2O 1.06
is on low-impedance/high capaci y elec odes o bioelec onics.
The e o e, we e alua ed hose wo pa ame e s only, and in a di-
ec compa ison (Table 3) he bes -pe o ming films a e p epa ed
ia he ollowing condi ions: (DC, 135 W, 47 mTo , 20% O2). This
op imized coa ing o P Oxwas compa ed in mic oelec odes wi h
wo well-known low impedance coa ings: PEDOT:PSS and I Ox.
This yielded he compa ison o impedance shown in Figu e 1C.
2.3. Bio ouling Tes s and Compa a i e S abili y
Du ing ope a ion o bioelec onics de ices, physiological condi-
ions ep esen a ha sh en i onmen and he issue o bio ouling
is impo an . Adhesion o p o eins and o he biomolecules on he
su ace can se e ely deg ade pe o mance o elec ode ma e ials.
We compa ed samples made using he op imized p o ocol (DC
135 W, 47 mTo , 20% O2) wi h I Oxand PEDOT as e e ences.
In hese expe imen s, we p epa ed MEAs wi h Ø 40 μm mic o-
Table 3. Es ima ed oxygen con en in P Oxlaye s (120 nm) and elec o-
chemical capaci y as a unc ion o diffe en spu e ing pa ame e s. Due
o sa e y limi a ions o he spu e ing sys em, deposi ions a e limi ed o
<20% O2in he spu e ing gas mix u e. *Sample hickness homogenei y
was low, he e o e easonable es ima ion o capaci ance was N/A.
P Oxp epa a ion p ocedu e O con en [a om%]
by EDX
Capaci ance
[mF cm−2]
Re . [11] p ocedu e, Elec ochemical
educ ion −0.8 V 60 s
44.9 0.612
RF 60 W, 25 mTo , 15% O256.1 N/A*
RF 135 W, 25 mTo , 15% O250.3 1.159
RF 135 W, 30 mTo , 15% O251.3 1.220
RF, 135 W, 47 mTo , 20% O255.5 1.305
DC 135 W, 28 mTo , 20% O240.5 0.763
DC 135 W, 37 mTo , 20% O244.5 1.216
DC,60W,47mTo ,20%O
250.6 N/A*
DC 135 W, 47 mTo , 20% O245.2 1.517
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Figu e 3. Rela i e s abili y o P Ox,I O
x, and PEDOT:PSS laye s (240 nm, on Ø40 μm Au mic oelec odes) subjec ed o bio ouling (A, C, and E) and
accele a ed aging es s a 60°(B, D, and F). A,B) Change in absolu e impedance a 1 kHz. C,D) Change in peak ol age alues o ca hodic phase
o 200 μCcm
−2phase−1biphasic pulse. These a e ca hodic ol age excu sions om baseline measu ed e sus an AgCl e e ence elec ode in h ee-
elec ode configu a ion. E,F) Change in olume ic capaci ance. All esul s o gi en ma e ial a e a e aged o e 3–4 diffe en mic oelec odes. Samples
a e emo ed om he aging chambe and measu ed, hen e u ned o he gi en aging condi ion.
elec odes made o plana gold, coa ed wi h 240 nm o each o he
espec i e coa ings.
The s abili y o he MEA samples was e alua ed in wo se s o
s abili y es s: The fi s add essed longe - e m bio ouling, whe e
he samples we e s o ed in 2% bo ine se um albumin in 1×PBS
a 37 °C o e he cou se o 30 days. The second was an accele a ed
aging es , whe e he samples we e s o ed in 1×PBS a 60 °C.
O e he cou se o bo h o hese p o ocols, samples we e egu-
la ly emo ed and es ed ia impedance measu emen s, CV cy-
cles, and a measu emen o ol age excu sions du ing applica ion
o biphasic cu en s imula ion pulses wi h 200 μCcm
−2phase−1.
The esul s o key figu es o me i : impedance alue a 1 kHz, ol-
ume ic capaci ance alues, and ca hodic ol age excu sion du -
ing pulsing show a c i ical compa ison be ween he h ee coa -
ings (Figu e 3). PEDOT and I Oxgene ally ou pe o m P Oxin
e ms o % change o e ime, hough P Oxlaye s demons a ed
some su p ising quali ies such as s able olume ic capaci ance
which was consis en ly mo e han wice as high as ha o PE-
DOT. O e all, he long- e m s abili y o P Ox, howe e , was poo e
han he e e ence samples I Oxand PEDOT. Though he pe o -
mance o P Oxdec eased, impedance emains an o de o mag-
ni ude be e han P alone. We would specula e ha he decline
in P Oxpe o mance is due o agg ega ion effec s which lead o
a dec ease in effec i e su ace a ea o some ex en .
3. Conclusions
P Ox, p epa ed by eac i e spu e ing, ep esen s an in e es ing
and po en ially compe i i e a ia ion o he ange o pla inum
modifica ions ha a e being pu sued in he bioelec onics field.
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I s p epa a ion is ully compa ible wi h mic op ocessing, easily
in eg a able wi h li hog aphy o ins ance. The many a iables
a ailable in eac i e spu e ing echniques, o which we ha e only
explo ed a ew, can po en ially p o ide a wide pale e o unc-
ional p ope ies o P Ox hin films. F om a undamen al poin o
iew, we ha e c i ically add essed he ques ion o cha ge s o age
mechanism in hese films: hey a e essen ially a highly po ous a-
ie y o pla inum. Mac oscopically, hese films show a ema kable
„ olume ic capaci ance″, wi h capaci ance scaling wi h hick-
ness. The olume ic capaci ance alues exceed, by mo e han a
ac o o wo, he well-known ma e ial PEDOT:PSS. Th ough a se-
ies o elec ochemical and elemen al analysis we compa e P Ox
wi h I Ox. Using hese compa a i e me hods, we show, ha he
high olume ic capaci ance effec in P Oxo igina es om high
po osi y o he films a he han a bulk e e sible edox chemis y
as is he case o I Ox(o PEDOT:PSS). The obse a ion sugges s
ha he concep o olume ic capaci ance does no necessa ily
apply only o pseudo a adaic ma e ials. In e ms o bioelec onic
mic oelec odes, he P Oxb ings pla inum o he le el o com-
pe i i e pa ame e s o impedance and capaci ance o he nex -
gene a ion ma e ials like I Oxand PEDOT. In con as o I Ox,
P Oxwo ks well al eady “as- ab ica ed” and does no equi e ex-
ensi e elec ochemical condi ioning. By i ue o ease o p ocess-
abili y and especially much lowe cos compa ed o I Ox, he use
o P Oxmay be indica ed in many applica ions o mic o ab i-
ca ed bioelec onics de ices.
4. Expe imen al Sec ion
Ma e ials:Spu e ing a ge s o Vaksis 3 m sys em (2.00″Dia. ×
0.125″ hick) we e supplied by Tes bou ne L d (P , 99.99%) and No dic
High Vacuum AB (Au, 99.99%). PEDOT:PSS (Cle ios PH1000 o mula-
ion) was supplied by He eaus. Dichlo o[2.2]pa acyclophane (Pa ylene-C
p ecu so ) was supplied by TiXX Coa ings L d. All o he chemicals we e
supplied by Sigma-Ald ich and used wi hou any pu ifica ion. Bo ine albu-
min se um used in he s abili y es s was he hea shock ac ion, pH 5.2,
≥96%.
P epa a ion o Au Coa ed Subs a es o Elec odes o 0.05 cm2Ac i e A ea:
PET oil (Polic om sc eens, 120 μm hick) was selec ed as a subs a e due
o he ac ha i p o ides good adhesion o laye s o spu e ed Au wi hou
he need o any addi ional s icking laye . Be o e Au deposi ion, he oil was
cu o ings o Ø 11.5 cm and cleaned by subsequen sonica ion (10 min)
in isop opanol and DI wa e . A e d ying, i was loaded in o a Vaksis 3 m
spu e ing sys em wi hou any p e-ac i a ion wi h oxygen plasma o ozone.
A e e acua ion o he acuum chambe o p essu e <1×10−5To , Au
laye (100 nm) was spu e ed a 3.8–4.0 mTo p essu e o pu e a gon us-
ingaDCmagne ona 100W.
Reac i e Spu e ing o P Ox:All deposi ions o me al oxides we e done
by magne on spu e ing using an A :O2mix u e. The p essu e was egu-
la ed wi h he ga e al e and o a ion eloci y o he u bomolecula pump.
The subs a es we e ne e hea ed. To ab ica e 0.05 cm2elec odes, Au-
coa ed PET oil was cu wi h scisso s o pieces o ap. 2 ×2cmsize(ap-
p op ia e o he cell used o he elec ochemical cha ac e iza ion) which
we e moun ed by he edges o he sample holde wi h Kap on ape. A -
e P Oxdeposi ion, ac i e a ea o he laye was limi ed o 0.05 cm2wi h
a sel -adhesi e oil (wi h Ø 2.5 mm opening). In he case o mic oelec-
odes, be o e loading o he spu e ing chambe , subs a es we e ea ed
wi h oxygen plasma (50 W, 120 s, Diene elec onic GmbH). Deposi ion
o he P Oxwas p eceded (in he same acuum cycle) by spu e ing o a
smoo h laye o P (10 nm) o imp o e adhesion o he oxide coa ing. In he
case o MEA samples in he final s ep o he ab ica ion sac ificial Pa ylene-
C laye was peeled off wi h he assis ance o Kap on ape, ai s eam and
i needed, mild sonica ion in DI wa e .
Thickness Con ol o he Spu e ing Deposi ed Laye s in Vaksis 3 mSys em:
Thickness o all laye s was con olled by he du a ion o he p ocess (based
on he known and well- ep oducible alues o a e) and always in good ac-
co dance wi h eadings o qua z c ys al moni o o he spu e ing sys em.
Tooling ac o s, as well as he alues o a e, we e p ede e mined by ime-
con olled spu e ing on glass subs a es, wi h hickness measu ed wi h a
Dek ak XT (B uke ) p ofilome e .
Fab ica ion o Mic oelec ode Samples:Silicon wa e s wi h 2.5 μm he -
mally g own oxide laye we e used as he subs a e. The me al leads and
in e connec s consis ing o 20 nm Ti and 50 nm Au we e deposi ed by an
elec on-beam e apo a ion sys em (BESTEC), pa e ned by pho oli hog a-
phy (AZ 1518) and e ched wi h KI:I2:H2O gold e chan and HF:H2O2:H2O
i anium e chan . The encapsula ion was p o ided wi h a 2 μmlaye o
Pa ylene-C (SCS Labco e ) g own by chemical apo deposi ion in p es-
ence o an adhesion p omo ing silane A-174. The me al pads we e exposed
by pho oli hog aphy (AZ 1518) and eac i e ion e ching (RIE, O2plasma,
200 W). To acili a e he pa e ning o he elec ode coa ing ma e ials (I Ox,
P Ox, and PEDOT:PSS), ano he , sac ificial, laye o 2 μm Pa ylene-C was
deposi ed on op o he encapsula ion laye wi h a 2% Mic o-90 an i-
adhesi e coa ing in be ween. The elec ode a ea (40 μm diame e ) was
exposed by pho oli hog aphy (AZ 9260) and eac i e ion e ching (RIE, O2
plasma, 200 W). Thus p epa ed subs a es we e ac i a ed by an O2plasma
jus be o e deposi ion o he elec ode ma e ial. The sac ificial Pa ylene-C
laye was hen peeled off o yield he mic oelec ode a ay.
PEDOT:PSS was deposi ed by spin coa ing om a sonica ed dispe -
sion o PEDOT:PSS (Cle ios PH 1000, He aeus), 5 w % e hylene glycol,
0.1 w % dodecyl benzene sul onic acid, and 1 w % o (3-glycidyloxyp opyl)-
ime hoxysilane (added and mixed jus be o e he spin coa ing). A e he
peel-off, he PEDOT:PSS laye was annealed a 140 °C o 45min.
I Oxwas deposi ed by magne on spu e ing acco ding o p e iously
published me hods,[17]and pa e ned ia Pa ylene-C peel-off as desc ibed
abo e.
SEM Imaging and EDX Analysis:SEM imaging and EDX analysis we e
pe o med wi h SEM Zeiss Sigma-500, equipped wi h B uke Nano XFlash
610 m De ec o (silicon d i de ec o (SDD), wi h he moelec ic (Pel ie )
cooling and ligh elemen window), se a ele a ion angle 35°. All samples
we e con ac ed o he mic oscope s age using coppe ape, a e washing
wi h DI wa e and d ying in a s eam o N2. Images we e aken wi h he
in-lens seconda y elec on de ec o a an accele a ion ol age o 7–15 kV,
30 μm beam ape u e, and 3.3–3.6 mm wo king dis ance, wi h he chambe
e acua ed o p essu e <1×10−5mba . Elec on beam shi was used o
mo e he imaging a ea wi hou in oducing ib a ions.
In EDX analysis, he P/B-ZAF s anda dless me hod was always used
wi h ca bon decon olu ion, as quan ifica ion co ec ion, and ollowing
spec al lines: 0.525 keV o O (K𝛼) and 2.048 keV o P (M). To maximize
he de ec o coun a e, he wo king dis ance was 10–11 mm, he beam
ape u e was se o 120 μm wi h he high cu en mode enabled. To com-
pensa e o su ace oughness and possible sensi i i y o he noble me al
oxides o he elec on beam, low image magnifica ion (×1000) and accel-
e a ion ol age (6 kV) we e always used. Resul s, gi en as P /O a om%,
we e a e aged o e 6 measu emen s, done in diffe en pa s o he spec-
imen. Va iabili y (as ela i e s anda d de ia ion) was ela i ely low (lowe
han he ela i e assay e o , calcula ed by he so wa e). Using highe ac-
cele a ion ol ages (up o 12 kV) usually ga e simila alues o a om% bu
wi h highe a iabili y. Fo he pu pose o he analysis, in o de no o o e -
es ima e me al con en in he oxide, o elimina e signal coming om he
subs a e a designa ed se o samples was p epa ed, in an analogous way
like o he elec ochemical cha ac e iza ion wi hou 10 nm o smoo h P
in e laye .
Elec ochemical Cha ac e iza ion:Cha ac e iza ion o all samples was
done wi h an I ium echnologies Ve ex One po en ios a and phospha e
buffe saline (1×PBS: 10 mm phospha e, pH 7.4; 138 mm NaCl, 2.7 mm
KCl in DI wa e ) as he elec oly e. 0.05 cm2samples we e elec ically con-
ac ed wi h coppe ape (a ached o he uncoa ed a ea o he subs a e)
and placed in a 15 mL double-sided elec ochemical cell (Redox.me),
equipped wi h a P coil as a coun e elec ode, and an Ag/AgCl wi e as a
pseudo e e ence elec ode. The elec oly e was deoxygena ed be o e mea-
su emen s by pu ging wi h a gon. Mic oelec odes we e measu ed wi h
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pla inum pla e as coun e elec ode and Ag/AgCl pseudo e e ence elec-
ode confined in a sy inge, filled wi h he elec oly e by adjus ing he p es-
su e wi h ano he sy inge connec ed by a flexible ubing. The sample was
p ecisely posi ioned unde he sy inge ip o achie e he elec oly ic con-
ac wi hou any mechanical connec ion. The elec ical con ac was ca e-
ully es ablished wi h a needle p obe placed on he con ac pad. In case o
mic oelec ode measu emen s, deoxygena ion o he elec oly e was no
possible. The cyclic ol amme y expe imen s we e pe o med wi h he
100 mV s−1scan a e and +0.1 o +0.3 V scanning ange o he pu pose
o es ima ing capaci ance o he elec odes. Scans a e conduc ed in his
ange o ob ain a s able capaci i e-cha ging ype ansien cu en , his be-
ha io s abilizes a e he fi s scan. Elec ochemical double-laye capaci-
ance was calcula ed by in eg a ing he cu en in his cha ging/discha ge
egion, acco ding o he equa ion desc ibed in Chap e 1 o he Ba d and
Faulkne ex book.[19]Elec ochemical impedance spec a we e eco ded
using a single-sine p obing AC ol age o 10 mV ampli ude a a DC bias
o 0 V e sus he e e ence elec ode wi h 20 poin s pe decade. Biphasic
pulsing s ess es was done using he same equipmen o a cha ge densi y
o 200 μCcm
−2phase−1in he ollowing sequence: 50 μs es ime(wi h
I=0 A), 250 μs ca hodic-leading squa e wa e o m, 50 μs in e pulse ime
(I=0 A), 250 μs anodic squa e wa e o m, 50 ms es ime (wi h I=0A).
The esul (as V= ( ) cu e, measu ed s Ag/AgCl pseudo e e ence elec-
ode wi h 10 μs in e al ime) was a e aged o e 10 consecu i e pulses.
The peak alue o he ca hodic phase is gi en as ol age e sus baseline
(a e aged V eco ded du ing ini ial 50 μs o he pulsing sequence).
Acknowledgemen s
The au ho s hank Ma y Donahue o help wi h PEDOT sample p epa a-
ion. This wo k has been suppo ed by he Eu opean Resea ch Council
(ERC) unde he Eu opean Union’s Ho izon 2020 esea ch and inno a-
ion p og am (E.D.G. g an ag eemen No. 949191), by he G an Agency
o he Czech Republic unde con ac 23-07432S, and by unding om
he Na ional Cen e o Neu ological Resea ch, suppo ed by he MEYS
CR (LX22NPO5107). Sample ab ica ion was suppo ed by CzechNanoLab
Resea ch In as uc u e suppo ed by MEYS CR (LM2023051).
Open access publishing acili a ed by Vysoke uceni echnicke B ne, as
pa o he Wiley - CzechELib ag eemen .
Conflic o In e es
The au ho s decla e no conflic o in e es .
Da a A ailabili y S a emen
The da a ha suppo he findings o his s udy a e a ailable om he co -
esponding au ho upon easonable eques .
Keywo ds
bioelec onics, biomedical mic ode ices, elec ochemis y, pla inum, eac-
i e spu e ing
Recei ed: July 26, 2023
Re ised: May 14, 2024
Published online:
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