Electron beam lithography for direct patterning of MoS2on PDMS substrates

Jumbert, Gil; Placidi, Marcel; Alzina, Francesc; Sotomayor Torres, C. M.; Sledzinska, Marianna

doi:http://dx.doi.org/10.13039/501100003329

Electron beam lithography for direct patterning of MoS2on PDMS substrates

Jumbert, Gil,Placidi, Marcel,Alzina, Francesc,Sotomayor Torres, C. M. ,Sledzinska, Marianna

Published: 2022-03-02
Publisher: Royal Society of Chemistry (UK)
DOI: http://dx.doi.org/10.13039/501100003329
Repository: digital.csic.es
Language: en

Abstract

ICN2 is funded by the CERCA program/Generalitat de Catalunya, and is supported by the Severo Ochoa program from Spanish MINECO (Grant No. SEV-2017-0706). We acknowledge support from EU Project NANOPOLY (GA 289061) and the Spanish MICINN project SIP (PGC2018-101743-B-I00). MP acknowledges the financial support from Spanish MICINN within the Ramón y Cajal Program (RYC-2017-23758).

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