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RESEARCH ARTICLE | FEBRUARY 07 2024
Epitaxial growth and characterization of multi-layer site-
controlled InGaAs quantum dots based on the buried
stressor method
Imad Limame ; Ching-Wen Shih ; Alexej Koltchanov ; Fabian Heisinger ; Felix Nippert ;
Moritz Plattner ; Johannes Schall ; Markus R. Wagner ; Sven Rodt ; Petr Klenovsky ;
Stephan Reitzenstein
Appl. Phys. Lett. 124, 061102 (2024)
https://doi.org/10.1063/5.0187074
11 March 2024 13:29:00
Epitaxial growth and characterization
of multi-layer site-controlled InGaAs quantum
dots based on the buried stressor method
Cite as: Appl. Phys. Lett. 124, 061102 (2024); doi: 10.1063/5.0187074
Submitted: 21 November 2023 .Accepted: 19 January 2024 .
Published Online: 7 February 2024
Imad Limame,
1
Ching-Wen Shih,
1
Alexej Koltchanov,
1
Fabian Heisinger,
1
Felix Nippert,
1
Moritz Plattner,
1
Johannes Schall,
1
Markus R. Wagner,
1,2
Sven Rodt,
1
Petr Klenovsky,
3,4,a)
and Stephan Reitzenstein
1,a)
AFFILIATIONS
1
Institute for Solid State Physics, Technical University of Berlin, Hardenbergstraße 36, D-10623 Berlin, Germany
2
Paul-Drude-Institut f€
ur Festk€
orperelektronik, Leibniz-Institut im Forschungsverbund Berlin e.V., 10117 Berlin, Germany
3
Department of Condensed Matter Physics, Masaryk University, Kotl
a
rsk
a 267/2, 611 37 Brno, Czech Republic
4
Czech Metrology Institute, Okru
zní 31, 63800 Brno, Czech Republic
a)
and stephan.reitzenstein@physik.tu-berlin.de
ABSTRACT
We report on the epitaxial growth, theoretical modeling, and structural as well as optical investigation of multi-layer, site-controlled quantum
dots fabricated using the buried stressor method. This deterministic growth technique utilizes the strain from a partially oxidized AlAs layer
to induce site-selective nucleation of InGaAs quantum dots. By implementing strain-induced spectral nano-engineering, we achieve spectral
control of emission and a local increase in the emitter density. Furthermore, we achieve a threefold increase in the optical intensity and
reduce the inhomogeneous broadening of the ensemble emission by 20% via stacking three layers of site-controlled emitters, which is valuable
for using the SCQDs as a gain medium in microlaser applications. Our optimization of site-controlled growth of quantum dots enables the
development of high-bmicrolasers with increased confinement factor.
V
C2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://
creativecommons.org/licenses/by/4.0/).https://doi.org/10.1063/5.0187074
The scalability of nanophotonic systems is a key to unlocking
their full potential and realizing their widespread applications in vari-
ous fields, such as optoelectronics and emerging photonic quantum
information technologies based on single quantum emitters.
1–3
Furthermore, the emission properties of cavity-enhanced microlasers
are also improved by a controlled integration of quasi-zero-
dimensional gain centers.
4
In this regard, the deterministic fabrication
of nanophotonic devices with a controlled number and position of
semiconductor quantum dots (QDs) is an important step forward in
achieving that goal. In the last two decades, innovative methods to
control the position of QDs have been developed, including the usage
of etched nanoholes, pre-patterned substrates, and cleaved-edge over-
growth.
5–12
Another attractive growth approach for site-controlled
QDs (SCQDs) is the buried stressor method.
13,14
This deterministic
growth technique leads to high-quality SCQDs with narrow emission
linewidth and high multi-photon suppression as well as pronounced
resonance fluorescence,
15
In this method the stressor layer below the
growth surface is used to control the nucleation site, and local number
of the QDs.
13,14
This allows for the deterministic and scalable fabrica-
tion of single-photon sources (SPSs)
16
and high-bmicropillar lasers.
17
However, despite its proven potential, systematic studies on the
employment of the buried-stressor method for the optimization of
site-controlled QDs (SCQDs) for usage as a gain medium in microlas-
ers are still lacking.
Here, we report on the investigation of the buried stressor growth
method to engineer the QD gain medium for increasing the confine-
ment (C)andb-factors of microcavity lasers, while at the same time
reducing the absorption losses due to non-positioned QDs. This paves
the way to the energy-efficient operation of those devices, which is of
great interest, for instance, in photonic reservoir computing, where
hundreds of microlasers need to be pumped above threshold.
18,19
Furthermore, we show that the buried stressor technique could serve
Appl. Phys. Lett. 124, 061102 (2024); doi: 10.1063/5.0187074 124, 061102-1
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as an alternative approach for growing high-quality QDs emitting pro-
spectively in the telecom O-band, to complement existing non-
positioning methods, such as strain-reducing layers (SRLs) and meta-
morphic buffer layers (MB).
20,21
The buried stressor method takes advantage of the strain induced
by a partially oxidized AlAs layer, stemming from a lattice constant
difference between AlAs (5:660 ˚
A) and Al
2
O
3
(4:785 ˚
A). The resulting
tensile strain at the center of the etched mesa protrudes to the surface,
where it leads to the accumulation of indium atoms at the most tensile
strained positions (largest lattice constant) above the aperture, which
results in the site-controlled nucleation of QDs.
14
In addition, control
over the emission wavelength is achieved by optimizing the growth
interruption time. To further increase the optical gain for laser applica-
tions, we stack multiple layers of SCQD (ML-SCQDs). Compared to
conventional SK QDs, the stacking of SCQDs results in higher optical
gain and better spectral homogeneity, as well as positional control of
QD formation.
22
Our samples were fabricated through a two-step growth process
using metal-organic chemical vapor deposition (MOCVD). After the
first growth step, UV-lithography was employed to pattern an array of
square mesas with approximately 20 lm side length. These mesas were
subsequently dry-etched to expose the AlAs layer, which was then
selectively oxidized to create the AlAs aperture at the mesa’scenter,
before performing the second growth step of the site-controlled QDs.
The layer design and process steps are displayed in the supplementary
material Fig. S1. Atomic force microscopy (AFM) was employed to
investigate the strain profile at the QD growth surface and to measure
the QD density. The microscopic analysis is complemented by Raman
spectroscopy above the aperture, which is used to monitor the strain
profile by measuring the strain-induced spectral shift of the longitudi-
nal optical phonon (LO) line of GaAs. Moreover, we applied the finite-
difference method to simulate the strength and shape of induced stress
and its effect on the SCQDs using continuum elasticity theory.
23
Finally, high-resolution cathodoluminescence (CL) was utilized to
characterize the emission properties of the emitters. Our approach
allows us to shift the energy of the site-controlled emitters compared to
the non-positioned QDs, enabling, thus, the growth of SCQD with high
density without compromising the site-controlled nature of the buried
stressor technique. Moreover, compared to non-positioned QDs, we
enhance the optical gain threefold while reducing the inhomogeneous
broadening of the ensemble by stacking three layers of SCQDs.
We first discuss the growth and emission properties of a single
layer of SCQDs. Figure 1(a) shows a CL intensity color map of a single
layer of SCQDs with a growth interruption time of 40 s in the wave-
length range between 1000 and 1150 nm overlapped with an SEM
image of the mesa, demonstrating high position accuracy (below
100nm) of the buried stressor method. Noteworthy, while SCQDs
based on nanohole arrays and inverted pyramids feature an alignment
accuracy in the tens of nm and are suitable for integration into pho-
tonic crystal cavities,
24,25
buried stressor SCQDs, with usually better
optical properties, are more suitable for integration in high Q-factor
cavities with relaxed mode-matching requirements on the order of a
few 100 nm. CL emission of on- and off-aperture positions from the
mesa shown in Fig. 1(a) is displayed in Fig. 1(b).TheSCQDshavea
maximum emission wavelength of 1070 nm [red curve in Fig. 1(b)]
and exhibit a strongly redshifted emission in comparison with the
non-positioned QDs of 950 nm [blue curve in Fig. 1(b)]. For
comparison, the wetting layer emission occurs at 920 nm (see the sup-
plementary material, Fig. S2). The shift of the emission wavelength is
achieved by higher localized tensile surface strain above the aperture
combined with a longer growth interruption (of 40 s as discussed
below) time. The observed magnitude of the redshift is compatible
with an increased indium content in the SCQDs as well as with larger
QDs. We interpret the observed behavior by buried stressor-induced
migration of the indium atoms to the most tensile strained position
directly above the aperture, resulting in a higher indium concentration
in the center of the mesa. This together with a higher InGaAs growth
rate, hence, leads to an increase in the density, size, and indium con-
tent of SCQDs compared to non-positioned QDs, thus contributing to
the observed redshift of SCQD emission. Intriguing, apart from the
achieved spectral redshift, the peak intensity of the SCQDs is main-
tained compared to the non-positioned QDs. We attribute that to the
high quality of the growth surface and low defect density compared to
other methods for redshifting QD emission using a SRL or a MB.
To obtain better insight into the buried stressor growth of
SCQDs, the surface strain distribution at the growth surface was mod-
eled using the continuum elasticity theory. Simulations of the strain
profile at the GaAs surface vs the position on the mesa for different
aperture sizes are depicted in Fig. 1(c). The difference in lattice con-
stants between AlAs and Al
2
O
3
results in lateral strain, which propa-
gates in the growth direction to the surface [see the supplementary
material, Figs. S3(a) and S3(b)], where the InGaAs wetting layer is
deposited. The buried stressor creates tensile and compressive stress
with surface strain extrema of 0.4% and 0.12%, respectively. The
strain profile depends in this configuration solely on the size of the
aperture as seen in Fig. 1(c) (see the supplementary material, Fig. S4),
whereas the strain magnitude depends on the size of the aperture as
can be observed in Fig. 1(c),thestressorlayerthickness,andtheaper-
ture to surface distance [see the supplementary material, Fig. S6(a)].
Corresponding AFM measurements in Fig. 1(d) show a smooth height
profile after the growth of a single uncapped QD layer for different
aperture sizes. Here, the migration of indium atoms from the compres-
sive to the tensile position leads to a change in the growth rate directly
above and surrounding the aperture. As shown in Fig. 1(d),thisresults
in a thickness difference in the growth direction, whereas
the unstrained GaAs on the mesa remains unchanged. We denote
the height difference between most tensile positions located above the
aperture and the GaAs surface as Dt, a parameter that characterizes the
magnitude of the strain-induced growth rate change above the stressor.
As predicted by simulations, the smallest aperture exhibits the highest
Dtdue to an increase in the surface strain with a smaller aperture size.
As the compressively strained position is depleted of indium, no QD
growth is observed in related areas in the AFM images (see the supple-
mentary material, Fig. S4). Indium atoms that migrate to the nearby
tensile strained positions above the aperture result in SCQDs with
higher indium content, which explains the redshift of the SCQD emis-
sion in Fig. 1(b). The associated lack of QD growth around the aper-
ture can also be observed in the CL maps [see white ring surrounding
the aperture in Fig. 1(a) right], as the luminescence from the surround-
ing area of the aperture is weak to non-existent.
The strain distribution is monitored by measuring the Raman
emission in the surrounding GaAs above the unoxidized AlAs layer.
For this purpose, we performed systematic Raman spectroscopy mea-
surements. A corresponding color map of the GaAs LO-phonon
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Raman band recomputed to strain for a mesa with an aperture size of
approximately 1000 nm is shown in Fig. 1(e). The stressor-induced
surface strain change is associated with a change in the bond
lengths, resulting in a shift of the GaAs LO-phonon band, in this case
resulting in a Raman shift of approximately 1.7 cm
1
, corresponding
to a strain magnitude of ð0:350 60:001Þ%. The induced strain is evi-
dent in the line scans displayed in Fig. 1(f) for three different-sized
apertures. The noteworthy observation in this context is the
excellent quantitative agreement between the computed strain
(approximately 0.3%) and the measured strain [ð0:350 60:001Þ%], as
evident in Figs. 1(c) and 1(f). This substantiates the predictive nature
of the simulation.
Next, we study the stacking multiple QD layers using the buried
stressor method. In Fig. 2(a),wepresenttheAFMheightprofilesatthe
center of the mesa for one, two, and three layers of SCQD structures
with similar aperture sizes (approximately 2 lm). We observe that
stacking of multiple QD layers does not alter the overall shape of the
surface strain profile and that QDs in the upper layers are aligned by
the strain field of buried stressor as well (see, e.g., Fig. S5). However,
the height difference Dtbetween the most tensile and compressive
positions increases systematically with the number of deposited QD
layers, as indicated by the red data points in Fig. 2(b). The gradual
increase in Dtwith the number of QD layers is attributed to the larger
tensile strain due to the increased distance between the aperture and
FIG. 1. Optical and strain analysis of SCQDs. (a) Low temperature (20 K) CL intensity map of SCQD emission ranging from 1000 to 1150 nm is overlaid with an SEM image of
the quadratic mesa, including the crystallographic orientation of the mesa edges. The high position accuracy of the growth technique is visually demonstrated by the presence
of two yellow dotted lines. Inset: Zoom-in CL image taken at the center of the mesa. (b) The CL spectrum is shown in red and blue for the center and off-center regions of the
mesa at 20 K, respectively. (c) Calculated surface strain profile exx þeyy along the cross section of the mesa, as a function of the aperture size. exx þeyy ¼0 corresponds to
unstrained GaAs. (d) AFM height profile of the aperture for various aperture sizes. (e) Strain taken at the center of the mesa, obtained by Raman measurements. (f) A line cut
to the center of the mesa of the Raman map in (e) for three different aperture sizes (800, 1100, and 1900 nm).
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SCQD layer in addition to the accumulation of the indium, which per-
sists across the multiple layers. Therefore, the growth of multiple layers
and the stress induced by the QDs do not seem to modify the surface
strain profile significantly, except of an approximately 0.7% change in
the absolute surface strain between the first and the third layer due to
the larger distance from the aperture. However, we do not expect any
significant effects on the formation of SCQDs, which is confirmed by
the constant QD density distribution observed across the layers [see
the supplementary material, Figs. S5 and S6(b)].
To evaluate the optical properties of the QDs, we fit the spectra
obtained from CL measurements, as shown in Fig. 1(b), by a Gaussian
function, across multiple mesas and variations in the number of layers.
In Fig. 2(b), we present the corresponding emission wavelength of the
SCQDs. Notably, we observed a distinct blue shift in the emission
when two layers were stacked, reducing the wavelength from
(1059 610) nm for a single layer to (1027 622) nm for the two-layer
structure. This shift can be attributed to a decrease in the average
height of the QDs in the second layer analogous to standard SK
QDs.
22
Furthermore, Fig. 2(c) demonstrates a similar trend regarding
the inhomogeneous broadening of the non-positioned and SCQDs,
which decreases with the number of layers from (80 613) nm and
4366
ðÞ
nm in the first layer to 6769
ðÞ
nm and 2863
ðÞ
nm for
positioned and non-positioned QDs, respectively, indicating improved
uniformity of QD sizes because of strain-coupling.
22
The stacking of SCQDs also results in a nearly linear increase in
integrated CL intensity, as shown in Fig. 2(d). The intensity in
Fig. 2(d) does not show saturation, which shows that the high optical
quality of the emitters is preserved during the stacking.
Interestingly, the buried stressor method also provides an attractive
opportunity to redshift the emission of SCQD. For example, consider
the strain magnitude or, more precisely, the shift in the GaAs LO band
associated with an aperture size of 1000 nm. The corresponding Raman
frequency shift is approximately 1.65 cm
1
, a value comparable to that
of an In
0.15
Ga
0.85
As MB layer with a thickness ranging from approxi-
mately 40–50 nm.
26
To demonstrate the strain-engineered redshifting of
SCQD emission, we utilize the buried stressor-induced strain profile
above the aperture. Here, the additional tensile strain in the center of the
mesa leads to energetically lower QD equilibrium compared to the
unstrained surface. Second, by increasing the growth interruption time,
we allow for the SCQDs to accumulate more indium atoms, resulting in
bigger dots with increased indium concentration and a corresponding
70nmredshiftoftheemissionasseeninFig. 3(a). The blue (red) spec-
trum represents a sample prepared with a growth interruption time after
the deposition of InGaAs of 20 (40) s. Additionally, our numerical
FIG. 2. Properties of multi-layer SCQDs. (a) Line scan of AFM measurements, presenting the height profile for a varying number of SCQD layers at the center of the mesa with
similar aperture sizes (approximately 2 lm), relative to the GaAs surface. (b) Emission wavelength of the SCQDs (black data points) relative to the number of deposited emitter
layers and height difference (red data points) between the most tensile and compressive positions in the center of the mesa. (c) The CL emission spectra exhibit inhomoge-
neous broadening for different numbers of stacked layers, including the wetting layer (red), non-positioned QDs (blue), and SCQDs (black). (d) The integrated CL intensity is
plotted against the number of grown layers, revealing enhanced intensity with increased layer stacking.
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studies predict that the tensile strain induced by the aperture will further
redshift the emission [see the supplementary material, Fig. S7(a)]. Note
that in the calculations, the surface strain obtained from the continuum
elasticity theory is added to the as-grown QD strain during the k.p com-
putation.
27,28
The increase in the aperture size results in a weaker lateral
strain between AlAs and Al
2
O
3
, which in turn decreases the stress prop-
agation to the surface. The increased magnitude of the tensile strain at
the center of the mesa due to the reduction of the aperture size results in
larger QDs with increased indium content, leading to a redshift of
70 nm in the emission of the SCQDs, as depicted in Fig. 3(b).In
Fig. 3(c), the experimental and theoretical emission wavelengths are
plotted against the aperture size. In both graphs, the emission wave-
length is highest for the smallest aperture size and then drops rapidly
with increasing aperture size. That is due to the reduction in surface
strain with a bigger unoxidized AlAs region. Consequently, the migra-
tion of indium atoms and an increase in growth rate above the aperture
occur. The discussed dependencies are also reflected in the CL line scans
of apertures with varying sizes, as presented in Fig. 3(d). Apertures of
930, 1700, and 5300 nm in width result in peak emission wavelengths of
1070, 1010, and 985 nm, respectively. In order to shift the emission
toward the telecom O-band, we suggest that a thicker AlAs stressor layer
and a top GaAs spacer, leading to an increased tensile surface strain, and
associated increase in Indium content in QDs should be used.
In summary, we introduced an innovative approach based on the
buried stressor technique, to achieve a redshift of SCQDs relative to
non-positioned ones. This approach enables the deposition of high-
density SCQDs within a singular layer, preserving excellent positional
control. This is achieved while concurrently monitoring and simulat-
ing strain distribution to gain deeper insights into the underlying
mechanisms. Furthermore, we demonstrate the stacking of three
SCQD layers, resulting in a threefold increase in optical intensity and a
reduction in ensemble inhomogeneous broadening. Subsequently, we
investigate the strain-induced redshift of the SCQD ensemble, granting
us direct control over emission properties. Combining the buried
stressor technique with strain nano-engineering of emission provides
control over the site, number/density, and optical properties of both
ensembles and single QDs. This achievement can potentially pave the
way not only for high-bfactor and low-threshold microlasers, but also
for single-photon sources operating in the O-band without the need of
a conventional strain reducing layer.
FIG. 3. Strain engineering the emission wavelength of SCQDs. (a) CL spectra of two similar structures containing SCQDs are shown. The blue (red) spectrum corresponds to
QDs obtained with a growth interruption time of 20 (40) s. (b) The CL emission from a structure with 40 s of growth interruption time for two aperture sizes. Increasing the size
of the aperture reduces the tensile surface strain, leading to a blue shift in the emission. (c) The experimental peak position of the emission for the SCQDs (black data points)
and the numerical results. The theory results are provided for the surface strain at the center of mesa (green squares) and for maximum surface strain on the aperture (khaki
squares). (d) Examples of CL line scans displaying the emission properties above the aperture for various aperture sizes are shown, with the red line serving as a reference to
facilitate the observation of the blue shift resulting from the increased aperture size.
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See the supplementary material for details regarding fabrication,
characterization, and simulation methods, as well as additional optical,
structural, and simulation results.
The authors gratefully acknowledge the financial support from
the Volkswagen Foundation via the project NeuroQNet2, the
German Research Foundation via INST 131/795-1 320 FUGG, the
German Federal Ministry of Education and Research (BMBF) via the
project MultiCoreSPS (Grant No. 16KIS1819K), and the SEQUME
projects (20FUN05) and QADeT (20IND05) from the EMPIR
program cofinanced by the Participating States and from the
European Union’s Horizon 2020 research and innovation program.
P.K was partly funded by the Institutional Subsidy for the Long-Term
Conceptual Development of a Research Organization granted to the
Czech Metrology Institute by the Ministry of Industry and Trade of
the Czech Republic and by the project Quantum Materials for
applications in sustainable technologies, CZ.02.01.01/00/22_008/
0004572. The authors further acknowledge Kathrin Schatke, Praphat
Sonka, Lucas Rickert, Aris Koulas-Simos, and Maximilian Ries for
their invaluable technical support and engaging scientific discussions,
which greatly contributed to this research.
AUTHOR DECLARATIONS
Conflict of Interest
The authors have no conflicts to disclose.
Author Contributions
Imad Limame: Conceptualization (equal). Petr Klenovsky: Funding
acquisition (supporting). Stephan Reitzenstein: Supervision (lead).
Ching-Wen Shih: Investigation (equal). Alexej Koltchanov: Data curation
(equal). Fabian Heisinger: Data curation (supporting). Felix Nippert:
Formal analysis (supporting). Moritz Plattner: Data curation (supporting).
Johannes Schall: Methodology (supporting). Markus R. Wagner:
Supervision (supporting). Sven Rodt: Methodology (supporting).
DATA AVAILABILITY
The data that support the findings of this study are available from
the corresponding author upon reasonable request.
REFERENCES
1
P. Michler, Quantum Dots for Quantum Information Technologies (Springer
International Publishing, Cham, 2017).
2
E. Rieffel and W. Polak, Quantum Computing: A Gentle Introduction (MIT
Press, Cambridge, MA 2011).
3
T. Heindel, J.-H. Kim, N. Gregersen, A. Rastelli, and S. Reitzenstein, “Quantum
dots for photonic quantum information technology,”Adv. Opt. Photonics
15(3), 613 (2023).
4
W. W. Chow and S. Reitzenstein, “Quantum-optical influences in optoelec-
tronics—An introduction,”Appl. Phys. Rev. 5(4), 041302 (2018).
5
C. Schneider, A. Huggenberger, M. Gschrey, P. Gold, S. Rodt, A. Forchel, S.
Reitzenstein, S. H€
ofling, and M. Kamp, “In(Ga)As/GaAs site-controlled quan-
tum dots with tailored morphology and high optical quality,”Phys. Status
Solidi A 209(12), 2379–2386 (2012).
6
M. Felici, P. Gallo, A. Mohan, B. Dwir, A. Rudra, and E. Kapon, “Site-
controlled InGaAs quantum dots with tunable emission energy,”Small 5(8),
938–943 (2009).
7
A. Rastelli, S. Stufler, A. Schliwa, R. Songmuang, C. Manzano, G. Costantini, K.
Kern, A. Zrenner, D. Bimberg, and O. G. Schmidt, “Hierarchical self-assembly
of GaAs/AlGaAs quantum dots,”Phys. Rev. Lett. 92(16), 166104 (2004).
8
M. Blumin, H. E. Ruda, I. G. Savelyev, A. Shik, and H. Wang, “Self-assembled
InAs quantum dots and wires grown on a cleaved-edge GaAs(110) surface,”
J. Appl. Phys. 99(9), 093518 (2006).
9
D. Wasserman and S. A. Lyon, “Cleaved-edge overgrowth of aligned quantum
dots on strained layers of InGaAs,”Appl. Phys. Lett. 85(22), 5352–5354 (2004).
10
K. M. Kim, Y. J. Park, Y. M. Park, C. K. Hyon, E. K. Kim, and J. H. Park,
“Alignment of InAs quantum dots on a controllable strain-relaxed substrate
using an InAs/GaAs superlattice,”J. Appl. Phys. 92(9), 5453–5456 (2002).
11
T. van Lippen, R. N€
otzel, G. J. Hamhuis, and J. H. Wolter, “Ordered quantum
dot molecules and single quantum dots formed by self-organized anisotropic
strain engineering,”J. Appl. Phys. 97(4), 044301 (2005).
12
S. Krishna, K. Linder, and P. Bhattacharya, “Photoluminescence linewidth of
self-organized In0.4Ga0.6As/GaAs quantum dots grown on InGaAlAs stressor
dots,”J. Appl. Phys. 86(8), 4691–4693 (1999).
13
A. Strittmatter, A. Schliwa, J.-H. Schulze, T. D. Germann, A. Dreismann, O.
Hitzemann, E. Stock, I. A. Ostapenko, S. Rodt, W. Unrau, U. W. Pohl, A.
Hoffmann, D. Bimberg, and V. Haisler, “Lateral positioning of InGaAs quan-
tum dots using a buried stressor,”Appl. Phys. Lett. 100(9), 093111 (2012).
14
A. Strittmatter, A. Holzbecher, A. Schliwa, J.-H. Schulze, D. Quandt, T. D.
Germann, A. Dreismann, O. Hitzemann, E. Stock, I. A. Ostapenko, S. Rodt, W.
Unrau, U. W. Pohl, A. Hoffmann, D. Bimberg, and V. Haisler, “Site-controlled
quantum dot growth on buried oxide stressor layers,”Phys. Status Solidi A
209(12), 2411–2420 (2012).
15
M. Strauß, A. Kaganskiy, R. Voigt, P. Schnauber, J.-H. Schulze, S. Rodt, A.
Strittmatter, and S. Reitzenstein, “Resonance fluorescence of a site-controlled
quantum dot realized by the buried-stressor growth technique,”Appl. Phys.
Lett. 110(11), 111101 (2017).
16
J. Große, M. von Helversen, A. Koulas-Simos, M. Hermann, and S. Reitzenstein,
“Development of site-controlled quantum dot arrays acting as scalable sources of
indistinguishable photons,”APL Photonics 5(9), 096107 (2020).
17
A. Kaganskiy, S. Kreinberg, X. Porte, and S. Reitzenstein, “Micropillar lasers
with site-controlled quantum dots as active medium,”Optica 6(4), 404 (2019).
18
A. Skalli, J. Robertson, D. Owen-Newns, M. Hejda, X. Porte, S. Reitzenstein, A.
Hurtado, and D. Brunner, “Photonic neuromorphic computing using vertical
cavity semiconductor lasers,”Opt. Mater. Express 12(6), 2395 (2022).
19
T. Heuser, J. Grose, S. Holzinger, M. M. Sommer, and S. Reitzenstein,
“Development of highly homogenous quantum dot micropillar arrays for optical
reservoir computing,”IEEE J. Select. Top. Quantum Electron. 26(1), 1–9 (2020).
20
P.Holewa,M.Burakowski,A.Musiał,N.Srocka,D.Quandt,A.Strittmatter,S.
Rodt,S.Reitzenstein,andG.SeRk, “Thermal stability of emission from single
InGaAs/GaAs quantum dots at the telecom O-band,”Sci. Rep. 10(1), 21816 (2020).
21
S. L. Portalupi, M. Jetter, and P. Michler, “InAs quantum dots grown on meta-
morphic buffers as non-classical light sources at telecom C-band: A review,”
Semicond. Sci. Technol. 34(5), 053001 (2019).
22
A. Somintac, E. Estacio, and A. Salvador, “Observation of blue-shifted photolu-
minescence in stacked InAs/GaAs quantum dots,”J. Cryst. Growth 251(1–4),
196–200 (2003).
23
S. Birner, T. Zibold, T. Andlauer, T. Kubis, M. Sabathil, A. Trellakis, and P.
Vogl, “nextnano: General purpose 3-D simulations,”IEEE Trans. Electron
Devices 54(9), 2137–2142 (2007).
24
T. S€unner, C. Schneider, M. Strauß, A. Huggenberger, D. Wiener, S. H€
ofling,
M. Kamp, and A. Forchel, “Scalable fabrication of optical resonators with
embedded site-controlled quantum dots,”Opt. Lett. 33(15), 1759 (2008).
25
M. H. Baier, E. Pelucchi, E. Kapon, S. Varoutsis, M. Gallart, I. Robert-Philip,
and I. Abram, “Single photon emission from site-controlled pyramidal quan-
tum dots,”Appl. Phys. Lett. 84(5), 648–650 (2004).
26
V. Bellani, C. Bocchi, T. Ciabattoni, S. Franchi, P. Frigeri, P. Galinetto, M.
Geddo, F. Germini, G. Guizzetti, L. Nasi, M. Patrini, L. Seravalli, and G.
Trevisi, “Residual strain measurements in InGaAs metamorphic buffer layers
on GaAs,”Eur. Phys. J. B 56(3), 217–222 (2007).
27
X. Yuan, S. F. Covre da Silva, D. Csontosov
a, H. Huang, C. Schimpf, M. Reindl,
J. Lu, Z. Ni, A. Rastelli, and P. Klenovsky, “GaAs quantum dots under quasiu-
niaxial stress: Experiment and theory,”Phys. Rev. B 107(23), 235412 (2023).
28
A. Mittelst€
adt, A. Schliwa, and P. Klenovsky, “Modeling electronic and optical
properties of III–V quantum dots—selected recent developments,”Light Sci.
Appl. 11(1), 17 (2022).
Applied Physics Letters ARTICLE pubs.aip.org/aip/apl
Appl. Phys. Lett. 124, 061102 (2024); doi: 10.1063/5.0187074 124, 061102-6
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