60 GHz Transceiver Circuits in
SiGe-HBT and CMOS
Technologies
vorgelegt von
Master of Science
Amin Hamidian
Von der Fakultät IV – Elektrotechnik und Informatik
der Technischen Universität Berlin
zur Erlangung des akademischen Grades
Doktor der Ingenieurwissenschaften
Dr.-Ing.
genehmigte Dissertation
Promotionsausschuss:
Vorsitzender: Prof. Dr.-Ing. Clemens Gühmann
Gutachter: Prof. Dr.-Ing. Georg Böck
Gutachter: Prof. Dr.-Ing. Arne Jacob
Tag der wissenschaftlichen Aussprache: 10. Dezember 2013
Berlin, 2014
D83
Zusammenfassung
Die Erhöhung der Übertragungsrate von Kommunikationssystemen ist von
hohem wissenschaftlichem und wirtschaftlichem Interesse. Die stetige
Fortentwicklung dieser Systeme, sowohl unter Aspekten der Hard- als auch der
Software, hat ein neues Technologiezeitalter eingeläutet. Verschiedene Szenarien,
auf optischen, drahtgebundenen und drahtlosen Technologien basierend, wurden für
diese Anwendungen entwickelt. Im 60 GHz ISM-Band (57 GHz bis 65 GHz) ist
wegen der hohen Absorptionsverluste bei dieser Frequenz eine Kurzstrecken-
Kommunikation mit hoher Datenrate von besonders hohem Interesse. Die
Realisierung solcher Systeme erfolgt aufgrund von Kosten- und Massenproduktions-
aspekten auf Basis von SiGe-HBT und CMOS Technologien.
Schlüsselparameter eines 60 GHz-Transceivers sind eine hohe
Ausgangsleistung, niedrige Rauschzahl, geringer Stromverbrauch und niedrige
Herstellungskosten. Um den gesamten Frequenzbereich des 60 GHz ISM-Bandes
abdecken zu können, wurden zahlreiche Transceivertopologien weltweit diskutiert.
Die verfügbare Technologie mit ihren Schlüsselparametern ft, fmax stellt hierbei eine
wichtige Randbedingung dar.
In dieser Arbeit werden Aspekte des 60 GHz-Transceiver-Designs unter
Verwendung einer 0,25 μm SiGe-HBT- und einer 90 nm CMOS-Technologie
untersucht. Zunächst wird die Modellierung von passiven und aktiven Komponenten
diskutiert. Verschiedene Techniken zur Modellextraktion basierend auf Messungen
und elektromagnetischen Simulationen werden gezeigt. Für die wichtigsten passiven
Bauelemente werden skalierbare Modelle entwickelt, um das Entwurfsverfahren zu
präzisieren. Im nächsten Schritt werden 60 GHz CMOS- und SiGe-HBT-
Leistungsverstärker untersucht. Basierend auf diesen Studien wurden zwei HBT und
zwei CMOS-Endstufen konzipiert, realisiert und gemessen. Infolge der Verfügbarkeit
einer hochgenauen Bauelemente-Bibliothek, ausgereifter Entwurfstechniken und der
Verifikation auf Basis von EM-Simulationen konnte an den gemessenen
Leistungsverstärkern eine hohe Ausgangsleistung mit guter Effizienz nachgewiesen
werden. Die Ergebnisse zeigen weiterhin eine gute Übereinstimmung von
Simulationen mit Messungen. Weiterhin wurden auf Basis einer 90 nm CMOS
Technologie ein Heterodyne und ein OOK Transceiver entwickelt. Der Heterodyne-
Transceiver mit einer Zwischenfrequenz von 20 GHz genügt dabei dem IEEE
802.15.3c Standard und erreicht eine Performance auf Höhe des internationalen
Standes von Wissenschaft und Technik. Für den OOK Sender wurde eine neue
Topologie entwickelt. Bei diesem Konzept bilden Modulator und Leistungsverstärker
eine Einheit, woraus Vorteile hinsichtlich Ausgangsleistung, Effizienz und Chipgröße
resultieren. Mit dieser Schaltung wurde in einem Systemtest eine Übertragungsrate
von 6 Gbps über eine Entfernung von 4 m erfolgreich nachgewiesen.
Summary
The rise of high-data-rate hungry applications has brought a new dawn to
telecommunication technologies in both hardware and software development
aspects. Different scenarios, mainly based on optical, coaxial and wireless systems,
have been developed for these multi-gigabit communication systems. In these
scenarios, the wireless system is utilized for indoor and short-range communication,
which can ease the requirements on RF power and noise figure of the transceivers.
However, the demand for multi-gigabit communication imposes a broadband
performance requirement upon these wireless transceivers. This broadband
performance requirement can be within the range of 2 GHz to 10 GHz. In order to
cover such a broad frequency range, different transceiver circuit topologies have
been suggested by many circuit designers. Due to the high oxygen loss in the
60 GHz range this 57 GHz to 65 GHz ISM band has attracted attention for high
speed short-range communication. Moreover, the newly emerged low cost
technologies (like, CMOS and SiGe HBT) have further attracted the industry to
explore this communication band.
The main requirements for a 60 GHz transceiver are high output power, low
noise figure, low power consumption and broadband performance. To cover the
whole 57 GHz to 65 GHz frequency band, numerous transceiver topologies are
under discussion. The key parameter ft, fmax of the available technology define the
achievable system performance.
In this thesis, multiple aspects of the 60 GHz transceiver design based on the
90 nm CMOS and 0.25 μm SiGe HBT designs have been investigated. First, the
modeling of passive and active components is presented. These components include
capacitors, inductors, transformers, transmission lines, transistors, matching
networks and RF pads. Different techniques for model extraction based on
measurements and electromagnetic simulations have been examined. For inductors,
transformers and capacitors scalable models have been developed. Further, the
design techniques of 60 GHz CMOS and SiGe HBT power amplifiers have been
studied. Based on these studies, two HBT and two CMOS power amplifiers have
been designed, realized and measured. Due to accurate modeling and design
techniques, high performance and good agreement with simulation has been
achieved. Finally, two different types of transmitters (Heterodyne and OOK) based on
the CMOS technology have been developed. The heterodyne transceiver, with an IF
frequency of around 20 GHz, has been designed based on the IEEE 802.15.3c
standard. This transmitter has achieved state of the art results with respect to output
power, conversion gain and efficiency with a small chip size and low power
consumption. For the OOK transmitter, a novel topology has been developed. In this
topology, the modulator and the power amplifier have been integrated into one
circuit. Due to many advantages of this new topology, this transmitter achieves
higher output power and efficiency compared with state-of-the-art results.
Furthermore, the realized circuit has been utilized within a wireless system where
more than 6 Gbps has been successfully transmitted over a 4 m distance.
Acknowledgments
I would like to thank Prof. Dr. –Ing. Boeck for giving me the opportunity of
doing my PhD under his supervision.
I would like to thank also my colleagues and ex-colleagues, especially Andrea,
Viswa, Daniel and Marko, who helped me a lot in the beginning. Especially, Viswa
who helped me a lot with many things including finding a room in a dormitory and
administrative problems I had in the beginning to learning Cadence and design-kit and
many other things. Daniel for his helps in many aspects and being a good friend.
I would like to thank all my colleagues in MWT and all my friends that I met
in Berlin, who are like a family to me, whom I like spending time with and who make
me feel happy everyday. I would also like to thank Sebastian for kindly correcting my
German abstract.
I would like to thank Dr. Keusgen and his colleagues Robert and Richard for
their supports during measurements.
Finally, I would like to thank my parents and family for all their love and
support.
Contents
List of Figures i
List of Tables v
Abbreviations vi
1 Introduction _____________________________________________________ 1
2 Modeling of Passive and Active Structures _____________________________ 6
2.1 EM Simulation ____________________________________________________ 8
2.2 Passive Structures Modeling for HBT Technology _________________________ 9
2.2.1 Capacitors _____________________________________________________________ 9
2.2.2 Transmission Line ______________________________________________________ 14
2.3 Passive and Active Structure Modeling for CMOS Technology _____________ 15
2.3.1 RF Feeding Structure ____________________________________________________ 16
2.3.2 Transmission Lines ______________________________________________________ 20
2.3.3 Transformer Design _____________________________________________________ 25
2.3.4 Transistors ____________________________________________________________ 35
2.4 Conclusion ______________________________________________________ 37
3 HBT PAs ________________________________________________________ 39
3.1 HBT PA Design and Considerations ___________________________________ 39
3.1.1 PA Transistor Core ______________________________________________________ 40
3.1.2 Pre-Amplifier Transistor Core _____________________________________________ 42
3.1.3 Biasing Networks _______________________________________________________ 42
3.1.4 Collector Current _______________________________________________________ 44
3.1.5 Topology Selection _____________________________________________________ 45
3.1.6 Broadband Design ______________________________________________________ 47
3.2 Realized V-band SiGe HBT Power Amplifiers ___________________________ 48
3.2.1 Low Power PA – 1st Version _______________________________________________ 48
3.2.2 Low Power PA – 2nd Version ______________________________________________ 53
3.2.3 High Power PA – 1st Version ______________________________________________ 61
3.2.4 High Power PA – 2nd Version ______________________________________________ 66
3.3 Conclusion ______________________________________________________ 72
4 CMOS PAs ______________________________________________________ 74
4.1 CMOS PA Design and Considerations _________________________________ 74
4.1.1 Transistor Size Selection _________________________________________________ 74
4.1.2 Topology _____________________________________________________________ 79
4.1.3 Conclusion ____________________________________________________________ 80
4.2 Realized V-Band Si CMOS Power Amplifiers ____________________________ 81
4.2.1 Wilkinson CMOS Power Amplifier__________________________________________ 81
4.2.2 Transformer CMOS Power Amplifier _______________________________________ 87
4.3 Conclusion ______________________________________________________ 91
5 Transmitters ____________________________________________________ 93
5.1 Heterodyne Transmitter ___________________________________________ 94
5.1.1 Link Budget ___________________________________________________________ 95
5.1.2 Circuit Design __________________________________________________________ 96
5.1.3 Experimental Results ___________________________________________________ 101
5.2 OOK Transmitter _________________________________________________ 104
5.2.1 Link Budget __________________________________________________________ 105
5.2.2 Circuit Design _________________________________________________________ 106
5.2.3 Experimental Results ___________________________________________________ 112
5.3 Conclusion _____________________________________________________ 121
6 Conclusion _____________________________________________________ 123
Bibliography _______________________________________________________ 125
List of Publications and Workshops _____________________________________ 134
i
List of Figures
Fig. 1 Indoor wireless communication scenario. ................................................................................ 1
Fig. 2 FCC requirement for indoor EIRP of the UWB system [31]. ...................................................... 2
Fig. 3 ITRS CMOS downscaling roadmap. ........................................................................................... 3
Fig. 4 Circuit design procedure (a) with EM simulation (b) with component modeling and
EM simulation combined. ......................................................................................................... 7
Fig. 5 An example of complete HFSS simulation................................................................................. 8
Fig. 6 Cross-section of the capacitor with main parasitic and coupling components....................... 10
Fig. 7 Simulated total coupling capacitance (Ctot) as a function of d ............................................... 11
Fig. 8 Capacitor with TL, via and pad (a) Schematic of test structure (b) HFSS layout (c) Chip
micrograph ............................................................................................................................. 11
Fig. 9 The S-parameter comparison of a 250 fF (a) Input reflection(b) Transmission ...................... 12
Fig. 10 The S-parameter comparison of a 500 fF: a) Input reflection b) Transmission ...................... 13
Fig. 11 a) Example of a microstrip line in HFSS. b) The extracted scalable model in ADS. [44] .......... 14
Fig. 12 Measured and simulated S-parameter results of a transmission line with W=30 um,
L=200 um. a) Magnitude. b) Phase. ........................................................................................ 14
Fig. 13 Feeding structure utilized for the entire device under tests. .................................................. 16
Fig. 14 a) Test structure utilized for the extraction of the model of the feeding structure. b) The
EM simulated transmission line for matrix [B] calculation. .................................................... 17
Fig. 15 Algorithm for the extraction of the feeding structure based on Matlab coding. ................... 18
Fig. 16 The S-parameter of the extracted feeding structure: a) Input and output return loss. b)
Transmission ........................................................................................................................... 18
Fig. 17 a) Left: Chip-micrograph of the open. Right: Chip-micrograph of the short. b) S-parameter
comparison between simulation and measurement. ............................................................. 19
Fig. 18 a) Chip-micrograph of a 470 fF capacitor. b) The S-parameter comparison between
simulation and measurement. ................................................................................................ 20
Fig. 19 a) GCTL. b) GCTL bottom view. c) SCTL. d) SCTL bottom view. e) Both TLs front view. .......... 21
Fig. 20 Impedance and insertion loss of the GCTL for various widths and spacing. ........................... 22
Fig. 21 Impedance and insertion loss of the SCTL for various widths and spacing. ........................... 22
Fig. 22 Test structure view including the transmission line and the pas structures ........................... 22
Fig. 23 Comparison between the simulated and measured results of 100 µm GCTL with 5 µm width
and 7.5 µm spacing. ................................................................................................................ 23
Fig. 24 Comparison between the simulated and measured results of 100 µm GCTL with 5 µm width
and 7.5 µm spacing. ................................................................................................................ 23
Fig. 25 Comparison between the simulated and measured results of 100 µm SCTL with 8 µm width
and 9.5 µm spacing. ................................................................................................................ 23
Fig. 26 The test amplifier designed with the help of GCTL. a) Schematic. b) Chip micrograph. ......... 24
Fig. 27 The test amplifier designed with the help of SCTL. a) Schematic. b) Chip micrograph. .......... 24
Fig. 28 Comparison between the simulated and measured results of the Cascode amplifier. ........... 25
Fig. 29 Comparison between the simulated and measured results of the common source amplifier.
................................................................................................................................................ 25
Fig. 30 Investigated transformers. a) 3D view. b) Side view. ............................................................. 26
Fig. 31 Realized transformer. a) Schematic. b) Chip micrograph. ...................................................... 27
Fig. 32 3D view of the realized transformers. a) Two turns on M9 and M7 with shielding on M6. b)
One turn on M9 and M8 with shielding on M7. c) One turn on M9 and M8 with shielding on
M1. .......................................................................................................................................... 28
Fig. 33 Measurement vs. EM simulation. S-parameter of: a) the first, b) the second and c) the third
transformer. ............................................................................................................................ 29
Fig. 34 Trans_M1. a) Cross section. b) Model. ................................................................................... 30
Fig. 35 Coupled lines. a) Cross section. b) 3D view. ............................................................................ 31
Fig. 36 Coupled lines model. ............................................................................................................... 31
Fig. 37 Comparison between model, EM simulated and measured results of the transformer ......... 33
Fig. 38 a) Balanced structure. b) Unbalanced structure with unsymmetrical center tap................... 34
ii
Fig. 39 3D view of the transformer with DC feeding connections at the center tap points of both
primary and secondary windings. ........................................................................................... 34
Fig. 40 The complete model of the transformer with center tap. ...................................................... 34
Fig. 41 Schematic of the transistor test structure. ............................................................................. 35
Fig. 42 Layout of the transistor test structure. ................................................................................... 35
Fig. 43 The S-parameter comparison of a 25 µm CMOS (Vdd=1.2 V and Vg=0.8) before de-
embedding (at plane A): a) Input and output reflections. b) Transmission. ........................... 36
Fig. 44 The S-parameter comparison of a 80 µm CMOS (Vdd=1.2 V and Vg=0.8) before de-
embedding (at plane A): a) Input and output reflections. b) Transmission. ........................... 36
Fig. 45 The S-parameter comparison of a 25 µm CMOS (Vdd=1.2 V and Vg=0.8) before de-
embedding (at plane A) (a) Input and output reflections (b) Transmission ............................ 37
Fig. 46 The S-parameter comparison of a 80 µm CMOS (Vdd=1.2 V and Vg=0.8) before de-
embedding (at plane A) (a) Input and output reflections (b) Transmission ............................ 37
Fig. 47 PA with an array of transistors ................................................................................................ 39
Fig. 48 a) 3D layout view of PA core. b) Schematic of the PA core. L1 to L4 are equal to electrical
length of the signal path through each transistor from input to output. ............................... 40
Fig. 49 PA characteristics vs. transistors core size at 60 GHz. a) OP1dB b) Transducer gain. .............. 41
Fig. 50 Optimum load impedance for maximum OP1dB. ..................................................................... 41
Fig. 51 a) Biasing network of the C.E. transistor. b) Biasing network of the C.B. transistors. ............ 43
Fig. 52 a) Comparison between the introduced current source and resistive potential divider. b) Load
line variation of the PA by input power (Pin) with the introduced current source. .................. 43
Fig. 53 BVCE for different base terminations. .................................................................................... 44
Fig. 54 Ft and Fmax vs. collector current. ............................................................................................. 44
Fig. 55 Isolation (S12) vs. topology. ..................................................................................................... 45
Fig. 56 Large signal performance. C.E. vs. Cascode. .......................................................................... 45
Fig. 57 The IV-curves of the SiGe HBT: a) Common emitter b) Cascode ............................................. 46
Fig. 58 ft vs. topology. ........................................................................................................................ 46
Fig. 59 a) Cascaded power stage and pre-amplifier. b) Total transducer gain for different frequency
spacing between f1 and f2. ...................................................................................................... 47
Fig. 60 a) Schematic of the PA. b) Chip-Photo .................................................................................... 49
Fig. 61 a) 3D view of the PA transistor core for a four parallel Cascode. b) PA core schematic. ....... 50
Fig. 62 The load-pull simulation of the PA after matching. a) At Psat. b) At small signal. .................. 50
Fig. 63 3D view of the EM simulated PA. ........................................................................................... 51
Fig. 64 Small signal gain and isolation. Sim. vs. Meas. ..................................................................... 52
Fig. 65 Small signal matching. Sim. vs. Meas. ................................................................................... 52
Fig. 66 Gain and PAE vs. input power at 60 GHz. ............................................................................... 52
Fig. 67 PAE, OP1dB and gain vs. frequency. ......................................................................................... 52
Fig. 68 Schematics and chip micrographes of the: a)PA1. b)PA2. c) PA1. d) PA2. ................................ 54
Fig. 69 PA core with output matching: a) Schematic. b) Performance vs. output matching network
variation at 60 GHz. c) 3D layout view of the PA core and output matching. ........................ 56
Fig. 70 The load pull simulations of the PA after matching. a) At Psat. b) At small signal. ................. 56
Fig. 71 Schematic and 3D view of the intermediate matching network. ........................................... 57
Fig. 72 Schematic and 3D view of: a&c) Pre-amplifier 1. b&d) Pre-amplifier 2. ................................ 58
Fig. 73 S-parameter measurement vs. simulation. a) PA1. b) PA2 ...................................................... 59
Fig. 74 Large signal measurement of both PA1 and PA2: a&b) vs. input power at 60 GHz. c) vs.
frequency. ............................................................................................................................... 60
Fig. 75 PA2 measurement: a) small signal S21. c) large signal performance. ...................................... 60
Fig. 76 a) Schematic of the PA. b) Chip-Photo. ................................................................................... 61
Fig. 77 The single core of the PA: a) schematic. b) 3D view. .............................................................. 63
Fig. 78 The two parallel identical transistor cores combined with the current combiner. ................. 63
Fig. 79 3D view of the PA output matching network together with the output current combiner. ... 64
Fig. 80 The load-pull simulations of the PA after matching. a) At Psat. b) At small signal. ................. 64
Fig. 81 Output matching steps of the output of PA core and DC feed to 50 Ω. .................................. 64
Fig. 82 PA Small signal S-Parameters. Simulation vs. Measurement. ................................................ 65
Fig. 83 Measured Gain and PAE vs. input power at 64 GHz. .............................................................. 65
Fig. 84 a) Schematic of the 4th PA. b) Chip-Photo. .............................................................................. 66
Fig. 85 The 3D view of the transistor Core of the power stage with shielding ground. ..................... 68
iii
Fig. 86 Simulated optimum output impedance versus input power. ................................................. 69
Fig. 87 The broadband input matching. ............................................................................................. 69
Fig. 88 Measured and simulated small signal performance of the PA biased for class AB. ............... 70
Fig. 89 Measured PA collector current vs. input power at 60 GHz. .................................................... 70
Fig. 90 Measured large signal performance of the PA at 60 GHz. a) Near class B biasing. b) Class A.
................................................................................................................................................ 71
Fig. 91 The PA performance vs. class of operation at 60 GHz. ........................................................... 71
Fig. 92 PAE vs. Psat for the state-of-the-art PAs and High Power PA – 2nd Version ........................... 73
Fig. 93 a) HFSS 3D view of the transistor core. b) Simulated maximum stable gain with and without
EM simulated core for 3 µm finger width (W) at 60 GHz and VDD = 1.2 V. ............................. 75
Fig. 94 Large signal simulations for various W and NoF @ 60 GHz for Vg = 1 V and VDD = 1.2 V. a)
Psat. b) PAE. ............................................................................................................................. 76
Fig. 95 Simulated GMAX vs. transistor size and current density at 60 GHz for W= 3 μm for each
transistor finger and VDD = 1.2 V. ............................................................................................ 78
Fig. 96 Stability factor vs. the total transistor width, a) finger width for 200 µA/µm current density.
b) Current density for 3 µm total width. ................................................................................. 78
Fig. 97 Simulated optimum input and output impedance at 60 GHz and VDD = 1.2 V. ..................... 79
Fig. 98 The maximum voltage swing a) C.S. b) Cascade. ................................................................... 80
Fig. 99 The PA block diagram. ............................................................................................................ 81
Fig. 100 a) Schematic of the single PA. b) Chip photo with total chip size of 0.76 mm2. ...................... 82
Fig. 101 Load-pull simulation of the PA after matching on the 16 Ω Smith chart and @ 60 GHz: a) At
Psat. b) At small signal. ............................................................................................................ 83
Fig. 102 a) Wilkinson combiner. b) Simulated results of the Wilkinson combiner. ............................... 84
Fig. 103 Small signal simulation and measurement. a) Matching. b) Gain and Isolation. ................... 85
Fig. 104 Large signal simulation and measurement. a) Power. b) Efficiency. c) Large signal measured
results at three different frequencies. ..................................................................................... 86
Fig. 105 The OP1dB and Psat of the state-of-the-art PAs vs. the power stage size (Active chip size
divided by number of stages). ................................................................................................. 87
Fig. 106 a) The schematic of the transformer-based PA. b) Chip micrograph of the realized PA with
0.065 mm2 active chip size and 0.27 mm2 total chip size. ...................................................... 88
Fig. 107 Optimum power stage transistor sizes for transformer-based matching. .............................. 89
Fig. 108 Load-pull simulation of the PA after matching @ 60 GHz: a) At Psat. b) Small signal. ............ 89
Fig. 109 Measured and simulated S-parameter results of the PA. ....................................................... 90
Fig. 110 a) Large signal measured and simulated results vs. power at 60 GHz. b) Measured linearity
and large signal for four IEEE 802.15.3c channels. ................................................................. 90
Fig. 111 a) The block diagram of the Heterodyne transmitter. b) Output power of the Mixer. c) Output
power after the PA. ................................................................................................................. 94
Fig. 112 The four IEEE802.15.3c channels............................................................................................. 95
Fig. 113 System plan. ............................................................................................................................ 95
Fig. 114 a) Schematic of the mixer. b) Chip photo with 0.41 mm2 total chip size. ................................ 96
Fig. 115 The T2 transistor output impedance vs. size. a) Schematic. b) ZS for ON condition. c) ZS for
OFF condition. ......................................................................................................................... 97
Fig. 116 a) Output power for various transistor sizes (PIF = 0 dBm & PLO = 5 dBm). b) IF transistor
layout. ..................................................................................................................................... 98
Fig. 117. Simulated S-parameter results. .............................................................................................. 98
Fig. 118 a) IF matching and transformer. b) S-parameter and phase imbalance simulation of the IF
matching network. .................................................................................................................. 99
Fig. 119 PA schematic. ........................................................................................................................ 100
Fig. 120 Load-pull simulation of the PA after matching @ 60 GHz: a) At Psat. b) Small signal. .......... 100
Fig. 121 Chip micrograph with 0.6 mm2 (0.4×1.5mm2) chip size including pads. ............................... 101
Fig. 122 Simulated S-parameter results. ............................................................................................. 101
Fig. 123 Measured GC and PDC versus LO power and gate voltage. .................................................. 102
Fig. 124 Measured large signal performance at 60 GHz vs. IF power for channel No.2. .................... 102
Fig. 125 Measured isolation for IEEE802.15.3c channels.................................................................... 102
Fig. 126 Measured large signal performance for IEEE802.15.3c channels. ........................................ 102
Fig. 127 Simulated S-parameter results. ............................................................................................. 103
Fig. 128 Measured large signal performance at 60 GHz vs. IF power for channel No.2. .................... 103
iv
Fig. 129 Measured large signal performance for IEEE802.15.3c channels. ........................................ 103
Fig. 130 a) Conventional OOK modulator. b) Proposed OOK Tx circuit. c) OOK transmitter............... 105
Fig. 131 Link-budget for the OOK system. .......................................................................................... 105
Fig. 132 Schematic of the OOK modulator. ......................................................................................... 106
Fig. 133 Zin vs. T2 size for BB=0. .......................................................................................................... 106
Fig. 134 Zin vs. T2 size for BB=1. .......................................................................................................... 106
Fig. 135 OOK switch transient simulation. a) Test bench. b) Drain current of the switch................... 107
Fig. 136 Rise and fall time between BB=1 and BB=0 for various T2 sizes. .......................................... 107
Fig. 137 Schematic of the PA. ............................................................................................................. 108
Fig. 138 a) Simulated source pull and b) load pull of the PA at 60 GHz and VDD=1.2 V. ..................... 109
Fig. 139 Simulated large signal performance of the power stage. ..................................................... 109
Fig. 140 a) Simulated source pull and b) load pull of the PA at 60 GHz and VDD=1.2 V. ..................... 111
Fig. 141 Schematic of the pre-amplifier. ............................................................................................. 111
Fig. 142 Simulated large signal performance of the pre-amplifier at 60 GHz and VDD = 1.2 V. .......... 112
Fig. 143 Chip micrograph (0.38 mm2 with pads) ................................................................................ 112
Fig. 144 Measurement vs. simulation: a) and b) Small signal performance vs. BB voltage. .............. 113
Fig. 145 Measured and simulated small signal gain. .......................................................................... 114
Fig. 146 Measured and simulated: a) matching. b) stability factor. ................................................... 114
Fig. 147 Measured and simulated POUT vs. BB biasing voltage. .......................................................... 115
Fig. 148 Meas. vs. sim. gain of the PA for both BB states. .................................................................. 115
Fig. 149 Measured large signal performance of the PA over frequency. ............................................ 115
Fig. 150 a) The output of the Tx modulated with 400 Mbps. b) Rise time. c) Fall time. ..................... 116
Fig. 151 The output of the Tx modulated with: a) 4 Gbps. b) 10 Gbps ............................................... 117
Fig. 152 Wireless communication set-up. a) Photo. b) Components. ................................................. 118
Fig. 153 Measured EYE-diagrams of wireless data communication over 2 m and 4 m distances. a&b)
4 Gbps. c&d) 6 Gbps. ............................................................................................................. 118
Fig. 154 a) Schematic of the Tx for linear modulation. b) BB to RF conversion gain for linear
modulations vs. VCON. ............................................................................................................ 119
Fig. 155 Large signal measured vs. simulated results. ........................................................................ 119
Fig. 156 a) Comparison of time domain signal from the Tx and the signal generator. b) Signal
generator constellation. c) Constellation of the received signal. .......................................... 120
v
List of Tables
Table. 1 Maximum transmitted power levels in different regions ........................................................ 2
Table. 2 HBT PA design criteria ........................................................................................................... 48
Table. 3 The values of the PA components. ........................................................................................ 49
Table. 4 The current source elements (Fig. 51a). ................................................................................ 49
Table. 5 PA characteristics over the frequency. .................................................................................. 52
Table. 6 The values of the PA1 components. ....................................................................................... 54
Table. 7 The values of the PA2 components (The rest are the same as PA1). ...................................... 54
Table. 8 Current source PA1 (Fig. 51a). ............................................................................................... 55
Table. 9 The values of the PA components. ........................................................................................ 62
Table. 10 Measured PA characteristics over the frequency. ................................................................. 65
Table. 11 The values of the PA components. ........................................................................................ 67
Table. 12 The current source elements (Fig. 51a). ................................................................................ 67
Table. 13 Comparison of our work with previously published PAs ....................................................... 73
Table. 14 NoF and finger width (W) for maximum PAE (Simulation).................................................... 76
Table. 15 NoF and finger width (W) for maximum Psat (Simulation) ..................................................... 77
Table. 16 Comparison of our works with previously published PAs ...................................................... 92
Table. 17 60 GHz frequency plan for IEEE802.15.3c standard. ............................................................. 94
Table. 18 Link budget calculation. ........................................................................................................ 95
Table. 19 The optimum transistor sizes for the maximum output power. ............................................ 98
Table. 20 Performance Summary ....................................................................................................... 103
Table. 21 Performance Summary ....................................................................................................... 103
Table. 22 Total transient time (rise time + fall time) for different W and NoF (Simulation) ............... 107
Table. 23 Power stage large signal performance (Simulation) ........................................................... 109
Table. 24 Pre-amplifier stage large signal performance (Simulation) ................................................ 112
Table. 25 Comparison of the heterodyne Tx with the state-of-the-art results. .................................. 121
Table. 26 Comparison of the OOK Tx with the state-of-the-art results............................................... 122
Table. 27 Comparison of the homodyne Tx with the state-of-the-art results. .................................... 122
vi
List of Abbreviations
3D Three dimensional
AC Alternating Current
CAD Computer aided design
CG Conversion gain
CMOS Complementary metal-oxide semiconductor
DC Direct current
DUT Device under test
EM Electro-magnetic
ft Transient frequency
fmax Maximum oscillation frequency
GMAX Maximum stable gain
HBT Heterojunction bipolar transistor
HF High frequency
HFSS High frequency structural simulator
IC Integrated Circuit
IF Intermediate frequency
IP3 Third-order intercept point
K Stability factor
LNA Low noise figure
NF Noise figure
NoF Number of fingers
OP1dB (P1dB) Output power at 1dB compression point
PA Power Amplifier
Psat Saturated output power
P1dB (OP1dB) Output power at 1dB compression point
PAE Power added efficiency
POUT Output power
PLL Phase locked loop
RF Radio frequency
Rx Receiver
Si Silicon
SiGe Silicon-Germanium
vii
Tx Transmitter
TRx Transceiver
VCO Voltage controlled oscillator
W The width of the single finger of the CMOS transistor
Wtot Total width of the CMOS transistor
1 Introduction
High data-rate, wireless communication is demanded by many applications,
such as for the Internet, video streaming for high definition TV and short-range data
transfers (Fig. 1). Most of these applications are foreseen for short-range and indoor
purposes with multi-user access. Due to the high data-rate, short-range and multi-user
requirements, a large frequency bandwidth for operation is required by these
applications.
Within the microwave frequency band (300 MHz to 30 GHz), the only
available band which can offer the required large bandwidth for these purposes, is the
3.1 GHz to 10.6 GHz unlicensed band, which can be used for ultra-wideband (UWB)
applications. The main problems with this frequency band are the difficulties in
developing such broadband circuits at such a low frequency (as center frequency to
bandwidth division is quite low) as well as the very low equivalent-isotropic-radiated-
power (EIRP) restriction defined by the FCC [31] (-41 dBm for indoor applications),
which further limits the data communication in both data-rate and communication
distance aspects. Fig. 2 presents the overall mask requirement by the UWB
application defined by the FCC [31].
Fig. 1 Indoor wireless communication scenario.
Introduction
Amin Hamidian 2
Fig. 2 FCC requirement for indoor EIRP of the UWB system [31].
Unlike the microwave band, the millimeter wave band offers an attractive
opportunity for these scenarios. The unlicensed 60 GHz ISM band, with an 8 GHz
bandwidth (57 GHz to 66 GHz), offers an opportunity to circuit designers to develop
circuits for the above mentioned applications. Due to the high center frequency in
comparison with the bandwidth, designing broadband circuitries is much easier for
this frequency band. In addition, based on the IEEE 802.15.3c standardization [32], a
much higher EIRP can be used within this frequency band (Table. 1) in comparison
with the UWB, which further facilitates a high data-rate communication system
design.
Table. 1 Maximum transmitted power levels in different regions
Region
Max. output power
Max. EIRP
Regulatory
document
USA
indoor: 27 dBi
outdoor: 40 dBi
47 CFR 15.255
Japan
10 dBm Max.
bandwidth: 2.5 GHz
57 dBi
ARIB STD-T69,
ARIB STD-T74
Australia
10 dBm
51.8 dBi
Radio communicat.
Class License 2000
Besides the above mentioned advantages of the mm-wave band, the recent
developments in the CMOS and Bipolar technologies have further facilitated the mass
production and low cost development of mm-wave chips. According to the ITRS
roadmap [33], CMOS technologies with more than 400 GHz ft and fmax are expected
to be commercially available in the market (Fig. 3), while the HBT technologies with
more than 400 GHz ft and fmax are already accessible [34].
Introduction
Amin Hamidian 3
Fig. 3 ITRS CMOS downscaling roadmap [33].
Despite many advantages and progresses, designing for the mm-wave
frequency faces many obstacles. Mainly lying in the passive and active components
models and process variations, these problems are hard to solve. As to the issue of
modeling, these challenges mainly include the extraction of the parasitic and coupling
elements of passive components and the Q-factor maximization of inductors or tank
circuits. Since λ/4 is in the same order as the length of the on-chip transmission lines
(T.L.), the coupling elements along with parasitic elements play an important role in
determining the behavior of the circuit. Moreover, the substrate conductance in some
of these technologies is an obstacle for circuit design. For example, the resistivity of
the substrate can vary from 50 Ohm cm in the 0.25 μm HBT BiCMOS technology to
2 Ohm cm in the 90 nm CMOS technology. Such a low ohmic substrate resistance in
the CMOS technology can deteriorate the Q-factor of the passive components and,
therefore, requires the employment of shielding techniques.
Even by including all of the parasitic and coupling elements at the simulation
level, many discrepancies can be seen during measurement. These are mainly due to
technological variations. In this case, all the designs must pass the worst-typical-best
case scenarios for the models. These model conditions are more important for the
active components and are usually provided by the foundries.
All these problems result in discrepancies between the simulated and
measured performances. Consequently, these deviations in each of the RF front-end
components (PA, LNA, Mixer, PLL, etc.) lead to the performance degradation of the
total system. In this context, the main challenges for circuit designers are to minimize
all these discrepancies, particularly at the mm-wave band, by using different
EM simulators (2D, 2.5D, 3D) to extract all the parasitic and coupling elements,
applying different techniques for highly tolerant designs (e.g., broadband designs) and
checking process variation effects on circuit performances (e.g., Monte Carlo
simulation).
Introduction
Amin Hamidian 4
Regardless of all these efforts in modeling, characterization and simulation,
meeting all the system requirements is quite a big challenge in these technologies.
Mainly due to limitations in the transistor performance, achieving high output power
in the PAs and a low noise figure in the LNAs is quite challenging. In the PAs, many
considerations, like PA core optimizations and high Q-factor matching network
design must be included in the design procedure. Moreover, many power combining
techniques - like Wilkinson, transformer and current-combining - must be utilized to
improve the output power performance of the PA.
All the above-mentioned problems and considerations make the mm-wave
circuit design quite challenging and require the extensive study of all aspects of the
circuit development. In this work, the 60 GHz front-end design is studied. Different
circuits, based on the SiGe HBT and Si CMOS technologies, have been designed,
realized and measured. In these designs, different techniques to minimize
discrepancies between the simulated and measured results, to increase the tolerances
of the circuit and, finally, to improve their performance, have been investigated.
This work is organized as follows:
Chapter 1 is the introduction.
Chapter 2 describes all the modeling techniques that have been used in this
work. These modeling techniques include the EM simulation techniques for the
extraction of all the parasitic and coupling elements from the passive structures in
both the 0.25 μm HBT and 90 nm LP CMOS technologies. Further, the model
extraction of the active and passive components through measurements in the 90 nm
LP CMOS technology has been investigated. Finally, scalable models have been
developed for some of the passive components to facilitate the circuit design
procedure. All the models have been extracted up to 100 GHz.
Chapter 3 presents the design procedures for different HBT PAs. The main
required considerations for these designs are investigated. Based on these design
procedures and considerations, two different types of amplifier have been developed.
In the first amplifier, broadband performance with medium output power has been
targeted, while in the second PA a transistor core extension based on the current-
combining technique for high output power achievement has been investigated.
Further, all the designed PAs have been realized and measured. Due to accurate
modeling and design techniques the measured results showed good agreement with
the simulation. In the low power PA, the broadband gain and input-matching covers
the whole V-band (50 GHz up to 70 GHz) with 20 dB gain. Moreover, the large signal
performance of the PA shows 15 dBm output power and 15% PAE. In the high power
PA, owing to the optimized transistor core, 3 dB higher output power (18 dBm) has
been achieved with almost the same PAE (14%) and 15 dB small signal gain at
60 GHz.
Chapter 4 continues with the PA design investigation in the 90 nm Si CMOS
technology. In this part, the PA design procedure and considerations for the CMOS
technology are investigated. As the CMOS transistor shows quite poor output power
performance, different power combining techniques have been studied for output
power improvement. Based on these power combining techniques, two PAs with a
Wilkinson power combiner and transformer have been designed. Although the
transformer-based PA consumes almost 2 times more DC power, the designs show the
much smaller chip size and higher performance of this PA in comparison with the
Wilkinson power combined PA. The Wilkinson power combined PA shows 11 dBm
output power, 8 dB gain and 6% PAE with 100 mW DC power consumption and
0.45 mm2 active chip size, while the transformer-based PA achieves 14 dBm output
Introduction
Amin Hamidian 5
power, 20 dB gain and 10% PAE with 200 mW DC power consumption and
0.065 mm2 active chip size.
Chapter 5, investigates the design of two different types of transmitters
(heterodyne and OOK) based on the CMOS technology. The heterodyne transceiver
with an IF frequency at around 20 GHz was designed based on the IEEE 802.15.3c
standard. In comparison with the other state-of-the-art results, these transmitters -
with a small chip size and low power consumption – have achieved during the
measurement a high POUT (13 dBm to 15.5 dBm), efficiency and conversion gains
(Table. 25). These advantages are mainly due to the transformer-based PA that was
used. Moreover, thanks to the accurate design of the Gilbert cell mixer, much higher
isolations were achieved in this work in comparison with the other state-of-the-art
PAs. Further in this chapter, the design and measurement of a 60 GHz OOK
transmitter has been investigated. In this transmitter, a new technique has been
utilized to simultaneously increase the transmitted bitrate and minimize the power
consumption and chip size. In this case, a new topology has been developed. In this
topology, the OOK modulator and the PA are integrated into one circuit. Further, the
modulator is designed for the maximum bitrate, no DC power consumption and a
small chip size. Moreover, by utilizing accurate models and designing appropriate
matching networks, a high performance PA has been realized. With this topology and
optimization techniques, more than 8 dBm output power and 9 dB gain have been
achieved in the measurement. In comparison with the state-of-the-art OOK results,
this transmitter has achieved much higher output power and efficiency (Table. 26).
Finally, by using this Tx in a complete wireless system, more than 6 Gbps over a 4 m
distance with less than 36 mW DC power consumption has been transmitted which to
the author’s best knowledge is the highest data-rate over a 1 m distance ever measured
with a CMOS transmitter at 60 GHz.
Chapter 6 concludes this work and discusses the possible future works and prospects
for this application.
2 Modeling of Passive
and Active Structures
The silicon-based high ft and fmax CMOS and bipolar transistors give the chip
designer the opportunity to use the mm-wave band for low cost wireless applications.
These applications cover a wide range, from high data-rate short-range
communications to radar systems. The operational frequencies of these applications
are increasing as the new technologies provide higher ft and fmax. For example, the
60 GHz band has been utilized for high data-rate, short-range applications [35], and
the 77 GHz for radar systems [36]. The recent developments show the feasibility of
transceiver design at 160 GHz [82]. Designing at such high frequencies requires the
precise modeling of all the passive and active components and devices.
The main utilized passive structures in a mm-wave circuit consist of inductors,
capacitors, transmission lines, transformers, junctions and transistor cores. Having a
scalable model for these passive structures would considerably ease all the design
problems and lead to a much simpler design and optimization techniques. However,
including all the parasitic and coupling elements in a scalable model, especially at the
mm-wave frequency range, is quite difficult and in some cases, not possible (for
example, coupling elements between the input and output-matching networks); hence,
different modeling techniques must be utilized during the design procedure.
In this section, the two main modeling techniques - based on the
EM simulation - and mathematically scalable models for passive structures are
investigated. The scalable models, although difficult to extract, have many advantages
during design and optimization over the EM-simulated ones, as their parameters can
be changed much more readily and quicker than EM-simulated models. Therefore, it
is important to develop a design procedure that can utilize both modeling techniques
to minimize the design time.
Fig. 4a presents a design procedure utilizing only the EM simulation. This
procedure can be implemented for a complete chip design [16] and extended up to
mm-wave frequencies. The main problem with this design technique are the
complications and time consumption of the EM simulation. In order to simulate the
complete circuit in an EM simulator, depending on the size of the circuit, a couple of
hours to a couple of days might be required. Such a time consuming process makes
the redesign quite difficult. However, the redesign process could be accelerated if the
EM simulation could be drawn out of the main design loop.
Fig. 4b presents the second design procedure. With this design technique, the
scalable model of the critical components (like capacitors, inductors and etc.) is
utilized in the design process and the EM simulator is only used for a specific area of
the circuit layout (like the transistor’s core and junctions). Through this, the
EM simulation time can be reduced significantly. Moreover, by utilizing intelligent
layout design techniques, the on-chip coupling can be reduced and the EM extraction
Modeling of Passive and Active Structures
Amin Hamidian 7
loop can be omitted. All together, these make modeling an important parameter in
high frequency circuit designs.
Results
Start Schematic
Design Layout &
DRC
EM Sim. ENDYes
No
(a)
Results
Results
Start Schematic
Design
Initial
Layout
EM Sim.
of Transistors’
core and
junctions END
Sim. With
Models
Complete
EM Sim.
Complete
Layout &
DRC
No
Yes
Yes
No
(b)
Fig. 4 Circuit design procedure (a) with EM simulation (b) with component modeling and
EM simulation combined.
The accurate modeling of the passive elements would not be helpful unless the
active components had an accurate model as well. Any slight inaccuracy in the
transistor model can result in a large mismatch between the simulated and measured
results as the frequency is increased. Finally, by cascading different circuits, these
mismatches can utterly change the performance of the complete system.
Unlike the passive structures, the modeling of the active components can be
quite challenging. Some active components - like varactors - can be modeled easily by
using lumped components [25], while the transistor model includes frequency- and
temperature-dependent small and large signal parameters. In this case, the accurate
modeling of the transistors by the circuit designers is quite difficult and, hence, the
foundry-provided model has to be utilized, which in turn has to be validated by
comparing the simulated and measured results of the test transistors.
This chapter is divided into four sections. In the first section, the
EM simulation technique for both the 0.25 μm HBT and 90 nm LP CMOS
technologies is explained. In the second and third sections, the modeling of different
passive and active components for the 0.25 μm HBT and 90 nm LP CMOS
technologies is investigated. Finally, the fourth section concludes this chapter.
Modeling of Passive and Active Structures
Amin Hamidian 8
2.1 EM Simulation
Different EM simulators are commercially available (HFSS, Momentum,
CST…). These simulators use different solution techniques to solve and characterize
passive structures, with good accuracy up to 100 GHz and above.
In this work, HFSS has been utilized for the model extraction. Employing a
3D simulation, this simulator is appropriate for multilayer chip design up to 100 GHz.
All the necessary passive structures can be drawn in the Cadence and imported into
the HFSS using Tech-file mapping. All the necessary information regarding the port
definition and boundaries can be found in the HFSS manual provided by Ansys Co.
[45]. An example of the HFSS simulation setup is shown in Fig. 5, where a folded
Wilkinson combiner has been simulated completely on the SiGe HBT substrate.
Fig. 5 An example of complete HFSS simulation.
Modeling of Passive and Active Structures
Amin Hamidian 9
2.2 Passive Structures Modeling for HBT Technology
Each matching network consists of parallel and series transmission lines and
capacitors. In this section, the modeling of these passive structures is presented. All
the models are verified by comparison with measured results up to 110 GHz.
2.2.1 Capacitors
Although in this technology the provided on-chip capacitors at the V-band
show a high Q-factor, the inclusion of its parasitic elements within the design is still
necessary. In this section, a complete scalable lumped component model up to
140 GHz for this capacitor has been developed. The developed model has been
compared with measurements for validation [14].
The capacitor parasitic elements (Fig. 6) can be divided in two categories:
Parasitic elements of the capacitor core
The coupling elements to the surrounding structures
The parasitic elements of the capacitor core are the sheet resistance, the
inductance of the capacitor plates and the resistance of the insulator. The coupling
elements between the capacitor and the surrounding passive structures are difficult to
extract. This is due to the layout variations of the neighboring structures. In this work,
all these elements are extracted with the EM simulator for a square-shaped capacitor
with a fixed surrounding ground plane. The technology provides five metal layers.
The capacitor is formed between metals two and three with the help of an extra layer
(metal C). Fig. 6 shows the capacitor and all the parasitic and coupling elements.
In order to simplify the modeling and split the above mentioned parasitic
effects in the MIM capacitors, it is important to remove the ground layer below the
capacitor and choose an ideal substrate. The plates and the insulator of the capacitor
have different parasitic elements. The conductance of the insulator is negligible for
the mm-wave band. Furthermore, by selecting square capacitors the ratio of area-to-
perimeter could be minimized, which minimizes the fringe effect of the capacitor.
As mentioned before, the EM simulation has been performed to extract the
parasitic elements. For this simulation, the capacitor is fed with an EM signal from
one side while the other sides are open. For capacitor sizes of less than λ/10, the
capacitor can be modeled with a series of resistors, inductors and capacitors. This
model agrees well with the measured results up to 140 GHz for all the capacitors
smaller than 4 pF for this technology.
As the value of the MIM capacitor (CMIM) is less dependent on the fringing
effect and frequency, in the modeling process it can be set as a constant. The values of
the inductor and resistor can be formulated through curve-fitting techniques from the
S-parameter results. This is presented as follows:
(1)
(2)
Modeling of Passive and Active Structures
Amin Hamidian 10
In the above formula, C1, C2 and C3 are constant values and Z is a function of
the CMIM and frequency (f). Also, due to the square shape of the capacitors, the series
resistance of the plates does not depend on the capacitor values.
Fig. 6 Cross-section of the capacitor with main parasitic and coupling components.
The grounding of the capacitor is one of the most important parts of circuit
design within the mm-wave band. The ground plate cannot be omitted as most of the
structures need a DC or RF ground. However, any ground plane under or around the
capacitor can increase the coupling capacitances considerably and so change the
performance of the capacitor severely. Due to these problems, the ground plate must
be drawn in such a way that the coupling elements are minimized while the grounding
of the other passive parts is less affected.
In order to minimize the effect of the ground coupling on the capacitor
performance, there must be no ground plate (Metal 1 in Fig. 6) under the capacitor.
By eliminating the ground under the capacitor, the remaining coupling elements are
the fringing capacitance from the edge of the capacitor to the edge of the ground plate
(CGND) and from the coupling capacitor to the substrate (CSUB). The fringing
capacitance is a function of the distance (d) between the edges of the ground and the
capacitor. Fig. 7 shows the total coupling capacitance to ground and the substrate for
the capacitors up to 4900 fF.
As seen from the simulated results presented in Fig. 7, the fringe capacitance
is negligible when d is more than 8 μm. The total coupling capacitance (CCtot = CSUB +
CGND) can be formulated as a function of d and the capacitor size (CMIM):
(3)
(4)
In the above formula, K1 to K6 are constant values. As is evident from the
presented EM simulated results, for ground metallization far from capacitor plates
(d > 8 µm) the CGND contribution to Ctot is much less and CSUB dominates.
Modeling of Passive and Active Structures
Amin Hamidian 11
Fig. 7 Simulated total coupling capacitance (Ctot) as a function of d
The verification of the proposed model has been carried out with the help of
the basic model provided by the foundry, EM simulation and measurement for various
structures. In this part, the capacitor model can be validated in two different
conditions. In the first case, the modeled capacitor core is compared with a very basic
and an EM-simulated capacitor model to determine the discrepancy between them up
to 140 GHz. In the second verification process, the developed model has been
simulated together with other modeled passive structures, like transmission lines, via
and pads, and compared with the measured results up to 110 GHz. Fig. 8a-c shows the
schematic, the 3D view from the EM simulator and the chip micrograph of a realized
MIM test structure in the ground-signal-ground (GSG) configuration.
IN OUT
TL TL
CMIM
(a)
(b)
(c)
Fig. 8 Capacitor with TL, via and pad (a) Schematic of test structure (b) HFSS layout
(c) Chip micrograph
Modeling of Passive and Active Structures
Amin Hamidian 12
In the first simulation, the modeled capacitor is compared with an EM-
simulated model and the basic capacitor model provided by the foundry up to
140 GHz. Fig. 9 presents the S-parameter results for a 250 fF capacitor (with d =
4 μm). As seen, the modeled capacitor shows very good agreement with the
EM simulation. From Fig. 9a, it is clear that the input reflection of the capacitor
diverges from the basic model at higher frequencies and that the deviation increases
with frequency.
The modeled capacitor is also compared with the measured results up to
110 GHz. The comparison results are presented in Fig. 10 for a 500 fF capacitor
(22.25 μm x 22.25 μm). The S-parameter measurements have been performed on-
wafer with a vector network analyzer. In order to reduce the coupling between the
input, output pads and probes, the capacitor has been extended with transmission lines
by 70 μm from each side (Fig. 8a). The pads, transmission lines ([44] and
section 2.2.2) and vias are modeled accurately and included in the simulation. As seen
from these figures the model shows good agreement with the measured results and
EM simulation over the whole frequency band.
(a)
(b)
Fig. 9 The S-parameter comparison of a 250 fF (a) Input reflection(b) Transmission
* This Model
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S11 [dB]
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Basic Model
EM-Sim.
T.M.*
Basic Model
EM-Sim.
T.M.*
Modeling of Passive and Active Structures
Amin Hamidian 13
(a)
(b)
Fig. 10 The S-parameter comparison of a 500 fF: a) Input reflection b) Transmission
* This Model.
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S11 [dB]
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S21 [dB]
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Modeling of Passive and Active Structures
Amin Hamidian 14
2.2.2 Transmission Line
In this work, and with the help of a systematic methodology and by extracting
the propagation coefficient and characteristic impedance of the transmission lines, a
scalable model for integrated microstrip lines is developed [44]. The extraction has
been performed with the help of EM simulations up to 140 GHz. Finally, the extracted
model has been verified by comparison with the measured results of the various
transmission line sizes up to 110 GHz. The detail of this work is presented in [44].
Here, only the final results are presented.
Fig. 11a presents the 3D view of EM-simulated transmission line with
accurately drawn substrate and passivation layers. The extracted model has been
imported into the ADS TLINP4 model (Fig. 11b) for design and optimization
purposes.
(a)
(b)
Fig. 11 a) Example of a microstrip line in HFSS. b) The extracted scalable model in ADS.
[44]
As mentioned earlier, the model has been verified by EM simulation and
measurement. Fig. 12 shows the comparison of the model, the EM-simulated and
measured results of a transmission line up to 110 GHz. The good agreement of the
results validates the extracted model for the transmission line.
(a)
(b)
Fig. 12 Measured and simulated S-parameter results of a transmission line with W=30 um,
L=200 um. a) Magnitude. b) Phase.
Modeling of Passive and Active Structures
Amin Hamidian 15
2.3 Passive and Active Structure Modeling for CMOS
Technology
Unlike bipolar technologies, CMOS circuit performance is more sensitive to
any deviations of the components models. This is mainly due to the much lower
impedances and gain of the transistors in these technologies. Further, these problems
can get aggravated, as much higher metal densities are required in CMOS technology
in comparison with bipolar technologies for the same ft and fmax. For example, the
250 nm HBT [34] has the same ft as the 45 nm CMOS technology [33], but the much
smaller metallization in the 45 nm CMOS - in comparison with 250 nm HBT - results
in a much higher metal density requirement during the CMOS process. In order to
satisfy the density requirements of the CMOS circuits, most of the circuit must be
filled with floating metal fillers. The metal fillers can affect the RF performance of
the circuit by changing the RF characteristics of the matching networks by
introducing new parasitic elements and deteriorating the quality factor of the passive
structures by increasing the coupling losses.
The above mentioned problems make the CMOS modeling and passive
structure design more complicated than for bipolar technologies. These difficulties
mainly lie in the sensitive CMOS transistor performance and unreliable passive
structure model and quality factor. In order to solve these problems, two main tactics
have been considered during the circuit design:
Filler effect minimization on the RF path.
Model extraction form measurement and comparison with EM
simulation.
In this chapter, firstly, a model extraction technique from the measurements is
investigated. In order to be able to extract the model of the test structures directly
from the measurements, the RF feeding structure - comprising RF probing pads, pad
to the transmission line transition, and short 50 Ω transmission lines both at the input
and output - must be modeled first. In the first section, a technique for the extraction
of such feeding structures from the measurements has been introduced [10].
Further, in the second section, to improve the matching networks quality
factor and filler effect minimization, two types of transmission lines based on a
coplanar structure have been studied. Based on the introduced extraction technique,
different transmission line sizes are extracted from the measurements and compared
with the EM simulation [7].
In the third section, on-chip transformers for mm-wave applications have been
studied. A model extraction technique based on EM simulation has been investigated
and verified by the measured results. Moreover, to be able to facilitate the
transformer-based PA design, a scalable model has been developed [1].
Finally, in order to verify the transistor model for 60 GHz application,
different transistor sizes have been realized and their models have been extracted from
the measurements based on the introduced technique. The extracted model also
includes the transistor core (the passive structure connecting the transistor to the
matching networks), which makes this model appropriate for amplifier design since
the reference points of these models and the matching networks are all on the same
level (on the top-metal layer) [9].
Modeling of Passive and Active Structures
Amin Hamidian 16
2.3.1 RF Feeding Structure
This section presents the extraction techniques of the RF feeding structures for
accurate modeling of on-chip passive and active components. The presented
techniques have been applied for a group of test structures realized in a 90 nm CMOS
process and validated through measurements up to 100 GHz. Feeding structures
comprising RF probing pads, pad to the transmission line transition and short 50 Ω
transmission lines, have been modeled with the help of measurements and
EM simulations. The modeled structures have been utilized in the extraction of the
test components - like MIM capacitors, transistors, etc. - from the measurements. The
comparisons between the foundry-based models and the extracted results of the
components show good accuracy, which further validates the applied techniques up to
100 GHz operating frequencies.
2.3.1.1 Topology
Feeding structures (i.e., pads plus interconnections) are necessary for the
measurement of the on-chip circuits. In this technology, in order to facilitate the
model extraction of the passive and active components from the measurements, a
fixed feeding structure has been selected for the measurement of all passive and active
test structures.
Fig. 13 presents the selected structure showing the probing pads in a GSG
configuration. The GSG configuration is designed with 100 μm pitch and an 82 μm by
47 μm pad size to minimize the chip size of the feeding structure. The input and
output ports of the test structures are placed at a distance of more than 200 μm from
each other in order to minimize the high frequency coupling effects between them.
Also, all the passive components are connected to the pads through a 50 Ω
transmission line. Finally, the pad and the transmission line are connected with a
tapered transition structure to minimize the parasitic junction capacitances.
Fig. 13 Feeding structure utilized for the entire device under tests.
Modeling of Passive and Active Structures
Amin Hamidian 17
2.3.1.2 Extraction Techniques and Results
In order to extract the pad structure, a test circuit has been designed and
measured (Fig. 14a). In this test circuit, the two feeding structures are simply
connected with a transmission line. The ABCD matrix of the total test structure can be
described as follows:
(5)
In this formula, [A] and [B] are the ABCD matrixes of the feeding structure
and the transmission line, [T] is the ABCD matrix of the total test structure and “*”
denotes the matrix multiplication. It should be noted that in the above formula the
output feeding structure is in the opposite direction to the input feeding structure and,
hence, its matrix is inserted as [A]-1. However, in the extraction code, since the
feeding structure is passive and both the input and output-matching are almost 50 Ω,
the matrixes [A] and [A]-1 can be, with a good estimation considered to be the same.
The model of the transmission line is extracted with HFSS simulation
(Fig. 14b). In addition, the ABCD matrix of the total structure is calculated from the
measured S-parameters. In this case, the only unknown in the above formula is matrix
[A]. In order to extract matrix [A] from the above formula, the following equation
must be solved:
(6)
(a)
(b)
Fig. 14 a) Test structure utilized for the extraction of the model of the feeding
structure. b) The EM simulated transmission line for matrix [B] calculation.
The above equation is solved with the help of MATLAB programming. In this
solution, [A]-1 is considered as an error function with an initial value equal to the unit
matrix. An error matrix [E] is calculated each time and is used to calculate the new
[A] matrix. This calculation continues until the error magnitude drops below 1%. The
total algorithm for the MATLAB coding is presented in Fig. 15. This algorithm is
only for a single frequency point and must be repeated for the whole frequency range.
Modeling of Passive and Active Structures
Amin Hamidian 18
Initial Value
A=[1]
[Ai]=[B]-1x[Ai-1]x[T]
[E]=[Ai]-[Ai-1] END
E<0.01
NO
Yes
[Ai]=[Ai-1]+0.5x[E]
Fig. 15 Algorithm for the extraction of the feeding structure based on Matlab coding.
The extracted S-parameter model of the feeding structure is calculated from
matrix A and presented in Fig. 16. As expected, the input and output reflection
coefficients are lower than -20 dB (Fig. 16a). This is due to the 50 Ω transmission line
and the utilized tapered connection between the transmission line and the pad.
Fig. 16b presents the insertion loss (as the reflection coefficients are negligible
the S21 can be considered as the insertion loss) of the feeding structure. The extracted
model exhibits a 0.5 dB to 0.7 dB insertion loss at the V-band.
(a)
(b)
Fig. 16 The S-parameter of the extracted feeding structure:
a) Input and output return loss. b) Transmission
In order to validate the modeled feeding structure, two test circuits have been
realized. Fig. 17a presents the realized open and short circuits. In Fig. 17b, the
S-parameter (S11) measured results and simulations are compared. The comparisons
show the accurate model of the feeding structure up to 100 GHz. The simulated and
measured S11 results slightly diverge from each other at frequencies above 70 GHz.
This is mainly, as expected due to the switching in the measurement set-up from
coaxial to waveguide operations at around 65 GHz.
Modeling of Passive and Active Structures
Amin Hamidian 19
(a)
(b)
Fig. 17 a) Left: Chip-micrograph of the open. Right: Chip-micrograph of the short.
b) S-parameter comparison between simulation and measurement.
2.3.1.3 Extraction Example
To design mm-wave circuits in this technology, different passive and active
components (including different transmission lines, inductors, and varactors) have
been realized and measured, and their models have been extracted with the help of the
model of the feeding structure. In this part, a capacitor (Fig. 18a) is studied by
comparing its measured and simulated results. The simulations are performed with the
help of foundry-based models and the feeding structure.
Capacitors of different sizes have been realized and measured. The foundry
provides an optional shielding structure for the capacitors. Due to the very low
substrate resistance and the high sensitivity of the circuit performance to the parasitic
elements at mm-waves, the shielding structure has been utilized to minimize the effect
of the substrate on the performance of the capacitors. Fig. 18b compares the
S-parameter measurement and simulation of a 470 fF capacitor with the feeding
structure. A good agreement (especially in S21) has been achieved up to 90 GHz. The
discrepancies between the simulation and measured results increase as the frequency
goes beyond 90 GHz. Part of these discrepancies might also be due to the junction
capacitances between the capacitor and the transmission line which can be reduced by
using wider transmission lines, a tapered connection between capacitor and
transmission lines, or else smaller capacitor sizes.
Modeling of Passive and Active Structures
Amin Hamidian 20
(a)
(b)
Fig. 18 a) Chip-micrograph of a 470 fF capacitor. b) The S-parameter comparison between
simulation and measurement.
2.3.2 Transmission Lines
This work investigates the design of two different coplanar transmission lines
(TL) and their application at millimeter wave frequencies up to 100 GHz. The
coplanar structure has been selected to improve the grounding and to remove the
effect of the fillers on the transmission lines. The two transmission lines differ by
their bottom metal layer patterns. In the first transmission line, the bottom metal is
solid ground while in the second transmission line the bottom metal layer is simply
used as a shield. The transmission lines are optimized for different parameters, such
as insertion loss, inductance per unit length and size. In addition, to justify the
simulated electromagnetic models of the transmission lines, different transmission
lines have been realized and measured. The characteristics of the transmission lines
are extracted from the measured results. The comparison of the model’s simulated
results and the measured results shows good agreement up to 100 GHz. Finally, two
60 GHz amplifiers in the 90 nm CMOS technology were designed based on these
transmission lines so as to further verify their functionality for 60 GHz circuit design.
2.3.2.1 Designed Transmission Lines
Two coplanar TLs with different bottom ground patterns are designed. The 3D
views of the designed TLs are presented in Fig. 19. In the first design (Grounded
Coplanar Transmission Line - GCTL), the bottom metal layer is selected to be as wide
as possible (Fig. 19a-b). The ground width (W1) is limited by the manufacturing
density rules. A wide bottom grounded metal minimizes the coupling to the substrate
and also requires less TL width (W) for 50 Ω and lower impedances. Although this
kind of transmission line is quite compact, it suffers from both eddy current loss and a
low self-resonant frequency due to higher capacitance to ground, and it also faces
many difficulties in the design of higher ohmic TLs (> 50 Ω). To compensate such
losses and the low self-resonant frequency, and to increase the TL impedance, a
shielded structure has been used in the second TL (Shielded Coplanar Transmission
Modeling of Passive and Active Structures
Amin Hamidian 21
Line - SCTL) instead of the ground plane (Fig. 19c-d). This kind of structure results
in higher impedance and lower eddy current losses, but to have the desired impedance
a much wider TL is required. Fig. 20 and Fig. 21 present the simulated results of both
TLs versus the width and the spacing values. The spacing value in the GCTL is
selected to be smaller than the SCTL. In the GCTL, this would help in gaining 50 Ω
impedance for smaller TL widths. However, in the SCTL having a higher spacing
would help in increasing the inductance value per unit length for the transmission line.
As result, the spacing values are selected at around 7.5 µm for the GCTL and 9 µm
for the SCTL. In the SCTL, increasing the spacing value would increase the
impedance and, consequently, the inductance value, but it is limited by the density
requirement of the foundry.
(a)
(b)
(c)
(d)
(e)
Fig. 19 a) GCTL. b) GCTL bottom view. c) SCTL. d) SCTL bottom view.
e) Both TLs front view.
Modeling of Passive and Active Structures
Amin Hamidian 22
Fig. 20 Impedance and insertion loss of the
GCTL for various widths and spacing.
Fig. 21 Impedance and insertion loss of the
SCTL for various widths and spacing.
In order to verify the introduced TLs, two different GCTLs (lengths equal to
100 µm and 600 µm) and one SCTL (length equals to 100 µm) have been
manufactured and measured. The measurements are performed completely on the chip
with GSG probes and a network analyzer from 100 MHz up to 100 GHz. The general
shape of the test structure is presented in Fig. 22. As mentioned in the RF feeding
structure section (Section 2.3.1), in order to extract the TLs performance all the pad
structures are modeled. By using the following equation, the ABCD matrix of the TL
can be extracted from the total test structure:
(7)
Fig. 22 Test structure view including the transmission line and the pas structures.
Fig. 23 presents the comparison between the S-parameter measured results and
the simulated results of the 100 µm GCTL. The pad structure has been subtracted
from the measurements, as explained above. Due to the good calibration during the
measurements and the accurate EM simulation of the transmission line, a good
agreement between simulated and measured results has been achieved. The measured
results show around a 0.8 dB/mm insertion loss.
Modeling of Passive and Active Structures
Amin Hamidian 23
Fig. 23 Comparison between the simulated and measured results of 100 µm GCTL with
5 µm width and 7.5 µm spacing.
Fig. 24 and Fig. 25 present the comparison between the simulated and
measured characteristics of both transmission lines. In the GCTL, the simulated
results of both the impedance and inductance of the 100 µm GCTL are compared with
the measured results. The comparison shows good agreement up to 60 GHz. The
simulation and measured results diverge slightly from each other at frequencies above
60 GHz. This might be mainly due to the calibration as well as to the slight
differences in the substrate characteristics at higher frequencies between simulation
and measurement.
In the SCTL, only the inductance value could be compared with the
simulation. Due to certain calibration problems at frequencies above 65 GHz, the
impedance value cannot be extracted accurately.
Fig. 24 Comparison between the simulated and
measured results of 100 µm GCTL with 5 µm
width and 7.5 µm spacing.
Fig. 25 Comparison between the
simulated and measured results of 100 µm
SCTL with 8 µm width and 9.5 µm
spacing.
Modeling of Passive and Active Structures
Amin Hamidian 24
2.3.2.2 Test Circuits Implementation
In order to justify the transmission line model and its functionality in circuit
design, two different amplifiers have been realized and measured (Fig. 26 and Fig.
27). The matching network of the first amplifier has been designed with the help of
the GCTL while the second amplifier utilizes the SCTL.
(a)
(b)
Fig. 26 The test amplifier designed with the help of GCTL. a) Schematic. b) Chip
micrograph.
(c)
(d)
Fig. 27 The test amplifier designed with the help of SCTL. a) Schematic. b) Chip
micrograph.
The first amplifier has been designed with a cascode topology. The one-stage
cascode topology provides good output-to-input isolation and, therefore, good
stability. Although the cascode topology in the CMOS technology shows less output
power than common source (C.S.) topology [8], it is widely used in the low noise
amplifier design [75]. As a high inductance value is needed for the input-matching, an
inductor has been used instead of a long transmission line in order to minimize the
chip size.
Unlike the first amplifier, in the second amplifier a C.S. topology has been
utilized. The C.S. topology provides a much better output power in comparison with
the cascode [8], making this topology more interesting for power amplifier design;
however, its lower isolation between output and input ports, in comparison with the
cascode topology, can cause instability.
The measurements have been performed under 1 V gate voltages and 1.2 V
drain voltages for both amplifiers. Fig. 28 and Fig. 29 show the good agreement
between the simulated and measured results for both amplifiers up to 100 GHz. The
first amplifier shows around 5 dB gain while the second amplifier shows more than
Modeling of Passive and Active Structures
Amin Hamidian 25
10 dB gain around 60 GHz. On the other hand, and as expected, the one-stage cascode
amplifier provides better isolation (S12) than the two-stage C.S.
Fig. 28 Comparison between the simulated
and measured results of the Cascode amplifier.
Fig. 29 Comparison between the simulated
and measured results of the common source
amplifier.
2.3.3 Transformer Design
In recent years, developments in transformer-based CMOS PA design have
demonstrated the capability of chip size minimizations without noticeable POUT
degradation [77]. To ease the use of transformers in mm-wave circuit design, scalable
models for transformers have been developed by different circuit designers [76]-[77].
The model presented in [76], although for complex transformer structures, shows less
accuracy for higher frequencies. To increase the accuracy up to the mm-wave, a
transmission line-based model is proposed in [77]. Although this model shows a good
tendency with the measurement results, due to higher filler density requirements in
these technologies, determining even and odd impedances and the propagation
constant is quite challenging.
In this work, different types of transformers have been investigated.
Depending upon the balanced or unbalanced state, number of turns and shielding
position, different transformers for different purposes (mainly including the up-
converter and the 60 GHz PA design) have been characterized. In the first step,
different transformers have been realized and, by extracting from the measured
results, their performances have been compared with the EM-simulated results.
Although EM simulation shows excellent agreement with the measured results, this
technique can be time consuming in relation to the design process (Fig. 4). Every time
that the width or the length of the transformer has to be changed, the new transformer
must be simulated again with an EM simulator. This process can become even more
complicated, as the complex nature of the transformer does not allow the designer to
guess either the correct initial value or the required size change.
Further, in order to ease the design procedure by decreasing the number of
iterations of the EM simulation, a scalable model for the transformer has been
developed. The developed model is based on a lumped component and includes all the
parasitic and coupling elements, which make it appropriate for mm-wave application.
Moreover, to be able to use this model in optimization techniques, a mathematical
formula for the equivalent model of the transformer has been developed.
Modeling of Passive and Active Structures
Amin Hamidian 26
The 3D structure of the transformer is presented in Fig. 30a. The shielding
structure has been selected in parallel with the transformer terminals to minimize
signal coupling to the shielding ground plane. In almost all the designs, the
transformers are realized on the two thick uppermost metal layers (and on the three
uppermost metals for more winding turns) to minimize the conductor losses and to
maintain the maximum distance from the low ohmic substrate. On the other hand, the
shielding structure has been realized in different layers. Placing the shielding structure
on the lowermost layer would result in minimum parasitic capacitance to ground at
the expense of the filler effects of all the other layers on the transformer performance.
By decreasing H (Fig. 30b), the filler from lower metal layers would be shielded but
the parasitic capacitance would increase.
In this section, first the EM-simulated and measured results of different
transformers are compared to validate the EM modeling technique. Further, to ease
the design of transformer-based mm-wave circuits, a lumped component-based
scalable model for this transformer is introduced. The modeling has been performed
for the shielding on the lowermost metal layer. By using the developed model, a
mathematical formula based on the transformer width and the length of the winding
and input impedance has been derived. Finally, the simulated results of the derived
model are compared with the measured results for validation.
(a)
(b)
Fig. 30 Investigated transformers. a) 3D view. b) Side view.
Modeling of Passive and Active Structures
Amin Hamidian 27
2.3.3.1 Transformer Modeling with EM Simulation
For a successful development of the transformer scalable model, the measured
results of different transformer sizes are required. The realization of different
transformer sizes is not a particularly cost-effective procedure. To decrease the
number of required transformer samples, the EM simulation has been utilized. By
inserting the exact details of the technology substrate and boundary requirements, the
extraction of the exact transformer model with the help of EM simulation has been
attempted. Further, to justify the accuracy of the model different transformers have
been realized and their extracted measured results have been compared with those of
the simulation.
Fig. 31a shows the general schematic of the realized transformers. Due to
measurement difficulties associated with differential structures, all the realized
transformers have been connected as single-to-single baluns. The chip micrograph of
a realized transformer with the pad structures is presented in Fig. 31b. The results of
the realized transformers have been extracted from the measurements based on the
technique introduced in previous section (Section 2.3.1) and in [10].
(a)
(b)
Fig. 31 Realized transformer. a) Schematic. b) Chip micrograph.
To justify the accuracy of the EM simulation for different transformer
architectures, three different transformers have been realized (Fig. 32). The
transformers differ in the number of turns, winding and the shielding layers.
The first transformer is designed on M9 and M7 with the shielding on M6.
The total length of the transformer is around 400 µm with a 4 µm metal width. To
minimize the total length of the transformer, a multi-turn structure has been selected.
This transformer has been designed for the LO-path in a test up-converter mixer to
convert the single input into two balanced signals. As in this test up-converter, the LO
power has been fed externally so that the losses of the transformer could be neglected,
which allows us to have the transformer winding metals further apart from each other
on M7 and M9. Unlike the losses, the signal balance is quite important for the up-
converter’s performance. In this case, by placing a symmetrical shielding structure
directly below the transformer, the filler effect on the RF path has been minimized
and, hence, any effect on the LO signal balance has been avoided.
In the second transformer, the winding metals are located on the M8 and M9
layers with a one turn architecture. In this design, and like the first design, the
shielding is located as near as possible to the transformer lower winding metal (M7)
to avoid any filler effects on the RF signal. This transformer has a total length of
300 µm and a width of 8 µm for both winding metals
The third studied transformer has also been designed on M8 and M9 with one
turn winding and a length of 200 µm and a width of 4 µm. Unlike the two other
Modeling of Passive and Active Structures
Amin Hamidian 28
transformers, in this design the shielding is located on the lowermost metal layer
(M1), to minimize the common mode capacitance to ground. Minimizing the common
mode capacitance results in the higher self-resonant frequency of the transformer,
which makes this type of metal shielding quite desirable for the PA design.
(a)
(b)
(c)
Fig. 32 3D view of the realized transformers. a) Two turns on M9 and M7 with shielding on
M6. b) One turn on M9 and M8 with shielding on M7. c) One turn on M9 and M8 with
shielding on M1.
The measured versus EM-simulated results of the realized transformers up to
67 GHz are presented in Fig. 33. The good agreement between the EM-simulated and
measured results (especially in the first and third transformers) validates the
EM simulation modeling technique and setup. Moreover, this accuracy validates the
extraction technique introduced in the previous section (Section 2.3.1) and in [10].
The deviation of the measured and simulated results at higher frequencies in
the second transformer is due to the low self-resonant frequency of this transformer.
This is mainly due to the minimum distance between the lower transformer winding
and the shielding structure, and the long and wide size of windings, which resulted in
higher common mode capacitance to ground.
Modeling of Passive and Active Structures
Amin Hamidian 30
2.3.3.2 Scalable Transformer Model
As the transformer modeling is targeted for the PA design, the third
transformer (Fig. 32c) type introduced in the previous section has been selected. As
explained earlier, due to the maximum distance between the winding and the
shielding layers, common mode capacitance is minimized and, hence, this transformer
has the highest self-resonant frequency in comparison with the other types.
To facilitate modeling, the transformer is divided into three parts
(Fig. 34a), which include two coupled lines (coupled lines A and B) and the inductive
(high impedance) lines (LS) to the terminals. By separately modeling each part, the
complete transformer model can be developed (Fig. 34b).
As the couple lines A and B are completely symmetrical, the same model can
be utilized for both of them. In this model, the parasitic junction capacitances have
been neglected and the model has been developed for straight coupled lines
(Fig. 35a). The detailed model of this structure is presented in Fig. 36, where Co and
Ce are odd and even mode capacitances, Rs is the metallic resistance of the windings
and Lp and Lleak are the winding and leakage inductances. Furthermore, as the
substrate is shielded its parasitic elements are neglected.
(a)
(b)
Fig. 34 Trans_M1. a) Cross section. b) Model.
Modeling of Passive and Active Structures
Amin Hamidian 31
Based on the dimensional parameter introduced in Fig. 35a (d, t, w and l) and
the frequency (freq), all the model parameters and components, including coupling
factor (K), inductance per µm (Lpum), LP, Lleak, Co, Ce and RS, have been
parameterized. The detailed model of the coupled line is presented in Fig. 36.
Except for K and Lpum, the other parameters can be directly calculated from
the physical dimensions of the transformer. To extract the constant and coefficient
values, various optimization algorithms (e.g., genetic and radiant) have been utilized:
(8)
Fig. 36 Coupled lines model.
(a)
(b)
Fig. 35 Coupled lines. a) Cross section. b) 3D view.
(9)
Modeling of Passive and Active Structures
Amin Hamidian 32
In the above equations, l and w are in millimeters. In the EM simulation, it has
been observed that K is a strong function of the spacing between the two windings
(d). By increasing d, K drops rapidly, which makes the power coupling less efficient
and, hence, less desirable for the PA design. K in (8) has been calculated for the two
upper thick metal layers of the technology (M8 and UTM).
With the help of K, Lpum and the physical dimensions of the transformer, Lp,
Lleak and Co can be calculated:
(10)
(11)
(12)
In (11), Co is calculated as a lumped component while the dimensions of the
transformer is in the same order of magnitude as λ/10. In order to minimize this effect
on the accuracy of the transformer model, Co is distributed between the input and
output ports (Fig. 36).
Rs and Ce relations with the physical structure of the transformer are quite
complex. In the same way as K and Lpum calculation, optimization techniques have
been utilized to extract the constants and coefficient values:
(13)
(14)
In (13), frequency (freq) is in GHz. The value of LS depends upon the length
of the connecting line at the terminal of the transformer. In this design, all the
connecting lines are around 20 µm, which results in:
By simplifying the total transformer model, a mathematical formula can be
derived, where Zi and Zo are the terminal impedances of the transformer:
Modeling of Passive and Active Structures
Amin Hamidian 33
(15)
This model has been verified using HFSS simulation for various transformer
sizes. Further, the model has been verified for the third transformer introduced in Fig.
32c up to 67 GHz. The comparison of the results (Fig. 37) shows the accuracy of the
model.
(a)
(b)
Fig. 37 Comparison between model, EM simulated and measured results of the transformer
2.3.3.3 Center Tap
In the active circuit design, the center tap of the transformers plays an
important role in the DC feeding. In an ideal balanced transformer, the center taps of
the primary and secondary windings are located exactly in the middle. However, in
the unbalanced transformer design, the center tap can affect the transformer
performance. In the case of one unbalanced terminal, the center tap of the balanced
side would be shifted away from the middle of the winding (Fig. 38).
By shifting the center tap to the new point, the middle point of the transformer
winding is no longer an RF ground. Because of this problem, the parasitic elements of
the DC feeding network at the center tap point must be considered in the simulations.
To include this structure in the simulation, the DC feeding network has been modeled.
Fig. 39 shows a transformer designed in 90 nm CMOS technology with
feeding structures at the center tap points. Since, regardless of the transformer sizes,
the size and structure of the DC feeds are always the same, LCT and CCT (in Fig. 40)
are selected as constant values. By performing a tuning simulation in ADS, LCT and
CCT can be extracted from the HFSS-simulated transformer with center tap
connections:
Modeling of Passive and Active Structures
Amin Hamidian 34
(a)
(b)
Fig. 38 a) Balanced structure. b) Unbalanced structure with unsymmetrical center tap.
Fig. 39 3D view of the transformer with DC feeding connections at the center tap points of
both primary and secondary windings.
Fig. 40 The complete model of the transformer with center tap.
INPOUTP
OUTN
LS
LS
LS
LS
INN
Coupled
Lines A
Coupled
Lines B
DC
Secondary DC
Primary
Center
Tap
LCT CCT LCT
CCT
Modeling of Passive and Active Structures
Amin Hamidian 35
2.3.4 Transistors
In this section the small signal characterization of nMOS transistors in 90 nm
CMOS technology is presented. Two different transistor widths, based on the
measured results up to 110 GHz are characterized. The widths of the transistors are
optimized for two different cases of low noise and power applications at 60 GHz. For
the characterization purpose, the on-chip feeding structures (pads, transmission lines
and vias) are extracted from the measured results based on the discussion in RF
feeding structure section (Section 2.3.1).
2.3.4.1 Realization and Extraction Techniques
Fig. 41 shows the schematic and the layout of the realized transistor test
structures. The transistors are in common-source configuration, with grounded bulk
and source terminals. The layout shown in Fig. 42 also includes the details of all the
on-chip feeding structures. This includes the RF pad structures in the GSG
configuration and the optimized low loss 50 Ω transmission lines (GCTL –
Section 2.3.2) up to the device input/output plane (Fig. 42 plane B). A very careful
layout design and EM modeling have been carried out to facilitate the accurate device
characterization. In order to decrease the coupling between the input and output probe
tips, the distance between the two pads is fixed to 200 µm.
The realized devices have been characterized on-wafer. The measurement set-
up includes a 110 GHz network analyzer, 110 GHz W-Band probes and external bias
tees for gate and drain biasing.
As explained in the pad RF feeding structure section (Section 2.3.1), to
accurately extract the transistor’s small signal performance, the pad, transmission line
and parasitic effects of the transistor core layout have been modeled and de-embedded
accurately. Through this technique, we were able to move our reference plane of
measurements (Fig. 42 plane A) to the input and output of the transistor (Fig. 42 plane
B). Finally, EM models of the transistor layout interconnects (transistor core) were
utilized to characterize the transistor with the electromagnetic effects of the layout.
Fig. 43 and Fig. 44 compare the simulated and measured S-parameter results
on plane A of the 25 µm and 80 µm transistors under the same biasing condition
(Vg=0.8 V, Vdd = 1.2V). As is shown in these figures, good agreement between the
IN
OUT
Pad+TL
Pad+TL
A
A
B
B
Fig. 41 Schematic of the transistor test
structure.
Fig. 42 Layout of the transistor test structure.
Modeling of Passive and Active Structures
Amin Hamidian 36
measured and simulated results - particularly up to 60 GHz - has been achieved. This
confirms the various critical aspects, including the pad model de-embedding method
from the measurement, the EM modeling of the transmission lines, the utilized RF
transistor models, and the measurement techniques.
(a)
(a)
(b)
(b)
Fig. 43 The S-parameter comparison of a
25 µm CMOS (Vdd=1.2 V and Vg=0.8)
before de-embedding (at plane A): a) Input
and output reflections. b) Transmission.
Fig. 44 The S-parameter comparison of a
80 µm CMOS (Vdd=1.2 V and Vg=0.8)
before de-embedding (at plane A): a) Input
and output reflections. b) Transmission.
Further, through the methods mentioned above, we extracted the fundamental
and critical parameters of the transistors alone, such as the maximum stable gain
(MSG), the transit frequency (ft) and the maximum oscillation frequency (fmax). The
extracted results are presented in Fig. 45 and Fig. 46. The MSG for both transistor
sizes and for different bias points is shown in Fig. 45a and Fig. 46a.
The extracted current gain (H21) results are presented in Fig. 45b and Fig. 46b.
From these results, it should be noted that the 80 µm transistor optimized for power
amplifier applications has ft and fmax values above 120 GHz for all the bias points. A
high ft and fmax are needed in the higher biasing levels in the power amplifier design.
Modeling of Passive and Active Structures
Amin Hamidian 37
(a)
(a)
(b)
(b)
Fig. 45 The S-parameter comparison of a
25 µm CMOS (Vdd=1.2 V and Vg=0.8)
before de-embedding (at plane A) (a) Input
and output reflections (b) Transmission
Fig. 46 The S-parameter comparison of a
80 µm CMOS (Vdd=1.2 V and Vg=0.8)
before de-embedding (at plane A) (a) Input
and output reflections (b) Transmission
2.4 Conclusion
Throughout this chapter, different passive structure models for HBT and
CMOS technologies are introduced. The introduced procedures are based on
EM simulation modeling and model extraction from measurement. A 3D
EM simulation setup based on ANSYS HFSS software was introduced in the first
section.
In the second, the modeling of two types of commonly-used passive structures
for the HBT PA design (capacitors and transmission lines) was investigated. Based on
these investigations, scalable models for both the transmission line and the capacitor
were developed. The model was further compared with the EM-simulated and
measured results. The good agreement between the simulated and measured results up
to 100 GHz has validated the models and EM simulations.
In the third section, firstly, a technique for the extraction of on-chip RF
feeding structures up to 100 GHz was presented. The extracted feeding structure can
be utilized to extract the accurate model of the passive and active components from
the measurements. To justify the accuracy of the technique, two different passive
components (a feeding structure with open and short terminations) were realized and
Modeling of Passive and Active Structures
Amin Hamidian 38
measured. The comparisons showed a very good trend between the S-parameter
measurements and the simulations up to 100 GHz. Furthermore, the feeding structure
model was utilized to validate the foundry-based models of capacitors for mm-wave
applications. Various capacitor sizes were realized and characterized. The
comparisons between the measurements and simulations showed the accuracy
between the models while the extracted results confirmed the applied techniques up to
100 GHz.
Further, the performances of two different TLs for mm-wave circuit design
were investigated. The main difference lies in the bottom metal layer. In the GCTL,
the bottom metal layer is used as a ground plane while in the SCTL it is used as a
shield. Moreover, the SCTL is wider than the GCTL, but it has less insertion loss and
provides a bigger inductance per unit length. The TLs were realized and measured.
The EM-simulated and measured results show good agreement up to 100 GHz. With
the help of these two TLs, two different amplifiers were designed on 90 nm CMOS
technology for 60 GHz band. The matching network of the cascode amplifier was
realized using the GCTL while the C.S. amplifier utilizes the SCTL. The one-stage
cascode amplifier showed a power gain higher than 5 dB at 60 GHz, while the power
gain of the two-stage C.S. amplifier reached 13 dB at around 62 GHz. The simulated
and measured results showed good agreement up to 100 GHz, which indicates the
functionality of these TL types for the mm-wave band circuit design.
In the third step, and to satisfy the need for a transformer model in up-
converter and PA designs, a scalable transformer model based on lumped elements
was developed. By comparing the simulated results of the model and the
EM simulation with the extracted results from the measurements, good agreement
with relatively high precision was shown and, hence, validated the transformer model
and the modeling technique.
Finally, the design, realization, de-embedding and characterization of the
nMOS transistors up to 110 GHz were studied. Transistors with different sizes
optimized for low noise and high power applications were realized and tested under
different biasing conditions. The measurements were compared with the simulations
including all the passive feeding structures. Very good agreement was shown between
the measured and simulated results up to 110 GHz. Moreover, by using the extracted
and modeled passive structures, the critical high frequency parameters of the
transistors were extracted for various biasing conditions.
Based on the investigations done on this section, all the passive and active
components have been modeled with high accuracy. Furthermore, all the components
have been optimized for maximum performance, which makes these components
appropriate for mm-wave circuit design.
3 HBT PAs
In this chapter, the design, realization and measurement of different PAs on
the 0.25 μm SiGe HBT technology are studied. For this purpose, and in order to select
the optimum transistor size, biasing circuits and voltages, topology and, finally, the
matching networks, many PA design considerations are investigated. In the first
section of this chapter, these design considerations are introduced. In the second
section, the designed and realized PAs are demonstrated, with a comparison of their
simulated and measured results. Finally, the third section concludes the chapter.
3.1 HBT PA Design and Considerations
As shown in Fig. 47, any PA is made up of three main blocks of a PA core,
matching networks and biasing networks. In order to achieve the maximum
performance of the PA, each block must be designed and optimized separately. In this
case, the impact of each part on the PA performance must be considered. These
considerations can be categorized as follows [11]-[12]:
Optimization of the PA transistor core
Optimization of the biasing networks
Optimization of the collector DC current
Increasing the breakdown voltage [53]
Topology selection
Broadband design
Fig. 47 PA with an array of transistors
Matching
Network
PA Core
Transistor
Cell
OUT
Matching
Network
IN
Biasing
Network
Matching
Network
PA Core
Transistor
Cell
OUT
Matching
Network
IN
Biasing
Network
SiGe HBT Power Amplifiers
Amin Hamidian 40
In this section, all the above-mentioned considerations are investigated in
detail. The relations between the PA performance and the transistor sizes and the
number of parallel transistors are shown. The effects of the power-dependent biasing
circuits, the transistors’ base impedance and the transistors’ DC current density on the
large and small signal performance of the PA are studied. The optimum topology for
the maximum output power, gain and stability has been selected. Finally, some
techniques for broadband PA design are introduced.
3.1.1 PA Transistor Core
All the transistors contributing to the output power of a PA and the
interconnections between them are considered as the PA core (Fig. 48a). The
schematic of the transistors in the PA core is presented in Fig. 48b. By carefully
distributing the transistor cells and designing the corresponding interconnections, the
size of the PA core and, hence, the output power can be maximized [30]. One of the
main considerations for the PA core design is the input-to-output electrical length of
each transistor (L1 to L4 in Fig. 48b). Any difference between these lengths results in
an out-of-phase current-combining at the output of the PA core and, thus, output
power degradation. In this case:
𝐿1= 𝐿2= 𝐿3= 𝐿4
Even by ensuring a careful design of the PA core, the output power of the PA
cannot be increased linearly for the larger transistor sizes and is limited by the
operating frequency and the parasitic elements of the passive structure of the PA core.
Fig. 48a shows a PA core simulated in HFSS. In this core, the common emitter (C.E.)
transistors are placed in a row. As the PA core size increases, the electrical length
between two transistors at two opposite corners of the core becomes more significant.
This increases the difference between the impedances seen by these two transistor
cells. This means that many transistor cells will be terminated with impedances
different from the required optimum impedance. Consequently, these cells will make
a poor contribution to the output power of the PA.
(a)
(b)
Fig. 48 a) 3D layout view of PA core. b) Schematic of the PA core. L1 to L4 are equal to
electrical length of the signal path through each transistor from input to output.
The effect of increasing the number of transistor fingers has been investigated
at 60 GHz for various transistor sizes. The simulated results of a C.E. transistor with
an ideal core show a constant gain and increasing OP1dB as the transistor size
Input
Matching
Circuit
1
2
N
Output
Matching
Circuit
DC Feed
NxL
IN
OUT
L1L2L3L4
SiGe HBT Power Amplifiers
Amin Hamidian 41
increases (Fig. 49a). By including the EM-simulated results of the interconnections
(PA core) it can be seen that, by increasing the number of fingers (NoF), the gain
decreases constantly (Fig. 49b). However, even a further decrease in gain does not
help increasing the output power performance after a 100 μm core length and, hence,
OP1dB remains almost constant for any core size above 100 μm (Fig. 49a). The N*L in
Fig. 49 plots are explained in Fig. 48a, which is the number (N) of the parallel
transistors multiplied by the length (L) of each transistor cell (the outer dimension of
each transistor including the trench).
(a)
(b)
Fig. 49 PA characteristics vs. transistors core size at 60 GHz. a) OP1dB b) Transducer gain.
Furthermore, complicated output-matching networks - due to the high losses
of the passive components in the mm-wave band - can usually provide poor quality
factors and as such must be avoided. One way to simplify these matching networks is
to select the correct transistor size. A larger PA core has lower load reactance, which
can make the design of the output-matching network more complicated and result in a
lower quality factor of the matching network (Fig. 50). In addition, the larger
transistor sizes have more parasitic elements, which can affect the accuracy of the
small and large signal models of the transistors. On the other hand, the smaller
transistor sizes can provide lower output power. In this case, based on Fig. 50 and Fig.
49, a N*L equal to 80 μm (four parallel transistors with 6 NoF) is quite appropriate
for high power and simple matching network PA design.
Fig. 50 Optimum load impedance for maximum OP1dB.
N*L = 20 µm
N*L = 100 µm
N*L = 200 µm
Complicated
Matching
Easy
Matching
N*L = 20 µm
N*L = 100 µm
N*L = 200 µm
Complicated
Matching
Easy
Matching
SiGe HBT Power Amplifiers
Amin Hamidian 42
3.1.2 Pre-Amplifier Transistor Core
In PA design, utilizing an appropriate pre-amplifier is necessary to improve
the gain, PAE and bandwidth (Section 3.1.6) of the PA. However, any pre-amplifier
increases the total power consumption. A large pre-amplifier transistor size with high
power consumption can deteriorate the total PAE of the PA. Moreover, by selecting
very small transistor sizes for the pre-amplifier, the OP1dB of the PA can be affected
by the linearity of the pre-amplifier. Due to these problems, the size of the pre-
amplifier core must be selected appropriately. A formula can be derived for the
minimum pre-amplifier transistor size:
(16)
In the above formula, NoFPA is the number of the finger of the power stage
transistor and GainPA,dB is the gain of the power stage in dB. In addition, in this
formula it is assumed that both the PA and pre-amplifier transistors have the same
base- and collector-biasing voltages.
As the pre-amplifier is usually biased at lower collector current density levels
than the PA, the rule of thumb requires a core size at least 3 to 4 times larger than the
minimum value. As an example, for the PA with 11 dB gain and 20 fingers, the
minimum size of the pre-amplifier core must be larger than 2 fingers, and by applying
the rule of thumb this size must be around 6 to 8 fingers so as to avoid any linearity
distortion of the PA.
3.1.3 Biasing Networks
The C.E. transistors in the cascode topology are biased with the help of a
current source (Fig. 51a) while the C.B. (Common Base) transistors are biased with a
potential divider and RF ground at their base (Fig. 51b). The main advantage of the
current source is its sensitivity to the input power, which helps to increase the linearity
of the PA [55].
Fig. 52a compares the base voltage (VBB) of the C.E. transistor in Fig. 51a and
its collector current for different base-biasing networks (the introduced current source
and resistive potential divider). VBB falls much faster in the case of a resistive biasing
network than the current source at higher input powers (Fig. 52a). This results in a
much smaller collector current increase (Fig. 52a) in the resistive-biasing network
and, consequently, lower output power.
Fig. 52b presents the change in the PA load line on the IV curve. With the
lower input powers, the load line is at the lower DC current, which thus results in a
lower DC consumption. As the input power increases, the load line moves towards the
higher DC currents, which would subsequently increase the load line amplitude and
the output power.
Finally, as explained in [53] in the HBT technology, the breakdown voltage of
the transistors are a function of their base impedances. The lower base impedance can
result in a larger breakdown voltage (Fig. 53) and, hence, improve the output power.
It can be observed from Fig. 53 that at the DC level the breakdown voltage of the C.E.
amplifier can be increased from 2 V to around 2.8 V by decreasing the base
termination from open to 100 Ω. This can still be improved to 3.5 V by further
SiGe HBT Power Amplifiers
Amin Hamidian 43
decreasing the base impedance. In the cascode topology, the breakdown voltage of the
C.B. transistor can be significantly enhanced (Fig. 57b) by connecting its base to the
RF ground ([16] and [38]).
(a)
(b)
Fig. 51 a) Biasing network of the C.E. transistor. b) Biasing network of the C.B. transistors.
(a)
(b)
Fig. 52 a) Comparison between the introduced current source and resistive potential divider.
b) Load line variation of the PA by input power (Pin) with the introduced current source.
Vref
RS2
RS1
TS1
TS2
TS3
RS3
CS1
Current Source
Power Amplifier
RS4
RP1
RP2
VCC
Potential Divider
Power Amplifier
RF
GND
VBCE
Vmin
Low PIN
High PIN
Sweep Amplitude
SiGe HBT Power Amplifiers
Amin Hamidian 44
Fig. 53 BVCE for different base terminations.
3.1.4 Collector Current
Two important factors in the biasing current selection are the ft and fmax of the
transistor. In order to achieve the maximum performance of the PA, the collector
current must be selected within the range where ft and fmax are maximized. Fig. 54
shows that by selecting collector current between 2.2 mA to 2.5 mA per transistor
finger maximum ft and fmax is achievable. However, higher current densities can result
in a higher output power, due to model validity degradation, and this is not
recommended by the foundry. Fig. 54 also shows a decrease in ft and fmax by
increasing the NoF. This appears as the parasitics increase by increasing the NoF.
Fig. 54 Ft and Fmax vs. collector current.
SiGe HBT Power Amplifiers
Amin Hamidian 45
3.1.5 Topology Selection
C.E. and cascode topologies are commonly used in PA design. The main
advantages of each topology are:
Cascode topology:
Higher isolation (Fig. 55) and, hence, better stability
Higher gain (Fig. 56)
Larger output voltage swing (Fig. 57) and, hence, more output power
(Fig. 56)
C.E. topology:
Less parasitic elements and a less complicated design procedure
Better ft due to less parasitic elements (Fig. 58)
Fig. 55 Isolation (S12) vs. topology.
Fig. 56 Large signal performance. C.E. vs. Cascode.
SiGe HBT Power Amplifiers
Amin Hamidian 46
(a) (b)
Fig. 57 The IV-curves of the SiGe HBT: a) Common emitter b) Cascode
As the parasitic elements of the C.E. transistor core are significantly less than
for the cascode topology, its design procedure is easier. Furthermore, and for the same
reason, the ft of the C.E. is much higher than the cascode topology (Fig. 58). As
shown in Fig. 58, the ft of the C.E. is around 200 GHz while the cascode has a ft of
120 GHz. This is critical for those applications with a frequency of operation near ft.
On the other hand, the cascode topology shows better performance in stability (due to
higher isolation), gain and output power (Fig. 55 and Fig. 56). Fig. 57 shows the IV-
curves of these two topologies. In the cascode topology (with stacked configuration
[89]), the breakdown is around 5.5 V but, in the C.E. topology, it only reaches 2.2 V.
This means that almost a 4.5 V voltage swing is possible using the cascode topology.
In comparison with the C.E. configuration, this voltage swing is almost two and a half
times higher (BVCE – VKnee = 1.7 V).
Fig. 58 ft vs. topology.
VCE [V]
ICE [mA]
VKnee BVCE
20
30
40
50
60
0 0.5 1 1.5 2
VKnee BVCE
1 2 3 4 5 6
VCE [V]
ICE [mA]
VKnee BVCE
20
30
40
50
60
0 0.5 1 1.5 2 VCE [V]
ICE [mA]
VKnee BVCE
20
30
40
50
60
0 0.5 1 1.5 2
20
30
40
50
60
0 0.5 1 1.5 2
VKnee BVCE
1 2 3 4 5 6
VKnee BVCE
1 2 3 4 5 61 2 3 4 5 6
SiGe HBT Power Amplifiers
Amin Hamidian 47
3.1.6 Broadband Design
Designing broadband PAs for a mm-wave band requires the accurate modeling
of the passive components and the fine-tuning of matching networks. Some V-band
broadband PAs have already been reported using CMOS and HBT technologies ([11],
[51] and [85]). The broadband design techniques are required for both the large and
small signal performances of the PAs. Simultaneous maximum bandwidth and high
output power and efficiency are the main objectives to achieve. In order to achieve
these goals, one PA must have simultaneous broadband gain, broadband small signal
input-matching and broadband large signal output-matching. To overcome these
problems, different design procedures for broadband PA design are suggested.
Compared to the implementation of an amplifier with broadband gain, the
design of a similar narrowband single-stage amplifier with high gain is much more
straightforward. This is mainly due to the quality factor limitations of the complex
broadband matching networks and their corresponding chip sizes. Instead of designing
a single broadband amplifier, several narrow band amplifiers with different center
frequencies can be cascaded (Fig. 59). By fine-tuning the center frequency of each
amplifier, the bandwidth of the total amplifier can be enlarged. Fig. 59 illustrates this
method using two narrow-band amplifiers (a pre-amplifier and a power stage)
matched at two different frequencies. The cascaded connection of each amplifier
results in the overall broadband performance of the multistage amplifier.
Although the above procedure sounds quite easy, it can face many difficulties
during the design procedure. These difficulties lie mainly in the frequency
dependency of the matching networks. In those cases where the above procedure faces
a difficulty, some tuning and optimization techniques can be utilized instead in order
to select the correct inter-stage matching network components for broadband gain
performance. All these procedures have been explained and employed in [11], [51]
and [85].
(a)
(b)
Fig. 59 a) Cascaded power stage and pre-amplifier. b) Total transducer gain for different
frequency spacing between f1 and f2.
In the case of input-matching network design, since a lossy input-matching
network does not affect the output power or linearity of the PA, a complicated
network can be utilized to have as broadband as possible form of input-matching to
cover the entire desired frequency bandwidth. However, complicated matching
networks at mm-wave frequencies are quite lossy and, hence, they are not appropriate
for output-matching networks. In this case, and unlike the input-matching network,
the output-matching network has to be designed so as to be as simple as possible.
Pre PA
IN OUT
Pre PA
IN OUT
PA Pre
f1f0f2
PA Pre
f1f0f2
f1f0f2
PA Pre PA Pre
f1f0f2
PA Pre
f1f0f2
f1f0f2
PA Pre
SiGe HBT Power Amplifiers
Amin Hamidian 48
3.2 Realized V-band SiGe HBT Power Amplifiers
In this section, four PAs are designed and realized in the 0.25 μm HBT
technology and the realizations have been thoroughly characterized. The PAs are
designed for V-band (60 GHz) applications. As discussed previously (Section 3.1.5),
in this technology the ft of the cascode topology is above 120 GHz (two times higher
than 60 GHz), which makes this technology and the cascode topology appropriate for
the V-band PA design.
In these designs, two types of PAs are targeted. The main differences between
these PAs lie in the POUT and the DC power consumption (PDC). For each type, a
primary version has been designed, realized and measured. Consequently, the primary
versions have been extended and improved in the secondary versions. In this
document, the second PA is the extension of the first PA and the fourth PA is the
extension of the third PA. In the rest of this paper, the first and second PAs are
referred as ‘low power PAs while the third and fourth PAs are referred as ‘high power
PAs. The general criteria for both types of PAs are listed in Table. 2.
Table. 2 HBT PA design criteria
Properties
Low Power PAs
High Power PAs
Gain [dB]
20
20
Psat [dBm]
15
18
OP1dB [dBm]
14
15
PAE [%]
15
15
PDC [mW]
200
400
Bandwidth [GHz]
50 – 70
50 – 70
As shown in Table. 2, most of the design criteria for both types of PAs are the
same. The main difference lies in the Psat of the PAs. In order to improve the output
power by 3 dB, a current-combining technique has been investigated and utilized in
the high power PAs. Besides, all the PAs are designed for high gain, high PAE and
the maximum coverage of the V-band.
3.2.1 Low Power PA – 1st Version
In the first PA, a single-stage amplifier with the cascode topology is designed
[15]. Fig. 60 shows the schematic and the chip micrograph of the PA. The values of
all the PA components are also presented in Table. 3. The one-stage PA has been
designed for maximum POUT, gain and PAE. Both the input and output-matching
networks are designed at the Psat level to achieve the maximum OP1dB and PAE. In
addition, the cascode topology has been selected for better POUT, gain and stability
(Section 3.1.5). The PA achieved a 1dB gain bandwidth of more than 9 GHz, from
57 GHz to 66 GHz, and a 3dB gain bandwidth of more than 18 GHz, from 51 GHz to
69 GHz. Furthermore, the large signal matching at the output resulted in an OP1dB
higher than 11.5 dBm and a PAE of around 9%, from 57 GHz to 65 GHz, with more
than 14 dBm Psat. The total size of the PA is 0.36 mm2 and the active size of the PA is
0.086 mm2.
Ω
SiGe HBT Power Amplifiers
Amin Hamidian 49
(a)
(b)
Fig. 60 a) Schematic of the PA. b) Chip-Photo
Table. 3 The values of the PA components.
Parameter
Value
Parameter
Value
TLIn [μm] (W/L)
3/90
CGND1 [pF]
8
TLOut [μm] (W/L)
30/250
CGND2 [pF]
6
CIn [fF]
130
R1 [kΩ]
1.5
COut [fF]
500
R2 [kΩ]
3
CBlock_In [fF]
500
Cpad [fF]
20
T1 = T2 (NoF)
4×6
Table. 4 The current source elements (Fig. 51a).
Parameter
Value
TS1 = TS2 = TS3
(NoF)
1×1
RS1 [Ω]
30
RS2 [kΩ]
2
RS3 [kΩ]
3.2
RS4 [Ω]
500
CS1 [pF]
2
VCC
IN
OUT
Vref
R1
R2
Cpad
Cpad
COut
TLOut
CGND1
TLIn
CIn
CGND2
CBlock_In
T2
T1
SiGe HBT Power Amplifiers
Amin Hamidian 50
3.2.1.1 PA Design
The value of all the components utilized in the PA and the current source are
given in Table. 3 and Table. 4. The schematic of the current source is also given in
Fig. 51a. In this section, the detailed design of each part is explained.
Fig. 61a-b presents the PA transistor core. The PA core is designed as four
parallel cascode amplifiers with an equal electrical length from input-to-output for
minimum signal distortion at the output (Section 3.1.1). Both the common base and
the C.E. transistors in each cascode amplifier have 6 fingers.
The introduced current source (Section 3.1.3) has been utilized for the biasing
of the C.E. transistors. Furthermore, a potential divider with a relatively low ohmic
RF ground has been utilized for the biasing of the common base transistors. As
mentioned earlier, the low ohmic RF grounds are necessary for both the gain and
breakdown voltage (Section 3.1.3) improvement of the cascode topology. The biasing
voltages are 3.3 V for the VCC and 2.6 V for the current source (Vref). The total current
consumption of the PA is 46 mA.
IN
OUT
4x6
4x6
(a)
(b)
Fig. 61 a) 3D view of the PA transistor core for a four parallel Cascode.
b) PA core schematic.
(a)
(b)
Fig. 62 The load-pull simulation of the PA after matching. a) At Psat. b) At small signal.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps.
IN
OUT
Cascode
C.B.
C.E.
IN
OUT
Cascode
C.B.
C.E.
SiGe HBT Power Amplifiers
Amin Hamidian 51
As mentioned earlier, the output has been matched at the Psat level. Fig. 62a
shows the large signal matching of the PA output (including the matching network).
The center of the load-pull circles point to the maximum power and efficiency. The
red contours show the POUT with a step of 0.5 dBm, decreasing from the maximum
power, while the blue circles show the PAE contours with a step of 2%, decreasing
from the maximum efficiency. The simulated results show a maximum power of
15 dBm and a maximum efficiency of 15%, including all the matching networks and
the RF pad structures.
The main consequence of large signal output matching of the PA is poor
output-matching at the small signal level (Fig. 62b). This can result in output-
matching as low as 5 dB (based on the simulated and measured results). Moreover, as
in the single-stage amplifiers the OP1dB and Psat can be affected by input-matching
(due to finite isolation between output and input terminals), the input of the PA has to
be designed at the higher power levels with the help of source-pull simulation setup.
Designing the input-matching at higher input power levels can further result in poor
small signal input-matching.
Finally, with help of the EM simulation, input and the output-matching
networks and the PA core have been characterized and optimized. In addition, in order
to extract the coupling elements, the whole PA has been simulated in HFSS (Fig. 63).
Fig. 63 3D view of the EM simulated PA.
3.2.1.2 Measurement vs. Simulation
Both large and small signal measurements are performed on the chip at room
temperature. The small signal measured results show good agreement with the
simulation up to 100 GHz. Fig. 64 shows the small signal gain and the isolation of the
PA. Around 8.8 dB gain has been achieved at 62 GHz with 1dB gain bandwidth of
more than 9 GHz, from 57 GHz to 66 GHz, and 3dB gain bandwidth from 51 GHz to
69 GHz. Also, and as expected, due to the employment of the cascode topology, an
isolation better than 25 dB is achieved within the entire band.
As mentioned before, the small signal matching at both the input and output
terminals is significantly affected by the large signal matching techniques utilized.
Fig. 65 shows around 5 dB and 8 dB matching, respectively, for the output and input
terminals.
Finally, the large signal measurement shows the good performance of the PA
within the required frequency band from 57 GHz to 66 GHz (Fig. 66 and Fig. 67).
SiGe HBT Power Amplifiers
Amin Hamidian 52
More than 11.5 dB OP1dB with 9% PAE is achieved during measurement, from
57 GHz to 65 GHz. Table. 5 presents the large signal characteristics of the PA versus
the frequency.
Fig. 64 Small signal gain and isolation.
Sim. vs. Meas.
Fig. 65 Small signal matching.
Sim. vs. Meas.
Table. 5 PA characteristics over the frequency.
Freq. [GHz]
58
60
62
64
66
Gain [dB]
8
8.6
8.8
8.8
7.8
OP1dB [dBm]
13.3
12
12
11.8
10.8
Psat [dBm]
>14
>14
>13
>13
>12
PAE [%]
9.8
9.2
9.6
9.2
7
Fig. 66 Gain and PAE vs. input power at
60 GHz.
Fig. 67 PAE, OP1dB and gain vs.
frequency.
SiGe HBT Power Amplifiers
Amin Hamidian 53
3.2.2 Low Power PA – 2nd Version
The first PA is extended and improved into two PAs (PA1 and PA2) with
higher targeted PAE and OP1dB [11]. A pre-amplifier has been utilized to increase the
total gain of the PAs. The small signal gain (S21) has been optimized to be almost flat
over a wide frequency band, covering from 50 GHz to 70 GHz. The broadband gain
performance of the PAs is achieved by tuning the inter-stage matching network in the
cascaded structures (Section 3.1.6). The two-stage PAs utilize the cascode topology to
boost the gain, power and output-to-input isolation (Section 3.1.5). A flat gain of
around 20 dB with a 3 dB bandwidth covering almost the entire V-band (50 GHz to
70 GHz) is achieved. The maximum OP1dB is 14 dBm, with a peak PAE of 15%.
Good agreement is observed between the simulated and measured results, which
further confirms the accuracy of the presented design methodology. The schematics
and the chip micrographs of the PAs are presented in Fig. 68. The active chip sizes of
the PAs are 0.2 mm2 and 0.19 mm2 and their total sizes are 0.42 μm2 and 0.41 μm2.
(a)
(b)
VCC
OUT
Vref
Cpad
IN
Cpad
TLOut
TLIMN
TLPre
TLIn1
TLIn2
TLIn3
CIn2
CIn1
T4
T3
R1
R2CGND1
T2
T1
CGND2
R1
R2CGND1
CGND2
COut
CIMN1
CIMN2
Cblock_In
VCC
OUT
Vref
Cpad
IN
Cpad
TLOut
TLIMN
TLPre
TLIn
CIn
T4
T3
R1
R2CGND1
T2
T1
CGND2
R1
R2CGND1
CGND2
COut
CIMN1
CIMN2
Cblock_In
SiGe HBT Power Amplifiers
Amin Hamidian 54
(c)
(d)
Fig. 68 Schematics and chip micrographes of the: a)PA1. b)PA2. c) PA1. d) PA2.
Table. 6 The values of the PA1 components.
Parameter
Value
Parameter
Value
T1 = T2 (NoF)
4×6
CIn1 [fF]
45
T3 = T4 (NoF)
1×6
CIn2 [fF]
91
TLIn1 [μm] (W/L)
7/15
CIMN1 [fF]
100
TLIn2 [μm] (W/L)
7/130
CIMN2 [fF]
50
TLIn3 [μm] (W/L)
3/151
COut [fF]
500
TLIMN [μm] (W/L)
7/150
CBlock_In [fF]
200
TLOut [μm] (W/L)
30/250
CGND1 [pF]
8
R1 [kΩ]
1.5
CGND2 [pF]
6
R2 [kΩ]
3
Cpad [fF]
20
Table. 7 The values of the PA2 components (The rest are the same as PA1).
Parameter
Value
TLIn [μm] (W/L)
10/420
TLIMN [μm] (W/L)
7/130
CIn1 [fF]
200
CIn2 [fF]
50
CIMN2 [fF]
35
SiGe HBT Power Amplifiers
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Table. 8 Current source values (Fig. 51).
Parameter
Value
PA1
PA2
Power Stage
Pre-amp.
Power Stage
Pre-amp.
TS1 = TS2 = TS3
(NoF)
1×1
1×1
1×1
1×1
RS1 [Ω]
30
50
30
50
RS2 [kΩ]
2
2
2
2
RS3 [kΩ]
5
13
3.2
11
RS4 [Ω]
500
500
500
500
CS1 [pF]
2
2
2
2
3.2.2.1 PA Design
The value of all components utilized in these PAs and the current sources are
given in Table. 6, Table. 7 and Table. 8. The schematics of the current source are also
given in Fig. 51a. In these designs, the current sources of PA1 and PA2 exhibit certain
differences. These differences have helped in achieving different biasing conditions
under the small and large signal power levels. In this section, the detailed design of
each part of the power amplifiers is explained.
Based on the presented design procedure (Section 3.1.6), two broadband PAs
are developed. Each PA includes two cascaded amplifiers, consisting of a cascode
pre-amplifier followed by a cascode power stage. The PAs are designed to work
through the V-band with approximately 20 dB small signal gain. The outputs of the
PAs are matched at 60 GHz for the maximum linearity and PAE. In the following
sections, the design of different parts of the PAs, including the amplifier cores (pre-
amplifier and power stage), input, output and inter-stage matching networks, are
explained.
a) PA Core and Output-matching: The PA core selection is introduced in
section 3.1.1 and section 3.2.1. Based on the selected PA core, an output-matching
network is designed. The output of the PA is matched at the large signal level to
achieve the maximum power performance. The main problem in the design of the
output-matching network of the power stage is the selection of the corresponding
input power level. To find the optimum input power level for the maximum OP1dB and
Psat performance, a cascode topology with an output-matching network is simulated
for various input power levels (Fig. 69a). Fig. 69b shows the simulated results for
various input power levels. At each power level, the optimum output-matching
network is designed based on the load-pull simulation and modeled with the help of
an EM simulator. With regard to Fig. 69b, the output-matching network of the power
stage is designed for an input power level of 0 dBm. For this power level, the OP1dB
reaches a maximum of 15 dBm while maintaining satisfactory gain and output-
matching. The 3D view of the power stage is presented in Fig. 69c.
SiGe HBT Power Amplifiers
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(a)
(b)
(c)
Fig. 69 PA core with output matching: a) Schematic. b) Performance vs. output matching
network variation at 60 GHz. c) 3D layout view of the PA core and output matching.
The results of the large and small signal load-pull simulations are presented in
Fig. 70. As expected, and due to the large signal matching, the small signal matching
is quite poor (Section 3.2.1).
(a)
(b)
Fig. 70 The load pull simulations of the PA after matching. a) At Psat. b) At small signal.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps.
VCC
OUT
Cpad
C
TL
4X6
4X6
TL W = 30 μm
TL L = 150 μm 230 μm
C = 100 fF 500 fF
VCC
OUT
Cpad
C
TL
4X6
4X6
TL W = 30 μm
TL L = 150 μm 230 μm
C = 100 fF 500 fF
TL
C
Pad
VCC
PA Core
TL
C
Pad
VCC
PA Core
SiGe HBT Power Amplifiers
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b) Inter-stage Matching Network: The inter-stage matching network plays the
most important role in the broadband design. The input-matching network of the
power stage and the output-matching network of the pre-amplifier must be designed at
two different frequencies (Section 3.1.6). The correct selection of these frequencies is
important as they determine the bandwidth and the in-band gain variations. The
intermediate matching must match the output of the pre-amplifier at f1 to the input of
the power stage at f2. Fig. 71 presents the designed intermediate matching circuit. In
both of the PAs designed in this work, f1 is selected at 55 GHz but f2 is selected at
65 GHz for PA1 and 67 GHz for PA2.
Fig. 71 Schematic and 3D view of the intermediate matching network.
c) Pre-Amplifier and Input-matching: Having designed the PA core, the pre-
amplifier core must be designed. By using (16) introduced on section 3.1.2, the
approximate core size can be calculated. By employing a tradeoff between the
matching network loss and the minimum required pre-amplifier transistor size, a six
finger transistor is selected for the pre-amplifier.
To improve the broadband characteristic of the total PA, a broadband input-
matching network is designed for the pre-amplifier as well. The principle of the
design is introduced in [12]. For each of these PAs, a different input-matching
network is designed. The second matching network has a better Q-factor, but it
occupies more space than the first one. The schematic and the 3D layout of the
designed matching networks and pre-amplifier are presented in Fig. 72.
(a)
(b)
C1C2
TL
P A
Input
C 1T L
C2
P r e - A m p .
O u t p u t
C1C2
TL
P A
Input
C 1T L
C2
P r e - A m p .
O u t p u t
VCC
OUT
1X6
1X6
C1
C2
IN L3
L2
IN
VCC
L1
1X6
1X6
C1
C2
C3
TL1
TL2
SiGe HBT Power Amplifiers
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(c)
(d)
Fig. 72 Schematic and 3D view of: a&c) Pre-amplifier 1. b&d) Pre-amplifier 2.
3.2.2.2 Measurement VS. Simulation
Fig. 73a-b present the simulated and measured small signal results of both
realized PAs. The PAs have been biased at the 3.3 V collector voltage (VCC) and the
2.6 V reference voltage (Vref). Due to different biasing networks, the collector current
(ICC) of each PA is different. The total current consumption of PA1 is 45 mA
(Class AB), while the total current consumption of PA2 is 55 mA (Class A). Thanks to
the accurate small signal transistor model and the EM modeling of the whole chip, the
measured and simulated results show a good agreement.
As shown in Fig. 73, broadband input-matching and transducer gain are
achieved. An input-matching of better than 10 dB from 51 GHz to 70 GHz for PA1
and from 47 GHz to above 70 GHz for PA2 are measured. The peak gain values of
both PAs are around 21 dB. Due to different input and inter-stage matching networks,
the peak gain varies from 55 GHz in PA1 to 65 GHz in PA2. The 3 dB bandwidth is
from 50 GHz to 68 GHz in PA1 and from 52 GHz to 70 GHz in PA2. More than 5 dB
small signal output-matching has been achieved in both PAs, at around 60 GHz. As
explained on section 3.2.1.2, this is mainly due to the large signal matching at the
output for the maximum OP1dB and PAE.
Output
Input
Pre-Amp.
Core
L3
L2
C1
C2
VCC
Output
Input
Pre-Amp.
Core
L3
L2
Output
Input
Pre-Amp.
Core
L3
L2
C1
C2
VCC
Output
Input
Pre-Amp.
Core
L1
TL2
TL1
C1
C2
VCC
Output
Input
Pre-Amp.
Core
L1
TL2
TL1
Output
Input
Pre-Amp.
Core
Output
Input
Pre-Amp.
Core
L1
TL2
TL1
C1
C2
VCC
SiGe HBT Power Amplifiers
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(a)
(b)
Fig. 73 S-parameter measurement vs. simulation. a) PA1. b) PA2
The large signal measurements are performed for both PAs under different
biasing conditions and different frequencies. Fig. 74a-b presents the measured results
of both PAs at 60 GHz under the same biasing conditions used for the small signal
measurements (VCC=3.3 V and Vref=2.6 V). Both PAs have almost the same power
gain at 60 GHz (around 20 dB) but, compared to PA1, the OP1dB of PA2 is 1.5 dB
more. This is mainly due to the higher collector current of PA2, which on the other
hand has resulted in 3% less peak PAE in PA2 than in PA1. Furthermore, and for the
same reason, PA1 has slightly better PAE at the back-off.
The large signal performances of both PAs versus frequency are presented in
Fig. 74c. An almost constant OP1dB is achieved for both PAs from 55 GHz to 65 GHz.
As already mentioned, due to the different biasing conditions, PA1 shows better PAE
than the PA2 over the targeted frequency band. Moreover, Fig. 75a-b present the small
signal and large signal performances of PA2 versus different bias points, which further
proves that 2.6 V Vref is the optimum selection for the current source-biasing voltage.
SiGe HBT Power Amplifiers
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(a)
(b)
(c)
Fig. 74 Large signal measurement of both PA1 and PA2:
a&b) vs. input power at 60 GHz. c) vs. frequency.
(a)
(b)
Fig. 75 PA2 measurement: a) small signal S21. c) large signal performance.
SiGe HBT Power Amplifiers
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3.2.3 High Power PA – 1st Version
The third PA is designed for a higher output power in comparison with the
previous PAs [16]. In order to improve the output power of this PA, a current-
combining technique is utilized [60]. Further, a two-stage amplifier with a cascode
topology is selected for better gain, output power and stability (Section 3.1.5). The
two-stage PA provides a gain of 17 dB at 64 GHz. The PA is also optimized for
biasing circuit, PA Core and matching networks. Because there are certain process
variations, narrow band matching designs and unpredicted parasitic and coupling
elements, a frequency shift is observed that deteriorated the power performance of the
PA. Due to these problems, the PA achieves a maximum OP1dB of 13.8 dBm at around
64 GHz, but the OP1dB nevertheless remains higher than 12 dBm within the entire
range of the frequency. The total chip size of the PA is 0.67 mm2 and the active size
of the PA is around 0.3 mm2.
(a)
(b)
Fig. 76 a) Schematic of the PA. b) Chip-Photo.
VCC
IN
OUT
Vref
TLOut2
Cpad
COut_Block
COut
T2
T1
TLOut1
T1
T2
R1
R2CGND2
CGND1
R1
R2CGND2
R3
TLIMN
CIMN
R1
R3
CGND3
Cpad CIn_Block
CIn
TLIn
T4
T3
R2
SiGe HBT Power Amplifiers
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Table. 9 The values of the PA components.
Parameter
Value
Parameter
Value
T1 = T2 (NoF)
4×6
CIn [fF]
88
T3 = T4 (NoF)
1×6
CIn_Block [fF]
500
TLOut1 [μm] (W/L)
20/280
CIMN [fF]
200
TLOut2 [μm] (W/L)
20/100
COut [fF]
200
TLIMN [μm] (W/L)
10/180
COut_Block [fF]
500
TLIn [μm] (W/L)
3/130
CGND1 [pF]
16
R1 [kΩ]
1.5
CGND2 [pF]
8
R2 [kΩ]
3
CGND3 [pF]
4
R3 [kΩ]
5
Cpad [fF]
20
3.2.3.1 PA Design
The values of all the components utilized in the PA and the biasing circuits are
given in Table. 9. In this design, and unlike the other designs, no current source is
utilized and instead the base of the C.E. transistors is directly biased through a resistor
(R3 in Fig. 76a). In this section, the detailed design of each part is explained.
The design of the PA is divided into two parts. In the first part, the power
stage and the pre-amplifier core design is investigated, while in the second part the
matching network designs are introduced.
a) PA and pre-amplifier cores: In this design, the total PA core is divided into
two smaller cores. The size of each core is selected based on the previous discussions
(Section 3.1.1 and Section 3.1.2). These cores are current-combined at both their
inputs and outputs. Current-combining is a simple technique that can be utilized in on-
chip PA designs [60]. In this technique, two completely symmetrical PA cores can be
connected to each other with a short but optimized line length. This only requires the
same impedances at the terminals of the transistor cores [60]. With this technique, the
number of parallel transistors in each PA core will be decreased by half (or even
further by three-quarters [60]), which facilitates the power distribution and collection
from each transistor.
Unlike the hybrid design, because in the chip design the transistors are all
located on one substrate, they show the same characteristics and hence those of their
PA cores with the same passive structures have the same output and input
impedances. Having the same impedances at the PA core terminals is ideal for the
current-combining technique since the isolation compensation (as with the Wilkinson
power combiner) between the input ports of the current combiner no longer has an
important role in the performance of the total PA. Despite this advantage, the PA
cores still cannot be placed too close to one another; such a placement would result in
high parasitic and coupling elements between the two and, hence, the deterioration of
the output power. The optimum spacing between the two PA cores, in this design, is
calculated with the help of EM simulation.
SiGe HBT Power Amplifiers
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The pre-amplifier transistor size is selected based on the discussion on
Section 3.1.2. In the power stage in this PA, two transistor cores are combined, which
results in a core size two times larger than the low power PAs (Section 3.2.1.1). In
this case, the pre-amplifier NoF must be two times larger. In this design, the NoF of
the pre-amplifier core is selected as 12 (2 transistors with 6 NoF for each transistor).
Fig. 77 presents the schematic and the 3D view of each single core in the
power stage. The C3 capacitors in Fig. 77b are the RF ground placed as near as
possible to the common base transistors so as to ensure the low ohmic RF ground at
this point and, hence, improve the breakdown voltage of the transistors
(Section 3.1.5). The complete 3D view of the PA core, including the input and output
current combiners, is also presented in Fig. 78.
IN
OUT
4x6
4x6
(a)
(b)
Fig. 77 The single core of the PA: a) schematic. b) 3D view.
Fig. 78 The two parallel identical transistor cores combined with the current combiner.
b) Matching networks: After finishing the PA core design, the matching
network must be added. In this case, the output-matching is designed at the Psat level
of the PA with the help of shunt and series inductors and capacitors. Fig. 79 presents
the 3D view of the designed output-matching network. The small and large signal
load-pull simulated results of the PA output-matching are presented in Fig. 80. As
mentioned before (Section 3.2.1.2), matching at the Psat level resulted in the poor
small signal output-matching of the PAs. The step-by-step output-matching procedure
of the power stage, after the DC feed, is explained in Fig. 81.
In
Out
C3
C3
In
Out
C3
C3
SiGe HBT Power Amplifiers
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Narrow band matching techniques are utilized for the input and inter-stage
matching networks. In this design, a series transmission line and a shunt capacitor are
used to match the input of the pre-amplifier. The output of the pre-amplifier is directly
matched to the input of the power stage with the help of a shunt inductor and a series
capacitor.
Fig. 79 3D view of the PA output matching network together with the output current
combiner.
(a)
(b)
Fig. 80 The load-pull simulations of the PA after matching. a) At Psat. b) At small signal.
Fig. 81 Output matching steps of the output of PA core and DC feed to 50 Ω.
LOut COut
Cpad
Z*
Opt
W = 20 μm
L = 100 μm
COut =
91 fF CPad ≈
20 fF
DC Block
50 Ω
Z*
Opt
LOut
LOut COut
Cpad
Z*
Opt
W = 20 μm
L = 100 μm
COut =
91 fF CPad ≈
20 fF
DC Block
50 Ω
Z*
Opt
LOut
SiGe HBT Power Amplifiers
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3.2.3.2 Measurement vs. Simulation
Fig. 82 presents the small signal simulated and measured results. Due to
narrow band matching, process variations and unforeseen parasitic and coupling
elements, the peak gain is shifted from 60 GHz to 64 GHz. The unforeseen parasitic
and coupling elements can mainly be located in the power stage core itself. Further
simulations have shown the high sensitivity of the PA performance to the coupling
elements between the two PA cores. The measured results show 14 dB gain at 60 GHz
and 17 dB gain at 64 GHz. Input-matching of more than 10 dB is achieved, but due to
the large signal output-matching (Section 3.2.1.2) the output small signal matching is
quite poor, at around 60 GHz.
However, due to the frequency shift, the performance of the PA is
deteriorated, though the large signal measured results still show the good power
performance of the PA within the frequency band from 60 GHz to 66 GHz (Fig. 83).
In this frequency range, an OP1dB higher than 12 dBm is achieved. The PA also
achieves an OP1dB of 13.8 dBm at 64 GHz and 13.2 dBm at 60 GHz, with a PAE
higher than 6%. These results could be further improved by utilizing a current source
instead of resistive biasing, as the measurement showed the collector current to drop
at larger signal levels. The large signal performance of the PA at different frequencies
is presented in Table. 10.
Fig. 82 PA Small signal S-Parameters.
Simulation vs. Measurement.
Fig. 83 Measured Gain and PAE vs. input
power at 64 GHz.
Table. 10 Measured PA characteristics over the frequency.
Freq. [GHz]
Gain [dB]
OP1dB [dBm]
Psat [dBm]
PAE [%]
60
14.2
13.2
15
6.3
62
16.2
12.3
15
6
64
17
13.8
15
8.5
66
17.1
13.5
15
8
SiGe HBT Power Amplifiers
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3.2.4 High Power PA – 2nd Version
The previous PA (High Power PA – 1st Version) was redesigned and
optimized in this work for higher POUT, PAE and linearity. In the same way as with
the previous PA, a current-combining technique is utilized for the Psat improvement
(Section 3.2.3.1). As observed with the previous PA, narrow band matching networks
and unforeseen parasitic and coupling elements in the PA core result in a frequency
shift in the PA’s performance. In this case, extra precautions in the PA core, input and
intermediate matching networks are considered for the broadband PA’s performance
and, hence, less sensitivity of the PA to the process variations.
At 60 GHz, this power amplifier achieves 18 dBm output power and 11 dB
gain in saturation with a peak power added efficiency of 14%. The PA is completely
integrated, including the matching networks and the biasing circuitry. The total chip
area is 0.53 mm2 and the active area is 0.19 mm2. The simplified schematic and chip
micrograph of the realized PA is shown in Fig. 84.
(a)
(b)
Fig. 84 a) Schematic of the 4th PA. b) Chip-Photo.
VCC
IN
OUT
Vref
TLOut2
Cpad
COut_Block
COut
T2
T1
TLOut1
T1
T2
R1
R2CGND2
CGND1
R1
R2CGND2
TLIMN
CIMN
R1
CGND3
Cpad CIn_Block
T4
T3
R2
TLIn1
TLIn2
TLIn3
CIn2
CIn1
SiGe HBT Power Amplifiers
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Table. 11 The values of the PA components.
Parameter
Value
Parameter
Value
T1 = T2 (NoF)
4×6
CIn1 [fF]
70
T3 = T4 (NoF)
1×6
CIn2 [fF]
200
TLOut1 [μm] (W/L)
20/250
CIn_Block [fF]
500
TLOut2 [μm] (W/L)
10/130
CIMN [fF]
200
TLIMN [μm] (W/L)
10/160
COut [fF]
100
TLIn1 [μm] (W/L)
5/30
COut_Block [fF]
500
TLIn2 [μm] (W/L)
5/100
CGND1 [pF]
16
TLIn3 [μm] (W/L)
3/60
CGND2 [pF]
8
R1 [kΩ]
1.5
CGND3 [pF]
4
R2 [kΩ]
3
Cpad [fF]
20
Table. 12 The current source elements (Fig. 51a).
Parameter
Value
TS1 = TS2 = TS3
(NoF)
1×1
RS1 [Ω]
30
RS2 [kΩ]
2
RS3 [kΩ]
3.2
RS4 [Ω]
500
CS1 [pF]
2
3.2.4.1 PA Design
Unlike the first version (High Power PA – 1st Version), in the second version a
current source is utilized to improve the power performance of the PA at the large
signal levels. The values of all the components utilized in this PA and the biasing
circuitries are given in Table. 11 and Table. 12. The schematic of the current source is
also given in Fig. 51a. In this section, the detail design of each part is explained.
a) PA and pre-amplifier cores: The PA core design is based on [16] (High
Power PA – 1st Version). In the design presented in [16], the PA was matched at the
output for maximum linearity. The expected OP1dB of the PA was around 16 dBm.
However, a high NoF and unwanted parasitic and coupling elements between the
passive structures of the power stage transistor core resulted in less accurate simulated
SiGe HBT Power Amplifiers
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results and, hence, caused the PA linearity’s reduction by 2 dB. In this design, and in
order to improve the PA tolerance, an extra shielding ground is placed between the
PA cores (Fig. 85). Although this structure results in the lower impedance of the PA
core, it improves the PA tolerances by avoiding the inter-core coupling elements.
Similar to the High Power PA – 1st Version, a cascode PA topology with
48 (8x6) fingers and a cascode pre-amplifier topology with 12 (2x6) fingers for both
the C.E. and C.B. transistors is selected. The optimum PA core is obtained by the in-
phase combining of the transistor fingers (Section 3.1.1) and the utilization of current-
combining techniques [60].
Fig. 85 The 3D view of the transistor Core of the power stage with shielding ground.
b) Matching networks: As mentioned earlier, one of the most important design
parameters is the PA optimum output impedance. This impedance varies as a function
of the input power. Fig. 86 presents one such variation in the output impedance of the
PA. Due to this variation, the amplifier performance is a strong function of the output-
matching. This includes the linearity (the OP1dB), the Psat, efficiency and PAE.
The maximum OP1dB can be achieved only for specific impedance on the
Smith chart. This impedance specifies an input power for which both gain and output
power are high. Matching the output of the transistor for higher or lower input powers
would result in the linearity’s deterioration. Moreover, due to the small radius of the
1dB contour around the P1dB optimum impedance (Fig. 86), any technology variation
or modeling problems can result in the fast deterioration of the OP1dB. Unlike the
OP1dB, the Psat is less dependent on the output impedance or the power level at which
the output is matched. Shown in Fig. 86 are the simulated gain contours of a PA core
(the gain step is 1 dB) for different input power levels. It can be seen that as the input
power increases the 1 dB contours become larger, which simplifies the matching
tolerances for the Psat.
Although an accurate model is important in designing a high gain and high
PAE amplifier, due to the broad contour regions the Psat becomes less dependent upon
the transistor large signal model accuracy. A PA matched to the optimum Psat
SiGe HBT Power Amplifiers
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impedance can achieve a simultaneous high gain, Psat and PAE. In this case, a good
approximation of the optimum saturated impedance can be quite helpful in a high
performance PA design.
Fig. 86 Simulated optimum output impedance versus input power.
In this design, the approximate optimum Psat impedance of the transistors is
estimated. The matching network and all the interconnections are designed with help
of EM simulation. As the power gain near Psat is quite low, a pre-amplifier is added.
In order to minimize the size of the inter-stage matching network, the output of the
pre-amplifier is directly matched to the input of the PA. Further, to minimize the
process variation effects on the PA performance, the inter-stage matching network is
designed for the broadband performance of the transducer gain (Section 3.1.6).
Fig. 87 presents the methodology applied for the input-matching. A wideband
input-matching is designed with the help of shunt-series transmission lines and MIM-
capacitors. As shown in Fig. 87 using the presented network, the input reflection can
be located within a 10 dB circle for the entire desired frequency band.
Fig. 87 The broadband input matching.
SiGe HBT Power Amplifiers
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3.2.4.2 Measurement VS. Simulation
Fig. 88 shows the simulated and measured small signal results of the realized
PA. The PA has been biased at 3.3 V with 60 mA of total current consumption. As
seen in Fig. 88, although some frequency shift can be observed, due to broadband
design and accurate EM modeling of the whole chip, the measured results show a
good agreement with the simulation.
Due to the broadband input matching, the input reflection is better than 10 dB
from 55 GHz to more than 70 GHz with a value better than 40 dB at 60 GHz. Under
the above biasing conditions, the PA has a small signal gain of 16 dB at 60 GHz. The
gain increases to 18 dB at 62 GHz. This is mainly due to the large signal matching at
the output of the PA at 60 GHz, which helps us to have the highest Psat at the 60 GHz.
Fig. 88 Measured and simulated small signal performance of the PA biased for class AB.
Biasing points for operations close to class A, class AB and class B have been
chosen for large signal measurements. Presented in Fig. 89 is the collector current
variation of the PA for all these biasing conditions as a function of the input power. It
can be seen that, due to the utilized current source topology, the total collector current
increases with the input power. The small signal currents are 60 mA, 100 mA and
130 mA, respectively, for each bias point.
Fig. 89 Measured PA collector current vs. input power at 60 GHz.
SiGe HBT Power Amplifiers
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Fig. 90a-b and Fig. 91 present the large signal measured results for three
operating conditions. As seen in Fig. 91, in the class AB biasing condition the PA has
a slightly higher small signal gain (16 dB) in comparison with 15 dB gain of the
class B condition. The PA achieves 17.5 dBm output power with 12 dB power gain
and 11% PAE under class AB biasing. However, the operation points near class B
shows a better Psat (18 dBm) and a higher PAE (14%) with 11 dB power gain.
(a)
(b)
Fig. 90 Measured large signal performance of the PA at 60 GHz.
a) Near class B biasing. b) Class A.
As shown in Fig. 91, the PDC and gain at small signal input power increase by
3 dB from class B to class A. Moreover, as the Psat is constant for all the bias points,
the resulted PAE values are lower at higher biasing conditions.
Fig. 91 The PA performance vs. class of operation at 60 GHz.
SiGe HBT Power Amplifiers
Amin Hamidian 72
3.3 Conclusion
In this work, the design of different PAs, based on HBT technology, are
studied. Different optimization techniques and design considerations are introduced.
For the first PA type, (Low Power PA – 1st Version and 2nd Version) a single PA core
without any power combining was utilized. These PAs were designed for
simultaneous high OP1dB and PAE. Due to the lower NoF used in the PA core, a better
transistor small signal model was obtained at the simulation level and, hence,
negligible discrepancies in the small signal level were observed between the
simulated and measured results. Further, by performing small signal optimizations, a
flat gain was achieved in the Low Power PA – 2nd Version.
At the large signal level, the expected Psat from the simulation was achieved in
the measurement, which further justified the utilization of the large signal load- and
source-pull simulations and matching techniques. However, unlike the small signal
level, and due to the poor large signal model of the transistors, the small 1dB gain
contour around the OP1dB (Fig. 86), and the process variations, the prediction of the
correct impedance for simultaneous maximum OP1dB and PAE faced certain
difficulties. The inability of the correct impedance extraction from the simulation
level for the maximum PAE resulted in the Psat occurrence for higher PDCs, which
resulted in around 4% lower PAE in comparison with the state-of-the-art results for
the same output power. Despite this problem, the designed PAs achieved more than
20 dB Gain, 14 dBm OP1dB, 15 dBm Psat and 14% PAE with broadband performance
covering the entire V-band and a less than 0.2 mm2 active chip size.
With the second design type (High Power PA – 1st Version and 2nd Version),
simultaneous maximum Psat and PAE were targeted. In addition, in these designs and
in order to improve the output power of the PA, a current-combining technique was
utilized [60]. With this technique, a 3 dB output power boost was targeted.
Unlike the previous version, the larger size of the PA core, the lower
impedance and higher number of coupling elements between the transistors, resulted
in a poorer small signal model of the PA core and, hence, a larger deviation was
observed in the small signal level in comparison with the previous PAs. By utilizing
broadband design techniques for the High Power PA – 2nd Version, the effect of the
small signal deviations on the large signal performance of the PA was eased and,
therefore, the discrepancies between the simulated and measured results were
minimized.
Further, the use of the resistive biasing in the High Power PA – 1st Version has
shown large signal performance deterioration. This is mainly due to the collector
current decrease in the PA by the increase in input power. In the High Power PA – 2nd
Version the presented current source (Section 3.1.3) was utilized. The observed
measured results verified the functionality of this current source (Fig. 89).
At the large signal level, these PAs were matched at the saturation level for
simultaneous maximum Psat and PAE (in comparison with the OP1dB in the previous
PAs). This is mainly due to the much larger 1dB contour around the Psat in
comparison with the OP1dB. With these techniques, the designed PAs achieved
18 dBm Psat, 14% PAE and 16 dB gain with around 0.19 mm2 active chip size.
Furthermore, a survey of the (currently) state-of-the-art publications (at
60 GHz and 77 GHz) shows an almost linear relationship between the Psat and PAE of
the PAs. It can also be seen that the PAE decreases as the Psat increases (Fig. 92), and
vice versa. For 60 GHz PAs, the PAE decreases from 20% at 15 dBm [35] to 6.3% at
SiGe HBT Power Amplifiers
Amin Hamidian 73
23 dBm (differential) [39]. By placing this PA (High Power PA – 2nd Version) on this
plot, the credibility of this design technique can be proven. Table. 13 compares these
PAs with the other published PAs. In this table, the PAs are sorted based on their
operating frequency and output power.
Fig. 92 PAE vs. Psat for the state-of-the-art PAs and High Power PA – 2nd Version
* High Power PA – 2nd Version
Table. 13 Comparison of our work with previously published PAs
Ref.
Freq.
[GHz]
Mode2
S213
[dB]
3 dB
BW4
[GHz]
OP1dB
[dB]
Psat
[dBm]
PAE
[%]
VCC
[V]
Total
Size
[mm2]
[15]
60
Single
8.6
51 - 69
12
14
9.2
3.3
0.36
[11]
60
Single
20
50 – 68
12.5
15
15
3.3
0.41
[11]
60
Single
19.5
52 – 70
14
15
12
3.3
0.42
[16]
60
Single
14.2
58 - 70
13.2
15
6.3
3.3
0.67
[62]
60
Bal.
11.5
–
11.2
15.8
16.8
–
–
[61]
60
Diff.
31
–
12
17.4
9.2
4
0.5
[12]
60
Single
16.5
59 – 70
13.2
17.5
11
3.3
0.53
[61]
60
Diff.
31.7
–
13.6
17.9
7.5
4
0.5
[12]
60
Single
15
59 – 70
14
18
14
3.3
0.53
[38]
60
Diff.
18
58 – 65
13
20
12.7
4
0.98
[39]
60
Diff.
20
–
–
23
6.3
4
3.42
[35]
61
Single
18.8
–
14.5
15
20
3.3
0.8
[16]
64
Single
17
58 - 70
13.8
15
8.5
3.3
0.67
[38]
64
Diff.
19.5
58 – 65
10.5
18
8
4
0.98
[61]
66
Diff.
21.4
–
15.5
18.4
11.5
4
0.5
[59]
66
Diff.
22.8
–
17.1
19.1
10.2
4
0.5
[61]
77
Diff.
–
–
–
18.5
5.4
–
–
[58]
77
Single
–
–
14.5
14.5
15.7
–
0.15
[36]
77
Single
17
–
10.2
17.5
12.8
–
0.61
1 Single ended, differential and balanced mode of operation
2 The small-signal gain
3 Bandwidth
4 CMOS PAs
In this chapter, the design, realization and measurement of different PAs on
the low power bulk 90 nm CMOS technology are studied. In the same way as with the
HBT PA design, firstly, to select the optimum transistor size, biasing voltages and
topology, many PA design considerations are investigated. In the first section of this
chapter, these design considerations are introduced. In the second section, the
designed and realized PAs are demonstrated with a comparison of their simulated and
measured results. Finally, the third sections conclude this chapter.
4.1 CMOS PA Design and Considerations
As explained in the previous chapter, many considerations must be taken into
account for the mm-wave HBT PA’s design. Some of these considerations are
common between CMOS and HBT PA design procedures, including pre-amplifier
transistor size selection, the broadband design and load- and source-pull simulation
setups. Despite these similarities in the design procedure, due to intrinsic differences
between the CMOS and HBT transistors, some considerations cannot be the same.
Among these considerations, the power stage transistor size and the PA topology
selection are the most prominent ones.
In this section, each of these two considerations is studied in detail and their
results are used in the design of the desired PAs.
4.1.1 Transistor Size Selection
In order to design a power amplifier, it is important to select the correct
transistor size, which requires the selection of the optimum values for their length,
width and NoF. Usually, the length of the transistors can be selected as small as
possible so as to achieve the maximum ft and fmax. However, selection of the width
and the NoF can depend upon many different factors, including:
Transistor core
Output power
PAE
Gain
Stability
Input and output impedances
In this section, the effect of the parasitic elements of the PA core on the RF
performance of the transistors is studied. Further, the relation between transistor size
and the large and small signal performance of the transistor is investigated. Moreover,
the optimum transistor size for a low loss matching network design is determined.
Finally, an optimum range for the transistor width and the NoF is suggested.
CMOS Power Amplifiers
Amin Hamidian 75
4.1.1.1 Transistor Core
Although, the transistor core is among the smallest parts of the PA, the
parasitic elements of its passive structure can have a massive effect on the
performance of the PA. This is mainly due to the low impedance of large PA
transistors (usually around 10 Ω or less in a 90 nm CMOS), which can be easily
affected by the intrinsic parasitic elements of the PA core, especially at higher
frequencies [15].
Adding the EM simulated core (Fig. 93a) to the simulation usually results in a
higher stability factor, which means a lower knee frequency point (the point where the
stability factor becomes more than 1) for GMAX. Fig. 93 compares the MSG at 60 GHz
with and without the EM simulated core for different transistor widths. Fig. 93b
shows that by adding the EM simulated core, GMAX sharply drops for transistor sizes
above 75 µm while without the core GMAX remains constant up to 90 µm.
(a)
(b)
Fig. 93 a) HFSS 3D view of the transistor core. b) Simulated maximum stable gain with and
without EM simulated core for 3 µm finger width (W) at 60 GHz and VDD = 1.2 V.
4.1.1.2 RF Performances
The RF performance of the transistor can be divided into two main categories
of large and small signal characteristics. These transistor performances are a function
of different parameters, such as ft, fmax, GMAX, stability and breakdown voltage. These
parameters can be modified by the intrinsic and extrinsic parameters of the transistors:
Intrinsic:
o Channel length
o Substrate conductivity
o Electron mobility
o Transistor technology (e.g. CMOS, Bipolar, LDMOS, etc.)
Extrinsic:
o Transistor size
o Biasing conditions
Although the intrinsic parameters have a more prominent effect on the
transistor performance, the large and small signal performances can also be modified
by extrinsic parameters. For example, ft and fmax deteriorate with increasing the
transistor size and they usually show the peak value for a specific biasing condition.
CMOS Power Amplifiers
Amin Hamidian 76
On the other hand, the power capability increases with increasing the transistor size
and drain current density, which will also be limited by the parasitic elements of the
larger transistors and their electron mobility. Finally, GMAX is a function of ft and fmax,
the frequency of operation and the RF power level at which the transistor is operating.
In the PA design, and depending upon the required output power and gain,
different combinations of the above mentioned parameters could serve as the
optimum selection. For example, during power stage design, high POUT and average
gain are the main requirements. Based on these requirements, larger transistor sizes
and higher current densities can be selected. In contrast with the power stage, for the
pre-amplifier stage a high gain and a medium or low POUT are required. In this case,
smaller transistor sizes and lower current densities can be selected.
In this section, the detailed large and small signal characteristics of the 90 nm
CMOS transistor (provided by TSMC foundry) are studied. Based on this study, a
range of transistor sizes for high gain, POUT, and PAE are introduced.
4.1.1.2.1 Large Signal Performance
The most important characteristics of PA are POUT and PAE. In an ideal case,
by increasing the transistor size the POUT increases linearly while the PAE remains
constant. However, this is not the case in reality. Fig. 94 presents the Psat and PAE of
a single transistor with the EM-simulated core for different sizes (W and NoF). To
calculate the maximum Psat and PAE, the transistor is terminated in each case with its
optimum input and output impedances (determined by load- and source-pull
simulations). As shown, Psat decreases for total transistor widths of more than 120 µm
(Fig. 94a) while PAE decreases for a total transistor width of more than 100 µm (Fig.
94b). Table. 14 and Table. 15 present the different combinations of NoF and W with
which the maximum Psat and PAE can be achieved.
(a)
(b)
Fig. 94 Large signal simulations for various W and NoF @ 60 GHz
for Vg = 1 V and VDD = 1.2 V. a) Psat. b) PAE.
Table. 14 NoF and finger width (W) for maximum PAE (Simulation)
W
NoF
PAE max
2 µm
44
20.5%
3 µm
32
21.5%
4 µm
24
21%
5 µm
18
20
CMOS Power Amplifiers
Amin Hamidian 77
Table. 15 NoF and finger width (W) for maximum Psat (Simulation)
W
NoF
Psat
2 µm
60
13 dBm
3 µm
44
13 dBm
4 µm
34
13 dBm
5 µm
26
13 dBm
4.1.1.2.2 Small Signal Performance
As the POUT of the mixers and modulators are often quite low, high gain PAs
are required to be able to drive the output of the PA into Psat or up to the P1dB level.
The gain of the PA can be increased by increasing the number of the amplifier stages
and optimizing the transistor size and current density. Increasing the number of stages
can result in a larger PA chip size, but it eases the complexity of the PA design, which
is mainly due to the lower gain requirement from the power stage. On the other hand,
the optimum transistor size and current density selection can decrease the number of
stages and minimize the chip size. It should be noticed that the transistor gain is
limited by GMAX (dependent upon the technology) and also that this optimization may
result in poorer power performance. In this case, by enabling a tradeoff between the
power stage performance and number of pre-amplifier stages, the transistors of the
power stage can be selected for medium gain and high POUT, while the transistors of
the pre-amplifiers can be optimized for maximum gain and moderate POUT.
To find the optimum condition, the GMAX of the transistor at 60 GHz is plotted
(Fig. 95) for various total widths and current densities. Within this plot, the single
finger width of the transistor is 3 µm and the total width of the transistor is varied by
changing the NoF. The blue dashed line indicates a stability factor less than or equal
to one. All the points below the blue dashed line have a stability factor of more than
one. Furthermore, by increasing the current density of the transistor, the stability
factor increases. This can result in a knee-point condition (Fig. 95) in the GMAX plot,
where the gain drops rapidly. Based on the discussion in [74], the GMAX value for
stability factors higher or lower than one can be calculated as follows:
For stability factor of less than one, GMAX can be calculated from (17). As the
stability factor becomes more than one, a new pole appears (18), which results in a
rapid decrease in the GMAX value.
Based on Fig. 95, for a stability factor close to one (the blue dashed line) and
for current densities of more than 100 µA/µm (where the transistor reaches the
saturation), a flat GMAX - around 8 dB for this technology - can be achieved at
60 GHz. In this case, and for the better power gain performance of the amplifier, the
transistor size and current density can be selected for stability factors close to one. It
should be considered that, due to low quality factor of the passive structures, by
adding the matching network the stability factor will further increase. Finally, as
(17)
(18)
CMOS Power Amplifiers
Amin Hamidian 78
shown in Fig. 95 for GMAX better than 7 dB and current densities higher than
100 µA/µm, a total transistor width of less than 90 µm should be selected.
As is already known, the total width of the transistor is a function of finger
width and the NoF, but the series gate resistance has a direct relation with the finger
width and an indirect relation with the NoF. By increasing the finger width, the series
resistance of each finger increases, which results in higher stability factors. Fig. 96a
presents the stability factor versus the total width of the transistor for various finger
widths. As can be seen, the stability factor is quite sensitive to the finger width.
Unlike the stability factor sensitivity to the NoF (Fig. 95) and finger width
(Fig. 96a) of the transistor, the CMOS transistor shows less sensitivity in its stability
to the current density. As shown in Fig. 96b, at a single total width, the stability factor
varies by less than 10% from 100 μA/μm up to 600 μA/μm current densities.
Based on the discussion in this section and the previous section, and
depending upon the required POUT, the correct transistor size and current density can
be selected for the maximum PAE and gain.
(a)
(b)
Fig. 96 Stability factor vs. the total transistor width, a) finger width for 200 µA/µm current
density. b) Current density for 3 µm total width.
Fig. 95 Simulated GMAX vs. transistor size and current density at 60 GHz for W= 3 μm for
each transistor finger and VDD = 1.2 V.
CMOS Power Amplifiers
Amin Hamidian 79
4.1.1.3 Transistor Size vs. Matching Network
The power performance of the PA is a function of the transistor size and the
quality factor of the matching networks. In order to realize high quality factor-
matching networks on-chip with low substrate resistivity, a precisely modeled passive
component with shielding structures is required. However, this may not be enough for
the matching of very low impedance transistors. Low impedance transistors (large
width) require more than a one-stage matching network for high quality factor design
[74]. The complexity of this matching network, especially of mm-wave frequencies,
can result in further quality factor deterioration and also in discrepancies between
simulation and measurement due to unseen parasitic and coupling elements in
simulation. Fig. 97 presents the transistor input and output impedances for various
transistor widths. For these terminal impedances, the transistor can deliver the
maximum output power. With this technology, and in order to achieve a less
complicated matching network, especially at the output of the PA the transistor sizes
around 40 µm to 50 µm can be selected.
Fig. 97 Simulated optimum input and output impedance at 60 GHz and VDD = 1.2 V.
4.1.2 Topology
C.S. and cascode topologies are the two common topologies utilized in the PA
design. The cascode topology provides a better isolation between output and input
ports, which will improve the stability of the circuit and facilitate the matching
network design. In addition, the cascode topology can have a higher power gain than
the C.S. topology as, for the same current gain, the cascode topology provides a
higher output impedance (dependent upon the technology) and, hence, a higher power
gain. In HBT technology, the cascode topology can provide higher output power (two
times or higher) as the base of the common base transistor is connected to a very low
ohmic RF ground (Section 3.1.3). The increase in output power is mainly due to the
nature of the breakdown voltage in bipolar transistors, which varies by the base
impedance [53]. Unlike the HBTs, in the two-well CMOS technology the cascode
topology does not help in improving the breakdown voltage and, hence, the output
power. In this case, to increase the drain voltage (more than 1.2 V), the triple well
CMOS transistors are necessary, though this introduces more parasitic elements and
can deteriorate the transistor performance.
CMOS Power Amplifiers
Amin Hamidian 80
By having the drain voltage fixed at 1.2 V, the C.S. topology can deliver a
higher voltage swing (Fig. 98) at the output and thus a higher output power than the
cascode topology. Due to these issues, the C.S. topology has been selected for our
designs.
(a)
(b)
Fig. 98 The maximum voltage swing a) C.S. b) Cascade.
4.1.3 Conclusion
In this section, various considerations for the 90 nm Si CMOS PA design are
investigated. These investigations have been divided into two parts, namely the
transistor size and the topology of the PA selections. In the first part of these
investigations, the importance of the transistor passive core in simulation was shown
and the large and small signal behavior of the transistor and the matching network
restrictions were studied. Based upon these studies, different transistor sizes were
selected for optimum large and small performances and the optimum matching
network design.
In this case, for optimum large signal performances, the optimum transistor
size for the maximum PAE is around 95 µm (Table. 14), while for maximum Psat
transistor sizes of more than 115 µm (Table. 15) can be selected. In the small signal
investigation, transistor sizes of less than 90 µm display GMAX better than 7 dB.
Finally, for the optimum matching network design (to 50 Ω terminal impedance), the
transistor sizes between 40 µm and 50 µm are the most appropriate. In this case, and
based upon the PA requirements, a tradeoff between the large and small signal
performances and matching network complexity must be made.
Further, different topologies (C.S. and cascode) were investigated for this
technology. It has been shown that, by using a two-well transistor technology, the
maximum VDD cannot be increased to more than 1.2 V in either of the topologies and,
hence, the C.S. topology shows a better output power in comparison with the cascode
topology.
CMOS Power Amplifiers
Amin Hamidian 81
4.2 Realized V-Band Si CMOS Power Amplifiers
In this section, two different V-band CMOS power amplifiers are presented.
The two PAs are designed, realized and measured. The PAs are designed to satisfy the
system requirements (defined in Section 5.1.1).
In order to achieve a higher output power, different power combining
techniques must be applied. The most common techniques for the mm-wave CMOS
technologies are Wilkinson power combining [78], transformer-based PAs [81] and
distributed active transformers [84]. In this section, first, the two power combining
techniques are studied and two PAs based on these techniques are realized.
4.2.1 Wilkinson CMOS Power Amplifier
In this work, a fully integrated 60 GHz two-stage power amplifier for high
data-rate wireless communication is presented [8]. All the matching networks are
designed on the top metal layers with SCTL structures [7]. The two-stage C.S. PA
was optimized for high POUT, gain and PAE. These goals were achieved through
source- and load-pull simulations and optimum transistor size selection.
The transistor sizes were selected based on the discussions in section 4.1.1 and
section 5.1.1. Based on the discussion in section 5.1.1, around 10 dBm POUT is
required. Moreover, as shown on section 4.1.1, this power is only 2 dB less than the
maximum achievable POUT from the single transistor. This means that a large
transistor size is required and, hence, that the PA-matching with this transistor size
might result in poor gain performance and a complicated matching network. To ease
the requirement on the PA design, a power combining technique is utilized to
decrease the required POUT from each individual PA.
Moreover, in order to be able to use larger transistor sizes for higher POUT
performance, the output and input impedances of the PA are matched to 16 Ω instead
of 50 Ω. This technique allows the use of larger transistor sizes with simpler matching
networks with higher quality factors. The 16 Ω impedance is later transformed to
50 Ω impedance at the output.
Further, the Wilkinson power combining technique is utilized in the design for
POUT enhancement. Utilizing GCTL and SCTL structures (Section 2.3.2 and [7]) for
the Wilkinson combiner’s design resulted in low combining losses. Moreover, the
Wilkinson power combiner was used as a part of input- and output-matching networks
to match the 16 Ω at the terminals of the PA to 50 Ω at the input and the output. The
simplified block diagram of the complete power amplifier is presented in Fig. 99.
Using a C.S. topology (Section 4.1.1) and power combining, the PA achieved
11 dBm Psat, 9 dBm OP1dB and more than 8 dB small signal gain with a peak PAE of
6%. The broadband performance of the gain was achieved utilizing the cascaded
structure [11]. The detailed design procedure and the achieved measurement results
are presented in this section.
Fig. 99 The PA block diagram.
CMOS Power Amplifiers
Amin Hamidian 82
4.2.1.1 Power Amplifier Design
The schematic of the realized PA is shown in Fig. 100a. The designed PA is
matched at the output for the maximum linearity to 16 Ω with the help of load-pull
simulation. Moreover, the size of the PA transistors was selected based on the
discussion in section 4.1.1.1 for the optimum matching to 16 Ω and maximum power
performance. The input-matching network is designed for broadband performance in
order to cover the entire required band around 60 GHz. In addition, the inter-stage
matching network is designed, based on the idea introduced on section 3.1.6 ([11]),
for broadband gain performance. The matching was designed utilizing the low loss
SCTL (Section 2.3.2). To avoid the critical impact of the capacitor quality factor on
the PA performance, the DC block capacitors are fixed at 300 fF.
The chip micrograph of the complete PA is presented in Fig. 100b. The total
chip size, including all the RF and DC pad structures, is 0.76 mm2. The active area of
the total chip (without pads) is 0.45 mm2.
In this section, the complete PA design procedure is presented. First, the
design of the power stage and the pre-amplifier are explained. Finally, the design of
the Wilkinson power combiner with the required terminal impedances is investigated.
(a)
(b)
Fig. 100 a) Schematic of the single PA. b) Chip photo with total chip size of 0.76 mm2.
CMOS Power Amplifiers
Amin Hamidian 83
a) Power Stage: As mentioned in section 5.1.1, around 10 dBm is the required
POUT from the PA. Since the Wilkinson power combiner was utilized, the required
POUT from each individual PA is lower. In this design, by considering less than 1 dB
combining loss for the Wilkinson power combiner, each power stage can be designed
for 8 dBm POUT. In this work, each PA is designed with 8 dBm POUT at around its
OP1dB point. Furthermore, the output of the power stage was matched near the
saturation power level for the maximum OP1dB while its input was matched to the
output of the pre-amplifier for the maximum gain.
In the first step, the transistor size was selected based on the discussion on
section 4.1.1. By assuming 3 dB differences between the OP1dB and Psat and a 1 dB
loss of the matching network and interconnections, the transistor size can be selected
for 12 dBm Psat. As shown in Fig. 94a, by selecting a transistor width around 75 µm,
the maximum POUT around 12 dBm can be achieved. However, this transistor size is
much larger than the optimum transistor size for 50 Ω matching. As discussed earlier,
to simplify the matching network design and improve its quality factor, the input and
output of the PA are matched to 16 Ω. The 16 Ω impedance will later be transformed
50 Ω with the help of the Wilkinson power combiner.
The finger width, NoF and current density of the power stage can be selected
from the discussion in the CMOS transistor size selection section (section 4.1.1).
Based on Fig. 95 for the stability factor near to one current density around 400 µA/µm
is required. In order to achieve the maximum POUT from the power stage, current
densities above 400 µA/µm should be selected. Simulating the graph in Fig. 96a for
this current density shows that 25 NoF and a 3 µm finger width is optimum.
Based on this transistor size and the current density, and with the help of the
load- and source-pull simulation setup, the optimum load and source matching
networks were designed. Fig. 101 presents both the large and small signal load-pull
simulations at 60 GHz for a single power stage with a matching network. As
motioned earlier, in order to select larger transistor sizes and keep the matching
network simple, the output of each PA was matched to 16 Ω. As shown in Fig. 101a,
the PA has a complete large signal matching at the saturation power level. Despite the
large signal matching, the small signal matching stays inside the 10 dB matching
circle (Fig. 101b).
(a)
(b)
Fig. 101 Load-pull simulation of the PA after matching on the 16 Ω Smith chart and
@ 60 GHz: a) At Psat. b) At small signal.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps @Psat and 0.2% @ small signal.
CMOS Power Amplifiers
Amin Hamidian 84
b) Pre-amplifier: The size of the pre-amplifier transistors (60 μm) was
selected slightly smaller than the power stage. Besides the transistor size scaling for
the pre-amplifier, its current density has also been scaled. In this case, the current
density of the pre-amplifier transistor was selected around 250 μA/μm, which is
around one and a half times less than the current density of the power stage.
In order to increase the tolerances of the PA against the process variations, the
inter-stage matching network was designed for the broadband performance of the PA
gain (Section 3.1.6).
c) Wilkinson Power Combiner: The symmetrical input and output Wilkinson
power combiner-divider (Fig. 102b) was designed with the introduced transmission
lines (Section 2.3.2). The complete structure was simulated with the help of the 3D
EM simulator Ansoft HFSS (Fig. 102a). The design shows a combiner loss of less
than 1 dB and better than 10 dB output-matching from 55 GHz up to 65 GHz
(Fig. 102c). The Wilkinson power combiner is designed to have 16 Ω impedance at
the input ports and 50 Ω impedance at the output. As mentioned before, this facilitates
the matching network design and improves the output power of the amplifier. The
total on-chip size of the Wilkinson combiner is 0.15 mm2.
(a)
(b)
(c)
Fig. 102 a) Wilkinson combiner. b) Simulated results of the Wilkinson combiner.
CMOS Power Amplifiers
Amin Hamidian 85
4.2.1.2 Measurement vs. Simulation
Both large and small signal measurements were performed on-wafer. The
measurement setup is the same as that introduced in [12]. All the measurements were
carried out at room temperature (23 C) for various bias points. The following sections
describe the small and large signal measurement results and their comparison with the
simulation.
a) Small Signal Results: Fig. 103 presents the simulated and measured small
signal results of the realized PA. The power stage and the pre-amplifier were biased at
1.2 V with 1 V gate voltage for the power stage and 0.8 V for the pre-amplifier. Due
to the good small signal modeling of the transistors [9] and the accurate modeling of
the passive components [7],[10], the comparison between simulation and
measurement shows good agreement.
As shown in Fig. 103a, input-matching values better than 15 dB were achieved
for the whole band (57 GHz to 65 GHz). Moreover, output-matching values better
than 10 dB were achieved at around 60 GHz. Due to the low isolation in the C.S.
topology, and as expected, the PA exhibited only 20 dB isolation between output and
input terminals (Fig. 103b). Finally, by utilizing the design technique introduced in
[11], a broadband performance of the transducer gain was accomplished. As shown in
Fig. 103b, the PA displays almost flat gain, from 57 GHz up to above 70 GHz, with a
peak gain of 8.7 dB at around 59 GHz.
(a)
(b)
Fig. 103 Small signal simulation and measurement. a) Matching. b) Gain and S12.
CMOS Power Amplifiers
Amin Hamidian 86
b) Large Signal Results: The large signal measurement was performed at three
different operating frequencies (55 GHz, 60 GHz and 65 GHz). Fig. 104a-b present
the large signal measurement results at 60 GHz with the same biasing condition as the
small signal measurement. The large signal measurement results also show good
agreement with the simulated results up to OP1dB of the PA. From Fig. 104a it can be
seen that the PA exhibits more than 8 dB gain with 9 dBm OP1dB and more than
11 dBm Psat.
Furthermore, under this biasing condition PA consumes around 100 mW DC
power at the saturation level, resulting in more than 6% peak PAE and 10% drain
efficiency (Fig. 104b). The detailed performance of the PA for each measured
frequency is presented in Fig. 104c.
(a)
(b)
(c)
Fig. 104 Large signal simulation and measurement. a) Power. b) Efficiency. c) Large signal
measured results at three different frequencies.
CMOS Power Amplifiers
Amin Hamidian 87
4.2.2 Transformer CMOS Power Amplifier
In this work, the design of transformer-based power amplifiers was
investigated [1]. For this purpose, a new scalable model for on-chip transformers is
introduced (Section 2.3.3). The modeling technique is also validated for 90 nm LP
CMOS technology by comparing measured and simulated results. Due to the high
accuracy and scalability of the model, a faster and more accurate design procedure for
a high performance transformer-based power amplifier design is achieved. The
measured results of the power amplifier show 22 dB gain, 14 dBm saturated output
power, 12 dBm output power and a 1dB compression point at 60 GHz with
0.065 mm2 active chip size.
The high POUT requirement for 60 GHz CMOS application required the
utilization of power combining techniques or array structures. In each case, to
minimize the total chip area, the size of each PA must be minimized. Fig. 105
compares the trend of Psat and OP1dB versus power-stage-chip-size (the active chip
size divided by the number of stages) for published state-of-the-art CMOS PAs.
Estimations show a faster POUT drop for power-stage-chip-sizes of less than 0.015
mm2. Based on Fig. 105, 14 dBm Psat and 12 dBm OP1dB with 0.015 mm2 are quite
feasible. Although these results are 4 times less than the results published in [78], the
active chip size of the power stage is 20 times smaller.
Fig. 105 The OP1dB and Psat of the state-of-the-art PAs vs. the power stage size (Active chip
size divided by number of stages).
* Estimated chip size
In recent years, developments in transformer-based CMOS PA designs have
shown the capacity for chip size minimization without noticeable POUT degradation
[77]. To ease the use of transformers in mm-wave circuit design, scalable models for
transformers have been developed by different circuit designers [76]-[77]. In this
work, the developed scalable model (Section 2.3.3) for on-chip transformers has been
utilized in the design of a 60 GHz PA. In the first section, the design of this
transformer-based 60 GHz PA - with the help of this model - is investigated. In the
CMOS Power Amplifiers
Amin Hamidian 88
second section, the measured and the simulated results of the realized PA are
compared to validate the design procedure.
4.2.2.1 Power Amplifier Design
Based on the modeled transformer, a high performance 60 GHz PA has been
designed. Four stages with a C.S. topology (Fig. 106a) were selected for better gain
and POUT (Section 4.1.2). In order to avoid source degeneration caused by the parasitic
elements of the ground plane, the sources of the differential transistor pairs in each
stage are connected as closely as possible to each other.
All the pre-amplifiers are designed with the same transistor sizes but with
different biasing. The first two-stages are biased with 200 µA/µm, the third stage with
300 µA/µm and the power stage with 450 µA/µm drain current densities. The chip
micrograph of the PA is shown in Fig. 106b with 0.065 mm2 active chip size.
(a)
(b)
Fig. 106 a) The schematic of the transformer-based PA. b) Chip micrograph of the realized
PA with 0.065 mm2 active chip size and 0.27 mm2 total chip size.
The design procedure for the power stage (the last stage) is shown in Fig. 107.
In this Smith chart, the optimum input and output impedances (ZIN and ZOUT) of the
transistor with differential structure, including the transistor core versus the transistor
size, are presented. In addition, by using (15), all those impedances that can be
transformed to 50 Ω impedance using the introduced transformer model are calculated
(the yellow circle in Fig. 107). Based on this calculation, any transistor sizes larger
than 70 µm (for each transistor) can be matched at small and large signal levels to
50 Ω impedance using the introduced transformer. Although larger transistor sizes are
required for higher POUT, due to intrinsic parasitic elements of the transistor and ft and
fmax drop, the maximum achievable POUT in this technology is limited and remains
almost constant for transistor sizes above 120 µm (Section 4.1.1). In this design, by
considering Fig. 107 and performing a tradeoff between the gain, POUT, PAE and the
size of the transformer, the power stage transistor size is selected
(Fig. 106a). By considering the size of the power stage transistors, the rest of the PA
is designed with the same technique.
CMOS Power Amplifiers
Amin Hamidian 89
Fig. 107 Optimum power stage transistor sizes for transformer-based matching.
As the output of the power stage has been matched at the large signal level, a
very good output-matching near the saturation level is achieved (Fig. 108a). Despite
the large signal matching of the PA, the small signal matching stays inside the 10 dB
matching circle (Fig. 108b).
(a)
(b)
Fig. 108 Load-pull simulation of the PA after matching @ 60 GHz:
a) At Psat. b) Small signal.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps @Psat and 0.2% @ small signal.
CMOS Power Amplifiers
Amin Hamidian 90
4.2.2.2 Measurement vs. Simulation
Small and large signal measurements are performed on-chip and at room
temperature up to 67 GHz. The measurement setup is the same as that introduced in
[12]. In all the measurements, the PA consumes 200 mA from a 1.2 V supply voltage.
The small signal measured results show good agreement with the simulated results. A
small signal gain of around 22 dB and with more than 10 dB matching at both input
and output terminals was achieved at around 60 GHz (Fig. 109).
Fig. 109 Measured and simulated S-parameter results of the PA.
Fig. 110a presents the large signal measured and simulated results of the PA at
60 GHz with good agreement up to Psat. The measured PA achieves around 12 dBm
OP1dB and 14 dBm Psat with 10 % PAE.
The large signal performances of the PA are also measured for four
IEEE 802.15.3c channels. The PA shows a relatively constant OP1dB and Psat for all
four channels, which is appropriate for broadband application at 60 GHz (Fig. 110b).
The output third-order intercept point (OIP3) is also measured for both upper
and lower harmonics at 10 MHz and 1 GHz frequency offsets. The measured results
show around 18 dBm OIP3 for all four measured channels (Fig. 110b).
(a)
(b)
Fig. 110 a) Large signal measured and simulated results vs. power at 60 GHz. b) Measured
linearity and large signal for four IEEE 802.15.3c channels. The dash line is the upper
channel and the solid line is the lower one.
CMOS Power Amplifiers
Amin Hamidian 91
4.3 Conclusion
In this work, the design and optimizations of 60 GHz Si CMOS PAs on the
90 nm technology have been investigated. The investigations show the limitations of
the transistor size and topology (Section 4.1) for high power applications. The limited
output power of the transistors requires the usage of power combining techniques.
Two different types of on-chip power combiners (Wilkinson and transformer) were
studied in this work and, based on these power combiners, two different PAs were
designed, realized and measured.
In the first PA, and to improve the output power, a Wilkinson combiner was
designed and the outputs of two single PAs with a C.S. topology were combined. The
designed Wilkinson combiner transfers the 16 Ω at the input ports to 50 Ω at the
output, which facilitates the matching network design and improves the power
performance of the PAs. All the matching networks and Wilkinson combiners were
designed with the help of low loss shielded coplanar transmission lines (Section 2.3.2)
for the further minimization of the combining losses. The utilization of a full chip EM
simulation led to a good estimation of all the parasitic elements and resulted in good
agreement between the simulated and measured results.
Although Wilkinson combining enhances the power performance of the PA,
due to the large size of this structure the resulting chip size is quite large. In order to
minimize the chip size and further improve the PA performance, a transformer-based
PA design was investigated. Unlike the Wilkinson combiner, transformers can play
the roles of DC feeding and matching besides power combining. This further
facilitates the DC feed and matching network design and results in much smaller chip
sizes. Further, due to the removal of the matching networks and DC feeds, the total
losses at the output of the transistors are much lower in this PA in comparison with
the Wilkinson PA. Also, as the source of the differential transistors in each stage is
placed as near as possible to each other, the RF ground at these points is almost
perfect and, hence, the source degeneration due to the parasitic elements of the ground
plane is minimized in the transformer based PA. These all together have resulted in
higher power performance of the transformer based PA in comparison with the
Wilkinson PA.
As a result of the above discussion, in the second part of this work a new
technique for transformer-based PA design is studied. For this purpose, a scalable
transformer model has been developed (Section 2.3.3). Thanks to the transformer
model accuracy and design procedure, a high performance PA was developed. The
realized PA, with 14 dBm Psat and 12 dBm OP1dB, agrees well with the trend shown in
Fig. 105. Moreover, the 0.065 mm2 active chip size makes this PA quite appealing for
on-chip power combining and array system design.
Table. 16 compares the designed PAs in this work with the currently published
state-of-the-art results with the 90 nm CMOS technology. As mentioned earlier, due
to lower combining losses and a less complicated matching network and DC feed in
the transformer-based PA (in comparison with the Wilkinson PA), the achieved
performance of the transformer-based PA is much better.
Further comparisons demonstrate the much smaller size of the designed
transformer-based PA in comparison with the other PAs. In comparison with [78], the
transformer-based PA has a more than 20 times smaller chip size with only 4 times
less output power. Also, and in comparison with [83], this PA has a more than 6 times
CMOS Power Amplifiers
Amin Hamidian 92
smaller chip size with 3 times less output power. In addition, by comparing this work
with the other state-of-the-art transformer-based PAs ([77] and [81]), it can be
observed that with almost the same chip size, higher gain, Psat and OP1dB have been
achieved. As this technology does not provide high quality capacitors, the usage of
the neutralization network has been avoided and, hence, the achieved PAE in this
work is slightly lower than the state-of-the-art results.
Table. 16 Comparison of our works with previously published PAs
REF
Gain
[dB]
Psat
[dBm]
OP1dB
[dBm]
PAE [%]
VDD [V]
Active
Chip size
[mm2]
[78]
20.6
19.9
18.2
14.2
1.2
1.4
[83]
15.5
18.5
N.A.
10
1.2
0.4
[60]
4.2
14.2
12.1
5.8
1
0.85
[1]
22
14.5
12
10
1.2
0.065
[77]
5.5
12.3
9
8.8
1
0.24*
[87]
20
12
8.2
9
1.2
0.65*
[60]
8.2
11.6
10.1
11.5
1
1*
[88]
16.3
11.5
10.5
8.5
0.9
0.16
[77]
13.8
11
N.A.
14.6
1.2
0.22
[8]
8
11
9
6
1.2
0.45
[81]
20
9.4
7
19.5
1.2
0.05
[87]
17
8.4
5.1
5.8
1.2
0.99*
[67]
9.6
7.6
5
4.3
1.2
N.A.
* Approximated from chip photo.
5 Transmitters
Two types of transmitter, heterodyne and ON-OFF-shift-keying (OOK), have
been investigated in this work. The transmitters are realized with 90 nm low power
CMOS technology. The characterizations and measurements show the functionality of
these circuits for different 60 GHz short-range data communication scenarios.
There are many advantages and disadvantages for each of these transmitter
topologies. Based on these advantages and the system requirements, the optimum
transmitter topology must be selected. In this case, a detailed study of each topology
is necessary.
The main advantage of the heterodyne transmitter lies in its bandwidth
efficiency. By utilizing complex modulation schemes, like 16QPSK, a much higher
bitrate for the same bandwidth can be achieved. The relation between bandwidth and
modulation scheme and bitrate can be formulated as follows:
(19)
In the above formula, α is the modulation factor (less than 2) and n is the
number of the bits per symbol. For example, for 5 Gbps in the BPSK system, an
8 GHz bandwidth (α = 1.8) is required while in a QPSK system the required
bandwidth is around 4 GHz (α = 1.6); in the 16QPSK system, for the same bitrate the
bandwidth can be as low as 2 GHz. These calculations reveal the importance of the
heterodyne topology for the scenarios where high data-rate communication in the
narrow frequency band is required.
Although the OOK transmitter suffers from bandwidth inefficiency, it has less
circuit complexity, lower DC power consumption and a smaller chip size in
comparison with the heterodyne transmitter. All these advantages are mainly because
of the lower number of components and the simpler system architecture of the OOK
in comparison with the heterodyne transmitter. The main components of the OOK
transmitter are an oscillator (without any PLL), a modulator (which can be as small as
a switch) and a medium power PA. The medium power requirement in the OOK is
mainly due to no back-off requirement in the modulation scheme.
In the first section, the design, realization and characterization of the
heterodyne transmitter is presented. The realized transmitter achieves between
13 dBm to 15.5 dBm POUT, 11 dBm to 14 dBm P1dB, 8% to 14% efficiency and 22 dB
to 30 dB power gain for all four channels defined in the IEEE 802.15.3c [32].
In the second section, the design, realization, characterization and system
measurements of the OOK transmitter are presented. This transmitter achieves 8 dBm
POUT, 9 dB gain and 17% efficiency with less than 36 mW DC power consumption.
The realized transmitter was further utilized in an OOK transceiver system setup,
where more than 6 Gbps was transmitted over a 4 m distance.
Finally, the last section concludes these works.
Transmitter
Amin Hamidian 94
5.1 Heterodyne Transmitter
The block diagram of the 60 GHz heterodyne Tx is presented in Fig. 111a.
The IF is selected at around 20 GHz and the LO at around 40 GHz, both based on
IEEE 802.15.3c [32]. The IF, LO, and RF frequencies are listed in Table. 17.
The first harmonics (𝐹𝐿𝑂 ± 𝐹𝐼𝐹) at the output of the mixer are 20 GHz and
60 GHz. In this topology, the RF signal (60 GHz) is selected far away from the image
signal (20 GHz), which can be damped down in the output using the transformer,
matching network and the gain of the PA (Fig. 111b-c).
(a)
(b)
(c)
Fig. 111 a) The block diagram of the Heterodyne transmitter. b) Output power of the Mixer.
c) Output power after the PA.
Table. 17 60 GHz frequency plan for IEEE802.15.3c standard.
Channel #
Center (GHz)
LO (GHz)
IF (GHz)
1
58.32
38.88
19.44
2
60.48
40.32
20.16
3
62.64
41.76
20.88
4
64.80
43.20
21.60
PA
Mixer
IF
20 GHz RF
60 GHz
LO
40 GHz
20 60
RF
Image
Transformers
and Gain of
the PA
20 60
RF
Image
Power [dBm]
Power [dBm]
Frequency [GHz] Frequency [GHz]
Transmitter
Amin Hamidian 95
5.1.1 Link Budget
The link budget must be calculated for different modulation schemes. This is
mainly due to the different SNR requirement for each modulation. The four IEEE
channels and the system plan for short-range data communication based on this
standard are presented in Fig. 112 and Fig. 113. By considering these values, the
minimum required POUT from the PA for each modulation scheme can be calculated
(Table. 18). Based on these calculations, in order to be able to transmit all these
modulation schemes over a 4 m distance, a minimum P1dB of around 10 dBm from the
PA is required.
Fig. 112 The four IEEE802.15.3c channels.
Fig. 113 System plan.
Table. 18 Link budget calculation.
Modulation Scheme
OFDM
BPSK
OFDM
QPSK
OFDM
16QPSK
OFDM
64QPSK
Units
Distance
4
4
4
4
m
Bandwidth
2.16
2.16
2.16
2.16
GHz
Antenna Gain Tx/Rx
14
14
14
14
dBi
RF packaging losses
Tx/Rx
3
3
3
3
dB
BB packaging losses Rx*
2
2
2
2
dB
Receiver noise figure
[91]
7
7
7
7
dB
Required SNR
2.5
5.5
12.1
16.7
dB
Required Tx Back-off*
10
10
10
10
dB
Min. Tx required POUT
-3.6
-0.6
6
10.8
dBm
Achieved bit rate*
0.756
1.512
3.024
3.402
-
* Defined in EASY-A project by the project partner IHP.
2.16 GHz
CH1 CH2 CH3 CH4
Board
≈ 1 dB Loss
40 GHz
Base Band
Signal
Generator
Tx G
S
G
Packaging
≈ 1 dB Loss Antenna
14 dBi Gain
Bandwidth
2.16 GHz
Noise Figure
7 dB
Base Band
Circuitry
Required SNR
for BER < 10-7
Depends on
Modulation
Scheme
PLL
S
LOS
1 m to 4 m Board
≈ 1 dB Loss 40 GHz
Rx
G
S
G
Packaging
≈ 1 dB Loss
Antenna
14 dBi Gain
PLL
S
Transmitter
Amin Hamidian 96
5.1.2 Circuit Design
The transmitter consists of two main circuits, a PA and an up-converter. To
minimize the LO leakage to the output, a Gilbert cell topology has been selected for
the up-converter. In order to be able to characterize it completely, the mixer was
realized and measured separately. In addition, the PA utilized in this work is the
extension of the PA presented in the previous section (Transformer CMOS Power
Amplifier).
Furthermore, in order to maximize the common mode rejection and the effect
of the ground parasitic element on the circuit’s performance, a fully differential
topology was selected for both circuits. In this case, and for ground parasitic
suppression, the emitters of each differential transistor pair are located as close as
possible to one another.
In this section, the detail design procedure of each circuit is presented.
5.1.2.1 Up-Converter
Fig. 114a presents the schematic of the Gilbert cell mixer. Because of
differential measurement limitations, differential-to-single-ended baluns are used at
all ports. The detailed design procedure of the baluns is presented on section 2.3.3
(Transformer Design). The high quality factor SCTL (Section 2.3.2) is also utilized in
the matching network circuits. Including the pads and baluns, the total size of the
mixer is 0.41 mm2 (Fig. 114b).
(a)
(b)
Fig. 114 a) Schematic of the mixer. b) Chip photo with 0.41 mm2 total chip size.
Transmitter
Amin Hamidian 97
The transistor sizes are optimized to meet the design requirements. In this
circuit, the T1 transistors are the IF amplifying transistors while the T2 transistors are
responsible for mixing the LO and IF signals. A co-design must be performed for the
T1 and T2 transistor size selections, as their performance is closely related to their
size. In this work, the size of the T2 transistor has been selected as the first
optimization point. Based on this selection, the optimum size for the T1 transistors
was calculated.
The LO switching transistors (T2) are selected based on Fig. 115. Fig. 115a
shows the simulation setup. In this setup, the VDD is set to 0.6 V, since in the
maximum VDS of the switching transistors in the Gilbert cell cannot exceed this value.
The gate was biased with 0 V for the off-case and 1.2 V for the on-case. By using this
setup, the ON-OFF impedance of the switch was calculated at the IF frequency
(around 20 GHz). A correct transistor size must have low impedance at the ON
condition while showing high impedance at the OFF condition.
The ON-OFF impedances of the transistor are calculated for various transistor
sizes. According to Fig. 115b-c, the transistor size with 3 µm width and 15 fingers
(NoF=15) shows simultaneously low ON impedance and high OFF impedance. As
each IF signal (drain of the T1 in Fig. 114a) is connected to two T2 transistors, a width
of 3 µm and NoF=8 can be selected for each T2 transistor.
(a)
(b)
(c)
Fig. 115 The T2 transistor output impedance vs. size. a) Schematic.
b) ZIN for OFF condition. c) ZIN for ON condition.
ZIN
LChoke
VDD=0.6 V
VDD=0...1.2 V
Transmitter
Amin Hamidian 98
Consequently, by selecting the T2 transistor size, the T1 transistor size can be
selected. In this case, the T1 transistors are optimized for the maximum output power
performance of the mixer. Fig. 116 shows the simulated saturation output power
performance of the mixer versus the transistor size while Table. 19 summarizes all the
transistor sizes in which the POUT is at its maximum. Due to process and layout
limitations, less transistor fingers are preferable. In this design, 20 fingers with 5 µm
width were selected for the T1 transistors. Finally, further optimization iterations show
minimum T1 and T2 transistor size changes from these values.
(a)
(b)
Fig. 116 a) Output power for various transistor sizes
(IF-power = 0 dBm & LO-power = 5 dBm). b) IF transistor layout.
Table. 19 The optimum transistor sizes for the maximum output power.
W (µm)
NF
Total Size
POUT (dBm)
2
48
96
-0.5
3
32
96
-0.5
4
24
96
-0.5
5
20
100
-0.5
As the next step, the mixer is matched at all the terminals to 50 Ω. The S-
parameter simulation of the mixer is presented in Fig. 117. The RF-matching is
designed as broadly as possible to avoid any frequency shift effect on the mixer
performance. Therefore, in this design an output-matching of greater than 15 dB was
the design goal over the entire V-band. In addition, the 10 dB IF and LO matching
bandwidth covers the IF and LO frequencies of the four targeted IEEE channels.
Fig. 117. Simulated S-parameter results.
Transmitter
Amin Hamidian 99
The IF, LO and RF transformers were utilized as a balun and a matching
network in this design. The 3D view and the S-parameter simulation of the IF-
matching network and the balun are presented in Fig. 118a-b. The inductor was
designed on M9 (UTM) for the maximum Q-factor. The size of the inductors was
optimized to have a 200 pH inductance value at around 20 GHz. An amplitude
imbalance of 1 dB and a phase imbalance of less than 10° was achieved at around
20 GHz.
(a)
(b)
Fig. 118 a) IF matching and transformer. b) S-parameter and phase imbalance simulation of
the IF matching network.
Transmitter
Amin Hamidian 100
5.1.2.2 Power Amplifier
The designed PA in this work is the same as the PA described on section 4.2.2,
with an extra pre-amplifier stage and some stability circuitries. The complete
schematic of this circuit is presented in Fig. 119. The parallel R-C network (R1 and
C1) was added between the third and the fourth stages to damp down the low
frequency oscillations. The network cut-off frequency can be calculated as follows:
The 6.6 GHz cut-off frequency is much lower than the minimum frequency of
the first channel (57.24 GHz) and still high enough to surpass all the low frequency
oscillations (near DC oscillations). The in-band stabilization was performed by using
source degeneration. This was done by adding small common mode inductors (L1) to
the source of the M2 transistors. The value of this inductor is around 5 pH.
All the transistor sizes from the first up to the fourth stage were the same.
Although the transistor width scaling for the pre-amplifier stages can improve the
PAE of the PA, as mentioned in section 4.2.2.1, and due to the design complications
of the scaled transistors, the drain current scaling was selected instead. In this case,
the drain current densities of the first three stages are selected at a very low level
(120 μA/μm). A medium drain current density was selected for the fourth stage
(300 μA/μm) and a high drain current density for the last stage (450 μA/μm).
Finally, a matching network (L2, L3 and C2) was added to match the output of
the PA at the large signal level (near the Psat of the PA). The load-pull simulations of
the PA at different power levels are presented in Fig. 120.
Fig. 119 PA schematic.
(a)
(b)
Fig. 120 Load-pull simulation of the PA after matching @ 60 GHz:
a) At Psat. b) Small signal.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps @Psat and 0.2% @ small signal.
M1
M1
M2
M2
VG1 VG2 VG5 VDD
VDD VDD
M1 = 90 nm × 4.5 µm × 18
M2 = 90 nm × 4.5 µm × 20
M1
M1
VG3
VDD M1
M1
VG4
VDD M1
M1
IN+
IN-
W = 5 µm
L= 188 µm W = 7 µm
L= 146 µm W = 7 µm
L= 146 µm
W = 10 µm
L= 160 µm
W = 10 µm
L= 236 µm
W = 7 µm
L= 156 µm
C1
R1
C1
R1
VG1= VG2 = VG3 = 0.75 V
VG4 = 0.9 VG5 = 1.1
VDD = 1.2 V
R1 = 80 Ω
C1 = 300 fF
C2 = 44 fF
L1
L1
OUT+
OUT-
L2L3
L2L3
C2
C2
L1 = 300 fF
L2 = 50 pH
L3 = 10 pH
Transmitter
Amin Hamidian 101
5.1.3 Experimental Results
Both the mixer and the PA were realized and measured separately. The
measured results of the PA (with three pre-amplifiers and a single output) have
already been introduced on section 4.2.2. In this section, firstly, the measured versus
the simulated results of the mixer are presented and compared. Finally, the results of
the whole transmitter are shown. The chip micrograph of the complete transmitter are
presented in Fig. 121.
Fig. 121 Chip micrograph with 0.6 mm2 (0.4×1.5mm2) chip size including pads.
5.1.3.1 Up-Converter
As mentioned earlier, the mixer was matched at all terminals to 50 Ω. The S-
parameter measured versus the simulated results of the mixer are presented in Fig.
122. The RF-matching is designed as broadly as possible to avoid any frequency shift
effects on the performance of the mixer. In this design, an output-matching better than
10 dB was achieved in the measurement for the entire required band. Moreover, a
higher than 10 dB IF- and LO-matching has been measured for all the four IEEE
channels.
The measurement setup includes two DC to 50 GHz HP 83650L signal
generators for the IF and LO sources, a variable attenuator and a R&S FSU spectrum
Fig. 122 Simulated S-parameter results.
Transmitter
Amin Hamidian 102
analyzer for DC up to 67 GHz. Fig. 123 presents the measured CG of different
channels and the PDC for various LO powers. At 4 dBm LO power, the measured
results show less than 1 dB CG variation from channel no.1 to no.4. The DC power
was 17 mW.
In addition, the large signal measurements were performed for various IF
power levels, at 14 mA (from 1.2 VDD) drain current and 4 dBm LO power. Fig. 124
compares the measured and simulated results of the up-converter for channel no.2.
The OP1dB around -9 dBm and the CG of -2 dB is achieved in the measurement. Due
to the careful modeling of all passive and active components, good agreement
between simulations and measurements was observed. Also, due to the carefully
designed mixer core and the small size of the T1 transistors, a very high LO-RF and
IF-RF isolation was achieved. Fig. 125 presents the measured isolation at the center
frequency of each channel. For all the channels, an isolation greater than 30 dB was
measured.
Fig. 126 presents the complete large signal performance of the mixer for all
four IEEE standard channels. The measurements were performed at the center
frequency of each channel. Due to the problems explained earlier, the mixer has
slightly less CG than the simulation in the entire band. A flat CG and OP1dB were
measured for all four channels, which makes this mixer appropriate for this
application. The performance summary of the mixer for all four channels is presented
in Table. 20.
Fig. 123 Measured GC and PDC versus LO
power and gate voltage.
Fig. 124 Measured large signal performance
at 60 GHz vs. IF power for channel No.2.
Fig. 125 Measured isolation for
IEEE802.15.3c channels.
Fig. 126 Measured large signal performance
for IEEE802.15.3c channels.
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Amin Hamidian 103
Table. 20 Performance Summary
Frequency band
57 GHz – 66 GHz
CG
-8 dB ± 1 dB
Psat
-8 dBm ± 1 dB
P1dB
-11 dBm ± 1 dB
PDC
11 mW (1.2 V)
5.1.3.2 Heterodyne Transmitter
The measured results of the complete transmitter show also a good agreement
with the simulation. Fig. 127 and Fig. 128 show the small signal matching at the
output terminal and the large signal performance of the second channel versus the
simulated results. The complete transmitter consumes around 250 mW. For 1 dB less
POUT, the power consumption can be decreased to less than 200 mW. Based on the
mixer measurement, the LO power was selected at around 3 dBm. Fig. 129 presents
the complete performance of the transmitter for all four channels. Furthermore, the
transmitter results are summarized in Table. 21.
Fig. 127 S-parameter results.
Fig. 128 Large signal performance at
60 GHz vs. IF power for channel No.2.
Table. 21 Performance Summary
Frequency band
57 GHz – 66 GHz
CG
31…21dB
Psat
15.5…13 dBm
P1dB
14…11 dBm
LO-RF Iso.
>45 dB
IF-RF+Image Iso
>45 dB
PDC
250 mW (1.2 V)
Fig. 129 Measured large signal performance
for IEEE802.15.3c channels.
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Amin Hamidian 104
5.2 OOK Transmitter
In recent years, different circuit topologies have been proposed for OOK
transmitter front-ends. In these designs, either the modulator and the PA are separate
components ([65] and [68]), or the modulator has been optimized for high output
power performance ([66] and [67]). Fig. 130a presents the general schematic of the
modulator designed in these works ([65]-[68]). Although these modulators have some
differences in their topologies, they are all mainly based on the DC current (ID)
switching of a single-ended or differential cascode amplifier. In [65] and [66], the
gate voltage of the common gate transistor in the cascode amplifier was utilized to
modulate the RF signal. Moreover, in [65], the cascode modulator was optimized as a
PA. Although this technique reduces the chip size due to the gate impedance of the
common gate transistor, it results in poor gain and power performance in the PA. In
[66], the modulator was biased for minimum DC power consumption and was
followed by a separate PA to improve the output power. This technique results in a
better gain and output power (>0 dBm) but requirs a larger chip size. In order to
improve the performance, a modulated current source and extra pMOS switch were
also added to this circuit [66]. The pMOS switch in this design improved the ON-OFF
transition by at least 80 ps in simulation. In [68]-[69], the modulator was designed to
have high output power (1.5 dBm). In this design, the RF and DC paths are separated.
The RF path includes two-stage C.S. amplifiers, while both amplifiers share the same
DC current. This helps with the minimization of the DC current consumption but
requires a higher drain voltage to improve the output power (1.8 V). Moreover, to
separate the baseband circuitries from the RF circuitries, a quarter-wave length line at
60 GHz was utilized. Using these long lines in the matching circuits resulted in a
larger chip size.
The other problem with these designs is the high frequency switching of the
drain current (more than 3.3 Gbps in [67]). In these topologies (Fig. 130a), the BB
signal switches the drain current (ID) on and off at the bitrate frequency. Since the
frequency of the BB signal (<10GHz) is much lower than the RF signal (60 GHz),
much larger RF ground capacitors (Fig. 130a) are needed on-chip to isolate the
biasing circuitry from the BB signal. If the RF GND cannot isolate the BB signal, the
impedance seen from the biasing circuitry can affect the ID waveform which can result
in RF leakage to the output in the OFF state and a lower signal level in the ON state.
This condition deteriorates as the transistor size increases, which limits the maximum
achievable POUT of this topology (a maximum of 1.5 dBm in [68]).
In order to overcome the above mentioned problems, the topology of the OOK
was modified. In the new topology, the modulator is completely integrated in the
matching network of the PA (Fig. 130b). In this design, transistor T2 is used as a
passive shunt switch. For a BB equal to 1, the T2 switch connects the RF path to
ground. This stops the RF signal from reaching the PA (T1 transistor) and vice versa
for a BB equal to 0. It must be considered that, in this design, the T2 transistor is part
of the PA-matching network. This means that, in an ideal case, for a BB equal to 0 the
input-matching of the PA must have a reflection coefficient near 0 and, for a BB equal
to 1, a reflection coefficient near 1.
In this topology, the modulator consumes no DC power and the drain current
(ID) of the PA is only a weak function of the BB signal. This helps to increase the T1
transistor size independently from the modulator performance, so as to improve the
output power of the transmitter. Finally, in order to improve the gain and the isolation
of the transmitter, a cascaded structure with two-stages was utilized (Fig. 130c).
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Amin Hamidian 105
(a)
(b)
(c)
Fig. 130 a) Conventional OOK modulator. b) Proposed OOK Tx circuit. c) OOK transmitter.
In this work, an ON-OFF shift keying transmitter front-end for 60 GHz
wireless communication is designed, realized and measured. The transmitter is
realized in 90 nm LP CMOS technology with a small chip size of 0.38 mm2 and DC
power consumption of only 36 mW. In order to enhance the transmitter performance,
a novel modulator topology is implemented. In this design, the modulator does not
consume any DC power and is completely integrated into the matching network of the
power amplifier. The power amplifier has been also designed for high gain and high
output power. With this design, more than 9 dB gain and 8 dBm Psat with 10% PAE
was measured at 61 GHz. By using this transmitter in a wireless system with an
external LO signal and horn antennas, data communication with bitrates higher than
6 Gbps over a 4 m distance were measured.
5.2.1 Link Budget
Due to the absence of a peak power-to-average ratio (PAPR) requirement in
the OOK system, a very high power PA is not a requirement for the OOK system. The
system plan of an OOK TRx is presented in Fig. 131. As mentioned before, based on
current publications, the expected receiver noise figure is around 7 dB [91] and the
minimum required SNR for the base band circuitry is around 15 dB [93] (for BER <
10-7). Based on these results, and in considering the system plan details (Fig. 131), at
4 m distance the minimum required POUT from the PA is around 3 dBm.
Fig. 131 Link-budget for the OOK system.
Board
≈ 1 dB Loss
60 GHz
Base Band
Signal
Generator OOK Tx
LOS
1 m to 4 m
G
S
G
Packaging
≈ 1 dB Loss
Antenna
14 dBi Gain
Bandwidth
7 GHz
Board
≈ 1 dB Loss
G
S
G
Antenna
14 dBi Gain Packaging
≈ 1 dB Loss
OOK Rx
Noise Figure
7 dB
Base Band
Circuitry
15 dB Required
input SNR for
BER < 10-7
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Amin Hamidian 106
5.2.2 Circuit Design
As the modulator (T2 in Fig. 130b) is part of the PA-matching networks, the
design of the PA and modulator must be done together. In this part, first of all, the
design of the optimum modulator based on this technology is introduced. Next, and
based on these results, the optimum PA is designed. All the optimizations were
performed based on the requirements calculated in the previous section.
5.2.2.1 OOK Modulator
The modulator schematics are shown in Fig. 132. The C1 capacitors and L1
inductors are used to avoid RF coupling between the two PA stages. The L1 inductors
have been designed based on a SCTL (Section 2.3.2) to connect the BB signal from
the pad structure to the gate of the T2 transistor with minimum insertion loss.
To select the optimum size of the T2 transistors, different characteristics must
be studied. These characteristics include the rise and fall times and the impedances
(ZIN in Fig. 132) in ON and OFF conditions (BB equal to 1 and 0). Fig. 133 and Fig.
134 present the simulated results of ZIN versus T2 size at 60 GHz. If the NoF and the
width increase, ZIN decreases. This is desirable in the ON condition (BB equal to 1) as
a very low impedance is required. However, in the OFF condition (BB equal to 0),
this can complicate the input-matching network design. Based on these simulated
results for the NoF between 15 to 20 and a width of 3 µm to 4 µm, an appropriate ZIN
can be achieved. In this transistor size range, the impedance ZIN is between 10 Ω to
20 Ω in the ON state and 80 Ω to 100 Ω in the OFF state.
Fig. 133 Zin vs. T2 size for BB=0.
Fig. 134 Zin vs. T2 size for BB=1.
Fig. 132 Schematic of the OOK modulator.
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Amin Hamidian 107
The ON and OFF transient times of the T2 transistors define the maximum
bitrate of the modulator. In this transmitter, the maximum targeted bitrate is 10 Gbps.
This means that the summation of the rise and fall time must be less than 100 ps in
order to avoid any vertical eye-diagram closing. In order to calculate the ON-OFF
transient time of the switch, a transient simulation was performed (Fig. 135a) and the
fall and rise times were calculated from Fig. 135b. It must be considered that the
voltage swing at the gate of the transistors is a determining factor of the transistor
speed. The swing amplitude is a function of the impedance seen at the gate of the
transistor. In this case, to correctly simulate the transient switching time, the switch
core, matching circuits (L1 and C1) and feeding structures are considered in the
simulation.
Fig. 136 presents the simulated results of the rise and fall times versus the
transistor sizes. The transistor size (total width) between 60 µm to 100 µm shows the
minimum transient time of around 90 ps (Table. 22). Based on these results (Fig. 133
to Fig. 136), the NoF equal to 15 and a width equal to 4 µm were selected.
(a)
(b)
Fig. 135 OOK switch transient simulation. a) Test bench. b) Drain current of the switch.
Table. 22 Total transient time (rise time +
fall time) in pico-second for different W and
NoF (Simulation)
𝑾
𝑵𝒐𝑭
10
15
20
25
1 µm
96
96
98
98
2 µm
97
99
99
96
3 µm
99
97
89
88
4 µm
98
89
88
90
5 µm
93
88
89
94
Fig. 136 Rise and fall time between BB=1
and BB=0 for various T2 sizes.
BB1
DC
I
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Amin Hamidian 108
5.2.2.2 OOK Power Amplifier
The two-stage PA is designed for maximum POUT and high gain. As discussed
in the previous section, the OOK modulation requires no back-off power and the
linearity (OP1dB) of the PA does not play a determining role in the performance of the
transmitter. As such, the PA can be designed for high Psat and gain [12]. For this
purpose, the first stage is designed for high gain while the second stage is designed for
high Psat. The design of each stage includes transistor size and biasing condition
selection and matching network design. In this design, all the matching circuits are
designed with the help of SCTL (Section 2.3.2) [10].
5.2.2.2.1 Power Stage
Fig. 137 presents the power stage of the power amplifier. The output of the
power stage was matched at the saturation level for the maximum Psat while its input
was matched to the output of the pre-amplifier. The transistor size was selected based
on the discussion in the previous chapter (Section 4.1.1). Based on the discussion in
the link budget section (Section 5.2.1), a Psat at around 3 dBm is enough for indoor
point-to-point communication. As shown on section 4.1.1, this power is much lower
than the maximum power, which can be yielded (13 dBm) from a transistor with this
technology. In this case, the transistor size can be optimized for other factors like
PAE, GMAX and a high quality factor-matching network.
As the matching network, the interconnections and antennae suffer from losses
a higher transistor POUT is required to ensure the correct Tx performance. In this case,
by selecting a transistor width of around 50 µm, the maximum POUT at around 9 dBm
can be achieved. Meanwhile this transistor size is appropriate for matching-network
design (Section 4.1.1.3). The finger width, NoF and current density of the power stage
can be selected from Fig. 96. In order to achieve the maximum of POUT from the
power stage, current densities more than 400 µA/µm should be selected. Simulating
the graph in Fig. 96a for this current density shows 14 NoF and 3.5 µm finger width
for a stability factor of around one.
Fig. 137 Schematic of the PA.
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Amin Hamidian 109
Based on this transistor size and current density, the optimum load and source
matching networks are designed. These designs are performed with the help of source
and load-pull simulations. The parasitic elements of the OOK modulator have also
been considered in this design. Fig. 138 presents the source- and load-pull simulations
of the power stage with the matching networks at 60 GHz and at around Psat level
(with 3 dBm LO power).
(a)
(b)
Fig. 138 a) Simulated source pull and b) load pull of the PA at 60 GHz and VDD=1.2 V.
Red: Power with 0.5 dB step. Blue: PAE with 2% steps @Psat and 0.2% @ small signal.
Fig. 139 presents the simulated large signal performance of the power stage.
Due to the losses of the output pad structure (around 1 dB [10]) and the matching
network, and also because of the large signal matching of the amplifier, the gain of
the power stage is around 2.5 dB less than the GMAX of the transistor. Finally, by
matching the output of the power stage at the saturation level, a high linearity and Psat
are achieved. Although linearity does not play any role in the OOK performance, high
linearity means high gain near the saturation power. The detailed simulated
performance of the PA is also presented in Table. 23.
Table. 23 Power stage large
signal performance (Simulation)
VDD
1.2 V
VG
1 V
IDD
20 mA
Psat
9 dBm
OP1dB
7 dBm
Gain
5 dB
PAEMax
16%
Fig. 139 Simulated large signal performance of the
power stage.
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Amin Hamidian 110
5.2.2.2.2 Pre-Amplifier
To boost the PA small signal performance, the first stage of the transmitter is
optimized for maximum gain. In this case, the current density and the transistor size
are selected for maximum gain and the matching networks are designed at the small
signal level.
The optimum current density and transistor size are also selected based on the
discussion in the previous chapter (Section 4.1). Based on this discussion, with
smaller transistor sizes and lower current densities, higher gain can be achieved.
However, other factors like stability and POUT can be limited. As discussed before,
smaller transistor sizes and lower current densities result in a lower stability factor
and POUT. The lower stability factor (less than 1) can increase the chance of the PA
oscillation. Although this can be tolerated to some extent due to the matching network
losses, the mismatches between the pre-amplifier and the power stage and low
stability factor can result in an internal oscillation, which can drive the pre-amplifier
output into saturation and cause DC current instabilities. Further, the low POUT of the
pre-amplifier can affect the large signal performance (gain at Psat, linearity and PAE)
of the power stage and the complete PA.
The power stage simulation shows around 5 dB small signal gain. This means
that the input P1dB of the power stage is 4 dB (as the gain in OP1dB is 1 dB less than
the small signal gain) lower than the OP1dB of the power stage. In this case, the OP1dB
of the pre-amplifier can be 4 dB lower than the power stage. In this design, in order to
have a margin, the pre-amplifier is optimized for 2 dB lower OP1dB. As discussed on
section 4.1.1.3, the optimum transistor size for 50 Ω-matching is around 40 µm to
50 µm. This is around the same transistor size as has been selected for the power
stage. In this case, the current density can be down scaled instead of the transistor size
for the desired power performance. In this design, the current density of the pre-
amplifier was selected as around 1.7 times (around 2.3 dB) less than the power stage
current density at around 230 µA/µm. The drain current of the transistor, biased at
class AB, increases at around the saturation level. For this reason, the current density
of the pre-amplifier is selected at a lower level than the design target (230 µA/µm
instead of 250 µA/µm).
In order to select the correct width and NoF for the pre-amplifier transistor, the
graph in Fig. 96a must be simulated again with the new current density. The lower
current density means a lower stability factor for the same transistor size. In this case,
the width of each transistor finger can be selected as being larger than the power stage
in order to compensate the stability factor decrease. In this design, 4 µm for the finger
width and 12 NoF were selected.
Moreover, in this design and in the design of the power stage, the optimization
of the PA for the maximum PAE was neglected. As shown in Fig. 94b, by selecting
50 µm transistor width the maximum achievable PAE (just from a transistor without
matching networks) is around 18%, which is around 3% less than the maximum PAE.
Finally, the input and output of the pre-amplifier were matched with the help
of source- and load-pull simulations. To improve the small signal performance, the
matching was performed at a lower power level than the power stage (5 dB lower, at
-2 dBm). Fig. 140 presents the source-pull and load-pull simulations of the pre-
amplifier at 60 GHz. As is shown in Fig. 140a and b, the input is matched at 50 Ω
while the output is matched to the input of the power stage.
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Amin Hamidian 111
(a)
(b)
Fig. 140 a) Simulated source pull and b) load pull of the PA at 60 GHz and VDD=1.2 V.
Fig. 141 Schematic of the pre-amplifier.
The complete schematic of the pre-amplifier is presented in Fig. 141. All the
matching networks are realized with SCTL (Section 2.3.2) for minimum losses. In
addition, the values of the matching network inductance are selected in such a way
that the inductances can be easily realized on-chip with this kind of transmission line.
The large signal performances of the pre-amplifier are presented in Fig. 142 and
Table. 24. As mentioned above, by decreasing the gate voltage of the pre-amplifier
from 1 V to 0.8 V, the drain current was decreased to 11 mA in order to increase the
total PA efficiency. As mentioned earlier, due to current increase in class AB
amplifiers, the OP1dB of the pre-amplifier is only 1.5 dB less than the power stage.
Furthermore, the saturation power of the pre-amplifier is the same as the power stage
at around 8 dBm, but with less power gain (at the saturation level). The gain could
only be improved by around 0.3 dB and, due to the small signal matching of the pre-
amplifier, the PAE of the pre-amplifier is almost 2% less than for the power stage.
The simulated results of the power stage and pre-amplifier presented here are
for the conjugate-matching condition, where the output of the pre-amplifier and the
input of the power stage are connected to their conjugated matched impedance. As
shown in the next section in Fig. 145, this PA in the simulation level achieves around
9 dB gain.
Transmitter
Amin Hamidian 112
Table. 24 Pre-amplifier stage
large signal performance
(Simulation)
VDD
1.2 V
VG
0.8 V
IDD
11 mA
Psat
8 dBm
OP1dB
5.5 dBm
Gain
5.3 dB
PAEMax
14%
Fig. 142 Simulated large signal performance of the pre-
amplifier at 60 GHz and VDD = 1.2 V.
5.2.3 Experimental Results
After the design and optimization of each part, the final Tx was realized.
Fig. 143 presents the chip micrograph of the realized Tx. The complete chip,
including pads, occupies 0.38 mm2. To completely characterize the Tx small signal,
large signal and time domain (data modulation and transmission), simulations and
measurements were performed. All the characterizations were done on-chip. In all the
above simulations, the S-parameter models for passive structures (extracted with EM
simulation) were utilized. The use of S-parameter models in time-domain simulations
can result in longer simulation times and, sometimes, in simulation conversion
problems. This can be a serious problem in complicated circuits like PLLs. However,
as the circuit structure of the Tx designed in this work is quite simple and the size of
the total chip is quite small, this problem does not have a significant effect on the time
domain circuit simulation.
In this section, each simulation and measurement category is presented. By
comparing the measured and simulated results in each section, the validity of the
models and the design techniques are verified. All the simulations and measurements
presented in this section are performed under 1.2 V drain voltage and 30 mA total
current.
Fig. 143 Chip micrograph (0.38 mm2 with pads)
Transmitter
Amin Hamidian 113
5.2.3.1 Small Signal
The main small signal performances are gain, stability and terminal matching.
It should be considered that, as in the OOK Tx, the BB signal only switches the LO
signal on and off, the gain of the OOK Tx is calculated between the LO and RF paths.
In this case, for a BB equal to 0, the BB pad is connected to ground while, for a BB
equal to 1, it is connected to 1.2 V. In addition, the measurements are performed in
steady state conditions. Later, in section 5.2.3.4, the CG of the modulator with linear
modulation techniques (QPSK, etc.) is calculated.
In this section, these small signal measurements are carried out for various LO
frequencies and DC voltages at the BB path. Although the circuit has been designed
for the desired performances at the BB equal to 0 and 1, the investigation of the
conditions between these two cases can give us a better understanding of the circuit’s
performance. Fig. 144 presents the gain, stability and reflections at both the input and
output ports versus the BB at 60 GHz. As can be seen (Fig. 144a-b), the PA
performance is relatively constant for BB DC voltages of less than 0.4 V and more
than 1 V. This demonstrates the good performance of the Tx for even smaller voltage
swings at the switch inputs.
The gain versus BB (Fig. 144a) measurement shows good agreement with the
simulation, although for some points a higher gain was achieved in measurement,
which might be mainly due to frequency shifts due to process variations. Furthermore,
Fig. 144a shows a stability increase by increasing the BB voltage. As expected, the
minimum stability occurs for a BB equal to 0, whereby at 60 GHz a stability factor
better than 2 is achieved. Finally, and as shown in Fig. 144b, the terminal matching
deteriorates with an increase of the BB voltage. This is quite desirable, as higher
mismatches at a BB equal to 1 mean less radiated power and, hence, a better dynamic
range between the ON and OFF cases.
Based on the above measurements (Fig. 144), the OOK performance region
can be divided into three regions. In the first region (a BB less than 0.4 V), the switch
is completely off and the Tx transmits the 60 GHz signal with its maximum output
power. In the second region (a BB between 0.4 V and 1 V), the Tx is between the ON
and OFF conditions. In this region, the gain of the Tx (between the LO and RF paths)
decreases almost linearly as the BB voltage increases. Finally, in the third region (a
BB more than 1 V), the gain is relatively low and almost no power radiates from the
Tx.
(a)
(b)
Fig. 144 Measurement vs. simulation: a) and b) Small signal performance vs. BB voltage.
Transmitter
Amin Hamidian 114
As a final step in the small signal measurement, the Tx was characterized
versus frequency. Fig. 145 compares the simulated and measured small signal gain of
the PA for both BB states (ON and OFF). Around 9 dB gain and 30 dB ON-OFF
isolation at the small signal level was measured at around 60 GHz. As shown later,
the isolation deteriorates slightly by driving the PA into deep saturation. The input
(LO pad) and output (RF pad) reflections for a BB equal to 0 are shown in Fig. 146a,
with better than 10 dB matching at around 60 GHz. Finally, the measured stability
factor from 50 GHz to 70 GHz shows the unconditional stability of the circuit for both
BB cases (Fig. 146b).
Fig. 145 Measured and simulated small signal gain.
(a)
(b)
Fig. 146 Measured and simulated: a) matching. b) stability factor.
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Amin Hamidian 115
5.2.3.2 Large Signal
In order to justify the large signal design techniques, the performance of the
complete Tx was measured for various input powers, LO frequencies and BB signals.
In these measurements, the main large signal characteristics, including POUT, power
gain, PAE and ON-OFF isolation, are characterized.
As mentioned in the previous section, the small and large signal performances
of the PA are functions of the BB signal DC biasing. In this section, the behavior of
the PA versus the BB biasing voltage is also investigated in order to find the optimal
biasing for power performance. Fig. 147 presents the measured and simulated results
of the POUT versus the BB biasing voltage. As expected, the large signal performance
shows the same tendency as the small signal performance (Fig. 144a).
The power gain of the Tx at 60 GHz versus the input power for both BB states
is shown in Fig. 148. The power gain measurement shows 1 dB less gain than the
small signal measurements, which is mainly due to calibration errors. The Tx
achieved 8 dBm Psat and better than 8 dB power gain. In this design, the isolation
shows around a 3 dB decrease near Psat in comparison with the small signal level.
With 8 dBm POUT from the PA, an ON-OFF isolation higher than 27 dB was
measured. The detailed performance over the frequency is presented in Fig. 149.
Fig. 147 Measured and simulated POUT vs. BB biasing voltage.
Fig. 148 Meas. vs. sim. gain of the PA for
both BB states.
Fig. 149 Measured large signal
performance of the PA over frequency.
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Amin Hamidian 116
5.2.3.3 Time Domain OOK Modulation
To further guarantee the modulator switches and PA design procedure, time
domain simulations were performed. The Tx was simulated with different BB bitrates
to identify the maximum Tx speed without EYE diagram closing. The EYE diagram
closing happens as the bitrate exceeds the rise and fall times of the Tx. As a result, the
POUT of the Tx decreases as the bitrate further exceeds the rise and fall times of the
Tx. In this case, the rise and fall times must be calculated from the point where the
BB signal change at the input to the point where the modulated signal reaches the
steady state condition at the output of the Tx.
Fig. 150 presents the output of the Tx modulated with a 400 Mbps BB signal.
By zooming to the transient conditions, the rise and fall times can be calculated
(Fig. 150b-c). Based on this calculation, the total transient time is around 100 ps
(50 ps rise time and 50 ps fall time). These values agree well with the simulated
results of the modulator alone (Section 5.2.2.1). Furthermore, this simulation shows
the minor effect of the PA on the rise and fall times of the signal. This is mainly due
to the small transistor sizes of the power stage and pre-amplifier as well as the high ft
and fmax of the amplifying transistor under these biasing conditions.
(a)
(b)
(c)
Fig. 150 a) The output of the Tx modulated with 400 Mbps. b) Rise time. c) Fall time.
Transmitter
Amin Hamidian 117
An approximately 50 ps rise and fall time mean that the maximum bitrate, for
which the POUT does not decline, is around 20 Gbps. This is higher than the required
OOK bitrate considered in the link budget calculations (Section 5.2.1). Fig. 151
presents higher bitrate simulations with the designed OOK Tx. As can be seen, the
amplitude of the Tx signal remains constant as the bitrate increases from 400 Mbps
(Fig. 150a) to 4 Gbps (Fig. 151 a). Nevertheless, by further increasing the bitrates to
10 Gbps (Fig. 151b) the amplitude declines. This is mainly due to a low pass filter
effect of the BB path matching network, which further delays the transistor switching.
Although the above simulated results show the feasibility of high bitrate data
transmission with the help of this OOK Tx, the maximum bitrate of the wireless
communication can decline due to other problems during measurement. These
problems can include the bandwidth limitations of the antenna and the TRx-antenna
interconnections, and multipath and receiver limitations. As the OOK modulation
suffers from bandwidth inefficiency, any bandwidth limitation of any component in
the TRx path can cause bitrate decline. But the multi-path can be tolerated as long as
the time differences between the paths are much smaller than the bit period.
To test this Tx in a wireless data communication system, a measurement setup
was built (Fig. 152a). As shown in Fig. 152b, the setup includes local oscillators, horn
antenna at both the transmission and reception paths with 25 dBi gain, a LNA with a
7 dB noise figure and 20 dB gain, a down-converter mixer with 10 dB conversion
loss, and an oscilloscope with a 40 GS/s sampling rate. The output of the Tx and horn
antennae is connected via a probe and a cable. This adds an extra 5.5 dB loss (probe
0.5 dB to 1 dB and cable 4.5 dB to 5 dB loss at 60 GHz) at the output of the Tx. By
using a waveform generator, a periodic 0 and 1 bit sequence signal was generated.
The receive path was installed completely on a wheeled table so as to measure
the transmitted signal at different path lengths from 1 m to 4 m (limited by the room
size). In addition, and as mentioned earlier, one of the advantage of the OOK TRx in
comparison with the normal TRx is the absence of a requirement for signal
synchronization in the receiver path. This allows us to have two independent signal
generators for Tx and Rx.
With the help of this measurement setup different bitrates at different
distances were measured. Due to the lack of a high data-rate pseudo-random signal
generator, a square wave signal generator was utilized to generate the sequence of 0
and 1 bits. The EYE-diagrams of the received signal for 4Gbps and 6 Gbps bitrates at
2 m and 4 m distances are presented in Fig. 153. As expected, the higher bitrates
(a)
(b)
Fig. 151 The output of the Tx modulated with: a) 4 Gbps. b) 10 Gbps
Transmitter
Amin Hamidian 118
demonstrate a smaller EYE-diagram in the receiver due to the bandwidth limitations
of the TRx components. Furthermore, increasing the Tx and Rx distance results in a
lower SNR in the receiver and, hence, a less clear signal.
(a)
(b)
(c)
(d)
Fig. 153 Measured EYE-diagrams of wireless data communication over 2 m and 4 m
distances. a&b) 4 Gbps. c&d) 6 Gbps.
(a)
(b)
Fig. 152 Wireless communication set-up. a) Photo. b) Components.
Transmitter
Amin Hamidian 119
5.2.3.4 Linear Modulation – Homodyne Tx
As shown in Fig. 144a and Fig. 147, the linear region between 0.4 V and 0.8 V
shows the possibility of linear modulation (e.g., QAM, QPSK, etc.) with this
structure. The simplified schematic of the direct conversion Tx (LO at 60 GHz) for
linear modulation is presented in Fig. 154a. In this case, by applying a small signal
BB, the switches can function as a passive mixer. The performance of this passive
mixer can be controlled by changing the VCON. Fig. 154b shows measured and
simulated BB to RF (60 GHz) conversion gain of the Tx for the small signal BB at
various bias points (VCON). This graph can also be calculated by differentiating the S21
curve in Fig. 144a.
(a)
(b)
Fig. 154 a) Schematic of the Tx for linear modulation. b) BB to RF conversion gain for
linear modulations vs. VCON.
The conversion gain in Fig. 154b shows the maximum for around a 0.6 V BB
biasing voltage (VCON). In addition, from Fig. 147 we know that by increasing the
VCON, the POUT of the PA decreases, which means less output power from the Tx.
With a LO power of around 5 dBm, the mixer shows a constant gain for all four
channels. Fig. 155 presents the large signal performance of the mixer for all four
channels. With a 35 mW power consumption and 5 dBm LO power, the Gilbert cell
mixer achieved around 5 dB CG and -4 dBm OP1dB.
Fig. 155 Large signal measured vs. simulated results.
VDD
LO RF
VGG
VCON
T2
T1
Mixer
Amplifier
BB
Transmitter
Amin Hamidian 120
In order to justify the functionality of the circuit for a 60 GHz application, this
circuit was tested in a 60 GHz wireless communication system as a homodyne Tx
over 1 m distance. In this system, the output of the Tx was connected to the horn
antenna via a probe and a cable. The modulated signal was generated with a
SMU200A signal generator with a 25 MHz bandwidth. At the receiver side, the setup
includes local oscillators, horn antennae, LNA with a 7 dB noise figure and 20 dB
gain, a down-converter mixer with 10 dB conversion loss and 2 GHz IF frequency,
and an oscilloscope with a 40 GS/s sampling rate.
The 100 Mbps time domain signals at the output of the SMU200A and the
receiver are presented in Fig. 156a. After sampling and data processing in MATLAB,
the constellation of the 16 QPSK signal was drawn in Fig. 156b-c. Fig. 156b presents
the constellation diagram directly at the output of the signal generator and Fig. 156c
presents the constellation diagram of the received signal. The main source of EVM
deterioration is due to the gain compression. As shown in Fig. 156c, the received
signal amplitude drops at the corners of the constellation as the signal levels pass the
1dB compression point.
(a)
(b)
(c)
Fig. 156 a) Comparison of time domain signal from the Tx and the signal generator.
b) Signal generator constellation. c) Constellation of the received signal.
Transmitter
Amin Hamidian 121
5.3 Conclusion
In this work, two types of transmitters - heterodyne and OOK - are studied,
designed, realized and measured. Both transmitters have shown state-of-the-art
performance.
The heterodyne transmitter utilized the Gilbert cell topology for the up-
conversion to gain better LO-RF and LO-IF isolations and image rejection ratios. The
Gilbert cell mixer was followed by a five-stage transformer-based PA to boost the
conversion gain and output power. Thanks to the transformer characteristics, no DC-
block was used in this design, which, because of the low Q-factor of the capacitors in
this technology, can deteriorate the output power. Furthermore, by placing the PA
transistors as close as possible to one another at each stage, an almost perfect RF
ground was introduced which further deterred any source degeneration. The realized
transmitter achieves between 13 dBm to 16 dBm POUT, 11 dBm to 14 dBm P1dB, 8%
to 14% efficiency and 22 dB to 30 dB power gain for all four channels defined in the
IEEE 802.15.3c [32]. In comparison with the state-of-the-art results (Table. 25) this
transmitter achieves high CG, POUT, isolation and efficiency with small chip size.
Table. 25 Comparison of the heterodyne Tx with the state-of-the-art results.
Ref./Tech.
[92] 40 nm
[91] 65 nm
[90] 45 nm
Heterodyne
Tx-90 nm
RF Freq. [GHz]
59.5-67
55-67
53-66
57-65
IF Freq [GHz]
0
0
0
18-22
Conv. Gain [dB]
26
18.3
15
22…30
P1dB [dBm]
<13
9.5
N.A.
11…14
Psat [dBm]
13.8…15.6
10.9
10
13…15.5
PDC [mW]
220
186
360
250
EFF. (%)
11…16.5
5
3
8…14
LO-RF Iso. [dB]
N.A.
N.A.
>22
>45
IF-RF Iso
+Image [dB]
>20
N.A.
>10
>45
Size [mm2]
0.96
3.5*
0.23
0.6
In the second transmitter topology, a novel OOK Tx structure based on CMOS
technology was introduced and the measured results were presented. The modulator is
designed for maximum bitrate, no DC power consumption and small chip size. In
addition, by utilizing accurate models and designing an appropriate matching
network, a high performance PA for this purpose was realized. With these
optimization techniques, more than 8 dBm output power, 9 dB gain and 17%
efficiency were measured. As shown in Table. 26, in comparison with the other state-
of-the-art results, the Tx presented in this work achieves much better performances.
Finally, by using this Tx in a complete wireless system, more than 6 Gbps over a 4 m
distance with less than 36 mW power consumption was achieved during
Transmitter
Amin Hamidian 122
measurement. To the author best knowledge, this is the highest data-rate beyond 1 m
distance ever measured with a CMOS transmitter at 60 GHz.
Table. 26 Comparison of the OOK Tx with the state-of-the-art results.
Ref.
[63]
[64]
[67]
OOK Tx
Modulation
QPSK
OOK
OOK
OOK
Distance [m]
1
0.3-0.5
0.6
4
Bit Rate [Gbps]
4
1.5
3.3
6
Psat [dBm]
10
-10
7
8
PDC [mW]
123*
31.2*
183*
36
EFF. (%)
8*
0.3*
3*
17.5
On/off Iso. [dB]
-
19.5
-
30
Antenna
25 dBi Horn
11.5 dBi
Yagi-Uda
14 dBi Patch
25 dBi Horn
Size [mm2]
6.875
1.08
0.43
0.38
*Including VCO
Further, this design (OOK Tx) has been utilized as direct conversion
(homodyne) Tx with linear modulation scheme. This Tx is working more like an
direct conversion up-converter as its output power is quite low. This topology
demonstrate poor LO isolation (> 10 dB), but it shows higher OP1dB and CG in
comparison with so far published state-of-the-art up-conversion mixers (Table. 27).
Table. 27 Comparison of the homodyne Tx with the state-of-the-art results.
Ref.
[71]
[73]
[5]
Homodyne
Tx
Process
CMOS 90 nm
CMOS 90 nm
CMOS 90 nm
CMOS 90 nm
Freq. [GHz]
40-51
25-75
58-66
58-66
IF [GHz]
11
N.A.
18-22
BB
LO Power
[dBm]
0
6
4
5
CG [dB]
-11
1
-2
5
OP1dB [dBm]
-10
-3.5
-9
-4
LO Iso. [dBm]
26.5
>30
>30
>10
VDD [V]
1.2
3
1.2
1.2
PDC [mW]
13.2
93
17
34
Size [mm2]
0.63
0.3
0.41
0.38
6 Conclusion
The emerging new applications require must faster data communication. To
satisfy these requirements, new systems and technologies are being developed. In line
with this trend, the main focus of system designers - in respect of the physical layer -
lies in the optical and wireless mediums. Higher data-rate requirements demand a
higher bandwidth. The higher bandwidth requirement together with the recent
technological developments in the CMOS and SiGe HBT technologies has attracted
circuit designers towards the mm-wave frequency band for wireless applications. In
this regard, the 60 GHz band (57 GHz to 65 GHz) has seen tremendous investigation
in many different aspects, from transceiver topology selection (homodyne,
heterodyne, OOK and regenerative) to detailed circuit design.
One of the most important research areas for any transceiver is the power
amplifier design. A high POUT and efficiency are essential for high data-rate
communication, coverage and battery lifetime. These problems become more
prominent at higher frequencies, as many design and technology limitations are
already limiting the performance of the power amplifier.
In this thesis, many aspects of 60 GHz transceiver modeling and design based
on 90 nm CMOS and 0.25 μm SiGe HBT design have been investigated. Based on
these investigations, different types of power amplifiers and transmitters were
designed. The designed power amplifiers based on the HBT technology, although
occupying a larger chip size, show higher output power and efficiency in comparison
with the CMOS power amplifiers. The two different power amplifiers designed on the
HBT technology show 15 dBm to 18 dBm POUT with around 15% PAE, while the
CMOS PAs could only achieve 11 dBm to 14 dBm POUT and around 10% PAE. In
both technologies, higher output power was achieved through different power
combining techniques. In the HBT PA, current-combining was utilized for minimum
power, combining loss and chip area occupation. Due to the higher output and input
impedances of the HBT transistors in comparison with the CMOS technology, this
power combining technique can be used without any low impedance problem during
the matching network design.
On the other hand, the sensitive and low impedance CMOS transistors require
more accurate power combining techniques. In this case, two types of power
combining have been tested with this technology. With the first PA, a Wilkinson
power combiner with different input and output impedances was utilized. The input
impedance of this combiner was 16 Ω while its output is matched to 50 Ω. This
allows to use larger transistor sizes for the PA design and, hence, increase the output
power. Although this technique has resulted in output power enhancements, due to
source degenerations and combining losses, this PA only achieved around 11 dBm
POUT. In order to minimize the combining losses and cancel out source degenerations,
a transformer was used in the second PA. This PA achieved 3 dB better POUT
(14 dBm), with better PAE and a much smaller chip size. By comparing these two
PAs, it can be concluded that the transformer would be a much better choice when
compared with the other types of combiners (i.e., the current and Wilkinson
combiners).
Finally, two different types of transmitters (heterodyne and OOK) based on
the CMOS technology have been designed and realized. The heterodyne transceiver
with an IF frequency at around 20 GHz was designed based on the IEEE 802.15.3c
Conclusion
Amin Hamidian 124
standard. In comparison with state-of-the-art results, this transmitter - with a small
chip size and low power consumption - achieved a high POUT (13 dBm to 15.5 dBm),
efficiency and conversion gains (Table. 25), which is mainly due to the use of the
transformer in this design. Moreover, thanks to the accurate design of the Gilbert cell
mixer, much higher isolations were achieved in this work in comparison with state-of-
the-art PAs.
For the OOK transmitter, a novel topology was developed. In this topology,
the modulator and the PA were integrated into one circuit without affecting the POUT
of the Tx. Thanks to this topology, this Tx achieved much higher POUT with much
lower power consumption. This resulted in much higher efficiency of this transmitter
in comparison with state-of-the-art OOK transmitters. Finally, the realized circuit was
utilized in a wireless system where more than 6 Gbps was successfully transmitted
over 4 m distance. To the author best knowledge, this is the highest data-rate beyond
1 m distance ever measured with a CMOS transmitter at 60 GHz.
Future works include the completion of both transceivers (heterodyne and
OOK) and packaging. In this case, the antenna design and antenna-chip interface must
be studied. In addition, and with regards to the PA design, some new techniques such
as distributed active transformers and transistor neutralization could be used in the
above designs to further increase the POUT and PAE.
Bibliography
[1] A. Hamidian, A. Malignaggi, and G. Boeck, “High Performance
Transformer Based mm-Wave CMOS Power Amplifier,” IEEE EuMic, Oct.
2013
[2] A. Hamidian, and G. Boeck, “24 GHz CMOS Transceiver and Wireless
Sensor Network for Indoor Localization – Part A Transceiver design,’’
IEEE Workshop RFIC-IMS, June. 2013.
[3] A. Hamidian, R. Ebelt, D. Shmakov, M. Vossiek, T. Zhang, V.
Subramanian, and G. Boeck, “24 GHz CMOS Transceiver with Novel T/R
Switching Concept for Indoor Localization,’’ IEEE RFIC, June. 2013
[4] A. Hamidian, A. Malignaggi, Ran Shu, A. M. Kamal, G. Boeck, “Multi-
Gigabit 60 GHz OOK Front-End in 90 nm CMOS,’’ IEEE SiRF, pp. 96-98,
Jan. 2013.
[5] A. Hamidian, A. Malignaggi, Ran Shu, A. M. Kamal, G. Boeck, “A
Wideband Gilbert Cell Up-Converter in 90 nm CMOS for 60 GHz
Application,’’ IEEE RFIT, pp. 50-52, Nov. 2012.
[6] A. Hamidian, and G. Boeck, “Novel 60 GHz OOK transmitter in 90 nm
CMOS,” Kleinheubacher Tagung URSI 2012, Miltenberg, Germany, Sep.
2012
[7] A. Hamidian, V. Subramanian, Ran Shu, A. Malignaggi, G. Boeck,
“Coplanar Transmission Lines on Silicon Substrates for the mm-Wave
Applications,” IEEE Mikon, pp. 27-30, May. 2012.
[8] A. Hamidian, V. Subramanian, R. Doerner, A. Malignaggi, M. K. Ali, and
G. Boeck, “60 GHz power amplifier utilizing 90 nm CMOS technology,”
IEEE RFIT Conference, pp. 73-76, Dec. 2011.
[9] A. Hamidian, V. Subramanian, R. Shu, A. Malignaggi, and G. Boeck,
“Device Characterization in 90 nm CMOS up to 110 GHz,” IEEE SCD, pp.
73-76, Sep. 2011
[10] A. Hamidian, V. Subramanian, Ran Shu, A. Malignaggi, G. Boeck,
“Extraction of RF Feeding Structures for Accurate Device Modeling up to
100 GHz,” IEEE IMWS, pp. 113-116, Sept. 2011.
[11] A. Hamidian, V. Subramanian, and G. Boeck, “Design of broad-band mm-
wave SiGe power amplifiers applying full EM simulation,” IEEE IMWS,
pp. 632-635, Sep. 2011.
[12] A. Hamidian, V. Subramanian, R. Doerner, G. Boeck, “A 60 GHz 18 dBm
Power Amplifier Utilizing 0.25 μm SiGe HBT,’’ IEEE EuMC/EuMIC, pp.
1686-1689/pp. 444–447, Oct. 2010.
[13] A. Hamidian and V. Subramanian, “Right and left handed transmission
lines for millimetre wave applications,” IEEE GeMiC, pp. 227-230, Mar.
2010.
[14] A. Hamidian, Z. Zhang, V. Subramanian, and G. Boeck, “Modeling of
MIM capacitors in 0.25 µm SiGe BiCMOS process up to 140 GHz,” IEEE
Prime, pp. 1-4, Jul. 2010
[15] A. Hamidian, G. Boeck, “60 GHz Wide-band Power Amplifier,” IEEE
BCTM, pp. 47-50, Oct. 2009.
[16] A. Hamidian, H. Portela, and G. Boeck, “High power V-band power
amplifier,’’ IEEE IMOC, pp. 783-786, Nov. 2009.
[17] A. Malignaggi, A. Hamidian, R. Shu, M. K. Ali, and G. Boeck, “Analytical
Study and Performance Comparison of mm-Wave CMOS LNAs,” IEEE
EuMic, pp. 1-4, Oct. 2012.
[18] A. Malignaggi, A. Hamidian, and G. Boeck, “A 60 GHz fully differential
LNA in 90 nm CMOS Technology,” IEEE IMOC, pp. 1-4, Oct. 2012.
[19] R. Shu, A. Hamidian, A. Malignaggi, M. K. Ali, and G. Boeck, “A 36-49
GHz Injection-locked Frequency Divider with Transformer-based Dual-
path Injection,” IEEE SiRF, pp. 114-116, Jan. 2013.
[20] P. Harati, A. Hamidian, A. Malignaggi, and G. Boeck, “48 GHz power
amplifier for mm-wave LO distribution circuitry in 90 nm
CMOS,” Proceedings of the IEEE Germany Student Conference, Nov.
2012.
[21] M. K. Ali, A. Hamidian, R. Shu, A. Malignaggi, and G. Boeck , “45 GHz
low power static frequency divider in 90 nm CMOS ,” IEEE RFIT, pp. 65-
67, Nov. 2012.
[22] R. Shu, A. Hamidian, A. Malignaggi, M. K. Ali, and G. Boeck, “A 40 GHz
CMOS voltage-controlled oscillator with resonated negative-conductance
cell,” IEEE RFIT, pp. 77-79, Nov. 2012.
[23] A. Malignaggi, A. Hamidian, R. Shu, M. K. Ali, A. Kravets, and G. Boeck,
“60 GHz LNAs in 90 nm CMOS technology,” IEEE ISSSE, pp. 1-4, Oct.
2012.
[24] T. Zhang, A. Malignaggi, A. Hamidian, V. Subramanian, and G. Boeck,
“Low-loss 24-GHz passive baluns for on-chip integration ,” IEEE ISSSE,
pp. 1-4, Oct. 2012
[25] A. Malignaggi, A. Hamidian, V. Subramanian, R. Shu, and G. Boeck,
“CMOS varactor model extraction up to 110 GHz,” IEEE Mikon, pp. 300-
303, May 2012.
[26] V. Subramanian, A. Hamidian, T. Zhang, R. Shu, A. Malignaggi, M. Kamal
and G. Boeck "CMOS Transceiver Circuits for K-band and V- band
Applications" RadioTec Workshop, Oct. 2011.
[27] R. Shu, V. Subramanian, A. Hamidian, A. Malignaggi, and G. Boeck,
“Characterization of LC-tank circuits for mm-wave applications in 90 nm
CMOS,” IEEE SCD, pp. 1-4, Sep. 2011.
[28] M. Haase, V. Subramanian, T. Zhang, and A. Hamidian, “Comparison of
CMOS VCO topologies,” IEEE PRIME, pp.1-4 , Jul. 2010
[29] G. Boeck, W. Keusgen, A. Hamidian, and V. Subramanian, “PAs for mmW
applications: A comparison of technologies and achievements,” IEEE
Workshop RFIC, Jun. 2009
[30] V. Subramanian, A. Hamidian, W. Keusgen, V.H. Do, and G. Boeck,
“Layout design considerations for 60 GHz SiGe power amplifiers,” IEEE
Mikon, Poland, pp. 1-4, May 2008.
[31] Liuqing Yang, G.B. Giannakis, “Ultra-wideband communications: an idea
whose time has come,” IEEE Signal Processing Magazine, vol. 21, no 6,
pp. 26-54, Nov. 2004.
[32] IEEE 802.15.3c “Wireless Medium Access Control (MAC) and Physical
Layer (PHY) Specifications for High Rate Wireless Personal Area
Networks (WPANs) Amendment 2: Millimeter-wave-based Alternative
Physical Layer Extension”
[33] http://www.itrs.net/Links/2011ITRS/2011Chapters/2011ERD.pdf
[34] http://www.ihp-microelectronics.com/
[35] G. Boeck, V. Subramanian, W. Keusgen, and V. H. Do, “A 60 GHz SiGe
HBT Chip Set,” IEEE EUMIC, pp. 13-16, Oct. 2008.
[36] A. Natarajan, A. Komijani, X. Guan, A. Babakhani, and A. Hajimiri, “A
77-GHz Phased-Array Transceiver with On-Chip Antenna in Silicon:
Transmitter and Local LO-Path Phase Shifting,” IEEE JSSC, vol. 41, no.
12, pp. 2807-2819, Dec. 2006.
[37] A. Hajimiri, A. Komijani, A. Natarajan, R. Chunara, X. Guan, and H.
Hashemi, “Phased Array System in Silicon,” IEEE Communications
Magazine, vol. 4, no 8, pp. 122-130, Aug. 2004.
[38] U.R. Pfeiffer and D. Goren, “20 dBm Fully-Integrated 60 GHz SiGe Power
Amplifier With Automatic Level Control,” IEEE J. Solid State Circuits,
vol. 42, no. 7, pp. 1455-1463, July 2007.
[39] U.R. Pfeiffer and D. Goren, “A 23-dBm 60-GHz Distributed Active
Transformer in Silicon Process Technology,” IEEE Trans. Microw. Theory
Tech., vol. 55, no. 5, pp. 857-865, May 2007.
[40] C.K. Liang, B. Razavi, “Systematic Transistor and Inductor Modeling for
Millimeter-Wave Design,” IEEE J. Solid-State Circuits, vol. 44, no. 2, pp.
450-457, Feb. 2009.
[41] T.O. Dickson, M.-A. LaCroix, S. Boret, D. Gloria, R. Beerkens, S.P.
Voinigescu, “30-100-GHz inductors and transformers for millimeter-wave
(Bi)CMOS integrated circuits,” IEEE Trans. Microw. Theory Tech., vol.
53, no. 1, pp. 123-133, Jan. 2005.
[42] S. Hauptmann, F. Ellinger, F. Korndoerfer, C. Scheytt, “V-band variable
gain amplifier applying efficient design methodology with scalable
transmission lines,” IET Circuits, Devices & Systems, vol. 4, no. 1, pp. 24-
29, 2010.
[43] A.M. Niknejad, “Modeling of passive elements with ASITIC,” IEEE IMS,
vol. 1, pp. 149-152, Aug. 2002.
[44] D. Gruner, Z. Zhang, and G. Boeck, “Modeling of integrated microstrip
lines on silicon substrates up to 140 GHz,” IEEE EuMC, pp. 894-897, Sep.
2009.
[45] http://www.ansys.com/
[46] http://www.agilent.com/
[47] www.suss.com
[48] C. Caloz, T. Itoh,“Novel microwave devices and structures based on the
transmission line approach of meta-materials” IEEE MTT-S International
Microwave Symposium Digest, Vol. 1, pp. 195-198, June 2003.
[49] M. Gil, J. Bonache, I. Gil, J. Garcia-Garcia, F. Martin, “Artificial Left-
handed Transmission Lines for Small Size Microwave Components:
Application to Power Dividers” IEEE Microwave Conference, 2006. 36th
European, pp.1135–1138, Sept. 2006.
[50] M. Gil, J. Bonache, J. Garcia-Garcia, F. Martin, “New Left Handed
Microstrip Lines with Complementary Split Rings Resonators (CSRRs)
Etched in the Signal Strip” IEEE IMS, pp.1419–1422, June 2007.
[51] J.-L. Kuo, Z.-M. Tsai, K.-Y. Lin, H. Wang, “A 50 to 70 GHz Power
Amplifier Using 90 nm CMOS Technology,” IEEE Microwave and
Wireless Components Letters, vol. 19, no. 1, pp. 45-47, Jan. 2009.
[52] A. Lai, T. Itoh, C. Caloz, “Composite right/left-handed transmission line
metamaterials” IEEE Microwave Magazine, Issue 3, Vol. 5, pp. 34-50,
Sept. 2004.
[53] H. Veenstra, G. A. M. Hurkx, D. van Goor, H. Brekelmans, and J.R. Long,
“Analyses and design of bias circuits tolerating output voltages above
BVCEO,” IEEE Journal of Solid-State Circuits, vol. 40, no. 10, pp. 2008-
2018, Oct. 2005.
[54] V.G. Veselago, “The Electrodynamics of Substances with Simultaneously
Negative Values of ε and μ,” Soviet Physics Uspekhi, 10 (4): 509-514,
1968.
[55] Y. S. Noh and C. S. Park, "PCS/W-CDMA Dual-Band MMIC Power
Amplifier With a Newly Proposed Linearizing Bias Circuit," IEEE Journal
of Solid-State Circuits, vol. 37, no. 9, pp. 1096-1099, Sept 2002.
[56] H. Portela, V. Subramanian, and G. Boeck, “Fully integrated high
efficiency K-band PA in 0.18 um CMOS technology,’’ Proceedings of the
IEEE/SBMO International Microwave and Optoelectronics Conference
IMOC, Brazil, pp. 393-396, Nov. 2009.
[57] R. Doerner and A. Rumiantsev, “Verification of the wafer-level LRM+
calibration technique for GaAs applications up to 110 GHz,’’ ARFTG
Conference Digest, ARFTG Conference Digest 65th, USApp. 5, June 2005.
[58] H. Li, H. M. Rein, T. Suttorp, and J. Boeck, “Fully Integrated SiGe VCOs
with Powerful Output Buffer for 77 GHz Automotive Radar System and
applications around 100 GHz,” IEEE JSSC, vol. 39, no. 10, pp. 1650-1658,
Oct. 2004.
[59] S. T. Nicolson, K.H.K. Yau, S. Pruvost, V. Danelon, P. Chevalier, P.
Garcia, A. Chantre, B. Sautreuil, S. and P. Voinigescu, “A Low-Voltage
SiGe BiCMOS 77-GHz Automotive Radar Chipset,” IEEE Trans. Microw.
Theory Tech, vol. 56, no. 5, pp. 1092-1104, May 2008.
[60] M. Bohsali, A.M. Niknejad, “Current combining 60GHz CMOS power
amplifiers,” IEEE RFIC, pp. 31-34, Jun. 2009.
[61] S. Glisic, C. Scheytt, “A 13.5-to-17 dBm P1dB, selective, high-gain power
amplifier for 60 GHz applications in SiGe” IEEE BCTM, pp. 65–68, Oct.
2008.
[62] C. Wang, Y. Cho, C. Lin, H. Wang, C. Chen, D. Niu, J. Yeh, C. Lee, and J.
Chern, “ A 60 GHz transmitter with integrated antenna in 0.18 μm SiGe
BiCMOS technology,” IEEE ISSCC, pp. 186-187, Feb. 2006.
[63] C. Marcu, D. Chowdhury, C. Thakkar, Ling-Kai Kong, M. Tabesh, Jung-
Dong Park, Yanjie Wang, B. Afshar, A. Gupta, A. Arbabian, S. Gambini,
R. Zamani, A.M. Niknejad, E. Alon, “A 90 nm CMOS low-power 60 GHz
transceiver with integrated baseband circuitry,” IEEE ISSCC, pp. 314–315,
Feb. 2009.
[64] W. Shin, M. Uzunkol, R.A. Alhalab, G.M. Rebeiz, “60 GHz Low Power
1.5 Gb/s ASK Transmitter in 90 nm CMOS with On-Board Yagi-Uda
Antenna” IEEE EuMC., .pp. 272-275, Sept. 2010.
[65] F. Lin, J. Brinkhoff, K. Kang, D. D. Pham, and X. Yuan, “A Low Power
60GHz OOK Transceiver System in 90nm CMOS with Innovative On-Chip
AMC Antenna,” IEEE ASSCC, pp.3492-352, Nov. 2009.
[66] W. Shin, M. Uzunkol, R. A. Alhalabi and G. M. Rebeiz, “60 GHz Low
Power 1.5 Gb/s ASK Transmitter in 90 nm CMOS with On-Board Yagi-
Uda Antenna” IEEE EuMC, pp. 272-275, Sept. 2010.
[67] Jri Lee, Yentso Chen, Yenlin Huang, “A Low-Power Low-Cost Fully-
Integrated 60-GHz Transceiver System With OOK Modulation and On-
Board Antenna Assembly,” IEEE JSSC, vol. 45, no. 2, pp. 264-275, Feb.
2010.
[68] Jae Jin Lee, Chul Soon Park, “60-GHz Gigabits-Per-Second OOK
Modulator With High Output Power in 90-nm CMOS,” IEEE Trans. On
Circuits and Systems-II, vol. 54, no. 5, pp. 249-253, May. 2011.
[69] Jae Jin Lee, Chul Woo Byeon, Ki Chan Eun, IEEE, Inn Yeal Oh, Chul
Soon Park, “60-GHz Gigabits-Per-Second OOK Modulator With High
Output Power in 90-nm CMOS,” IEEE CSICS, pp. 1-4, Oct. 2010.
[70] F. Zhang, E. Skafidas, and W. Shieh, “60 GHz doublebalanced up-con-
version mixer on 130 nm CMOS technology,” IEEE Electron. Letters, vol.
44, no. 10, pp. 633–634, May 2008.
[71] I. C. H. Lai, Y. Kambayashi, and M. Fujishima, “50 GHz double-bal-anced
up-conversion mixer using CMOS 90 nm process,” IEEE Int. Circuits Syst.
Symp, pp. 2542–2545, May 2007.
[72] J. H. Chen, C. C. Kuo, Y. M. Hsin, and H. Wang, “A 15–50 GHz
broadband resistive FET ring mixer using 0.18-µm CMOS technology,”
IEEE IMS, 2010, pp. 784–787.
[73] J. H. Tsai, P. S. Wu, C. S. Lin, T. W. Huang, J.GJ. Chern, W. C. Huang, "A
25-75 GHz broadband Gilbert-Cell mixer using 90-nm CMOS technology",
IEEE Microw. Wireless Compon. Lett., vol. 17, no. 4, pp. 247-249, April
2007.
[74] G. Conzalez, Microwave Transistor Amplifiers: Analysis and Design.
Prentice Hall NJ, 1997.
[75] H. Hsieh-Hung, W. Po-Yi, J. Chewn-Pu, H. Fu-Lung, H. Guo-Wei “60GHz
high-gain low-noise amplifiers with a common-gate inductive feedback in
65nm CMOS” IEEE RFIC, pp. 1-4, June 2011.
[76] J.R. Long, “Monolithic Transformers for Silicon RF IC Design” IEEE
JSSC, vol. 44, no. 10, pp. 1368-1382, Oct. 2000.
[77] D. Chowdhury, P. Reynaert, A. M. Niknejad, “Design Considerations for
60 GHz Transformer-Coupled CMOS Power Amplifiers” IEEE JSSC, vol.
44, no. 10, pp. 2733-2744, Oct. 2009.
[78] C.Y. Law, A.–V. Pham, “A high-gain 60GHz power amplifier with 20dBm
output power in 90nm CMOS” IEEE ISSCC, pp. 426-427, Feb. 2010.
[79] W.L. Chan, J.R. Long, “A 58–65 GHz Neutralized CMOS Power Amplifier
With PAE Above 10% at 1-V Supply” IEEE JSSC, vol. 45, no. 3, pp. 554-
564, Mar. 2010.
[80] J.Y.-C. Liu, Q.J. Gu, A. Tang, N.-Y Wang, M.-C.F. Chang “A 60 GHz
Tunable Output Profile Power Amplifier in 65 nm CMOS” IEEE MWCL,
pp. 377-379, July 2011.
[81] E. Cohen, O. Degani, S. Ravid, D. Ritter, “Robust 60 GHz 90nm and 40nm
CMOS Wideband Neutralized Amplifiers with 23dB gain 4.6dBNF and
24% PAE,” IEEE SiRF, pp. 207-210, Sept. 2011.
[82] E. Laskin, P. Chevalier, A. Chantre, B. Sautreuil, S. P. Voinigescu, “165-
GHz Transceiver in SiGe Technology,” in IEEE J. Solid-State Circuits, vol.
43, no. 5, pp. 1087-1100, May. 2008.
[83] J.-F. Yeh, J.-H. Tsai, T.-W. Huang, “A multi-mode 60-GHz power
amplifier with a novel power combination technique,” IEEE RFIC, pp. 61-
64, June 2012.
[84] J. Chen, A.M. Niknejad, “A compact 1V 18.6dBm 60GHz power amplifier
in 65nm CMOS,” IEEE ISSCC, pp. 432-433, Feb. 2012.
[85] M. Abbasi, T. Kjellberg, A. de Graauw, E. van der Heijden,
R. Roovers, H. Zirath, “A broadband differential cascode power amplifier
in 45 nm CMOS for high-speed 60 GHz system-on-chip,” IEEE RFIC, pp.
533-536, June 2010.
[86] J. Essing, R. Mahmoudi, Y. Pei, A. van Roermund, “A fully integrated
60GHz distributed transformer power amplifier in bulky CMOS 45nm,”
IEEE RFIC, pp. 1-4, June 2011.
[87] D. Dawn, S. Sarkar, P. Sen, B. Perumana, D. Yeh, S. Pinel, J. Laskar, “17-
dB-gain CMOS power amplifier at 60GHz,” IEEE IMS, pp. 859-862, June
2008.
[88] M. Tanomura, Y. Hamada, S. Kishimoto, M. Ito, N. Orihashi, K.
Maruhashi, H. Shimawaki, “TX and RX Front-Ends for 60GHz Band in
90nm Standard Bulk CMOS,” IEEE ISSCC, pp. 558-635, Feb. 2008.
[89] S. Leuschner, J. –E. Mueller, H. Klar, “A 1.8GHz wide-band stacked-
cascode CMOS power amplifier for WCDMA applications in 65nm
standard CMOS,’’ IEEE RFIC, pp. 1-4, Jun. 2011.
[90] M. Abbasi, T. Kjellberg, A. de Graauw, R. Roovers, H. Zirath, “A direct
conversion quadrature transmitter with digital interface in 45 nm CMOS for
high-speed 60 GHz communications,” IEEE RFIC, pp. 1-4, June 2011.
[91] K. Okada, K. Matsushita, K. Bunsen, R. Murakami, A. Musa, T. Sato, H.
Asada, N. Takayama, Ning Li, S. Ito, W. Chaivipas, R. Minami, A.
Matsuzawa, “A 60GHz 16QAM/8PSK/QPSK/BPSK direct-conversion
transceiver for IEEE 802.15.3c,” IEEE ISSCC, pp. 160-162, Feb. 2011.
[92] Dixian Zhao, S. Kulkarni, P. Reynaert, “A 60GHz outphasing transmitter in
40nm CMOS with 15.6dBm output power,” IEEE ISSCC, pp. 170-172,
Feb. 2012.
[93] Q. Tang, S.K.S. Gupta, L. Schwiebert, “BER performance analysis of an
on-off keying based minimum energy coding for energy constrained
wireless sensor applications,” IEEE ICC, pp. 2734-2738, 2005.
List of Publications and
Workshops
[1] A. Hamidian, A. Malignaggi, and G. Boeck, “High Performance
Transformer Based mm-Wave CMOS Power Amplifier,” IEEE EuMic, Oct.
2013
[2] A. Hamidian, and G. Boeck, “24 GHz CMOS Transceiver and Wireless
Sensor Network for Indoor Localization – Part A Transceiver design,’’
IEEE Workshop RFIC-IMS, June. 2013.
[3] A. Hamidian, R. Ebelt, D. Shmakov, M. Vossiek, T. Zhang, V.
Subramanian, and G. Boeck, “24 GHz CMOS Transceiver with Novel T/R
Switching Concept for Indoor Localization,’’ IEEE RFIC, June. 2013
[4] A. Hamidian, A. Malignaggi, Ran Shu, A. M. Kamal, G. Boeck, “Multi-
Gigabit 60 GHz OOK Front-End in 90 nm CMOS,’’ IEEE SiRF, pp. 96-98,
Jan. 2013.
[5] A. Hamidian, A. Malignaggi, Ran Shu, A. M. Kamal, G. Boeck, “A
Wideband Gilbert Cell Up-Converter in 90 nm CMOS for 60 GHz
Application,’’ IEEE RFIT, pp. 50-52, Nov. 2012.
[6] A. Hamidian, and G. Boeck, “Novel 60 GHz OOK transmitter in 90 nm
CMOS,” Kleinheubacher Tagung URSI 2012, Miltenberg, Germany, Sep.
2012
[7] A. Hamidian, V. Subramanian, Ran Shu, A. Malignaggi, G. Boeck,
“Coplanar Transmission Lines on Silicon Substrates for the mm-Wave
Applications,” IEEE Mikon, pp. 27-30, May. 2012.
[8] A. Hamidian, V. Subramanian, R. Doerner, A. Malignaggi, M. K. Ali, and
G. Boeck, “60 GHz power amplifier utilizing 90 nm CMOS technology,”
IEEE RFIT Conference, pp. 73-76, Dec. 2011.
[9] A. Hamidian, V. Subramanian, R. Shu, A. Malignaggi, and G. Boeck,
“Device Characterization in 90 nm CMOS up to 110 GHz,” IEEE SCD, pp.
73-76, Sep. 2011
[10] A. Hamidian, V. Subramanian, Ran Shu, A. Malignaggi, G. Boeck,
“Extraction of RF Feeding Structures for Accurate Device Modeling up to
100 GHz,” IEEE IMWS, pp. 113-116, Sept. 2011.
[11] A. Hamidian, V. Subramanian, and G. Boeck, “Design of broad-band mm-
wave SiGe power amplifiers applying full EM simulation,” IEEE IMWS,
pp. 632-635, Sep. 2011.
[12] A. Hamidian, V. Subramanian, R. Doerner, G. Boeck, “A 60 GHz 18 dBm
Power Amplifier Utilizing 0.25 μm SiGe HBT,’’ IEEE EuMC/EuMIC, pp.
1686-1689/pp. 444–447, Oct. 2010.
[13] A. Hamidian and V. Subramanian, “Right and left handed transmission
lines for millimetre wave applications,” IEEE GeMiC, pp. 227-230, Mar.
2010.
[14] A. Hamidian, Z. Zhang, V. Subramanian, and G. Boeck, “Modeling of
MIM capacitors in 0.25 µm SiGe BiCMOS process up to 140 GHz,” IEEE
Prime, pp. 1-4, Jul. 2010
[15] A. Hamidian, G. Boeck, “60 GHz Wide-band Power Amplifier,” IEEE
BCTM, pp. 47-50, Oct. 2009.
[16] A. Hamidian, H. Portela, and G. Boeck, “High power V-band power
amplifier,’’ IEEE IMOC, pp. 783-786, Nov. 2009.
[17] A. Malignaggi, A. Hamidian, R. Shu, M. K. Ali, and G. Boeck, “Analytical
Study and Performance Comparison of mm-Wave CMOS LNAs,” IEEE
EuMic, pp. 1-4, Oct. 2012.
[18] A. Malignaggi, A. Hamidian, and G. Boeck, “A 60 GHz fully differential
LNA in 90 nm CMOS Technology,” IEEE IMOC, pp. 1-4, Oct. 2012.
[19] R. Shu, A. Hamidian, A. Malignaggi, M. K. Ali, and G. Boeck, “A 36-49
GHz Injection-locked Frequency Divider with Transformer-based Dual-
path Injection,” IEEE SiRF, pp. 114-116, Jan. 2013.
[20] P. Harati, A. Hamidian, A. Malignaggi, and G. Boeck, “48 GHz power
amplifier for mm-wave LO distribution circuitry in 90 nm
CMOS,” Proceedings of the IEEE Germany Student Conference, Nov.
2012.
[21] M. K. Ali, A. Hamidian, R. Shu, A. Malignaggi, and G. Boeck , “45 GHz
low power static frequency divider in 90 nm CMOS ,” IEEE RFIT, pp. 65-
67, Nov. 2012.
[22] R. Shu, A. Hamidian, A. Malignaggi, M. K. Ali, and G. Boeck, “A 40 GHz
CMOS voltage-controlled oscillator with resonated negative-conductance
cell,” IEEE RFIT, pp. 77-79, Nov. 2012.
[23] A. Malignaggi, A. Hamidian, R. Shu, M. K. Ali, A. Kravets, and G. Boeck,
“60 GHz LNAs in 90 nm CMOS technology,” IEEE ISSSE, pp. 1-4, Oct.
2012.
[24] T. Zhang, A. Malignaggi, A. Hamidian, V. Subramanian, and G. Boeck,
“Low-loss 24-GHz passive baluns for on-chip integration ,” IEEE ISSSE,
pp. 1-4, Oct. 2012
[25] A. Malignaggi, A. Hamidian, V. Subramanian, R. Shu, and G. Boeck,
“CMOS varactor model extraction up to 110 GHz,” IEEE Mikon, pp. 300-
303, May 2012.
[26] V. Subramanian, A. Hamidian, T. Zhang, R. Shu, A. Malignaggi, M. Kamal
and G. Boeck "CMOS Transceiver Circuits for K-band and V- band
Applications" RadioTec Workshop, Oct. 2011.
[27] R. Shu, V. Subramanian, A. Hamidian, A. Malignaggi, and G. Boeck,
“Characterization of LC-tank circuits for mm-wave applications in 90 nm
CMOS,” IEEE SCD, pp. 1-4, Sep. 2011.
[28] M. Haase, V. Subramanian, T. Zhang, and A. Hamidian, “Comparison of
CMOS VCO topologies,” IEEE PRIME, pp.1-4 , Jul. 2010
[29] G. Boeck, W. Keusgen, A. Hamidian, and V. Subramanian, “PAs for mmW
applications: A comparison of technologies and achievements,” IEEE
Workshop RFIC, Jun. 2009
[30] V. Subramanian, A. Hamidian, W. Keusgen, V.H. Do, and G. Boeck,
“Layout design considerations for 60 GHz SiGe power amplifiers,” IEEE
Mikon, Poland, pp. 1-4, May 2008.